The Experts below are selected from a list of 200976 Experts worldwide ranked by ideXlab platform
Roland Hauert - One of the best experts on this subject based on the ideXlab platform.
-
influence of film structure and composition on diffusion barrier performance of siox thin films deposited by pecvd
Surface & Coatings Technology, 2006Co-Authors: A Gruniger, A Bieder, Axel Sonnenfeld, Ph Rudolf Von Rohr, U Muller, Roland HauertAbstract:This study focuses on the oxygen permeability of SiOx thin films on polyethyleneterephtalate (PET) produced by plasma-enhanced chemical vapor deposition (PECVD) from oxygen-diluted hexamethyldisiloxane (HMDSO). The versatile PECVD set-up, equipped with two plasma sources (remote microwave and direct radio frequency), allows the deposition of films with variable morphologies and compositions. The deposits were analyzed by XPS, ellipsometry, and atomic force microscopy (AFM). Curve fitting of the Si 2p peak in X-ray photoelectron spectra (XPS) provided information about the chemical binding states of the silicon atoms. The results clearly show that the oxygen transmission rate (OTR) depends highly on the film structure, whereas the chemical composition has only little effect. In order to achieve the desired dense and smooth film structure, it is necessary to have a high substrate bias, which promotes ion bombardment of the film surface during growth. OTR values down to 0.2 cm 3 (STP) m � 2 day � 1 , corresponding to a barrier Improvement Factor of 500, have been achieved. D 2005 Elsevier B.V. All rights reserved.
-
influence of film structure and composition on diffusion barrier performance of siox thin films deposited by pecvd
Surface & Coatings Technology, 2006Co-Authors: A Gruniger, A Bieder, Axel Sonnenfeld, Ph Rudolf Von Rohr, U Muller, Roland HauertAbstract:Abstract This study focuses on the oxygen permeability of SiOx thin films on polyethyleneterephtalate (PET) produced by plasma-enhanced chemical vapor deposition (PECVD) from oxygen-diluted hexamethyldisiloxane (HMDSO). The versatile PECVD set-up, equipped with two plasma sources (remote microwave and direct radio frequency), allows the deposition of films with variable morphologies and compositions. The deposits were analyzed by XPS, ellipsometry, and atomic force microscopy (AFM). Curve fitting of the Si 2p peak in X-ray photoelectron spectra (XPS) provided information about the chemical binding states of the silicon atoms. The results clearly show that the oxygen transmission rate (OTR) depends highly on the film structure, whereas the chemical composition has only little effect. In order to achieve the desired dense and smooth film structure, it is necessary to have a high substrate bias, which promotes ion bombardment of the film surface during growth. OTR values down to 0.2 cm3 (STP) m− 2 day− 1, corresponding to a barrier Improvement Factor of 500, have been achieved.
A Gruniger - One of the best experts on this subject based on the ideXlab platform.
-
influence of film structure and composition on diffusion barrier performance of siox thin films deposited by pecvd
Surface & Coatings Technology, 2006Co-Authors: A Gruniger, A Bieder, Axel Sonnenfeld, Ph Rudolf Von Rohr, U Muller, Roland HauertAbstract:This study focuses on the oxygen permeability of SiOx thin films on polyethyleneterephtalate (PET) produced by plasma-enhanced chemical vapor deposition (PECVD) from oxygen-diluted hexamethyldisiloxane (HMDSO). The versatile PECVD set-up, equipped with two plasma sources (remote microwave and direct radio frequency), allows the deposition of films with variable morphologies and compositions. The deposits were analyzed by XPS, ellipsometry, and atomic force microscopy (AFM). Curve fitting of the Si 2p peak in X-ray photoelectron spectra (XPS) provided information about the chemical binding states of the silicon atoms. The results clearly show that the oxygen transmission rate (OTR) depends highly on the film structure, whereas the chemical composition has only little effect. In order to achieve the desired dense and smooth film structure, it is necessary to have a high substrate bias, which promotes ion bombardment of the film surface during growth. OTR values down to 0.2 cm 3 (STP) m � 2 day � 1 , corresponding to a barrier Improvement Factor of 500, have been achieved. D 2005 Elsevier B.V. All rights reserved.
