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M. Dubois C. Meunier And L. Thomas - One of the best experts on this subject based on the ideXlab platform.
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Characterization by electron spin resonance of defects in a-C:H thin Films. Correlation between structural evolutions and optical properties
Surface and Coatings Technology, 2004Co-Authors: Eric Tomasella, M. Dubois C. Meunier And L. ThomasAbstract:The structural evolutions of a-C:H thin Films prepared by r.f. plasma-enhanced chemical vapor deposition from a CH yAr or 4 CH yHe gas mixture have been investigated. Elastic recoil detection analysis, infrared and Raman spectroscopies have been used 4 to quantify, respectively, hydrogen content, the bonding and sp proportion carbon of thin Films. The variations of electron spin 2 resonance parameters, the peak-to-peak linewidth DH , g-factor and the spin density, as a function of the Film Preparation are pp discussed on the basis of the complete physico-chemical characterization. The type of defects do not change drastically when the conditions of the Film Preparation vary contrary to the spin–spin interaction: a stronger exchange resulting from the greater delocalization of the p-electron occurs when the bias voltage increases. Moreover, the hyperfine interaction of the spins with the hydrogen atoms decreases. We have found that the optical band gap E of these Films decreases with the loss of hydrogen g (bonded and unbonded) and the increasing of sp content while E gap increases. These results have been related to the spin densities.
D R Mckenzie - One of the best experts on this subject based on the ideXlab platform.
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combined deposition and implantation in the cathodic arc for thick Film Preparation
Surface & Coatings Technology, 2001Co-Authors: R N Tarrant, C S Montross, D R MckenzieAbstract:Delamination is a major mode of failure for many thin Films. A Film may delaminate spontaneously if the strain energy released exceeds the adhesion energy per unit area. In this work we explore the use of pulsed ion bombardments with energies up to 20 keV. At this energy, which is much higher than that normally used in ion-assisted deposition, implantation into the underlying substrate will occur. The process may have beneficial effects on the Film adhesion. We report that we have successfully prepared carbon Films in excess of 4.5 μm in thickness on silicon substrates. The thick Films demonstrate indentation properties similar to bulk glassy carbon. In addition, we have been able to modify the stoichiometry of Films by using a combination of implantation and deposition.
Eric Tomasella - One of the best experts on this subject based on the ideXlab platform.
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Characterization by electron spin resonance of defects in a-C:H thin Films. Correlation between structural evolutions and optical properties
Surface and Coatings Technology, 2004Co-Authors: Eric Tomasella, M. Dubois C. Meunier And L. ThomasAbstract:The structural evolutions of a-C:H thin Films prepared by r.f. plasma-enhanced chemical vapor deposition from a CH yAr or 4 CH yHe gas mixture have been investigated. Elastic recoil detection analysis, infrared and Raman spectroscopies have been used 4 to quantify, respectively, hydrogen content, the bonding and sp proportion carbon of thin Films. The variations of electron spin 2 resonance parameters, the peak-to-peak linewidth DH , g-factor and the spin density, as a function of the Film Preparation are pp discussed on the basis of the complete physico-chemical characterization. The type of defects do not change drastically when the conditions of the Film Preparation vary contrary to the spin–spin interaction: a stronger exchange resulting from the greater delocalization of the p-electron occurs when the bias voltage increases. Moreover, the hyperfine interaction of the spins with the hydrogen atoms decreases. We have found that the optical band gap E of these Films decreases with the loss of hydrogen g (bonded and unbonded) and the increasing of sp content while E gap increases. These results have been related to the spin densities.
R N Tarrant - One of the best experts on this subject based on the ideXlab platform.
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combined deposition and implantation in the cathodic arc for thick Film Preparation
Surface & Coatings Technology, 2001Co-Authors: R N Tarrant, C S Montross, D R MckenzieAbstract:Delamination is a major mode of failure for many thin Films. A Film may delaminate spontaneously if the strain energy released exceeds the adhesion energy per unit area. In this work we explore the use of pulsed ion bombardments with energies up to 20 keV. At this energy, which is much higher than that normally used in ion-assisted deposition, implantation into the underlying substrate will occur. The process may have beneficial effects on the Film adhesion. We report that we have successfully prepared carbon Films in excess of 4.5 μm in thickness on silicon substrates. The thick Films demonstrate indentation properties similar to bulk glassy carbon. In addition, we have been able to modify the stoichiometry of Films by using a combination of implantation and deposition.
Wentao Zhai - One of the best experts on this subject based on the ideXlab platform.
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cellular thermoplastic polyurethane thin Film Preparation elasticity and thermal insulation performance
Industrial & Engineering Chemistry Research, 2018Co-Authors: Chengbiao Ge, Wentao ZhaiAbstract:Thermoplastic polyurethane (TPU) has excellent extensibility, high abrasion resistance, good elastic resilience, and biocompatibility, and the fabrication of cellular TPU thin Film by an environmentally friendly method is attractive in both the academic and industrial communities. In this work, by a novel constrained surface diffusion foaming method, cellular TPU thin Films with thicknesses of 10–40 μm were prepared using CO2 as the physical blowing agent for the first time. The TPU thin Film was sandwiched by two polyimide (PI) Films via compression molding. The PI Films reduced the gas escape, which ensured the nucleated bubbles grew steadily and then produced cellular TPU thin Film with special structure, i.e., the microcellular structure within the thin Film and the micro/nanocellular bubbles on the surface of TPU thin Film by the physical foaming for the first time. Furthermore, our morphological observations showed that the foam morphology in the cross section can be easily changed by adjusting the ...