The Experts below are selected from a list of 20172 Experts worldwide ranked by ideXlab platform
Gabriele Di Giacomo - One of the best experts on this subject based on the ideXlab platform.
-
Vapor-liquid equilibrium calculation of the system water-Hydrogen Chloride
Fluid Phase Equilibria, 1994Co-Authors: Stefano Brandani, Vincenzo Brandani, Gabriele Di GiacomoAbstract:Abstract Brandani, S., Brandani, V. and Di Giacomo, G., 1994. Vapor-liquid equilibrium calculation of the system water-Hydrogen Chloride. Fluid Phase Equilibria, 92: 67-74. The vapor-liquid equilibrium of the system water-Hydrogen Chloride has been described. The activity coefficients in the liquid phase are evaluated by an extended Pitzer model, where the reference state for Hydrogen Chloride is defined according to Henry's law. The results have been compared with those obtained using a modified Engels and Bosen model.
Stefano Brandani - One of the best experts on this subject based on the ideXlab platform.
-
Vapor-liquid equilibrium calculation of the system water-Hydrogen Chloride
Fluid Phase Equilibria, 1994Co-Authors: Stefano Brandani, Vincenzo Brandani, Gabriele Di GiacomoAbstract:Abstract Brandani, S., Brandani, V. and Di Giacomo, G., 1994. Vapor-liquid equilibrium calculation of the system water-Hydrogen Chloride. Fluid Phase Equilibria, 92: 67-74. The vapor-liquid equilibrium of the system water-Hydrogen Chloride has been described. The activity coefficients in the liquid phase are evaluated by an extended Pitzer model, where the reference state for Hydrogen Chloride is defined according to Henry's law. The results have been compared with those obtained using a modified Engels and Bosen model.
Vincenzo Brandani - One of the best experts on this subject based on the ideXlab platform.
-
Vapor-liquid equilibrium calculation of the system water-Hydrogen Chloride
Fluid Phase Equilibria, 1994Co-Authors: Stefano Brandani, Vincenzo Brandani, Gabriele Di GiacomoAbstract:Abstract Brandani, S., Brandani, V. and Di Giacomo, G., 1994. Vapor-liquid equilibrium calculation of the system water-Hydrogen Chloride. Fluid Phase Equilibria, 92: 67-74. The vapor-liquid equilibrium of the system water-Hydrogen Chloride has been described. The activity coefficients in the liquid phase are evaluated by an extended Pitzer model, where the reference state for Hydrogen Chloride is defined according to Henry's law. The results have been compared with those obtained using a modified Engels and Bosen model.
Cor J. Peters - One of the best experts on this subject based on the ideXlab platform.
-
Vapor–liquid phase behavior of binary systems of Hydrogen Chloride and certain n-alkanes: I. The system Hydrogen Chloride + ethane
Fluid Phase Equilibria, 2002Co-Authors: Louw J. Florusse, Cor J. PetersAbstract:Abstract This contribution reports on experimental data of the vapor–liquid phase behavior of the binary system Hydrogen Chloride+ethane. It was confirmed that the system Hydrogen Chloride+ethane has type-I fluid phase behavior in the classification of Van Konynenburg and Scott with maximum pressure azeotropy. As an additional feature, it turned out that no reaction between Hydrogen Chloride and the mercury present in the Cailletet apparatus did occur as long as traces of oxygen in the sample were absent, i.e. this apparatus is suitable to handle mixtures containing Hydrogen Chloride. In addition to the experimental work, the data were modeled with the Stryjek–Vera modification of the Peng–Robinson (PRSV) equation of state.
Erdogan Gulari - One of the best experts on this subject based on the ideXlab platform.
-
The low-temperature catalyzed etching of gallium arsenide with Hydrogen Chloride
Journal of Applied Physics, 1992Co-Authors: Jeffrey L. Dupuie, Erdogan GulariAbstract:A heated tungsten filament has been used to catalyze the gas phase etching of gallium arsenide with Hydrogen Chloride at a substrate temperature of 563 K. Rapid etch rates, between 1 and 3 microns per minute, were obtained in a pure Hydrogen Chloride ambient in the pressure range of 3.3 to 20.0 Pascal. Low flow rates of Hydrogen quenched the etching reaction, and resulted in degradation of the quality of the etched gallium arsenide surface. Dilution of the Hydrogen Chloride to 10.5% in helium reduced the etch rate to 63 nanometers per minute. The removal of 83 nm of gallium arsenide with the helium‐diluted gas mixture resulted in a specular surface. X‐ray photoelectron spectroscopy indicated that the gallium arsenide surface became enriched in gallium after the etch in helium‐diluted Hydrogen Chloride. No tungsten or other metal contamination on the etched gallium arsenide surface was detected by x‐ray photoelectron spectroscopy.
