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Panagiotis D Christofides - One of the best experts on this subject based on the ideXlab platform.
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multiscale computational fluid dynamics modeling of thermal atomic layer deposition with application to Chamber Design
Chemical Engineering Research & Design, 2019Co-Authors: Yichi Zhang, Yangyao Ding, Panagiotis D ChristofidesAbstract:Author(s): Zhang, Yichi | Advisor(s): Christofides, Panagiotis D. | Abstract: This work develops a first-principles-based three-dimensional, multiscale computational fluid dynamics (CFD) model, together with reactor geometry optimizations, of SiO2 thin-film thermal atomic layer deposition (ALD) using bis(tertiary-butylamino)silane (BTBAS) and ozone as precursors. Specifically, an accurate macroscopic CFD model of the ALD reactor Chamber gas-phase development is integrated with a detailed microscopic kinetic Monte-Carlo (kMC) model that was developed in [1], accounting for the microscopic lattice structure, atomic interactions and detailed surface chemical reactions. The multiscale information exchange and the transient simulation of the microscopic distributed kMC algorithms and the macroscopic CFD model are achieved through a parallel processing message passing interface (MPI) structure. Additionally, density functional theory (DFT)-based calculations are used compute the key thermodynamic and kinetic parameters for the microscopic thin-film growth process. Recognizing the transient non-uniformity and the possibility to reduce the current ALD cycle time, the optimal configuration of reactor geometry is Designed including a showerhead panel adjustment and geometry modifications on reactor inlet and upstream. It is demonstrated that with suitable reactor Chamber Design the required BTBAS ALD half-cycle time can be reduced by 39.6%.
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multiscale computational fluid dynamics modeling of thermal atomic layer deposition with application to Chamber Design
Chemical Engineering Research & Design, 2019Co-Authors: Yichi Zhang, Yangyao Ding, Panagiotis D ChristofidesAbstract:Abstract This work develops a first-principles-based three-dimensional, multiscale computational fluid dynamics (CFD) model, together with reactor geometry optimizations, of SiO2 thin-film thermal atomic layer deposition (ALD) using bis(tertiary-butylamino)silane (BTBAS) and ozone as precursors. Specifically, an accurate macroscopic CFD model of the ALD reactor Chamber gas-phase development is integrated with a detailed microscopic kinetic Monte Carlo (kMC) model that was developed in Ding et al. (2019) , accounting for the microscopic lattice structure, atomic interactions and detailed surface chemical reactions. The multiscale information exchange and the transient simulation of the microscopic distributed kMC algorithms and the macroscopic CFD model are achieved through a parallel processing message passing interface (MPI) structure. Additionally, density functional theory (DFT)-based calculations are adopted to compute the key thermodynamic and kinetic parameters for the microscopic thin-film growth process. Recognizing the transient non-uniformity and the possibility to reduce the current ALD cycle time, the optimal configuration of reactor geometry is Designed and evaluated including a showerhead panel adjustment and geometry modifications on reactor inlet and upstream. It is demonstrated that with suitable reactor Chamber Design the required BTBAS ALD half-cycle time can be reduced by 39.6%.
Yichi Zhang - One of the best experts on this subject based on the ideXlab platform.
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multiscale computational fluid dynamics modeling of thermal atomic layer deposition with application to Chamber Design
Chemical Engineering Research & Design, 2019Co-Authors: Yichi Zhang, Yangyao Ding, Panagiotis D ChristofidesAbstract:Author(s): Zhang, Yichi | Advisor(s): Christofides, Panagiotis D. | Abstract: This work develops a first-principles-based three-dimensional, multiscale computational fluid dynamics (CFD) model, together with reactor geometry optimizations, of SiO2 thin-film thermal atomic layer deposition (ALD) using bis(tertiary-butylamino)silane (BTBAS) and ozone as precursors. Specifically, an accurate macroscopic CFD model of the ALD reactor Chamber gas-phase development is integrated with a detailed microscopic kinetic Monte-Carlo (kMC) model that was developed in [1], accounting for the microscopic lattice structure, atomic interactions and detailed surface chemical reactions. The multiscale information exchange and the transient simulation of the microscopic distributed kMC algorithms and the macroscopic CFD model are achieved through a parallel processing message passing interface (MPI) structure. Additionally, density functional theory (DFT)-based calculations are used compute the key thermodynamic and kinetic parameters for the microscopic thin-film growth process. Recognizing the transient non-uniformity and the possibility to reduce the current ALD cycle time, the optimal configuration of reactor geometry is Designed including a showerhead panel adjustment and geometry modifications on reactor inlet and upstream. It is demonstrated that with suitable reactor Chamber Design the required BTBAS ALD half-cycle time can be reduced by 39.6%.
