The Experts below are selected from a list of 11097 Experts worldwide ranked by ideXlab platform
A. Larsson - One of the best experts on this subject based on the ideXlab platform.
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monolithic integration of vertical cavity surface emitting laser and diffractive optical element for advanced Beam Shaping
IEEE Photonics Technology Letters, 1999Co-Authors: H. Martinsson, J. Bengtsson, M. Ghisoni, A. LarssonAbstract:We have demonstrated a vertical-cavity surface-emitting laser (VCSEL) with a monolithically integrated diffractive optical element (DOE) for advanced Beam Shaping. The DOE is a two-level surface relief, etched into the GaAs substrate beneath a bottom-emitting VCSEL. The combination generates a 4/spl times/4 array of focused spots 10 mm from the substrate with spot sizes down to less than 400 /spl mu/m, almost at the diffraction limit. Diffraction efficiencies of 29% and uniformity errors of 14% were measured.
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Monolithic integration of vertical-cavity surface-emitting laser and diffractive optical element for advanced Beam Shaping
IEEE Photonics Technology Letters, 1999Co-Authors: H. Martinsson, J. Bengtsson, M. Ghisoni, A. LarssonAbstract:We have demonstrated a vertical-cavity surface-emitting laser (VCSEL) with a monolithically integrated diffractive optical element (DOE) for advanced Beam Shaping. The DOE is a two-level surface relief, etched into the GaAs substrate beneath a bottom-emitting VCSEL. The combination generates a 4×4 array of focused spots 10 mm from the substrate with spot sizes down to less than 400 μm, almost at the diffraction limit. Diffraction efficiencies of 29% and uniformity errors of 14% were measured.
H. Martinsson - One of the best experts on this subject based on the ideXlab platform.
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monolithic integration of vertical cavity surface emitting laser and diffractive optical element for advanced Beam Shaping
IEEE Photonics Technology Letters, 1999Co-Authors: H. Martinsson, J. Bengtsson, M. Ghisoni, A. LarssonAbstract:We have demonstrated a vertical-cavity surface-emitting laser (VCSEL) with a monolithically integrated diffractive optical element (DOE) for advanced Beam Shaping. The DOE is a two-level surface relief, etched into the GaAs substrate beneath a bottom-emitting VCSEL. The combination generates a 4/spl times/4 array of focused spots 10 mm from the substrate with spot sizes down to less than 400 /spl mu/m, almost at the diffraction limit. Diffraction efficiencies of 29% and uniformity errors of 14% were measured.
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Monolithic integration of vertical-cavity surface-emitting laser and diffractive optical element for advanced Beam Shaping
IEEE Photonics Technology Letters, 1999Co-Authors: H. Martinsson, J. Bengtsson, M. Ghisoni, A. LarssonAbstract:We have demonstrated a vertical-cavity surface-emitting laser (VCSEL) with a monolithically integrated diffractive optical element (DOE) for advanced Beam Shaping. The DOE is a two-level surface relief, etched into the GaAs substrate beneath a bottom-emitting VCSEL. The combination generates a 4×4 array of focused spots 10 mm from the substrate with spot sizes down to less than 400 μm, almost at the diffraction limit. Diffraction efficiencies of 29% and uniformity errors of 14% were measured.
M. Ghisoni - One of the best experts on this subject based on the ideXlab platform.
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monolithic integration of vertical cavity surface emitting laser and diffractive optical element for advanced Beam Shaping
IEEE Photonics Technology Letters, 1999Co-Authors: H. Martinsson, J. Bengtsson, M. Ghisoni, A. LarssonAbstract:We have demonstrated a vertical-cavity surface-emitting laser (VCSEL) with a monolithically integrated diffractive optical element (DOE) for advanced Beam Shaping. The DOE is a two-level surface relief, etched into the GaAs substrate beneath a bottom-emitting VCSEL. The combination generates a 4/spl times/4 array of focused spots 10 mm from the substrate with spot sizes down to less than 400 /spl mu/m, almost at the diffraction limit. Diffraction efficiencies of 29% and uniformity errors of 14% were measured.
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Monolithic integration of vertical-cavity surface-emitting laser and diffractive optical element for advanced Beam Shaping
IEEE Photonics Technology Letters, 1999Co-Authors: H. Martinsson, J. Bengtsson, M. Ghisoni, A. LarssonAbstract:We have demonstrated a vertical-cavity surface-emitting laser (VCSEL) with a monolithically integrated diffractive optical element (DOE) for advanced Beam Shaping. The DOE is a two-level surface relief, etched into the GaAs substrate beneath a bottom-emitting VCSEL. The combination generates a 4×4 array of focused spots 10 mm from the substrate with spot sizes down to less than 400 μm, almost at the diffraction limit. Diffraction efficiencies of 29% and uniformity errors of 14% were measured.
