The Experts below are selected from a list of 96 Experts worldwide ranked by ideXlab platform
C. Cambillau - One of the best experts on this subject based on the ideXlab platform.
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An Integration Routine Based on Profile Fitting with Optimized Fitting Area for the Evaluation of Weak and/or Overlapped Two-Dimensional Laue or Monochromatic Patterns
Journal of Applied Crystallography, 1998Co-Authors: Dominique Bourgeois, Didier Nurizzo, R. Kahn, C. CambillauAbstract:New software for the Integration of weak and/or spatially overlapped diffraction patterns is presented. The program, named PROW (profile fitting for overlapped and weak data), uses box Integration with an optimized summation area for strong nonoverlapped spots, and profile fitting with an optimized fitting area for weak and/or overlapped spots. The sizes of the Integration areas are dynamically adjusted to find the best compromise between minimal bias resulting from statistical fluctuations of the X-ray background and maximal use of the information content in each diffraction spot. Deconvolution of spatially overlapped spots is performed by a standard least-squares procedure. The program is compatible with the Daresbury Laue software suite and with the DENZO package. It has been tested on several data-sets recorded on image-plate and CCD (charge-coupled device) detectors. Intensities extracted from very weak Laue data-sets containing as many as 60% overlapped spots were shown to be of sufficient quality to lead to an accurate structure refinement. Difficult monochromatic data-sets were also processed successfully, leading to a generally better compromise between reliability factors, redundancy and completeness than previously achieved. Concomitant improvement in atomic model refinement was also observed.
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an Integration Routine based on profile fitting with optimized fitting area for the evaluation of weak and or overlapped two dimensional laue or monochromatic patterns
Journal of Applied Crystallography, 1998Co-Authors: Dominique Bourgeois, Didier Nurizzo, R. Kahn, C. CambillauAbstract:New software for the Integration of weak and/or spatially overlapped diffraction patterns is presented. The program, named PROW (profile fitting for overlapped and weak data), uses box Integration with an optimized summation area for strong nonoverlapped spots, and profile fitting with an optimized fitting area for weak and/or overlapped spots. The sizes of the Integration areas are dynamically adjusted to find the best compromise between minimal bias resulting from statistical fluctuations of the X-ray background and maximal use of the information content in each diffraction spot. Deconvolution of spatially overlapped spots is performed by a standard least-squares procedure. The program is compatible with the Daresbury Laue software suite and with the DENZO package. It has been tested on several data-sets recorded on image-plate and CCD (charge-coupled device) detectors. Intensities extracted from very weak Laue data-sets containing as many as 60% overlapped spots were shown to be of sufficient quality to lead to an accurate structure refinement. Difficult monochromatic data-sets were also processed successfully, leading to a generally better compromise between reliability factors, redundancy and completeness than previously achieved. Concomitant improvement in atomic model refinement was also observed.
Dominique Bourgeois - One of the best experts on this subject based on the ideXlab platform.
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An Integration Routine Based on Profile Fitting with Optimized Fitting Area for the Evaluation of Weak and/or Overlapped Two-Dimensional Laue or Monochromatic Patterns
Journal of Applied Crystallography, 1998Co-Authors: Dominique Bourgeois, Didier Nurizzo, R. Kahn, C. CambillauAbstract:New software for the Integration of weak and/or spatially overlapped diffraction patterns is presented. The program, named PROW (profile fitting for overlapped and weak data), uses box Integration with an optimized summation area for strong nonoverlapped spots, and profile fitting with an optimized fitting area for weak and/or overlapped spots. The sizes of the Integration areas are dynamically adjusted to find the best compromise between minimal bias resulting from statistical fluctuations of the X-ray background and maximal use of the information content in each diffraction spot. Deconvolution of spatially overlapped spots is performed by a standard least-squares procedure. The program is compatible with the Daresbury Laue software suite and with the DENZO package. It has been tested on several data-sets recorded on image-plate and CCD (charge-coupled device) detectors. Intensities extracted from very weak Laue data-sets containing as many as 60% overlapped spots were shown to be of sufficient quality to lead to an accurate structure refinement. Difficult monochromatic data-sets were also processed successfully, leading to a generally better compromise between reliability factors, redundancy and completeness than previously achieved. Concomitant improvement in atomic model refinement was also observed.