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multiscale computational fluid dynamics modeling of thermal atomic layer deposition with application to Chamber Design
Chemical Engineering Research & Design, 2019Co-Authors: Yichi Zhang, Yangyao Ding, Panagiotis D ChristofidesAbstract:Abstract This work develops a first-principles-based three-dimensional, multiscale computational fluid dynamics (CFD) model, together with reactor geometry optimizations, of SiO2 thin-film thermal atomic layer deposition (ALD) using bis(tertiary-butylamino)silane (BTBAS) and ozone as precursors. Specifically, an accurate macroscopic CFD model of the ALD reactor Chamber gas-phase development is integrated with a detailed microscopic kinetic Monte Carlo (kMC) model that was developed in Ding et al. (2019) , accounting for the microscopic lattice structure, atomic interactions and detailed surface chemical reactions. The multiscale information exchange and the transient simulation of the microscopic distributed kMC algorithms and the macroscopic CFD model are achieved through a parallel processing message passing interface (MPI) structure. Additionally, density functional theory (DFT)-based calculations are adopted to compute the key thermodynamic and kinetic parameters for the microscopic thin-film growth process. Recognizing the transient non-uniformity and the possibility to reduce the current ALD cycle time, the optimal configuration of reactor geometry is Designed and evaluated including a showerhead panel adjustment and geometry modifications on reactor inlet and upstream. It is demonstrated that with suitable reactor Chamber Design the required BTBAS ALD half-cycle time can be reduced by 39.6%.
Jan Muhr - One of the best experts on this subject based on the ideXlab platform.
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low cost Chamber Design for simultaneous co2 and o2 flux measurements between tree stems and the atmosphere
Tree Physiology, 2021Co-Authors: Juliane Helm, Henrik Hartmann, Martin Gobel, Boaz Hilman, David Herrera, Jan MuhrAbstract:Tree stem CO2 efflux is an important component of ecosystem carbon fluxes and has been the focus of many studies. While CO2 efflux can easily be measured, a growing number of studies have shown that it is not identical with actual in situ respiration. Complementing measurements of CO2 flux with simultaneous measurements of O2 flux provides an additional proxy for respiration, and the combination of both fluxes can potentially help getting closer to actual measures of respiratory fluxes. To date, however, the technical challenge to measure relatively small changes in O2 concentration against its high atmospheric background has prevented routine O2 measurements in field applications. Here we present a new and low-cost field-tested device for autonomous real-time and quasi-continuous long-term measurements of stem respiration by combining CO2 (NDIR based) and O2 (quenching based) sensors in a tree stem Chamber. Our device operates as a cyclic closed system and measures changes in both CO2 and O2 concentration within the Chamber over time. The device is battery-powered with a > 1 week power independence and data acquisition is conveniently achieved by an internal logger. Results from both field and laboratory tests document that our sensors provide reproducible measurements of CO2 and O2 exchange fluxes under varying environmental conditions.
Mohammed Farid - One of the best experts on this subject based on the ideXlab platform.
