The Experts below are selected from a list of 237 Experts worldwide ranked by ideXlab platform
James S. Horwitz - One of the best experts on this subject based on the ideXlab platform.
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Pulsed laser deposition of Electronic Ceramics
Nuclear Instruments & Methods in Physics Research Section B-beam Interactions With Materials and Atoms, 1997Co-Authors: James S. Horwitz, Douglas B. Chrisey, P. C. Dorsey, L.a. Knauss, Jeffrey M. Pond, M. L. Wilson, M. S. Osofsky, S. B. Qadri, J. Caulfield, Raymond C. Y. AuyeungAbstract:Abstract High quality thin films of Electronic Ceramics are currently being deposited by pulsed laser deposition (PLD) for a variety of applications. Examples of these applications include ferroelectric thin films for active microwave Electronics and rare-earth doped manganite thin films for uncooled infrared focal plane arrays (IRFPAs). Single phase and oriented SrxBa(1−xTiO3 films have been deposited by PLD onto (100) substrates of LaAlO3 for active microwave devices. The dielectric properties of these films has been measured using gold interdigital capacitors deposited on top of the film. A 2 : 1 change in the capacitance can be achieved using a 40 V bias across a 5–10 μm capacitor gap. The dissipation factor (measured at 1 MHz) depends on film composition and temperature. Rare-earth manganite (RExM1−xMnOδ) thin films have also been deposited by PLD for use in uncooled IRFPAs. The temperature dependence of the resistivity has been measured for La0.67Ca0.33MnO3 and La0.67Sr0.33MnO3 thin films deposited onto LaAlO3 substrates. Film properties depend strongly on composition and post-deposition processing conditions to vary the oxygen stoichiometry. The temperature coefficient of resistance (TCR) has been measured to be between 2 and 15%. Based on preliminary measurements, these films will increase the sensitivity of the uncooled IR detector to be comparable or greater than a cooled detector based on HgCdTe.
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Pulsed laser deposition of thick films of Electronic Ceramics (Review Paper)
Lasers as Tools for Manufacturing of Durable Goods and Microelectronics, 1996Co-Authors: Douglas B. Chrisey, P. C. Dorsey, James S. Horwitz, L.a. Knauss, Raymond C. Y. AuyeungAbstract:Pulsed laser deposition is a superior technique for the growth of high quality thin films ( = 1 micrometers ) of Electronic Ceramics. Two film qualities principally control the growth of thick films: the film surface morphology and film stress. The deposition parameters which affect these qualities include: film deposition rate, film-substrate lattice mismatch, film-substrate thermal coefficient of expansion mismatch, and film growth kinetics. Our results suggest that it will be difficult to fabricate thick ceramic films of suitable Electronic quality by conventional physical vapor deposition techniques.
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Pulsed laser deposition of Electronic Ceramics
Surface and Coatings Technology, 1992Co-Authors: James S. Horwitz, Douglas B. Chrisey, Kenneth S. Grabowski, R. E. LeuchtnerAbstract:Abstract Pulsed laser deposition (PLD) is a unique physical vapor deposition technique which has gained considerable attention recently in the deposition of high quality, high temperature superconductors. In this technique, a short pulsed laser ( 2 Cu 3 O 7-δ thin films deposited by PLD have excellent d.c. and high frequency transport properties. For YBa 2 Cu 3 O 7-δ epitaxial multilayer structures of superconductor/dielectric/superconductor are reported. Microwave devices fabricated from superconducting thin films and multilayer films have demonstrated significant performance improvements over devices fabricated from conventional materials. High quality ferroelectric thin films are also being deposited by PLD. The deposition and electrical characterization of oriented PbZr x Ti 1- x O 3 thin films are reported. PLD is shown as a versatile physical vapor deposition technique and will soon be an important industrial coating technique.
