The Experts below are selected from a list of 90 Experts worldwide ranked by ideXlab platform
Zhaoyuan Ning - One of the best experts on this subject based on the ideXlab platform.
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Effect of driving frequency on Plasma Property in radio frequency and very high frequency magnetron sputtering discharges
Plasma Sources Science and Technology, 2013Co-Authors: Fupei Huang, Yi Liu, Xiangying Wang, Zhaoyuan NingAbstract:Ion energy distributions (IEDs), electron energy distributions (EEDs) and other Plasma parameters of magnetron sputtering discharges driven by 13.56, 27.12 and 60 MHz sources were investigated by a retarding field energy analyzer and Langmuir probe measurements. An increase in driving frequency leads to an increase in ion energy and the evolution of IEDs from a uni-modal distribution at the 13.56 MHz discharge toward a bi-modal distribution at 27.12 MHz, and a multi-modal distribution at the 60 MHz discharge. For IEDs near the target surface, this evolution is related to the ion acceleration and the charge transfer collisions between Ar atoms and Ar+ ions in the presheath, while for IEDs at the substrate, the evolution depends on the ratio of the ion transit time across the sheath to the radio frequency period. The increase in driving frequency also leads to the evolution of EED function from a Maxwellian type at the 13.56 MHz discharge toward a bi-Maxwellian type at the 27.12 MHz discharge and a Druyvesteyn-like type at the 60 MHz discharge due to the change in the generation and loss mechanisms of electrons. In addition, increasing the driving frequency can lead to a higher electron temperature and a lower electron density. Therefore, the driving frequency becomes an effective tool to control the Plasma properties of magnetron sputtering discharges.
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Effect of Internal Antenna Coil Power on the Plasma Parameters in 13.56 MHz/60 MHz Dual-Frequency Sputtering
Plasma Science and Technology, 2013Co-Authors: Fupei Huang, Chicheng Yang, Zhaoyuan NingAbstract:The Plasma Property of a hybrid ICP/sputtering discharge driven by 13.56 MHz/60 MHz power sources was investigated by Langmuir probe measurement. For the pure sputtering discharge, the low electron density and ion flux, the rise of floating potential and Plasma potential with increasing power, as well as the bi-Maxwellian distribution of electron energy distributions (EEDFs) were obtained. The assistance of ICP discharge led to the effective increases of electron density and ion flux, the suppression of rise of floating potential and Plasma potential, as well as the change of EEDFs from bi-Maxwellian distribution into Maxwellian distribution. The increase of electron density and ion flux, and the EEDFs evolution were related to the effective electron heating by the induced electric field.
Fupei Huang - One of the best experts on this subject based on the ideXlab platform.
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Plasma Property of inductively coupled discharge and substrate bias co-assisted very-high-frequency magnetron sputtering
Thin Solid Films, 2015Co-Authors: Yi Liu, Xiangying Wang, Fupei HuangAbstract:Abstract Very-high-frequency (VHF) magnetron sputtering is an important method to deposit the polycrystalline films at low temperature. To increase the Plasma density, ion flux and to control the ion energy, the inductively coupled Plasma (ICP) and substrate bias co-assisted VHF magnetron sputtering was developed. The Plasma properties of this system were measured by a Langmuir probe and a retarding field energy analyzer. In the VHF magnetron sputtering, the ICP discharge can increase the Plasma density effectively but has a small influence on the ion energy and ion flux; the substrate bias can increase the Plasma density and ion flux more effectively but result in the divergence of ion energy. When the ICP discharge and substrate bias are simultaneously applied, the divergence of ion energy can be suppressed, while the high Plasma density (2.6 × 10 17 m − 3 ) and ion flux (4.3 × 10 20 m − 2 ⋅ s − 1 ) can be remained. Therefore, the ICP and substrate bias co-assisted VHF magnetron sputtering is a possible way to deposit the polycrystalline films at low temperature with a higher growth rate.
