The Experts below are selected from a list of 1698 Experts worldwide ranked by ideXlab platform
Cedric Clevy - One of the best experts on this subject based on the ideXlab platform.
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URAI - Pattern-based vision for microrobotic manipulators calibRation and servoing
2016 13th International Conference on Ubiquitous Robots and Ambient Intelligence (URAI), 2016Co-Authors: Valerian Guelpa, Patrick Sandoz, Cedric Clevy, Nadine Le Fort-piat, Guillaume J LaurentAbstract:This paper presents recent results obtained with a visual method allowing absolute position measurements at nanoscale. Based on the direct phase analysis of pseudo-periodic patterns, this approach enabled fast measurements of position with large range-to-Resolution Ratios. Applications include microrobotic manipulators calibRation and visual servoing but also microforce measurement by using a compliant structure. Range-to-Resolution Ratio of 105 are typically overcome. For instance, the experiments have demonstrated a sub-nanometric Resolution over a range of 168 µm, as well as a Resolution below 50 nN for a 50mN range for force measurement.
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vision based microforce measurement with a large range to Resolution Ratio using a twin scale pattern
IEEE-ASME Transactions on Mechatronics, 2015Co-Authors: Valerian Guelpa, Guillaume J Laurent, Patrick Sandoz, Cedric ClevyAbstract:Force sensors are often required in order to work at the microscale, but existing ones rarely meet all expectations, particularly in terms of Resolution, range, accuracy, or integRation potential. This paper presents a novel microforce measurement method by vision, based on a twin-scale pattern fixed on a compliant structure. This approach enabled subpixelic measurement of position by the use of a micromachined pattern based on the Vernier principle. This method also presents flexibility, insensitivity to electronic noise, fast operating time, and ease of calibRation. The major contribution consists in the large range-to-Resolution Ratio of the measurement system. With an experimental range of 50 mN and a Resolution below 50 nN, a range-to-Resolution Ratio of 106 is obtained. A repeatability under 7.8 $\mu$ N and a trueness under 15 $\mu$ N have been experimentally measured. Finally, the method can be applied to other specifications and applications in terms of range.
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Twin-scale Vernier Micro-pattern for Visual Measurement of 1-D in-plane Absolute Displacements with Increased Range-to-Resolution Ratio
International Journal of Optomechatronics, 2013Co-Authors: Patrick Sandoz, Guillaume J Laurent, Lucas Lopes Lemos, Cedric ClevyAbstract:International audienceThis paper presents a visual method for 1D in-plane displacement measurement which combines a Resolution of a few nanometers with an unambiguous excursion range of 168 µm. Furthermore, position retrieval is only based on elementary phase computations and thus might become compatible with high-rate processing by implementing the processing algorithm on high speed computing architectures like a DSP or a FPGA device. The method is based on a twin scale Vernier micro-pattern fixed on the moving target of interest. The two periodic grids have slightly different periods in order to encode the period order within the phase difference observed between the two sub-patterns. As a result, an unambiguous range of 168 µm is obtained from grid periods of 8 µm and 8.4 µm. The Resolution is evaluated to be of 11.7 nm despite remaining mechanical disturbances. Differential measurements demonstrated indeed a measurement accuracy better than 5 nm
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Twin-scale vernier micro-pattern for visual measurement of 1D in-plane absolute displacements with increased range-to-Resolution Ratio
2012Co-Authors: Patrick Sandoz, Guillaume J Laurent, Lucas Lopes Lemos, Cedric ClevyAbstract:This paper presents a visual method for 1D in-plane displacement measurement which combines a Resolution of a few nanometers with an unambiguous excursion range of 168µm. Furthermore, position retrieval is only based on elementary phase computations and thus might become compatible with high-rate processing by implementing the processing algorithm on high speed computing architectures like a DSP or a FPGA device. The method is based on a twin scale Vernier micro-pattern fixed on the moving target of interest. The two periodic grids have slightly different periods in order to encode the period order within the phase difference observed between the two sub-patterns. As a result, an unambiguous range of 168µm is obtained from grid periods of 8µm and 8.4µm. The Resolution is evaluated to be of 11.7nm despite remaining mechanical disturbances. Differential measurements demonstrated indeed a measurement accuracy better than 5nm.
