The Experts below are selected from a list of 94224 Experts worldwide ranked by ideXlab platform

Kazuo Furuya - One of the best experts on this subject based on the ideXlab platform.

  • dynamic profile calculation of deposition resolution by High Energy Electrons in electron beam induced deposition
    Ultramicroscopy, 2005
    Co-Authors: Kazutaka Mitsuishi, M. Shimojo, Ming Han, Zhiquan Liu, Kazuo Furuya
    Abstract:

    Abstract The effect of the accelerating voltage of incident Electrons on the resolution of electron-beam-induced deposition was investigated by a dynamic Monte Carlo profile simulator which includes the electron scattering in the already grown deposit structure. By simulating the deposition at two different accelerating voltages of 20 and 200 kV with an idealistic zero-diameter incident probe on a bulk substrate, it was revealed that the smaller size structures were attainable by 200 keV than by 20 keV. The effect of the substrate was also argued by comparing the above results with the simulation results obtained for a point-like starting substrate. Surprisingly, the shapes of the deposits grown on bulk substrates were reproduced well by the simulations starting from point-like substrates indicating the small effect of the substrate on the shape of deposits.

  • features of self supporting tungsten nanowire deposited with High Energy Electrons
    Journal of Applied Physics, 2004
    Co-Authors: Zhiquan Liu, Kazutaka Mitsuishi, Kazuo Furuya
    Abstract:

    The features of self-supporting tungsten nanowire fabricated by electron-beam-induced deposition using 200 keV Electrons were investigated. The width of wire first decreases with the increase of the scan speed, then saturates at about 7–10 nm when the scan speed is Higher than 10 nm/s. The wire has belt-shipped morphology elongated along the incident beam. The wire parallel to the substrate surface was fabricated at the beam scan speed of 4.0 nm/s, while those with upward and downward features were obtained by changing the scan speed. Nanobelt, nanorod, and nanotip with High aspect ration and small lateral size were fabricated with this method. Considering the forward scattering of Electrons and the beam Gaussian profile, a model was developed for the growth of wire using High-Energy Electrons.

  • electron beam induced deposition using a subnanometer sized probe of High Energy Electrons
    Applied Physics Letters, 2003
    Co-Authors: Kazutaka Mitsuishi, M. Shimojo, Ming Han, Kazuo Furuya
    Abstract:

    Electron-beam-induced deposition was performed to fabricate nanostructures using a subnanometer-sized probe of High-Energy Electrons emitted by a 200 kV transmission electron microscope equipped with a field emission gun. We fabricated nanometer-sized dots with a diameter of less than 5 nm, controlling their position and size by the introduction of a organometallic precursor gas near the substrate surface. The relation between the size of the deposit and the deposition time was studied, and, in addition, the effect of the substrate thickness was examined.

Kazutaka Mitsuishi - One of the best experts on this subject based on the ideXlab platform.

  • dynamic profile calculation of deposition resolution by High Energy Electrons in electron beam induced deposition
    Ultramicroscopy, 2005
    Co-Authors: Kazutaka Mitsuishi, M. Shimojo, Ming Han, Zhiquan Liu, Kazuo Furuya
    Abstract:

    Abstract The effect of the accelerating voltage of incident Electrons on the resolution of electron-beam-induced deposition was investigated by a dynamic Monte Carlo profile simulator which includes the electron scattering in the already grown deposit structure. By simulating the deposition at two different accelerating voltages of 20 and 200 kV with an idealistic zero-diameter incident probe on a bulk substrate, it was revealed that the smaller size structures were attainable by 200 keV than by 20 keV. The effect of the substrate was also argued by comparing the above results with the simulation results obtained for a point-like starting substrate. Surprisingly, the shapes of the deposits grown on bulk substrates were reproduced well by the simulations starting from point-like substrates indicating the small effect of the substrate on the shape of deposits.

