The Experts below are selected from a list of 76758 Experts worldwide ranked by ideXlab platform

M Kramkowska - One of the best experts on this subject based on the ideXlab platform.

  • silicon anisotropic etching in alkaline solutions iv the effect of organic and inorganic agents on silicon anisotropic etching process
    Sensors and Actuators A-physical, 2001
    Co-Authors: Irena Zubel, Irena Barycka, Kamilla Kotowska, M Kramkowska
    Abstract:

    Abstract Silicon anisotropic etching process in organic and inorganic solutions has been studied. Experimental results on silicon etching in KOH and TMAH solutions with and without IPA addition have been presented. Etching rate curves versus solution concentration were plotted for different crystallographic planes with special emphasis on high-indexed ones. A comparison of our own experimental results with the results of other authors, concerning silicon anisotropic etching process in hydroxides of other metals from the first group of periodic table, revealed that their ions and molecules contained in the solution play an important role in the process and influence its anisotropy. The observations led us to some general conclusions regarding physical and Chemical Phenomena associated with the silicon anisotropic etching. We have suggested that the lowering of etching rates is connected with adsorption of cations and organic additions on some crystallographic planes.

Todd J Martinez - One of the best experts on this subject based on the ideXlab platform.

  • ab initio nonadiabatic quantum molecular dynamics
    Chemical Reviews, 2018
    Co-Authors: Basile F E Curchod, Todd J Martinez
    Abstract:

    The Born–Oppenheimer approximation underlies much of Chemical simulation and provides the framework defining the potential energy surfaces that are used for much of our pictorial understanding of Chemical Phenomena. However, this approximation breaks down when the dynamics of molecules in excited electronic states are considered. Describing dynamics when the Born–Oppenheimer approximation breaks down requires a quantum mechanical description of the nuclei. Chemical reaction dynamics on excited electronic states is critical for many applications in renewable energy, Chemical synthesis, and bioimaging. Furthermore, it is necessary in order to connect with many ultrafast pump–probe spectroscopic experiments. In this review, we provide an overview of methods that can describe nonadiabatic dynamics, with emphasis on those that are able to simultaneously address the quantum mechanics of both electrons and nuclei. Such ab initio quantum molecular dynamics methods solve the electronic Schrodinger equation alongsi...

Irena Zubel - One of the best experts on this subject based on the ideXlab platform.

  • silicon anisotropic etching in alkaline solutions iv the effect of organic and inorganic agents on silicon anisotropic etching process
    Sensors and Actuators A-physical, 2001
    Co-Authors: Irena Zubel, Irena Barycka, Kamilla Kotowska, M Kramkowska
    Abstract:

    Abstract Silicon anisotropic etching process in organic and inorganic solutions has been studied. Experimental results on silicon etching in KOH and TMAH solutions with and without IPA addition have been presented. Etching rate curves versus solution concentration were plotted for different crystallographic planes with special emphasis on high-indexed ones. A comparison of our own experimental results with the results of other authors, concerning silicon anisotropic etching process in hydroxides of other metals from the first group of periodic table, revealed that their ions and molecules contained in the solution play an important role in the process and influence its anisotropy. The observations led us to some general conclusions regarding physical and Chemical Phenomena associated with the silicon anisotropic etching. We have suggested that the lowering of etching rates is connected with adsorption of cations and organic additions on some crystallographic planes.

Olga S Ovchinnikova - One of the best experts on this subject based on the ideXlab platform.

  • Chemical Phenomena of atomic force microscopy scanning
    Analytical Chemistry, 2018
    Co-Authors: Anton V Ievlev, Sergei V Kalinin, Chance Brown, Matthew J Burch, Joshua C Agar, Gabriel Velarde, Lane W Martin, Petro Maksymovych, Olga S Ovchinnikova
    Abstract:

    Atomic force microscopy is widely used for nanoscale characterization of materials by scientists worldwide. The long-held belief of ambient AFM is that the tip is generally Chemically inert but can be functionalized with respect to the studied sample. This implies that basic imaging and scanning procedures do not affect surface and bulk chemistry of the studied sample. However, an in-depth study of the confined Chemical processes taking place at the tip-surface junction and the associated Chemical changes to the material surface have been missing as of now. Here, we used a hybrid system that combines time-of-flight secondary ion mass spectrometry with an atomic force microscopy to investigate the Chemical interactions that take place at the tip-surface junction. Investigations showed that even basic contact mode AFM scanning is able to modify the surface of the studied sample. In particular, we found that the silicone oils deposited from the AFM tip into the scanned regions and spread to distances exceeding 15 μm from the tip. These oils were determined to come from standard gel boxes used for the storage of the tips. The explored Phenomena are important for interpreting and understanding results of AFM mechanical and electrical studies relying on the state of the tip-surface junction.

Lane W Martin - One of the best experts on this subject based on the ideXlab platform.

  • Chemical Phenomena of atomic force microscopy scanning
    Analytical Chemistry, 2018
    Co-Authors: Anton V Ievlev, Sergei V Kalinin, Chance Brown, Matthew J Burch, Joshua C Agar, Gabriel Velarde, Lane W Martin, Petro Maksymovych, Olga S Ovchinnikova
    Abstract:

    Atomic force microscopy is widely used for nanoscale characterization of materials by scientists worldwide. The long-held belief of ambient AFM is that the tip is generally Chemically inert but can be functionalized with respect to the studied sample. This implies that basic imaging and scanning procedures do not affect surface and bulk chemistry of the studied sample. However, an in-depth study of the confined Chemical processes taking place at the tip-surface junction and the associated Chemical changes to the material surface have been missing as of now. Here, we used a hybrid system that combines time-of-flight secondary ion mass spectrometry with an atomic force microscopy to investigate the Chemical interactions that take place at the tip-surface junction. Investigations showed that even basic contact mode AFM scanning is able to modify the surface of the studied sample. In particular, we found that the silicone oils deposited from the AFM tip into the scanned regions and spread to distances exceeding 15 μm from the tip. These oils were determined to come from standard gel boxes used for the storage of the tips. The explored Phenomena are important for interpreting and understanding results of AFM mechanical and electrical studies relying on the state of the tip-surface junction.