The Experts below are selected from a list of 9639 Experts worldwide ranked by ideXlab platform
Steven M. George - One of the best experts on this subject based on the ideXlab platform.
-
Atomic Layer Deposition of SiO2 and TiO2 in Alumina Tubular Membranes: Pore Reduction and Effect of Surface Species on Gas Transport
Langmuir, 2000Co-Authors: M. A. Cameron, I. P. Gartland, Jamison A. Smith, And S. F. Diaz, Steven M. GeorgeAbstract:The pore diameters in alumina tubular membranes were progressively reduced via SiO2 and TiO2 atomic layer deposition (ALD) using sequential surface reactions. The SiO2 ALD was accomplished using alternating exposures of SiCl4 and H2O. The TiO2 ALD was achieved using alternating exposures of TiCl4 and H2O. The reduction of the pore diameter was observed using in situ N2 conductance measurements. The total conductance, Ct = Q/ΔPt, was measured using a mass flow controller to define a constant Gas Throughput, Q, and two capacitance manometers to monitor the total pressure drop, ΔPt. These N2 conductance measurements revealed that the SiO2 and TiO2 ALD progressively reduced the pore diameter from an initial diameter of 50 A to molecular diameters. Using an aperture model for the conductance, the pore diameter was found to decrease at a rate of 1.3 ± 0.1 A per SiCl4/H2O AB cycle during SiO2 deposition and 3.1 ± 0.9 A per TiCl4/H2O AB cycle during TiO2 deposition. The N2 conductance measurements were also very ...
-
In situ monitoring of atomic layer controlled pore reduction in alumina tubular membranes using sequential surface reactions
Chemistry of Materials, 1998Co-Authors: B. S. Berland, I. P. Gartland, Steven M. GeorgeAbstract:The pore diameter in alumina tubular membranes with an initial diameter of 50 A was systematically reduced using the atomic layer controlled deposition of Al2O3. The Al2O3 was deposited using sequential exposures of Al(CH3)3 (trimethylaluminum, TMA) and H2O in an ABAB... binary reaction sequence. The pore diameter reduction was monitored using in situ N2 and Ar conductance measurements. The conductance, C = Q/ΔP, was measured using a mass flow controller to define a constant Gas Throughput, Q, and a pair of capacitance manometers to monitor the transmembrane pressure drop, ΔP. Conductance measurements were periodically obtained at 298 K as a function of AB binary reaction cycles. These conductance measurements were consistent with a pore diameter reduction from 50 A to ∼5−10 A at a rate of ∼2.5 A for each AB cycle. Conductance measurements were also performed during the Al2O3 deposition at 500 K after each half-reaction in the binary reaction sequence. The TMA half-reaction leaves the pore surface covered...
J. C. Rostaing - One of the best experts on this subject based on the ideXlab platform.
-
Multitube surface-wave discharges for increased Gas Throughput at atmospheric pressure
Journal of Applied Physics, 1998Co-Authors: Michel Moisan, Z. Zakrzewski, R. Etemadi, J. C. RostaingAbstract:Large diameter (>10 mm) microwave discharges at atmospheric pressure are often constricted transversely and, when large Gas flow rates are used, unstable as far as microwave power coupling is concerned. A group of small bore tubes can be used instead to provide the same Gas Throughput and ensure a higher probability of interaction of molecules to be processed with the carrier Gas. The solution presented provides equal power sharing in these small diameter plasma columns and it employs preferably a single microwave field applicator, therefore enabling one to use only one power generator and yielding a compact system. This scheme is based on the properties of surface-wave sustained plasmas and it calls on basic principles of waveguide circuitry.
Michel Moisan - One of the best experts on this subject based on the ideXlab platform.