-
influence of film structure and composition on diffusion barrier performance of siox thin films deposited by pecvd
Surface & Coatings Technology, 2006Co-Authors: A Gruniger, A Bieder, Axel Sonnenfeld, Ph Rudolf Von Rohr, U Muller, Roland HauertAbstract:Abstract This study focuses on the oxygen permeability of SiOx thin films on polyethyleneterephtalate (PET) produced by plasma-enhanced chemical vapor deposition (PECVD) from oxygen-diluted hexamethyldisiloxane (HMDSO). The versatile PECVD set-up, equipped with two plasma sources (remote microwave and direct radio frequency), allows the deposition of films with variable morphologies and compositions. The deposits were analyzed by XPS, ellipsometry, and atomic force microscopy (AFM). Curve fitting of the Si 2p peak in X-ray photoelectron spectra (XPS) provided information about the chemical binding states of the silicon atoms. The results clearly show that the oxygen transmission rate (OTR) depends highly on the film structure, whereas the chemical composition has only little effect. In order to achieve the desired dense and smooth film structure, it is necessary to have a high substrate bias, which promotes ion bombardment of the film surface during growth. OTR values down to 0.2 cm3 (STP) m− 2 day− 1, corresponding to a barrier Improvement Factor of 500, have been achieved.
Hoang Pham - One of the best experts on this subject based on the ideXlab platform.
-
a multi objective optimization of imperfect preventive maintenance policy for dependent competing risk systems with hidden failure
IEEE Transactions on Reliability, 2011Co-Authors: Yaping Wang, Hoang PhamAbstract:This paper studies a multi-objective maintenance optimization embedded within the imperfect preventive maintenance (PM) for one single-unit system subject to the dependent competing risks of degradation wear and random shocks. We consider two kinds of random shocks in the system: 1) fatal shocks that will cause the system to fail immediately, and 2) nonfatal shocks that will increase the system degradation level by a certain cumulative shock amount. Also, an Improvement Factor in the form of quasi-renewal sequences is introduced to modulate the imperfect maintenance by raising the degradation critical threshold proportionally. Finally, the two decision variables for maintenance scheduling, the number of PMs to replacement, and the initial PM interval, are determined by simultaneously maximizing the system asymptotic availability, and minimizing the system cost rate using the fast elitist non-dominated Sorting Genetic Algorithm (NSGA-II). Sensitivity analysis for two parameters, including imperfect PM degree, and quasi-renewal coefficient of imperfect PM interval, is performed to provide insight into the behavior of the proposed maintenance policies. The comparison results show that the optimization solution is consistent between one-objective and multi-objective optimization, and the Pareto frontier for the maintenance optimization problem can provide alternative solutions according to customer preference and resource constraints.
-
Imperfect preventive maintenance policies for two-process cumulative damage model of degradation and random shocks
International Journal of System Assurance Engineering and Management, 2011Co-Authors: Yaping Wang, Hoang PhamAbstract:In numerous applications, the system may fail due to multiple competing risks, especially degradation processes and random shocks. In this paper, we develop a two-process combination model for degraded system subject to cumulative effect from random shocks and degradation with two kinds of path function, including additive and multiplicative. Two numerical examples with sensitivity analysis for additive and multiplicative degradation path are discussed separately to illustrate this combination model. Based on the definition of the cumulative damage system, the imperfect preventive maintenance policy ( N *, T *) with a common Improvement Factor is obtained to minimize the expected maintenance cost rate. The uncertainty of the reliability estimation and maintenance optimization is considered in the problem modeling. Also some extensions for this combination model are suggested for further research.
U Muller - One of the best experts on this subject based on the ideXlab platform.
-
influence of film structure and composition on diffusion barrier performance of siox thin films deposited by pecvd
Surface & Coatings Technology, 2006Co-Authors: A Gruniger, A Bieder, Axel Sonnenfeld, Ph Rudolf Von Rohr, U Muller, Roland HauertAbstract:This study focuses on the oxygen permeability of SiOx thin films on polyethyleneterephtalate (PET) produced by plasma-enhanced chemical vapor deposition (PECVD) from oxygen-diluted hexamethyldisiloxane (HMDSO). The versatile PECVD set-up, equipped with two plasma sources (remote microwave and direct radio frequency), allows the deposition of films with variable morphologies and compositions. The deposits were analyzed by XPS, ellipsometry, and atomic force microscopy (AFM). Curve fitting of the Si 2p peak in X-ray photoelectron spectra (XPS) provided information about the chemical binding states of the silicon atoms. The results clearly show that the oxygen transmission rate (OTR) depends highly on the film structure, whereas the chemical composition has only little effect. In order to achieve the desired dense and smooth film structure, it is necessary to have a high substrate bias, which promotes ion bombardment of the film surface during growth. OTR values down to 0.2 cm 3 (STP) m � 2 day � 1 , corresponding to a barrier Improvement Factor of 500, have been achieved. D 2005 Elsevier B.V. All rights reserved.