  • features of self supporting tungsten nanowire deposited with High Energy Electrons
    Journal of Applied Physics, 2004
    Co-Authors: Zhiquan Liu, Kazutaka Mitsuishi, Kazuo Furuya
    Abstract:

    The features of self-supporting tungsten nanowire fabricated by electron-beam-induced deposition using 200 keV Electrons were investigated. The width of wire first decreases with the increase of the scan speed, then saturates at about 7–10 nm when the scan speed is Higher than 10 nm/s. The wire has belt-shipped morphology elongated along the incident beam. The wire parallel to the substrate surface was fabricated at the beam scan speed of 4.0 nm/s, while those with upward and downward features were obtained by changing the scan speed. Nanobelt, nanorod, and nanotip with High aspect ration and small lateral size were fabricated with this method. Considering the forward scattering of Electrons and the beam Gaussian profile, a model was developed for the growth of wire using High-Energy Electrons.

  • electron beam induced deposition using a subnanometer sized probe of High Energy Electrons
    Applied Physics Letters, 2003
    Co-Authors: Kazutaka Mitsuishi, M. Shimojo, Ming Han, Kazuo Furuya
    Abstract:

    Electron-beam-induced deposition was performed to fabricate nanostructures using a subnanometer-sized probe of High-Energy Electrons emitted by a 200 kV transmission electron microscope equipped with a field emission gun. We fabricated nanometer-sized dots with a diameter of less than 5 nm, controlling their position and size by the introduction of a organometallic precursor gas near the substrate surface. The relation between the size of the deposit and the deposition time was studied, and, in addition, the effect of the substrate thickness was examined.

M. Shimojo - One of the best experts on this subject based on the ideXlab platform.

  • dynamic profile calculation of deposition resolution by High Energy Electrons in electron beam induced deposition
    Ultramicroscopy, 2005
    Co-Authors: Kazutaka Mitsuishi, M. Shimojo, Ming Han, Zhiquan Liu, Kazuo Furuya
    Abstract:

    Abstract The effect of the accelerating voltage of incident Electrons on the resolution of electron-beam-induced deposition was investigated by a dynamic Monte Carlo profile simulator which includes the electron scattering in the already grown deposit structure. By simulating the deposition at two different accelerating voltages of 20 and 200 kV with an idealistic zero-diameter incident probe on a bulk substrate, it was revealed that the smaller size structures were attainable by 200 keV than by 20 keV. The effect of the substrate was also argued by comparing the above results with the simulation results obtained for a point-like starting substrate. Surprisingly, the shapes of the deposits grown on bulk substrates were reproduced well by the simulations starting from point-like substrates indicating the small effect of the substrate on the shape of deposits.

  • electron beam induced deposition using a subnanometer sized probe of High Energy Electrons
    Applied Physics Letters, 2003
    Co-Authors: Kazutaka Mitsuishi, M. Shimojo, Ming Han, Kazuo Furuya
    Abstract:

    Electron-beam-induced deposition was performed to fabricate nanostructures using a subnanometer-sized probe of High-Energy Electrons emitted by a 200 kV transmission electron microscope equipped with a field emission gun. We fabricated nanometer-sized dots with a diameter of less than 5 nm, controlling their position and size by the introduction of a organometallic precursor gas near the substrate surface. The relation between the size of the deposit and the deposition time was studied, and, in addition, the effect of the substrate thickness was examined.

Ming Han - One of the best experts on this subject based on the ideXlab platform.

  • dynamic profile calculation of deposition resolution by High Energy Electrons in electron beam induced deposition
    Ultramicroscopy, 2005
    Co-Authors: Kazutaka Mitsuishi, M. Shimojo, Ming Han, Zhiquan Liu, Kazuo Furuya
    Abstract:

    Abstract The effect of the accelerating voltage of incident Electrons on the resolution of electron-beam-induced deposition was investigated by a dynamic Monte Carlo profile simulator which includes the electron scattering in the already grown deposit structure. By simulating the deposition at two different accelerating voltages of 20 and 200 kV with an idealistic zero-diameter incident probe on a bulk substrate, it was revealed that the smaller size structures were attainable by 200 keV than by 20 keV. The effect of the substrate was also argued by comparing the above results with the simulation results obtained for a point-like starting substrate. Surprisingly, the shapes of the deposits grown on bulk substrates were reproduced well by the simulations starting from point-like substrates indicating the small effect of the substrate on the shape of deposits.