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an Integration Routine based on profile fitting with optimized fitting area for the evaluation of weak and or overlapped two dimensional laue or monochromatic patterns
Journal of Applied Crystallography, 1998Co-Authors: Dominique Bourgeois, Didier Nurizzo, R. Kahn, C. CambillauAbstract:New software for the Integration of weak and/or spatially overlapped diffraction patterns is presented. The program, named PROW (profile fitting for overlapped and weak data), uses box Integration with an optimized summation area for strong nonoverlapped spots, and profile fitting with an optimized fitting area for weak and/or overlapped spots. The sizes of the Integration areas are dynamically adjusted to find the best compromise between minimal bias resulting from statistical fluctuations of the X-ray background and maximal use of the information content in each diffraction spot. Deconvolution of spatially overlapped spots is performed by a standard least-squares procedure. The program is compatible with the Daresbury Laue software suite and with the DENZO package. It has been tested on several data-sets recorded on image-plate and CCD (charge-coupled device) detectors. Intensities extracted from very weak Laue data-sets containing as many as 60% overlapped spots were shown to be of sufficient quality to lead to an accurate structure refinement. Difficult monochromatic data-sets were also processed successfully, leading to a generally better compromise between reliability factors, redundancy and completeness than previously achieved. Concomitant improvement in atomic model refinement was also observed.
R. Kahn - One of the best experts on this subject based on the ideXlab platform.
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An Integration Routine Based on Profile Fitting with Optimized Fitting Area for the Evaluation of Weak and/or Overlapped Two-Dimensional Laue or Monochromatic Patterns
Journal of Applied Crystallography, 1998Co-Authors: Dominique Bourgeois, Didier Nurizzo, R. Kahn, C. CambillauAbstract:New software for the Integration of weak and/or spatially overlapped diffraction patterns is presented. The program, named PROW (profile fitting for overlapped and weak data), uses box Integration with an optimized summation area for strong nonoverlapped spots, and profile fitting with an optimized fitting area for weak and/or overlapped spots. The sizes of the Integration areas are dynamically adjusted to find the best compromise between minimal bias resulting from statistical fluctuations of the X-ray background and maximal use of the information content in each diffraction spot. Deconvolution of spatially overlapped spots is performed by a standard least-squares procedure. The program is compatible with the Daresbury Laue software suite and with the DENZO package. It has been tested on several data-sets recorded on image-plate and CCD (charge-coupled device) detectors. Intensities extracted from very weak Laue data-sets containing as many as 60% overlapped spots were shown to be of sufficient quality to lead to an accurate structure refinement. Difficult monochromatic data-sets were also processed successfully, leading to a generally better compromise between reliability factors, redundancy and completeness than previously achieved. Concomitant improvement in atomic model refinement was also observed.
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an Integration Routine based on profile fitting with optimized fitting area for the evaluation of weak and or overlapped two dimensional laue or monochromatic patterns
Journal of Applied Crystallography, 1998Co-Authors: Dominique Bourgeois, Didier Nurizzo, R. Kahn, C. CambillauAbstract:New software for the Integration of weak and/or spatially overlapped diffraction patterns is presented. The program, named PROW (profile fitting for overlapped and weak data), uses box Integration with an optimized summation area for strong nonoverlapped spots, and profile fitting with an optimized fitting area for weak and/or overlapped spots. The sizes of the Integration areas are dynamically adjusted to find the best compromise between minimal bias resulting from statistical fluctuations of the X-ray background and maximal use of the information content in each diffraction spot. Deconvolution of spatially overlapped spots is performed by a standard least-squares procedure. The program is compatible with the Daresbury Laue software suite and with the DENZO package. It has been tested on several data-sets recorded on image-plate and CCD (charge-coupled device) detectors. Intensities extracted from very weak Laue data-sets containing as many as 60% overlapped spots were shown to be of sufficient quality to lead to an accurate structure refinement. Difficult monochromatic data-sets were also processed successfully, leading to a generally better compromise between reliability factors, redundancy and completeness than previously achieved. Concomitant improvement in atomic model refinement was also observed.
Didier Nurizzo - One of the best experts on this subject based on the ideXlab platform.
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An Integration Routine Based on Profile Fitting with Optimized Fitting Area for the Evaluation of Weak and/or Overlapped Two-Dimensional Laue or Monochromatic Patterns
Journal of Applied Crystallography, 1998Co-Authors: Dominique Bourgeois, Didier Nurizzo, R. Kahn, C. CambillauAbstract:New software for the Integration of weak and/or spatially overlapped diffraction patterns is presented. The program, named PROW (profile fitting for overlapped and weak data), uses box Integration with an optimized summation area for strong nonoverlapped spots, and profile fitting with an optimized fitting area for weak and/or overlapped spots. The sizes of the Integration areas are dynamically adjusted to find the best compromise between minimal bias resulting from statistical fluctuations of the X-ray background and maximal use of the information content in each diffraction spot. Deconvolution of spatially overlapped spots is performed by a standard least-squares procedure. The program is compatible with the Daresbury Laue software suite and with the DENZO package. It has been tested on several data-sets recorded on image-plate and CCD (charge-coupled device) detectors. Intensities extracted from very weak Laue data-sets containing as many as 60% overlapped spots were shown to be of sufficient quality to lead to an accurate structure refinement. Difficult monochromatic data-sets were also processed successfully, leading to a generally better compromise between reliability factors, redundancy and completeness than previously achieved. Concomitant improvement in atomic model refinement was also observed.