Jianyi Yang - One of the best experts on this subject based on the ideXlab platform.
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fano resonance based ultra high Resolution Ratio metric wavelength monitor on silicon
Optics Letters, 2016Co-Authors: Gencheng Wang, Ao Shen, Changyun Zhao, Longzhi Yang, Yuehai Wang, Yubo Li, Xiaoqing Jiang, Jianyi YangAbstract:An integrated ultra-high-Resolution Ratio-metric wavelength monitor (RMWM) with compact size based on slope tunable Fano resonance is demonstrated on silicon. The Fano resonance is generated by adding an asymmetric microring inside and coupling with the outer ring to produce a nonlinear phase shift. The slope tunability is achieved by controlling the microheaters to adjust the phase condition. Two asymmetric embedded microring resonators (AEMR) are functioned as edge filters and designed to achieve an “X-type” spectral response in a particular wavelength range. An ultra-high Resolution of 0.8 pm in a 0.47 nm wide wavelength range is experimentally demonstrated. This device could be applied in on-chip high-sensitivity wavelength monitoring sensing.
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Ultrahigh-Resolution Ratio-Metric Wavelength Monitors Based on Tunable Microrings on Silicon
IEEE Photonics Technology Letters, 2015Co-Authors: Ao Shen, Changyun Zhao, Xiaoqing Jiang, Jianyi YangAbstract:An ultrahigh-Resolution Ratio-metric wavelength monitor based on microring resonators (MRRs) is demonstrated on silicon. The theoretical wavelength Resolution is related to the functional wavelength range and the quality ( $Q$ )-factor of the microring. We analyze the relationship and experimentally demonstrate that the functional range and the Resolution can be adjusted by thermally tuning the resonance spacing of the MRRs. The Resolution is also limited by the noise introduced in the measurements. An ultrahigh experimental Resolution of 1.5 pm is obtained within a 0.72 nm functional range and an ultrahigh theoretical extreme Resolution of $\sim 0.4$ pm can be expected considering of the intrinsic systems noise only. The causes of the difference between the experimental and theoretical Resolution and the measures to reduce the difference are also discussed.
Patrick Sandoz - One of the best experts on this subject based on the ideXlab platform.
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URAI - Pattern-based vision for microrobotic manipulators calibRation and servoing
2016 13th International Conference on Ubiquitous Robots and Ambient Intelligence (URAI), 2016Co-Authors: Valerian Guelpa, Patrick Sandoz, Cedric Clevy, Nadine Le Fort-piat, Guillaume J LaurentAbstract:This paper presents recent results obtained with a visual method allowing absolute position measurements at nanoscale. Based on the direct phase analysis of pseudo-periodic patterns, this approach enabled fast measurements of position with large range-to-Resolution Ratios. Applications include microrobotic manipulators calibRation and visual servoing but also microforce measurement by using a compliant structure. Range-to-Resolution Ratio of 105 are typically overcome. For instance, the experiments have demonstrated a sub-nanometric Resolution over a range of 168 µm, as well as a Resolution below 50 nN for a 50mN range for force measurement.
-
vision based microforce measurement with a large range to Resolution Ratio using a twin scale pattern
IEEE-ASME Transactions on Mechatronics, 2015Co-Authors: Valerian Guelpa, Guillaume J Laurent, Patrick Sandoz, Cedric ClevyAbstract:Force sensors are often required in order to work at the microscale, but existing ones rarely meet all expectations, particularly in terms of Resolution, range, accuracy, or integRation potential. This paper presents a novel microforce measurement method by vision, based on a twin-scale pattern fixed on a compliant structure. This approach enabled subpixelic measurement of position by the use of a micromachined pattern based on the Vernier principle. This method also presents flexibility, insensitivity to electronic noise, fast operating time, and ease of calibRation. The major contribution consists in the large range-to-Resolution Ratio of the measurement system. With an experimental range of 50 mN and a Resolution below 50 nN, a range-to-Resolution Ratio of 106 is obtained. A repeatability under 7.8 $\mu$ N and a trueness under 15 $\mu$ N have been experimentally measured. Finally, the method can be applied to other specifications and applications in terms of range.