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Effect of driving frequency on Plasma Property in radio frequency and very high frequency magnetron sputtering discharges
Plasma Sources Science and Technology, 2013Co-Authors: Fupei Huang, Yi Liu, Xiangying Wang, Zhaoyuan NingAbstract:Ion energy distributions (IEDs), electron energy distributions (EEDs) and other Plasma parameters of magnetron sputtering discharges driven by 13.56, 27.12 and 60 MHz sources were investigated by a retarding field energy analyzer and Langmuir probe measurements. An increase in driving frequency leads to an increase in ion energy and the evolution of IEDs from a uni-modal distribution at the 13.56 MHz discharge toward a bi-modal distribution at 27.12 MHz, and a multi-modal distribution at the 60 MHz discharge. For IEDs near the target surface, this evolution is related to the ion acceleration and the charge transfer collisions between Ar atoms and Ar+ ions in the presheath, while for IEDs at the substrate, the evolution depends on the ratio of the ion transit time across the sheath to the radio frequency period. The increase in driving frequency also leads to the evolution of EED function from a Maxwellian type at the 13.56 MHz discharge toward a bi-Maxwellian type at the 27.12 MHz discharge and a Druyvesteyn-like type at the 60 MHz discharge due to the change in the generation and loss mechanisms of electrons. In addition, increasing the driving frequency can lead to a higher electron temperature and a lower electron density. Therefore, the driving frequency becomes an effective tool to control the Plasma properties of magnetron sputtering discharges.
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Effect of Internal Antenna Coil Power on the Plasma Parameters in 13.56 MHz/60 MHz Dual-Frequency Sputtering
Plasma Science and Technology, 2013Co-Authors: Fupei Huang, Chicheng Yang, Zhaoyuan NingAbstract:The Plasma Property of a hybrid ICP/sputtering discharge driven by 13.56 MHz/60 MHz power sources was investigated by Langmuir probe measurement. For the pure sputtering discharge, the low electron density and ion flux, the rise of floating potential and Plasma potential with increasing power, as well as the bi-Maxwellian distribution of electron energy distributions (EEDFs) were obtained. The assistance of ICP discharge led to the effective increases of electron density and ion flux, the suppression of rise of floating potential and Plasma potential, as well as the change of EEDFs from bi-Maxwellian distribution into Maxwellian distribution. The increase of electron density and ion flux, and the EEDFs evolution were related to the effective electron heating by the induced electric field.
Xiangying Wang - One of the best experts on this subject based on the ideXlab platform.
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Effect of Frequency and Power of Bias Applied to Substrate on Plasma Property of Very-High-Frequency Magnetron Sputtering
Plasma Science and Technology, 2015Co-Authors: Yi Liu, Xiangying WangAbstract:The effect of the frequency and power of the bias applied to the substrate on Plasma properties in 60 MHz (VHF) magnetron sputtering was investigated. The Plasma properties include the ion velocity distribution function (IVDF), electron energy probability function (EEPF), electron density ne, ion flux Γi, and effective electron temperature Teff. These parameters were measured by a retarding field energy analyzer and a Langmuir probe in the 60 MHz magnetron sputtering, assisted with 13.56 MHz or 27.12 MHz substrate bias. The 13.56 MHz substrate bias led to broadening and multi-peaks IVDFs, Maxwellian EEPFs, as well as high electron density, ion flux, and low electron temperature. The 27.12 MHz substrate bias led to a further increase of electron density and ion flux, but made the IVDFs narrow. Therefore, the frequency of the substrate bias was a possible way to control the Plasma properties in VHF magnetron sputtering.
