The Experts below are selected from a list of 212457 Experts worldwide ranked by ideXlab platform
Ch. Hollenstein - One of the best experts on this subject based on the ideXlab platform.
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dependence of intrinsic stress in hydrogenated amorphous silicon on excitation frequency in a plasma enhanced chemical vapor Deposition Process
Journal of Applied Physics, 1992Co-Authors: Joydeep Dutta, Ulrich Kroll, Patrick Chabloz, A A Howling, A. Shah, J L Dorier, Ch. HollensteinAbstract:Dependence of intrinsic stress in hydrogenated amorphous silicon on excitation frequency in a plasma-enhanced chemical vapor Deposition Process
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Dependence of intrinsic stress in hydrogenated amorphous silicon on excitation frequency in a plasma‐enhanced chemical vapor Deposition Process
Journal of Applied Physics, 1992Co-Authors: Joydeep Dutta, Ulrich Kroll, Patrick Chabloz, A A Howling, A. Shah, J L Dorier, Ch. HollensteinAbstract:Dependence of intrinsic stress in hydrogenated amorphous silicon on excitation frequency in a plasma-enhanced chemical vapor Deposition Process
Joydeep Dutta - One of the best experts on this subject based on the ideXlab platform.
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dependence of intrinsic stress in hydrogenated amorphous silicon on excitation frequency in a plasma enhanced chemical vapor Deposition Process
Journal of Applied Physics, 1992Co-Authors: Joydeep Dutta, Ulrich Kroll, Patrick Chabloz, A A Howling, A. Shah, J L Dorier, Ch. HollensteinAbstract:Dependence of intrinsic stress in hydrogenated amorphous silicon on excitation frequency in a plasma-enhanced chemical vapor Deposition Process
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Dependence of intrinsic stress in hydrogenated amorphous silicon on excitation frequency in a plasma‐enhanced chemical vapor Deposition Process
Journal of Applied Physics, 1992Co-Authors: Joydeep Dutta, Ulrich Kroll, Patrick Chabloz, A A Howling, A. Shah, J L Dorier, Ch. HollensteinAbstract:Dependence of intrinsic stress in hydrogenated amorphous silicon on excitation frequency in a plasma-enhanced chemical vapor Deposition Process
Patrick Chabloz - One of the best experts on this subject based on the ideXlab platform.
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dependence of intrinsic stress in hydrogenated amorphous silicon on excitation frequency in a plasma enhanced chemical vapor Deposition Process
Journal of Applied Physics, 1992Co-Authors: Joydeep Dutta, Ulrich Kroll, Patrick Chabloz, A A Howling, A. Shah, J L Dorier, Ch. HollensteinAbstract:Dependence of intrinsic stress in hydrogenated amorphous silicon on excitation frequency in a plasma-enhanced chemical vapor Deposition Process
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Dependence of intrinsic stress in hydrogenated amorphous silicon on excitation frequency in a plasma‐enhanced chemical vapor Deposition Process
Journal of Applied Physics, 1992Co-Authors: Joydeep Dutta, Ulrich Kroll, Patrick Chabloz, A A Howling, A. Shah, J L Dorier, Ch. HollensteinAbstract:Dependence of intrinsic stress in hydrogenated amorphous silicon on excitation frequency in a plasma-enhanced chemical vapor Deposition Process
J L Dorier - One of the best experts on this subject based on the ideXlab platform.
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dependence of intrinsic stress in hydrogenated amorphous silicon on excitation frequency in a plasma enhanced chemical vapor Deposition Process
Journal of Applied Physics, 1992Co-Authors: Joydeep Dutta, Ulrich Kroll, Patrick Chabloz, A A Howling, A. Shah, J L Dorier, Ch. HollensteinAbstract:Dependence of intrinsic stress in hydrogenated amorphous silicon on excitation frequency in a plasma-enhanced chemical vapor Deposition Process
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Dependence of intrinsic stress in hydrogenated amorphous silicon on excitation frequency in a plasma‐enhanced chemical vapor Deposition Process
Journal of Applied Physics, 1992Co-Authors: Joydeep Dutta, Ulrich Kroll, Patrick Chabloz, A A Howling, A. Shah, J L Dorier, Ch. HollensteinAbstract:Dependence of intrinsic stress in hydrogenated amorphous silicon on excitation frequency in a plasma-enhanced chemical vapor Deposition Process
Ulrich Kroll - One of the best experts on this subject based on the ideXlab platform.
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dependence of intrinsic stress in hydrogenated amorphous silicon on excitation frequency in a plasma enhanced chemical vapor Deposition Process
Journal of Applied Physics, 1992Co-Authors: Joydeep Dutta, Ulrich Kroll, Patrick Chabloz, A A Howling, A. Shah, J L Dorier, Ch. HollensteinAbstract:Dependence of intrinsic stress in hydrogenated amorphous silicon on excitation frequency in a plasma-enhanced chemical vapor Deposition Process
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Dependence of intrinsic stress in hydrogenated amorphous silicon on excitation frequency in a plasma‐enhanced chemical vapor Deposition Process
Journal of Applied Physics, 1992Co-Authors: Joydeep Dutta, Ulrich Kroll, Patrick Chabloz, A A Howling, A. Shah, J L Dorier, Ch. HollensteinAbstract:Dependence of intrinsic stress in hydrogenated amorphous silicon on excitation frequency in a plasma-enhanced chemical vapor Deposition Process