-
Twin-scale Vernier Micro-pattern for Visual Measurement of 1-D in-plane Absolute Displacements with Increased Range-to-Resolution Ratio
International Journal of Optomechatronics, 2013Co-Authors: Patrick Sandoz, Guillaume J Laurent, Lucas Lopes Lemos, Cedric ClevyAbstract:International audienceThis paper presents a visual method for 1D in-plane displacement measurement which combines a Resolution of a few nanometers with an unambiguous excursion range of 168 µm. Furthermore, position retrieval is only based on elementary phase computations and thus might become compatible with high-rate processing by implementing the processing algorithm on high speed computing architectures like a DSP or a FPGA device. The method is based on a twin scale Vernier micro-pattern fixed on the moving target of interest. The two periodic grids have slightly different periods in order to encode the period order within the phase difference observed between the two sub-patterns. As a result, an unambiguous range of 168 µm is obtained from grid periods of 8 µm and 8.4 µm. The Resolution is evaluated to be of 11.7 nm despite remaining mechanical disturbances. Differential measurements demonstrated indeed a measurement accuracy better than 5 nm
-
Twin-scale vernier micro-pattern for visual measurement of 1D in-plane absolute displacements with increased range-to-Resolution Ratio
2012Co-Authors: Patrick Sandoz, Guillaume J Laurent, Lucas Lopes Lemos, Cedric ClevyAbstract:This paper presents a visual method for 1D in-plane displacement measurement which combines a Resolution of a few nanometers with an unambiguous excursion range of 168µm. Furthermore, position retrieval is only based on elementary phase computations and thus might become compatible with high-rate processing by implementing the processing algorithm on high speed computing architectures like a DSP or a FPGA device. The method is based on a twin scale Vernier micro-pattern fixed on the moving target of interest. The two periodic grids have slightly different periods in order to encode the period order within the phase difference observed between the two sub-patterns. As a result, an unambiguous range of 168µm is obtained from grid periods of 8µm and 8.4µm. The Resolution is evaluated to be of 11.7nm despite remaining mechanical disturbances. Differential measurements demonstrated indeed a measurement accuracy better than 5nm.
Guillaume J Laurent - One of the best experts on this subject based on the ideXlab platform.
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URAI - Pattern-based vision for microrobotic manipulators calibRation and servoing
2016 13th International Conference on Ubiquitous Robots and Ambient Intelligence (URAI), 2016Co-Authors: Valerian Guelpa, Patrick Sandoz, Cedric Clevy, Nadine Le Fort-piat, Guillaume J LaurentAbstract:This paper presents recent results obtained with a visual method allowing absolute position measurements at nanoscale. Based on the direct phase analysis of pseudo-periodic patterns, this approach enabled fast measurements of position with large range-to-Resolution Ratios. Applications include microrobotic manipulators calibRation and visual servoing but also microforce measurement by using a compliant structure. Range-to-Resolution Ratio of 105 are typically overcome. For instance, the experiments have demonstrated a sub-nanometric Resolution over a range of 168 µm, as well as a Resolution below 50 nN for a 50mN range for force measurement.
-
vision based microforce measurement with a large range to Resolution Ratio using a twin scale pattern
IEEE-ASME Transactions on Mechatronics, 2015Co-Authors: Valerian Guelpa, Guillaume J Laurent, Patrick Sandoz, Cedric ClevyAbstract:Force sensors are often required in order to work at the microscale, but existing ones rarely meet all expectations, particularly in terms of Resolution, range, accuracy, or integRation potential. This paper presents a novel microforce measurement method by vision, based on a twin-scale pattern fixed on a compliant structure. This approach enabled subpixelic measurement of position by the use of a micromachined pattern based on the Vernier principle. This method also presents flexibility, insensitivity to electronic noise, fast operating time, and ease of calibRation. The major contribution consists in the large range-to-Resolution Ratio of the measurement system. With an experimental range of 50 mN and a Resolution below 50 nN, a range-to-Resolution Ratio of 106 is obtained. A repeatability under 7.8 $\mu$ N and a trueness under 15 $\mu$ N have been experimentally measured. Finally, the method can be applied to other specifications and applications in terms of range.