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Plasma Property of inductively coupled discharge and substrate bias co-assisted very-high-frequency magnetron sputtering
Thin Solid Films, 2015Co-Authors: Yi Liu, Xiangying Wang, Fupei HuangAbstract:Abstract Very-high-frequency (VHF) magnetron sputtering is an important method to deposit the polycrystalline films at low temperature. To increase the Plasma density, ion flux and to control the ion energy, the inductively coupled Plasma (ICP) and substrate bias co-assisted VHF magnetron sputtering was developed. The Plasma properties of this system were measured by a Langmuir probe and a retarding field energy analyzer. In the VHF magnetron sputtering, the ICP discharge can increase the Plasma density effectively but has a small influence on the ion energy and ion flux; the substrate bias can increase the Plasma density and ion flux more effectively but result in the divergence of ion energy. When the ICP discharge and substrate bias are simultaneously applied, the divergence of ion energy can be suppressed, while the high Plasma density (2.6 × 10 17 m − 3 ) and ion flux (4.3 × 10 20 m − 2 ⋅ s − 1 ) can be remained. Therefore, the ICP and substrate bias co-assisted VHF magnetron sputtering is a possible way to deposit the polycrystalline films at low temperature with a higher growth rate.
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Effect of driving frequency on Plasma Property in radio frequency and very high frequency magnetron sputtering discharges
Plasma Sources Science and Technology, 2013Co-Authors: Fupei Huang, Yi Liu, Xiangying Wang, Zhaoyuan NingAbstract:Ion energy distributions (IEDs), electron energy distributions (EEDs) and other Plasma parameters of magnetron sputtering discharges driven by 13.56, 27.12 and 60 MHz sources were investigated by a retarding field energy analyzer and Langmuir probe measurements. An increase in driving frequency leads to an increase in ion energy and the evolution of IEDs from a uni-modal distribution at the 13.56 MHz discharge toward a bi-modal distribution at 27.12 MHz, and a multi-modal distribution at the 60 MHz discharge. For IEDs near the target surface, this evolution is related to the ion acceleration and the charge transfer collisions between Ar atoms and Ar+ ions in the presheath, while for IEDs at the substrate, the evolution depends on the ratio of the ion transit time across the sheath to the radio frequency period. The increase in driving frequency also leads to the evolution of EED function from a Maxwellian type at the 13.56 MHz discharge toward a bi-Maxwellian type at the 27.12 MHz discharge and a Druyvesteyn-like type at the 60 MHz discharge due to the change in the generation and loss mechanisms of electrons. In addition, increasing the driving frequency can lead to a higher electron temperature and a lower electron density. Therefore, the driving frequency becomes an effective tool to control the Plasma properties of magnetron sputtering discharges.
Yi Liu - One of the best experts on this subject based on the ideXlab platform.
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Effect of Frequency and Power of Bias Applied to Substrate on Plasma Property of Very-High-Frequency Magnetron Sputtering
Plasma Science and Technology, 2015Co-Authors: Yi Liu, Xiangying WangAbstract:The effect of the frequency and power of the bias applied to the substrate on Plasma properties in 60 MHz (VHF) magnetron sputtering was investigated. The Plasma properties include the ion velocity distribution function (IVDF), electron energy probability function (EEPF), electron density ne, ion flux Γi, and effective electron temperature Teff. These parameters were measured by a retarding field energy analyzer and a Langmuir probe in the 60 MHz magnetron sputtering, assisted with 13.56 MHz or 27.12 MHz substrate bias. The 13.56 MHz substrate bias led to broadening and multi-peaks IVDFs, Maxwellian EEPFs, as well as high electron density, ion flux, and low electron temperature. The 27.12 MHz substrate bias led to a further increase of electron density and ion flux, but made the IVDFs narrow. Therefore, the frequency of the substrate bias was a possible way to control the Plasma properties in VHF magnetron sputtering.