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an investigation on pulsed electric fields technology using new treatment Chamber Design
Innovative Food Science and Emerging Technologies, 2007Co-Authors: Sally Alkhafaji, Mohammed FaridAbstract:A pulsed electric field (PEF) system was Designed and constructed using modern IGBT technology. The main focus of this work was to Design a new PEF treatment Chamber that operate at high electric field intensities with limited increase in liquid temperature and limited fouling of electrodes. Four multi-pass treatment Chambers were Designed consisting of two stainless steel mesh electrodes in each Chamber, with the treated fluid flowing through the openings of the mesh electrodes. The two electrodes are electrically isolated from each other by an insulator element Designed to form a small orifice where most of the electric field is concentrated. Dielectric breakdown inside the Chambers was prevented by removing the electrodes far from the narrow gap. The effect of PEF treatment on the inactivation of gram-negative Escherichia coli ATCC 25922 suspended in simulated milk ultra-filtrate (SMUF) of 100%, 66.67% and 50% w/w was investigated. Treatments with the same electrical input power but with higher electric field strengths provided larger degree of killing. The effect of PEF treatment using suspensions at different flow rates and different pulse frequencies was also investigated. In general, the inactivation rate of E. coli increased with increasing electric field strength, treatment time and processing temperature. More than 6 log reductions in E. coli suspended in SMUF was achieved using electric field intensity in the range of (37.2–49.6 kV/cm) with a treatment temperature not exceeding 38 °C.
Yangyao Ding - One of the best experts on this subject based on the ideXlab platform.
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multiscale computational fluid dynamics modeling of thermal atomic layer deposition with application to Chamber Design
Chemical Engineering Research & Design, 2019Co-Authors: Yichi Zhang, Yangyao Ding, Panagiotis D ChristofidesAbstract:Author(s): Zhang, Yichi | Advisor(s): Christofides, Panagiotis D. | Abstract: This work develops a first-principles-based three-dimensional, multiscale computational fluid dynamics (CFD) model, together with reactor geometry optimizations, of SiO2 thin-film thermal atomic layer deposition (ALD) using bis(tertiary-butylamino)silane (BTBAS) and ozone as precursors. Specifically, an accurate macroscopic CFD model of the ALD reactor Chamber gas-phase development is integrated with a detailed microscopic kinetic Monte-Carlo (kMC) model that was developed in [1], accounting for the microscopic lattice structure, atomic interactions and detailed surface chemical reactions. The multiscale information exchange and the transient simulation of the microscopic distributed kMC algorithms and the macroscopic CFD model are achieved through a parallel processing message passing interface (MPI) structure. Additionally, density functional theory (DFT)-based calculations are used compute the key thermodynamic and kinetic parameters for the microscopic thin-film growth process. Recognizing the transient non-uniformity and the possibility to reduce the current ALD cycle time, the optimal configuration of reactor geometry is Designed including a showerhead panel adjustment and geometry modifications on reactor inlet and upstream. It is demonstrated that with suitable reactor Chamber Design the required BTBAS ALD half-cycle time can be reduced by 39.6%.
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multiscale computational fluid dynamics modeling of thermal atomic layer deposition with application to Chamber Design
Chemical Engineering Research & Design, 2019Co-Authors: Yichi Zhang, Yangyao Ding, Panagiotis D ChristofidesAbstract:Abstract This work develops a first-principles-based three-dimensional, multiscale computational fluid dynamics (CFD) model, together with reactor geometry optimizations, of SiO2 thin-film thermal atomic layer deposition (ALD) using bis(tertiary-butylamino)silane (BTBAS) and ozone as precursors. Specifically, an accurate macroscopic CFD model of the ALD reactor Chamber gas-phase development is integrated with a detailed microscopic kinetic Monte Carlo (kMC) model that was developed in Ding et al. (2019) , accounting for the microscopic lattice structure, atomic interactions and detailed surface chemical reactions. The multiscale information exchange and the transient simulation of the microscopic distributed kMC algorithms and the macroscopic CFD model are achieved through a parallel processing message passing interface (MPI) structure. Additionally, density functional theory (DFT)-based calculations are adopted to compute the key thermodynamic and kinetic parameters for the microscopic thin-film growth process. Recognizing the transient non-uniformity and the possibility to reduce the current ALD cycle time, the optimal configuration of reactor geometry is Designed and evaluated including a showerhead panel adjustment and geometry modifications on reactor inlet and upstream. It is demonstrated that with suitable reactor Chamber Design the required BTBAS ALD half-cycle time can be reduced by 39.6%.