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Graham K Hubler - One of the best experts on this subject based on the ideXlab platform.
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pulsed Laser Deposition of thin films
Pulsed Laser Deposition of Thin Films, 2003Co-Authors: D B Chrisey, Graham K HublerAbstract:Partial table of contents: History and Fundamentals of Pulsed Laser Deposition (J. Cheung). Diagnostics and Characteristics of Laser--Produced Plasmas (D. Geohegan). Particulates Generated by Pulsed Laser Ablation (L.--C. Chen). Angular Distribution of Ablated Material (K. Saenger). Film Nucleation and Film Growth in Pulsed Laser Deposition of Ceramics (J. Horwitz & J. Sprague). Processes Characteristics and Film Properties in Pulsed Laser Plasma Deposition (S. Metev). Commercial Scale--Up of Pulsed Laser Deposition (J. Greer). Pulsed Laser Deposition: Future Trends (T. Venkatesan). Comparison of Vacuum Deposition Techniques (G. Hubler). Pulsed Laser Deposition of High--Temperature Superconducting Thin Films for Active and Passive Device Applications (R. Muenchausen & X. Wu). Pulsed Laser Deposition of Metals (J. Kools). Appendix. References. Index.
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Pulsed Laser Deposition
MRS Bulletin, 1992Co-Authors: Graham K HublerAbstract:Research on materials grown by pulsed Laser Deposition, or PLD, has experienced phenomenal growth since late 1987 when T. Venkatesan (one of the authors for this issue) and co-workers pointed out that extreme nonequilibrium conditions created by pulsed Laser melting of YBaCuO allowed in-situ preparation of thin films of this high transition temperature (Tc) superconducting material. Since then, PLD has emerged as the primary means for high throughput Deposition of high-quality superconducting thin films for research and devices. This probably came as no surprise to J.T. Cheung (another of this issue's authors), who performed original research in this area and tirelessly labored during the 1980s to convince a skeptical audience of the advantages of PLD.Along with the success of PLD in the arena of high-temperature superconductivity, however, is the explosion of activity in the Deposition of many other materials, made possible by the unique features of pulsed Laser Deposition, materials previously not amenable to in-situ thin film growth. Creative minds reasoned that since PLD can deposit a demanding, complex material such as the perovskite structure Y1Ba2Cu3O7-δ, why not other perovskites or multicomponent oxide materials? It also turns out that the range of properties of multicomponent oxides is virtually limitless. They can be metallic, insulating, semiconducting, biocompatable, superconducting, ferroelectric, piezoelectric, and so on. One is not limited to the properties of elements or binary compounds on which the electronics and microelectronics industries are based. Indeed, in a recent review of hybrid ferromagnetic- semiconductor structures, G. Prinz states, “… there has been little work devoted to incorporating magnetic materials into planar integrated electronic (or photonic) circuitry there are potential applications that have no analog in vacuum electronics but that remain unrealized, awaiting the development of appropriate materials and processing procedures.” In pulsed Laser Deposition, we may well have in hand the “appropriate processing procedure” to deposit sequential epitaxial layers of high quality materials that possess profoundly different properties.
Ion N. Mihailescu - One of the best experts on this subject based on the ideXlab platform.
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Pulsed Laser Deposition of Hydroxyapatite Thin Films
Materials Science and Engineering: C, 2007Co-Authors: C.f. Koch, D B Chrisey, Sandra Johnson, Dinesh Kumar, Miroslav Jelinek, Anand Doraiswamy, Chunming Jin, Roger J. Narayan, Ion N. MihailescuAbstract:Hydroxyapatite is a bioactive ceramic material that mimics the mineral composition of natural bone. This material does not possess acceptable mechanical properties for use as a bulk biomaterial; however, it does demonstrate significant potential for use as a coating on metallic orthopaedic and dental prostheses. This paper reviews recent developments involving pulsed Laser Deposition of hydroxyapatite thin films for medical and dental applications. The structural, mechanical, and biological properties of hydroxyapatite thin films are described. In addition, future directions in pulsed Laser Deposition of hydroxyapatite thin films are discussed.
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La2O3-doped BaTiO3 thin films obtained by pulsed Laser Deposition
Journal of Modern Optics, 2001Co-Authors: M. Cernea, Ion N. Mihailescu, C Martin, Carmen Ristoscu, Monica IliescuAbstract:Abstract La2O3-doped barium titanate (BaTiO3) thin films have been obtained by pulsed Laser Deposition. The structure and quality of deposited films were characterized by X-ray diffraction and scanning electron microscopy. A smooth surface was obtained when the films were deposited in 30 Pa ambient oxygen. The composition (elements and oxides) of the thin films were close to those of the target. The layer obtained by pulsed Laser Deposition from a target of BaTiO3 doped with 0.5 at.% La exhibits good dielectric characteristics: capacitance 88 pF, Curie temperature 59°C and dielectrics loss, tanδ, 0.084.