J. Bengtsson - One of the best experts on this subject based on the ideXlab platform.
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monolithic integration of vertical cavity surface emitting laser and diffractive optical element for advanced Beam Shaping
IEEE Photonics Technology Letters, 1999Co-Authors: H. Martinsson, J. Bengtsson, M. Ghisoni, A. LarssonAbstract:We have demonstrated a vertical-cavity surface-emitting laser (VCSEL) with a monolithically integrated diffractive optical element (DOE) for advanced Beam Shaping. The DOE is a two-level surface relief, etched into the GaAs substrate beneath a bottom-emitting VCSEL. The combination generates a 4/spl times/4 array of focused spots 10 mm from the substrate with spot sizes down to less than 400 /spl mu/m, almost at the diffraction limit. Diffraction efficiencies of 29% and uniformity errors of 14% were measured.
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Monolithic integration of vertical-cavity surface-emitting laser and diffractive optical element for advanced Beam Shaping
IEEE Photonics Technology Letters, 1999Co-Authors: H. Martinsson, J. Bengtsson, M. Ghisoni, A. LarssonAbstract:We have demonstrated a vertical-cavity surface-emitting laser (VCSEL) with a monolithically integrated diffractive optical element (DOE) for advanced Beam Shaping. The DOE is a two-level surface relief, etched into the GaAs substrate beneath a bottom-emitting VCSEL. The combination generates a 4×4 array of focused spots 10 mm from the substrate with spot sizes down to less than 400 μm, almost at the diffraction limit. Diffraction efficiencies of 29% and uniformity errors of 14% were measured.
Stuart Edwardson - One of the best experts on this subject based on the ideXlab platform.
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multi imaging based Beam Shaping for ultrafast laser material processing using spatial light modulators
Optics and Lasers in Engineering, 2019Co-Authors: Jiangning Li, Joerg Schille, Udo Loeschner, Zheng Kuang, Walter Perrie, Yue Tang, Geoff Dearden, Stuart EdwardsonAbstract:Abstract An imaging based Beam Shaping technique combined with parallel Beam processing has been demonstrated. Binary and intensity masks have been designed and applied on phase only spatial light modulator (SLM) to shape the input laser Beam in the desired profile and intensity distribution. A second SLM with a computer generated hologram(CGH) applied was used to split the incident picosecond laser Beam. Hence, the laser Beam was effectively converted to required target shape, intensity distribution and a separated pattern then reconstructed at the image plane of a focusing lens. The machined footprints on a polished Titanium (Ti6Al4V) substrate accurately match the desired Beam in shape and depth distribution.
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imaging based amplitude laser Beam Shaping for material processing by 2d reflectivity tuning of a spatial light modulator
Applied Optics, 2016Co-Authors: Jiangning Li, Zheng Kuang, Walter Perrie, Stuart Edwardson, Geoff DeardenAbstract:We have demonstrated an imaging-based amplitude laser-Beam-Shaping technique for material processing by 2D reflectivity tuning of a spatial light modulator. Intensity masks with 256 gray levels were designed to shape the input laser Beam in the outline profile and inside intensity distribution. Squared and circular flattop Beam shapes were obtained at the diffractive near-field and then reconstructed at an image plane of an f-theta lens (f∼100 mm). The observed intensity distribution inside the Beam-Shaping geometry was much more even than using binary masks. The ablation footprint well matches the desired Beam shape.
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ultrafast laser Beam Shaping for material processing at imaging plane by geometric masks using a spatial light modulator
Optics and Lasers in Engineering, 2015Co-Authors: Zheng Kuang, Jiangning Li, Walter Perrie, Stuart Edwardson, Geoff DeardenAbstract:We have demonstrated an original ultrafast laser Beam Shaping technique for material processing using a spatial light modulator (SLM). Complicated and time-consuming diffraction far-field phase hologram calculations based on Fourier transformations are avoided, while simple and direct geometric masks are used to shape the incident Beam at diffraction near-field. Various Beam intensity shapes, such as square, triangle, ring and star, are obtained and then reconstructed at the imaging plane of an f-theta lens. The size of the shaped Beam is approximately 20 µm, which is comparable to the Beam waist at the focal plane. A polished stainless steel sample is machined by the shaped Beam at the imaging plane. The shape of the ablation footprint well matches the Beam shape.