-
Multitube surface-wave discharges for increased Gas Throughput at atmospheric pressure
Journal of Applied Physics, 1998Co-Authors: Michel Moisan, Z. Zakrzewski, R. Etemadi, J. C. RostaingAbstract:Large diameter (>10 mm) microwave discharges at atmospheric pressure are often constricted transversely and, when large Gas flow rates are used, unstable as far as microwave power coupling is concerned. A group of small bore tubes can be used instead to provide the same Gas Throughput and ensure a higher probability of interaction of molecules to be processed with the carrier Gas. The solution presented provides equal power sharing in these small diameter plasma columns and it employs preferably a single microwave field applicator, therefore enabling one to use only one power generator and yielding a compact system. This scheme is based on the properties of surface-wave sustained plasmas and it calls on basic principles of waveguide circuitry.
I. P. Gartland - One of the best experts on this subject based on the ideXlab platform.
-
Atomic Layer Deposition of SiO2 and TiO2 in Alumina Tubular Membranes: Pore Reduction and Effect of Surface Species on Gas Transport
Langmuir, 2000Co-Authors: M. A. Cameron, I. P. Gartland, Jamison A. Smith, And S. F. Diaz, Steven M. GeorgeAbstract:The pore diameters in alumina tubular membranes were progressively reduced via SiO2 and TiO2 atomic layer deposition (ALD) using sequential surface reactions. The SiO2 ALD was accomplished using alternating exposures of SiCl4 and H2O. The TiO2 ALD was achieved using alternating exposures of TiCl4 and H2O. The reduction of the pore diameter was observed using in situ N2 conductance measurements. The total conductance, Ct = Q/ΔPt, was measured using a mass flow controller to define a constant Gas Throughput, Q, and two capacitance manometers to monitor the total pressure drop, ΔPt. These N2 conductance measurements revealed that the SiO2 and TiO2 ALD progressively reduced the pore diameter from an initial diameter of 50 A to molecular diameters. Using an aperture model for the conductance, the pore diameter was found to decrease at a rate of 1.3 ± 0.1 A per SiCl4/H2O AB cycle during SiO2 deposition and 3.1 ± 0.9 A per TiCl4/H2O AB cycle during TiO2 deposition. The N2 conductance measurements were also very ...
-
In situ monitoring of atomic layer controlled pore reduction in alumina tubular membranes using sequential surface reactions
Chemistry of Materials, 1998Co-Authors: B. S. Berland, I. P. Gartland, Steven M. GeorgeAbstract:The pore diameter in alumina tubular membranes with an initial diameter of 50 A was systematically reduced using the atomic layer controlled deposition of Al2O3. The Al2O3 was deposited using sequential exposures of Al(CH3)3 (trimethylaluminum, TMA) and H2O in an ABAB... binary reaction sequence. The pore diameter reduction was monitored using in situ N2 and Ar conductance measurements. The conductance, C = Q/ΔP, was measured using a mass flow controller to define a constant Gas Throughput, Q, and a pair of capacitance manometers to monitor the transmembrane pressure drop, ΔP. Conductance measurements were periodically obtained at 298 K as a function of AB binary reaction cycles. These conductance measurements were consistent with a pore diameter reduction from 50 A to ∼5−10 A at a rate of ∼2.5 A for each AB cycle. Conductance measurements were also performed during the Al2O3 deposition at 500 K after each half-reaction in the binary reaction sequence. The TMA half-reaction leaves the pore surface covered...
R. Etemadi - One of the best experts on this subject based on the ideXlab platform.
-
Multitube surface-wave discharges for increased Gas Throughput at atmospheric pressure
Journal of Applied Physics, 1998Co-Authors: Michel Moisan, Z. Zakrzewski, R. Etemadi, J. C. RostaingAbstract:Large diameter (>10 mm) microwave discharges at atmospheric pressure are often constricted transversely and, when large Gas flow rates are used, unstable as far as microwave power coupling is concerned. A group of small bore tubes can be used instead to provide the same Gas Throughput and ensure a higher probability of interaction of molecules to be processed with the carrier Gas. The solution presented provides equal power sharing in these small diameter plasma columns and it employs preferably a single microwave field applicator, therefore enabling one to use only one power generator and yielding a compact system. This scheme is based on the properties of surface-wave sustained plasmas and it calls on basic principles of waveguide circuitry.