-
Twin-scale Vernier Micro-pattern for Visual Measurement of 1-D in-plane Absolute Displacements with Increased Range-to-Resolution Ratio
International Journal of Optomechatronics, 2013Co-Authors: Patrick Sandoz, Guillaume J Laurent, Lucas Lopes Lemos, Cedric ClevyAbstract:International audienceThis paper presents a visual method for 1D in-plane displacement measurement which combines a Resolution of a few nanometers with an unambiguous excursion range of 168 µm. Furthermore, position retrieval is only based on elementary phase computations and thus might become compatible with high-rate processing by implementing the processing algorithm on high speed computing architectures like a DSP or a FPGA device. The method is based on a twin scale Vernier micro-pattern fixed on the moving target of interest. The two periodic grids have slightly different periods in order to encode the period order within the phase difference observed between the two sub-patterns. As a result, an unambiguous range of 168 µm is obtained from grid periods of 8 µm and 8.4 µm. The Resolution is evaluated to be of 11.7 nm despite remaining mechanical disturbances. Differential measurements demonstrated indeed a measurement accuracy better than 5 nm
-
Twin-scale vernier micro-pattern for visual measurement of 1D in-plane absolute displacements with increased range-to-Resolution Ratio
2012Co-Authors: Patrick Sandoz, Guillaume J Laurent, Lucas Lopes Lemos, Cedric ClevyAbstract:This paper presents a visual method for 1D in-plane displacement measurement which combines a Resolution of a few nanometers with an unambiguous excursion range of 168µm. Furthermore, position retrieval is only based on elementary phase computations and thus might become compatible with high-rate processing by implementing the processing algorithm on high speed computing architectures like a DSP or a FPGA device. The method is based on a twin scale Vernier micro-pattern fixed on the moving target of interest. The two periodic grids have slightly different periods in order to encode the period order within the phase difference observed between the two sub-patterns. As a result, an unambiguous range of 168µm is obtained from grid periods of 8µm and 8.4µm. The Resolution is evaluated to be of 11.7nm despite remaining mechanical disturbances. Differential measurements demonstrated indeed a measurement accuracy better than 5nm.
Ao Shen - One of the best experts on this subject based on the ideXlab platform.
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fano resonance based ultra high Resolution Ratio metric wavelength monitor on silicon
Optics Letters, 2016Co-Authors: Gencheng Wang, Ao Shen, Changyun Zhao, Longzhi Yang, Yuehai Wang, Yubo Li, Xiaoqing Jiang, Jianyi YangAbstract:An integrated ultra-high-Resolution Ratio-metric wavelength monitor (RMWM) with compact size based on slope tunable Fano resonance is demonstrated on silicon. The Fano resonance is generated by adding an asymmetric microring inside and coupling with the outer ring to produce a nonlinear phase shift. The slope tunability is achieved by controlling the microheaters to adjust the phase condition. Two asymmetric embedded microring resonators (AEMR) are functioned as edge filters and designed to achieve an “X-type” spectral response in a particular wavelength range. An ultra-high Resolution of 0.8 pm in a 0.47 nm wide wavelength range is experimentally demonstrated. This device could be applied in on-chip high-sensitivity wavelength monitoring sensing.
-
Ultrahigh-Resolution Ratio-Metric Wavelength Monitors Based on Tunable Microrings on Silicon
IEEE Photonics Technology Letters, 2015Co-Authors: Ao Shen, Changyun Zhao, Xiaoqing Jiang, Jianyi YangAbstract:An ultrahigh-Resolution Ratio-metric wavelength monitor based on microring resonators (MRRs) is demonstrated on silicon. The theoretical wavelength Resolution is related to the functional wavelength range and the quality ( $Q$ )-factor of the microring. We analyze the relationship and experimentally demonstrate that the functional range and the Resolution can be adjusted by thermally tuning the resonance spacing of the MRRs. The Resolution is also limited by the noise introduced in the measurements. An ultrahigh experimental Resolution of 1.5 pm is obtained within a 0.72 nm functional range and an ultrahigh theoretical extreme Resolution of $\sim 0.4$ pm can be expected considering of the intrinsic systems noise only. The causes of the difference between the experimental and theoretical Resolution and the measures to reduce the difference are also discussed.