The Experts below are selected from a list of 21 Experts worldwide ranked by ideXlab platform

Dario Narducci - One of the best experts on this subject based on the ideXlab platform.

  • Morphology changes of Si(0 0 1) surfaces during wet chemical halogenation
    Applied Surface Science, 2003
    Co-Authors: L. Pedemonte, Gianangelo Bracco, Annalisa Relini, Ranieri Rolandi, Dario Narducci
    Abstract:

    Abstract This paper reports an experimental study aimed to develop a suitable and reliable procedure to graft Organic molecular fragments onto silicon surfaces, leading to a stable Organic termination. Grafting of self-assembled Organic films on the (0 0 1) surface of Si is performed by SC1/SC2 processing and by a bromination step preceding the nucleophilic reaction with the Organic Aromatic Compound. After each wet processing step the Si(0 0 1) morphology is investigated using atomic force microscopy to correlate the etching chemistry and the substrate morphology. The bromination step is observed to cause a strong increase of surface roughness due to the formation of pyramid-shaped nanostructures. Controlling the surface roughness as induced by chemical processing is suggested as a fundamental goal towards an increase of the Organic film coverage and stability. Correcting actions and enabling prevention of surface damage are proposed and discussed.

L. Pedemonte - One of the best experts on this subject based on the ideXlab platform.

  • Morphology changes of Si(0 0 1) surfaces during wet chemical halogenation
    Applied Surface Science, 2003
    Co-Authors: L. Pedemonte, Gianangelo Bracco, Annalisa Relini, Ranieri Rolandi, Dario Narducci
    Abstract:

    Abstract This paper reports an experimental study aimed to develop a suitable and reliable procedure to graft Organic molecular fragments onto silicon surfaces, leading to a stable Organic termination. Grafting of self-assembled Organic films on the (0 0 1) surface of Si is performed by SC1/SC2 processing and by a bromination step preceding the nucleophilic reaction with the Organic Aromatic Compound. After each wet processing step the Si(0 0 1) morphology is investigated using atomic force microscopy to correlate the etching chemistry and the substrate morphology. The bromination step is observed to cause a strong increase of surface roughness due to the formation of pyramid-shaped nanostructures. Controlling the surface roughness as induced by chemical processing is suggested as a fundamental goal towards an increase of the Organic film coverage and stability. Correcting actions and enabling prevention of surface damage are proposed and discussed.

Ranieri Rolandi - One of the best experts on this subject based on the ideXlab platform.

  • Morphology changes of Si(0 0 1) surfaces during wet chemical halogenation
    Applied Surface Science, 2003
    Co-Authors: L. Pedemonte, Gianangelo Bracco, Annalisa Relini, Ranieri Rolandi, Dario Narducci
    Abstract:

    Abstract This paper reports an experimental study aimed to develop a suitable and reliable procedure to graft Organic molecular fragments onto silicon surfaces, leading to a stable Organic termination. Grafting of self-assembled Organic films on the (0 0 1) surface of Si is performed by SC1/SC2 processing and by a bromination step preceding the nucleophilic reaction with the Organic Aromatic Compound. After each wet processing step the Si(0 0 1) morphology is investigated using atomic force microscopy to correlate the etching chemistry and the substrate morphology. The bromination step is observed to cause a strong increase of surface roughness due to the formation of pyramid-shaped nanostructures. Controlling the surface roughness as induced by chemical processing is suggested as a fundamental goal towards an increase of the Organic film coverage and stability. Correcting actions and enabling prevention of surface damage are proposed and discussed.

Annalisa Relini - One of the best experts on this subject based on the ideXlab platform.

  • Morphology changes of Si(0 0 1) surfaces during wet chemical halogenation
    Applied Surface Science, 2003
    Co-Authors: L. Pedemonte, Gianangelo Bracco, Annalisa Relini, Ranieri Rolandi, Dario Narducci
    Abstract:

    Abstract This paper reports an experimental study aimed to develop a suitable and reliable procedure to graft Organic molecular fragments onto silicon surfaces, leading to a stable Organic termination. Grafting of self-assembled Organic films on the (0 0 1) surface of Si is performed by SC1/SC2 processing and by a bromination step preceding the nucleophilic reaction with the Organic Aromatic Compound. After each wet processing step the Si(0 0 1) morphology is investigated using atomic force microscopy to correlate the etching chemistry and the substrate morphology. The bromination step is observed to cause a strong increase of surface roughness due to the formation of pyramid-shaped nanostructures. Controlling the surface roughness as induced by chemical processing is suggested as a fundamental goal towards an increase of the Organic film coverage and stability. Correcting actions and enabling prevention of surface damage are proposed and discussed.

Gianangelo Bracco - One of the best experts on this subject based on the ideXlab platform.

  • Morphology changes of Si(0 0 1) surfaces during wet chemical halogenation
    Applied Surface Science, 2003
    Co-Authors: L. Pedemonte, Gianangelo Bracco, Annalisa Relini, Ranieri Rolandi, Dario Narducci
    Abstract:

    Abstract This paper reports an experimental study aimed to develop a suitable and reliable procedure to graft Organic molecular fragments onto silicon surfaces, leading to a stable Organic termination. Grafting of self-assembled Organic films on the (0 0 1) surface of Si is performed by SC1/SC2 processing and by a bromination step preceding the nucleophilic reaction with the Organic Aromatic Compound. After each wet processing step the Si(0 0 1) morphology is investigated using atomic force microscopy to correlate the etching chemistry and the substrate morphology. The bromination step is observed to cause a strong increase of surface roughness due to the formation of pyramid-shaped nanostructures. Controlling the surface roughness as induced by chemical processing is suggested as a fundamental goal towards an increase of the Organic film coverage and stability. Correcting actions and enabling prevention of surface damage are proposed and discussed.