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an Integration Routine based on profile fitting with optimized fitting area for the evaluation of weak and or overlapped two dimensional laue or monochromatic patterns
Journal of Applied Crystallography, 1998Co-Authors: Dominique Bourgeois, Didier Nurizzo, R. Kahn, C. CambillauAbstract:New software for the Integration of weak and/or spatially overlapped diffraction patterns is presented. The program, named PROW (profile fitting for overlapped and weak data), uses box Integration with an optimized summation area for strong nonoverlapped spots, and profile fitting with an optimized fitting area for weak and/or overlapped spots. The sizes of the Integration areas are dynamically adjusted to find the best compromise between minimal bias resulting from statistical fluctuations of the X-ray background and maximal use of the information content in each diffraction spot. Deconvolution of spatially overlapped spots is performed by a standard least-squares procedure. The program is compatible with the Daresbury Laue software suite and with the DENZO package. It has been tested on several data-sets recorded on image-plate and CCD (charge-coupled device) detectors. Intensities extracted from very weak Laue data-sets containing as many as 60% overlapped spots were shown to be of sufficient quality to lead to an accurate structure refinement. Difficult monochromatic data-sets were also processed successfully, leading to a generally better compromise between reliability factors, redundancy and completeness than previously achieved. Concomitant improvement in atomic model refinement was also observed.
Toichiro Kinoshita - One of the best experts on this subject based on the ideXlab platform.
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tenth order electron anomalous magnetic moment contribution of diagrams without closed lepton loops
Physical Review D, 2015Co-Authors: Tatsumi Aoyama, Toichiro Kinoshita, Masashi Hayakawa, Makiko NioAbstract:This paper presents a detailed account of the evaluation of the electron anomalous magnetic moment ${a}_{e}$ which arises from a gauge-invariant set, called Set V, consisting of 6354 tenth-order Feynman diagrams without closed lepton loops. The latest value of the sum of Set V diagrams evaluated by the Monte Carlo Integration Routine VEGAS is 8.726 $(336)(\ensuremath{\alpha}/\ensuremath{\pi}{)}^{5}$, which replaces the very preliminary value reported in 2012. Combining it with 6318 previously published tenth-order diagrams, we obtain 7.795 $(336)(\ensuremath{\alpha}/\ensuremath{\pi}{)}^{5}$ as the complete mass-independent tenth-order term. Together with the improved value of the eighth-order term this leads to ${a}_{e}(\text{theory})=1\text{ }159\text{ }652\text{ }181.643\text{ }(25)(23)(16)(763)\ifmmode\times\else\texttimes\fi{}1{0}^{\ensuremath{-}12}$, where the first three uncertainties are from the eighth-order, tenth-order, and hadronic and elecroweak terms. The fourth and largest uncertainty is from ${\ensuremath{\alpha}}^{\ensuremath{-}1}=137.035\text{ }999\text{ }049\text{ }(90)$, the fine-structure constant derived from the rubidium recoil measurement. Thus, ${a}_{e}(\text{experiment})\ensuremath{-}{a}_{e}(\text{theory})=\ensuremath{-}0.91\text{ }(0.82)\ifmmode\times\else\texttimes\fi{}1{0}^{\ensuremath{-}12}$. Assuming the validity of the standard model, we obtain the fine-structure constant ${\ensuremath{\alpha}}^{\ensuremath{-}1}({a}_{e})=\phantom{\rule{0ex}{0ex}}137.035\text{ }999\text{ }1570\text{ }(29)(27)(18)(331)$, where uncertainties are from the eighth-order, tenth-order, and hadronic and electroweak terms, and the measurement of ${a}_{e}$. This is the most precise value of $\ensuremath{\alpha}$ available at present and provides a stringent constraint on possible theories beyond the standard model.
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Improved evaluation of the alpha 3 vacuum-polarization contribution to the alpha 4 muon anomalous magnetic moment.
Physical review. D Particles and fields, 1993Co-Authors: Toichiro KinoshitaAbstract:The contribution of the eighth-order vertices containing sixth-order one-electron-loop vacuum-polarization subdiagrams to the muon anomalous magnetic moment, witch was evaluated previously using the Integration Routine RIWIAD on a CDC 7600 computer, is reevaluated using the Integration Routine VEGAS on an IBM ES/9000 computer. The previous calculation was found to suffer from a severe underestimation of errors. The new result, −0.241 5(19), is close to the asymptotic analytic result obtained recently by Broadhurst et al. using a renormalization group technique. The difference between the numerical and analytic results may be written as 10.23(39)(m e /m μ )