R. E. Leuchtner - One of the best experts on this subject based on the ideXlab platform.
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Pulsed laser deposition of Electronic Ceramics
Surface and Coatings Technology, 1992Co-Authors: James S. Horwitz, Douglas B. Chrisey, Kenneth S. Grabowski, R. E. LeuchtnerAbstract:Abstract Pulsed laser deposition (PLD) is a unique physical vapor deposition technique which has gained considerable attention recently in the deposition of high quality, high temperature superconductors. In this technique, a short pulsed laser ( 2 Cu 3 O 7-δ thin films deposited by PLD have excellent d.c. and high frequency transport properties. For YBa 2 Cu 3 O 7-δ epitaxial multilayer structures of superconductor/dielectric/superconductor are reported. Microwave devices fabricated from superconducting thin films and multilayer films have demonstrated significant performance improvements over devices fabricated from conventional materials. High quality ferroelectric thin films are also being deposited by PLD. The deposition and electrical characterization of oriented PbZr x Ti 1- x O 3 thin films are reported. PLD is shown as a versatile physical vapor deposition technique and will soon be an important industrial coating technique.
Douglas B. Chrisey - One of the best experts on this subject based on the ideXlab platform.
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Pulsed laser deposition of Electronic Ceramics
Nuclear Instruments & Methods in Physics Research Section B-beam Interactions With Materials and Atoms, 1997Co-Authors: James S. Horwitz, Douglas B. Chrisey, P. C. Dorsey, L.a. Knauss, Jeffrey M. Pond, M. L. Wilson, M. S. Osofsky, S. B. Qadri, J. Caulfield, Raymond C. Y. AuyeungAbstract:Abstract High quality thin films of Electronic Ceramics are currently being deposited by pulsed laser deposition (PLD) for a variety of applications. Examples of these applications include ferroelectric thin films for active microwave Electronics and rare-earth doped manganite thin films for uncooled infrared focal plane arrays (IRFPAs). Single phase and oriented SrxBa(1−xTiO3 films have been deposited by PLD onto (100) substrates of LaAlO3 for active microwave devices. The dielectric properties of these films has been measured using gold interdigital capacitors deposited on top of the film. A 2 : 1 change in the capacitance can be achieved using a 40 V bias across a 5–10 μm capacitor gap. The dissipation factor (measured at 1 MHz) depends on film composition and temperature. Rare-earth manganite (RExM1−xMnOδ) thin films have also been deposited by PLD for use in uncooled IRFPAs. The temperature dependence of the resistivity has been measured for La0.67Ca0.33MnO3 and La0.67Sr0.33MnO3 thin films deposited onto LaAlO3 substrates. Film properties depend strongly on composition and post-deposition processing conditions to vary the oxygen stoichiometry. The temperature coefficient of resistance (TCR) has been measured to be between 2 and 15%. Based on preliminary measurements, these films will increase the sensitivity of the uncooled IR detector to be comparable or greater than a cooled detector based on HgCdTe.
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Pulsed laser deposition of thick films of Electronic Ceramics (Review Paper)
Lasers as Tools for Manufacturing of Durable Goods and Microelectronics, 1996Co-Authors: Douglas B. Chrisey, P. C. Dorsey, James S. Horwitz, L.a. Knauss, Raymond C. Y. AuyeungAbstract:Pulsed laser deposition is a superior technique for the growth of high quality thin films ( = 1 micrometers ) of Electronic Ceramics. Two film qualities principally control the growth of thick films: the film surface morphology and film stress. The deposition parameters which affect these qualities include: film deposition rate, film-substrate lattice mismatch, film-substrate thermal coefficient of expansion mismatch, and film growth kinetics. Our results suggest that it will be difficult to fabricate thick ceramic films of suitable Electronic quality by conventional physical vapor deposition techniques.
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Pulsed laser deposition of Electronic Ceramics
Surface and Coatings Technology, 1992Co-Authors: James S. Horwitz, Douglas B. Chrisey, Kenneth S. Grabowski, R. E. LeuchtnerAbstract:Abstract Pulsed laser deposition (PLD) is a unique physical vapor deposition technique which has gained considerable attention recently in the deposition of high quality, high temperature superconductors. In this technique, a short pulsed laser ( 2 Cu 3 O 7-δ thin films deposited by PLD have excellent d.c. and high frequency transport properties. For YBa 2 Cu 3 O 7-δ epitaxial multilayer structures of superconductor/dielectric/superconductor are reported. Microwave devices fabricated from superconducting thin films and multilayer films have demonstrated significant performance improvements over devices fabricated from conventional materials. High quality ferroelectric thin films are also being deposited by PLD. The deposition and electrical characterization of oriented PbZr x Ti 1- x O 3 thin films are reported. PLD is shown as a versatile physical vapor deposition technique and will soon be an important industrial coating technique.
