The Experts below are selected from a list of 3522 Experts worldwide ranked by ideXlab platform
Yoshinobu Kawai - One of the best experts on this subject based on the ideXlab platform.
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Large area SiH4/H2 VHF plasma pRoduced at high pressure using multi-Rod electRode
Surface and Coatings Technology, 2008Co-Authors: Yasuhiro Yamauchi, Yoshiaki Takeuchi, Hiromu Takatsuka, Yuichi Kai, Hiroshi Muta, Yoshinobu KawaiAbstract:Abstract A VHF SiH 4 /H 2 plasma was pRoduced using a multi-Rod electRode of 1200 mm × 115 mm and the characteristics of VHF plasma at high pressure were measured with a heated Langmuir probe, where the frequency of VHF power source was 60 MHz and the power was up to 450 W. The pressure was ranged from 1 Torr to 3 Torr. When the pressure was increased, the ion saturation current density decreased independent of the concentration ratio of SiH 4 /H 2 and the electron temperature tended to increase at high pressures. Furthermore, when the VHF power was increased, the wall potential decreased at high pressures.
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Large Area SiH4/H2 VHF Plasma PRoduced with Multi‐Rod ElectRode
Plasma Processes and Polymers, 2007Co-Authors: Tatsuyuki Nishimiya, Yoshiaki Takeuchi, Yasuhiro Yamauchi, Hiromu Takatsuka, Yuichi Kai, Hiroshi Muta, Yoshinobu KawaiAbstract:A SiH4/H2 VHF plasma with a frequency of 60 MHz was pRoduced with a multi-Rod electRode of 1 200 × 114 mm2 at high pressure. The plasma parameters were measured as a function of pressure and concentration of SiH4 to H2 with a tiny heated Langmuir probe. When the pressure was increased, the plasma density decreased independent of the concentration of SiH4 to H2, while the electron temperature increased to about 11 eV at 3 Torr. The wall potential defined as the potential difference between the plasma potential and the floating potential was anomalously small at high pressure, suggesting very low ion bombardment. Furthermore, Langmuir probe characteristics indicated that there exist much negative ions.
Yasuhiro Yamauchi - One of the best experts on this subject based on the ideXlab platform.
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Large area SiH4/H2 VHF plasma pRoduced at high pressure using multi-Rod electRode
Surface and Coatings Technology, 2008Co-Authors: Yasuhiro Yamauchi, Yoshiaki Takeuchi, Hiromu Takatsuka, Yuichi Kai, Hiroshi Muta, Yoshinobu KawaiAbstract:Abstract A VHF SiH 4 /H 2 plasma was pRoduced using a multi-Rod electRode of 1200 mm × 115 mm and the characteristics of VHF plasma at high pressure were measured with a heated Langmuir probe, where the frequency of VHF power source was 60 MHz and the power was up to 450 W. The pressure was ranged from 1 Torr to 3 Torr. When the pressure was increased, the ion saturation current density decreased independent of the concentration ratio of SiH 4 /H 2 and the electron temperature tended to increase at high pressures. Furthermore, when the VHF power was increased, the wall potential decreased at high pressures.
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Large Area SiH4/H2 VHF Plasma PRoduced with Multi‐Rod ElectRode
Plasma Processes and Polymers, 2007Co-Authors: Tatsuyuki Nishimiya, Yoshiaki Takeuchi, Yasuhiro Yamauchi, Hiromu Takatsuka, Yuichi Kai, Hiroshi Muta, Yoshinobu KawaiAbstract:A SiH4/H2 VHF plasma with a frequency of 60 MHz was pRoduced with a multi-Rod electRode of 1 200 × 114 mm2 at high pressure. The plasma parameters were measured as a function of pressure and concentration of SiH4 to H2 with a tiny heated Langmuir probe. When the pressure was increased, the plasma density decreased independent of the concentration of SiH4 to H2, while the electron temperature increased to about 11 eV at 3 Torr. The wall potential defined as the potential difference between the plasma potential and the floating potential was anomalously small at high pressure, suggesting very low ion bombardment. Furthermore, Langmuir probe characteristics indicated that there exist much negative ions.
Hiroshi Muta - One of the best experts on this subject based on the ideXlab platform.
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Large area SiH4/H2 VHF plasma pRoduced at high pressure using multi-Rod electRode
Surface and Coatings Technology, 2008Co-Authors: Yasuhiro Yamauchi, Yoshiaki Takeuchi, Hiromu Takatsuka, Yuichi Kai, Hiroshi Muta, Yoshinobu KawaiAbstract:Abstract A VHF SiH 4 /H 2 plasma was pRoduced using a multi-Rod electRode of 1200 mm × 115 mm and the characteristics of VHF plasma at high pressure were measured with a heated Langmuir probe, where the frequency of VHF power source was 60 MHz and the power was up to 450 W. The pressure was ranged from 1 Torr to 3 Torr. When the pressure was increased, the ion saturation current density decreased independent of the concentration ratio of SiH 4 /H 2 and the electron temperature tended to increase at high pressures. Furthermore, when the VHF power was increased, the wall potential decreased at high pressures.