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Plasma Property of inductively coupled discharge and substrate bias co-assisted very-high-frequency magnetron sputtering
Thin Solid Films, 2015Co-Authors: Yi Liu, Xiangying Wang, Fupei HuangAbstract:Abstract Very-high-frequency (VHF) magnetron sputtering is an important method to deposit the polycrystalline films at low temperature. To increase the Plasma density, ion flux and to control the ion energy, the inductively coupled Plasma (ICP) and substrate bias co-assisted VHF magnetron sputtering was developed. The Plasma properties of this system were measured by a Langmuir probe and a retarding field energy analyzer. In the VHF magnetron sputtering, the ICP discharge can increase the Plasma density effectively but has a small influence on the ion energy and ion flux; the substrate bias can increase the Plasma density and ion flux more effectively but result in the divergence of ion energy. When the ICP discharge and substrate bias are simultaneously applied, the divergence of ion energy can be suppressed, while the high Plasma density (2.6 × 10 17 m − 3 ) and ion flux (4.3 × 10 20 m − 2 ⋅ s − 1 ) can be remained. Therefore, the ICP and substrate bias co-assisted VHF magnetron sputtering is a possible way to deposit the polycrystalline films at low temperature with a higher growth rate.
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Effect of driving frequency on Plasma Property in radio frequency and very high frequency magnetron sputtering discharges
Plasma Sources Science and Technology, 2013Co-Authors: Fupei Huang, Yi Liu, Xiangying Wang, Zhaoyuan NingAbstract:Ion energy distributions (IEDs), electron energy distributions (EEDs) and other Plasma parameters of magnetron sputtering discharges driven by 13.56, 27.12 and 60 MHz sources were investigated by a retarding field energy analyzer and Langmuir probe measurements. An increase in driving frequency leads to an increase in ion energy and the evolution of IEDs from a uni-modal distribution at the 13.56 MHz discharge toward a bi-modal distribution at 27.12 MHz, and a multi-modal distribution at the 60 MHz discharge. For IEDs near the target surface, this evolution is related to the ion acceleration and the charge transfer collisions between Ar atoms and Ar+ ions in the presheath, while for IEDs at the substrate, the evolution depends on the ratio of the ion transit time across the sheath to the radio frequency period. The increase in driving frequency also leads to the evolution of EED function from a Maxwellian type at the 13.56 MHz discharge toward a bi-Maxwellian type at the 27.12 MHz discharge and a Druyvesteyn-like type at the 60 MHz discharge due to the change in the generation and loss mechanisms of electrons. In addition, increasing the driving frequency can lead to a higher electron temperature and a lower electron density. Therefore, the driving frequency becomes an effective tool to control the Plasma properties of magnetron sputtering discharges.
Mitchell L. R. Walker - One of the best experts on this subject based on the ideXlab platform.
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Effects of Ingested vs. Injected Propellant on Radio-Frequency Discharge Plasma Properties
Frontiers in Physics, 2019Co-Authors: Natalie R. S. Caruso, Mitchell L. R. WalkerAbstract:Radio-frequency (RF) ion thrusters are characterized in vacuum test facilities differentiated by pumping speed and thus subject to varying levels of neutral propellant ingestion that affect Plasma plume properties and artificially raise the pressure of neutral propellant available to the thruster. These Plasma properties are often used to calculate anticipated thrust values for RF thruster prototypes without consideration of the effects ingested neutral propellant may have beyond increasing the amount of neutral atoms available. This study compares exit plane Plasma properties for nominal operation of a replica of the Madison Helicon Experiment operating at a propellant flow rate of 2 standard cm^3/min argon subject to 3.8 cm^3/min ingested argon flow with thruster operation over a range of propellant flow rates (1.3–60 standard cm^3/min argon) subject to a maximum ingested argon flow rate of 0.8 cm^3/min to determine the validity of compensating for neutral ingestion at higher operating pressures by increasing supplied propellant flow rates when operating at lower facility pressures. This study finds that no single operating condition at the 0.8 cm^3/min ingestion condition reproduces all the Plasma Property values recorded at the nominal flow rate at the 3.8 cm^3/min ingestion condition. The inability of Plasma properties to be reproduced at a single adjusted flow rate is a result of the differing magnitudes of influence neutral ingestion effects have on individual plume properties.