Raymond C. Y. Auyeung - One of the best experts on this subject based on the ideXlab platform.
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Pulsed laser deposition of Electronic Ceramics
Nuclear Instruments & Methods in Physics Research Section B-beam Interactions With Materials and Atoms, 1997Co-Authors: James S. Horwitz, Douglas B. Chrisey, P. C. Dorsey, L.a. Knauss, Jeffrey M. Pond, M. L. Wilson, M. S. Osofsky, S. B. Qadri, J. Caulfield, Raymond C. Y. AuyeungAbstract:Abstract High quality thin films of Electronic Ceramics are currently being deposited by pulsed laser deposition (PLD) for a variety of applications. Examples of these applications include ferroelectric thin films for active microwave Electronics and rare-earth doped manganite thin films for uncooled infrared focal plane arrays (IRFPAs). Single phase and oriented SrxBa(1−xTiO3 films have been deposited by PLD onto (100) substrates of LaAlO3 for active microwave devices. The dielectric properties of these films has been measured using gold interdigital capacitors deposited on top of the film. A 2 : 1 change in the capacitance can be achieved using a 40 V bias across a 5–10 μm capacitor gap. The dissipation factor (measured at 1 MHz) depends on film composition and temperature. Rare-earth manganite (RExM1−xMnOδ) thin films have also been deposited by PLD for use in uncooled IRFPAs. The temperature dependence of the resistivity has been measured for La0.67Ca0.33MnO3 and La0.67Sr0.33MnO3 thin films deposited onto LaAlO3 substrates. Film properties depend strongly on composition and post-deposition processing conditions to vary the oxygen stoichiometry. The temperature coefficient of resistance (TCR) has been measured to be between 2 and 15%. Based on preliminary measurements, these films will increase the sensitivity of the uncooled IR detector to be comparable or greater than a cooled detector based on HgCdTe.
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Pulsed laser deposition of thick films of Electronic Ceramics (Review Paper)
Lasers as Tools for Manufacturing of Durable Goods and Microelectronics, 1996Co-Authors: Douglas B. Chrisey, P. C. Dorsey, James S. Horwitz, L.a. Knauss, Raymond C. Y. AuyeungAbstract:Pulsed laser deposition is a superior technique for the growth of high quality thin films ( = 1 micrometers ) of Electronic Ceramics. Two film qualities principally control the growth of thick films: the film surface morphology and film stress. The deposition parameters which affect these qualities include: film deposition rate, film-substrate lattice mismatch, film-substrate thermal coefficient of expansion mismatch, and film growth kinetics. Our results suggest that it will be difficult to fabricate thick ceramic films of suitable Electronic quality by conventional physical vapor deposition techniques.
Kenneth S. Grabowski - One of the best experts on this subject based on the ideXlab platform.
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Pulsed laser deposition of Electronic Ceramics
Surface and Coatings Technology, 1992Co-Authors: James S. Horwitz, Douglas B. Chrisey, Kenneth S. Grabowski, R. E. LeuchtnerAbstract:Abstract Pulsed laser deposition (PLD) is a unique physical vapor deposition technique which has gained considerable attention recently in the deposition of high quality, high temperature superconductors. In this technique, a short pulsed laser ( 2 Cu 3 O 7-δ thin films deposited by PLD have excellent d.c. and high frequency transport properties. For YBa 2 Cu 3 O 7-δ epitaxial multilayer structures of superconductor/dielectric/superconductor are reported. Microwave devices fabricated from superconducting thin films and multilayer films have demonstrated significant performance improvements over devices fabricated from conventional materials. High quality ferroelectric thin films are also being deposited by PLD. The deposition and electrical characterization of oriented PbZr x Ti 1- x O 3 thin films are reported. PLD is shown as a versatile physical vapor deposition technique and will soon be an important industrial coating technique.