  • electron beam induced deposition using a subnanometer sized probe of High Energy Electrons
    Applied Physics Letters, 2003
    Co-Authors: Kazutaka Mitsuishi, M. Shimojo, Ming Han, Kazuo Furuya
    Abstract:

    Electron-beam-induced deposition was performed to fabricate nanostructures using a subnanometer-sized probe of High-Energy Electrons emitted by a 200 kV transmission electron microscope equipped with a field emission gun. We fabricated nanometer-sized dots with a diameter of less than 5 nm, controlling their position and size by the introduction of a organometallic precursor gas near the substrate surface. The relation between the size of the deposit and the deposition time was studied, and, in addition, the effect of the substrate thickness was examined.

Graham S Kerr - One of the best experts on this subject based on the ideXlab platform.

  • response of sdo hmi observables to heating of the solar atmosphere by precipitating High Energy Electrons
    The Astrophysical Journal, 2020
    Co-Authors: Viacheslav M Sadykov, Alexander G Kosovichev, Irina N Kitiashvili, Graham S Kerr
    Abstract:

    We perform an analysis of the line-of-sight (LOS) observables of the SDO/HMI for models of the solar atmosphere heated by precipitating High-Energy Electrons during solar flares. The radiative hydrodynamic (RADYN) flare models are obtained from the F-CHROMA database. The Stokes profiles for the Fe 6173 A line observed by SDO/HMI are calculated using the radiative transfer code RH1.5D assuming statistical equilibrium for atomic level populations and imposing uniform background vertical magnetic field of various strength. The SDO/HMI observing sequence and LOS data processing pipeline algorithm are applied to derive the observables (continuum intensity, line depth, Doppler velocity, LOS magnetic field). Our results reveal that the strongest deviations of the observables from the actual spectroscopic line parameters are found for the model with a total Energy deposited of $E_{total}=1.0\times{}10^{12}$ erg cm$^{-2}$, injected with power-law spectral index of $\delta=3$ above a low-Energy cutoff of $E_{c}=25$ keV. The magnitudes of the velocity and magnetic field deviations depend on the imposed magnetic field, and can reach 0.35 km/s for LOS velocities, 90 G for LOS magnetic field, and 3\% for continuum enhancement for the 1000 G imposed LOS magnetic field setup. For $E_{total}\geq{}3.0\times{}10^{11}$ erg cm$^{-2}$ models, the velocity and magnetic field deviations are most strongly correlated with the Energy flux carried by $\sim$50 keV Electrons, and the continuum enhancement is correlated with the synthesized $\sim$55-60 keV hard X-ray photon flux. The relatively low magnitudes of perturbations of the observables and absence of magnetic field sign reversals suggest that the considered radiative hydrodynamic beam heating models augmented with the uniform vertical magnetic field setups cannot explain strong transient changes found in the SDO/HMI observations.

  • response of sdo hmi observables to heating of the solar atmosphere by precipitating High Energy Electrons
    arXiv: Solar and Stellar Astrophysics, 2019
    Co-Authors: Viacheslav M Sadykov, Alexander G Kosovichev, Irina N Kitiashvili, Graham S Kerr
    Abstract:

    We perform modeling of the line-of-sight (LOS) observables of the Helioseismic and Magnetic Imager (HMI) onboard the Solar Dynamics Observatory (SDO) for models of the solar atmosphere heated by precipitating High-Energy Electrons during solar flares. The radiative hydrodynamic (RADYN) flare models are obtained from the F-CHROMA database. The Stokes profiles for the Fe 6173 A line observed by SDO/HMI are calculated using the radiative transfer code RH1.5D assuming statistical equilibrium for atomic level populations and imposing a 100 G or 1000 G uniform vertical magnetic field. The SDO/HMI data processing pipeline algorithm is applied to derive the observables (continuum intensity, line depth, Doppler velocity, LOS magnetic field). Our results reveal that the deviations of the observables from the actual spectroscopic line parameters can reach 0.7 km/s for Doppler velocities and almost 100 G for the LOS magnetic field for the flare models with an average deposited Energy flux of $\ge{}5.0\times{}10^{10}$ erg cm$^{-2}$ s$^{-1}$. Such deviations are significantly smaller for weaker flares with lower deposited Energy fluxes. The LOS magnetic field observable does not reverse its sign for any considered flare model. The results show that sharp magnetic transients in SDO/HMI observations during solar flares may partly be due to rapid changes of the line profile. These changes are likely caused by heating of the atmosphere by accelerated Electrons and should be interpreted with caution.