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Large Area SiH4/H2 VHF Plasma PRoduced with Multi‐Rod ElectRode
Plasma Processes and Polymers, 2007Co-Authors: Tatsuyuki Nishimiya, Yoshiaki Takeuchi, Yasuhiro Yamauchi, Hiromu Takatsuka, Yuichi Kai, Hiroshi Muta, Yoshinobu KawaiAbstract:A SiH4/H2 VHF plasma with a frequency of 60 MHz was pRoduced with a multi-Rod electRode of 1 200 × 114 mm2 at high pressure. The plasma parameters were measured as a function of pressure and concentration of SiH4 to H2 with a tiny heated Langmuir probe. When the pressure was increased, the plasma density decreased independent of the concentration of SiH4 to H2, while the electron temperature increased to about 11 eV at 3 Torr. The wall potential defined as the potential difference between the plasma potential and the floating potential was anomalously small at high pressure, suggesting very low ion bombardment. Furthermore, Langmuir probe characteristics indicated that there exist much negative ions.
Yoshiaki Takeuchi - One of the best experts on this subject based on the ideXlab platform.
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Large area SiH4/H2 VHF plasma pRoduced at high pressure using multi-Rod electRode
Surface and Coatings Technology, 2008Co-Authors: Yasuhiro Yamauchi, Yoshiaki Takeuchi, Hiromu Takatsuka, Yuichi Kai, Hiroshi Muta, Yoshinobu KawaiAbstract:Abstract A VHF SiH 4 /H 2 plasma was pRoduced using a multi-Rod electRode of 1200 mm × 115 mm and the characteristics of VHF plasma at high pressure were measured with a heated Langmuir probe, where the frequency of VHF power source was 60 MHz and the power was up to 450 W. The pressure was ranged from 1 Torr to 3 Torr. When the pressure was increased, the ion saturation current density decreased independent of the concentration ratio of SiH 4 /H 2 and the electron temperature tended to increase at high pressures. Furthermore, when the VHF power was increased, the wall potential decreased at high pressures.
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Large Area SiH4/H2 VHF Plasma PRoduced with Multi‐Rod ElectRode
Plasma Processes and Polymers, 2007Co-Authors: Tatsuyuki Nishimiya, Yoshiaki Takeuchi, Yasuhiro Yamauchi, Hiromu Takatsuka, Yuichi Kai, Hiroshi Muta, Yoshinobu KawaiAbstract:A SiH4/H2 VHF plasma with a frequency of 60 MHz was pRoduced with a multi-Rod electRode of 1 200 × 114 mm2 at high pressure. The plasma parameters were measured as a function of pressure and concentration of SiH4 to H2 with a tiny heated Langmuir probe. When the pressure was increased, the plasma density decreased independent of the concentration of SiH4 to H2, while the electron temperature increased to about 11 eV at 3 Torr. The wall potential defined as the potential difference between the plasma potential and the floating potential was anomalously small at high pressure, suggesting very low ion bombardment. Furthermore, Langmuir probe characteristics indicated that there exist much negative ions.
Hiromu Takatsuka - One of the best experts on this subject based on the ideXlab platform.
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Large area SiH4/H2 VHF plasma pRoduced at high pressure using multi-Rod electRode
Surface and Coatings Technology, 2008Co-Authors: Yasuhiro Yamauchi, Yoshiaki Takeuchi, Hiromu Takatsuka, Yuichi Kai, Hiroshi Muta, Yoshinobu KawaiAbstract:Abstract A VHF SiH 4 /H 2 plasma was pRoduced using a multi-Rod electRode of 1200 mm × 115 mm and the characteristics of VHF plasma at high pressure were measured with a heated Langmuir probe, where the frequency of VHF power source was 60 MHz and the power was up to 450 W. The pressure was ranged from 1 Torr to 3 Torr. When the pressure was increased, the ion saturation current density decreased independent of the concentration ratio of SiH 4 /H 2 and the electron temperature tended to increase at high pressures. Furthermore, when the VHF power was increased, the wall potential decreased at high pressures.
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Large Area SiH4/H2 VHF Plasma PRoduced with Multi‐Rod ElectRode
Plasma Processes and Polymers, 2007Co-Authors: Tatsuyuki Nishimiya, Yoshiaki Takeuchi, Yasuhiro Yamauchi, Hiromu Takatsuka, Yuichi Kai, Hiroshi Muta, Yoshinobu KawaiAbstract:A SiH4/H2 VHF plasma with a frequency of 60 MHz was pRoduced with a multi-Rod electRode of 1 200 × 114 mm2 at high pressure. The plasma parameters were measured as a function of pressure and concentration of SiH4 to H2 with a tiny heated Langmuir probe. When the pressure was increased, the plasma density decreased independent of the concentration of SiH4 to H2, while the electron temperature increased to about 11 eV at 3 Torr. The wall potential defined as the potential difference between the plasma potential and the floating potential was anomalously small at high pressure, suggesting very low ion bombardment. Furthermore, Langmuir probe characteristics indicated that there exist much negative ions.