-
influence of film structure and composition on diffusion barrier performance of siox thin films deposited by pecvd
Surface & Coatings Technology, 2006Co-Authors: A Gruniger, A Bieder, Axel Sonnenfeld, Ph Rudolf Von Rohr, U Muller, Roland HauertAbstract:Abstract This study focuses on the oxygen permeability of SiOx thin films on polyethyleneterephtalate (PET) produced by plasma-enhanced chemical vapor deposition (PECVD) from oxygen-diluted hexamethyldisiloxane (HMDSO). The versatile PECVD set-up, equipped with two plasma sources (remote microwave and direct radio frequency), allows the deposition of films with variable morphologies and compositions. The deposits were analyzed by XPS, ellipsometry, and atomic force microscopy (AFM). Curve fitting of the Si 2p peak in X-ray photoelectron spectra (XPS) provided information about the chemical binding states of the silicon atoms. The results clearly show that the oxygen transmission rate (OTR) depends highly on the film structure, whereas the chemical composition has only little effect. In order to achieve the desired dense and smooth film structure, it is necessary to have a high substrate bias, which promotes ion bombardment of the film surface during growth. OTR values down to 0.2 cm3 (STP) m− 2 day− 1, corresponding to a barrier Improvement Factor of 500, have been achieved.
A Bieder - One of the best experts on this subject based on the ideXlab platform.
-
influence of film structure and composition on diffusion barrier performance of siox thin films deposited by pecvd
Surface & Coatings Technology, 2006Co-Authors: A Gruniger, A Bieder, Axel Sonnenfeld, Ph Rudolf Von Rohr, U Muller, Roland HauertAbstract:This study focuses on the oxygen permeability of SiOx thin films on polyethyleneterephtalate (PET) produced by plasma-enhanced chemical vapor deposition (PECVD) from oxygen-diluted hexamethyldisiloxane (HMDSO). The versatile PECVD set-up, equipped with two plasma sources (remote microwave and direct radio frequency), allows the deposition of films with variable morphologies and compositions. The deposits were analyzed by XPS, ellipsometry, and atomic force microscopy (AFM). Curve fitting of the Si 2p peak in X-ray photoelectron spectra (XPS) provided information about the chemical binding states of the silicon atoms. The results clearly show that the oxygen transmission rate (OTR) depends highly on the film structure, whereas the chemical composition has only little effect. In order to achieve the desired dense and smooth film structure, it is necessary to have a high substrate bias, which promotes ion bombardment of the film surface during growth. OTR values down to 0.2 cm 3 (STP) m � 2 day � 1 , corresponding to a barrier Improvement Factor of 500, have been achieved. D 2005 Elsevier B.V. All rights reserved.
-
influence of film structure and composition on diffusion barrier performance of siox thin films deposited by pecvd
Surface & Coatings Technology, 2006Co-Authors: A Gruniger, A Bieder, Axel Sonnenfeld, Ph Rudolf Von Rohr, U Muller, Roland HauertAbstract:Abstract This study focuses on the oxygen permeability of SiOx thin films on polyethyleneterephtalate (PET) produced by plasma-enhanced chemical vapor deposition (PECVD) from oxygen-diluted hexamethyldisiloxane (HMDSO). The versatile PECVD set-up, equipped with two plasma sources (remote microwave and direct radio frequency), allows the deposition of films with variable morphologies and compositions. The deposits were analyzed by XPS, ellipsometry, and atomic force microscopy (AFM). Curve fitting of the Si 2p peak in X-ray photoelectron spectra (XPS) provided information about the chemical binding states of the silicon atoms. The results clearly show that the oxygen transmission rate (OTR) depends highly on the film structure, whereas the chemical composition has only little effect. In order to achieve the desired dense and smooth film structure, it is necessary to have a high substrate bias, which promotes ion bombardment of the film surface during growth. OTR values down to 0.2 cm3 (STP) m− 2 day− 1, corresponding to a barrier Improvement Factor of 500, have been achieved.