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New studies of reactive pulsed Laser Deposition
ROMOPTO '97: Fifth Conference on Optics, 1998Co-Authors: Ion N. Mihailescu, Eniko Gyorgy, Valentin S. Teodorescu, Gheorghe Marin, D. Pantelica, A. Andrei, Johny NeamtuAbstract:****Depament of Natural Science. University of Craiova. RomaniaABSTRACTWe report the synthesis and Deposition of TiC films by reactive pulsed Laser Deposition. Titargets have been submitted to multipuise LIV Laser action in low pressure CH. The thinfilms were grown on a collector placed parallel to the target. The films were characterizedby electron microscopy. electron spectroscopy and nuclear techniques.Keywords: reactive pulsed Laser Deposition, titanium carbide thin films1. INTRODUCTION
Martin Jansen - One of the best experts on this subject based on the ideXlab platform.
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A new pulsed Laser Deposition technique: Scanning multi-component pulsed Laser Deposition method
Review of Scientific Instruments, 2012Co-Authors: Daniel Fischer, G. F. De La Fuente, Martin JansenAbstract:The scanning multi-component pulsed Laser Deposition (PLD) method realizes uniform Depositions of desired coatings by a modified pulsed Laser Deposition process, preferably with a femto-second Laser-system. Multi-component coatings (single or multilayered) are thus deposited onto substrates via Laser induced ablation of segmented targets. This is achieved via horizontal line-scanning of a focused Laser beam over a uniformly moving target's surface. This process allows to deposit the desired composition of the coating simultaneously, starting from the different segments of the target and adjusting the scan line as a function of target geometry. The sequence and thickness of multilayers can easily be adjusted by target architecture and motion, enabling inter/intra layer concentration gradients and thus functional gradient coatings. This new, simple PLD method enables the achievement of uniform, large-area coatings. Case studies were performed with segmented targets containing aluminum, titanium, and niobium...
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A new pulsed Laser Deposition technique: Scanning multi-component pulsed Laser Deposition method
The Review of scientific instruments, 2012Co-Authors: Daniel Fischer, G. F. De La Fuente, Martin JansenAbstract:The scanning multi-component pulsed Laser Deposition (PLD) method realizes uniform Depositions of desired coatings by a modified pulsed Laser Deposition process, preferably with a femto-second Laser-system. Multi-component coatings (single or multilayered) are thus deposited onto substrates via Laser induced ablation of segmented targets. This is achieved via horizontal line-scanning of a focused Laser beam over a uniformly moving target's surface. This process allows to deposit the desired composition of the coating simultaneously, starting from the different segments of the target and adjusting the scan line as a function of target geometry. The sequence and thickness of multilayers can easily be adjusted by target architecture and motion, enabling inter/intra layer concentration gradients and thus functional gradient coatings. This new, simple PLD method enables the achievement of uniform, large-area coatings. Case studies were performed with segmented targets containing aluminum, titanium, and niobium. Under the Laser irradiation conditions applied, all three metals were uniformly ablated. The elemental composition within the rough coatings obtained was fixed by the scanned area to Ti-Al-Nb = 1:1:1. Crystalline aluminum, titanium, and niobium were found to coexist side by side at room temperature within the substrate, without alloy formation up to 600 °C.
C. H. Woo - One of the best experts on this subject based on the ideXlab platform.
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Monte Carlo simulation of pulsed Laser Deposition
Physical Review B, 2002Co-Authors: P M Lam, Shen Jung Liu, C. H. WooAbstract:Using the Monte Carlo method, we have studied the pulsed Laser Deposition process at the submonolayer regime. In our simulations, dissociation of an atom from a cluster is incorporated. Our results indicate that the pulsed Laser Deposition resembles molecular-beam epitaxy at very low intensity, and that it is characteristically different from molecular-beam epitaxy at higher intensity. We have also obtained the island size distributions. The scaling function for the island size distribution for pulsed Laser Deposition is different from that of molecular-beam epitaxy.
C. L. Choy - One of the best experts on this subject based on the ideXlab platform.
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Reactive pulsed Laser Deposition of CNx films
Applied Physics Letters, 1995Co-Authors: X.‐a. Zhao, Chung Wo Ong, Y. C. Tsang, Y. W. Wong, P. W. Chan, C. L. ChoyAbstract:Carbon nitride (CNx) films were prepared by reactive pulsed Laser Deposition at nitrogen partial pressure PN2varying from 0 to 300 mTorr. It is found that the atomic fraction of nitrogen f in the films first increases with increasing PN2, reaches a maximum of 0.32 at PN2=100 mTorr, and then decreases to a saturated value of 0.26 at PN2≳200 mTorr. Because of the absence of energetic particles in reactive pulsed Laser Deposition, the limited nitrogen content cannot be attributed to preferential sputtering of nitrogen that is generally observed in particle‐assisted Deposition of CNx films. Infrared absorption experiments show the existence of C≡N bonds and graphitic sp2 bonds. The sp2 bonds become IR active because of symmetry breaking of graphitic rings as a consequence of nitrogen incorporation. CNx films deposited at low PN2 (e.g., 5 mTorr) are more graphitic than the diamondlike pure carbon sample deposited at PN2=0, so have a slightly narrower electron band gap Eopt and a significantly higher room‐tempe...
