Silicon Substrate

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John E Bowers - One of the best experts on this subject based on the ideXlab platform.

  • thermal stress implications in athermal tio2 waveguides on a Silicon Substrate
    Optics Express, 2014
    Co-Authors: Jock Bovington, Kwangting Cheng, Rui Wu, John E Bowers
    Abstract:

    Ring resonators with TiO2 core confinement factors from 0.07 to 0.42 are fabricated and measured for thermal sensitivity achieving −2.9 pm/K thermal drift in the best case. Materials used are CMOS compatible (TiO2, SiO2 and Si3N4) on a Si Substrate. The under discussed role of stress in thermo-optic behavior is clearly observed when contrasting waveguides buried in SiO2 to those with etched sidewalls revealed to air. Multiphysics simulations are conducted to provide a theoretical explanation of this phenomenon in contrast to the more widely reported theories on thermo-optic behavior dominated by confinement factor.

  • 1310nm Silicon evanescent laser
    Optics Express, 2007
    Co-Authors: Hsuhao Chang, Alexander W Fang, M N Sysak, Hyundai Park, Richard Jones, Oded Cohen, Omri Raday, Mario J Paniccia, John E Bowers
    Abstract:

    We report the first 1310 nm hybrid laser on a Silicon Substrate. This laser operates continuous wave (C.W.) up to 105 °C. The room temperature threshold current of this laser is 30 mA, and the maximum single sided fiber-coupled output power is 5.5 mW.

Bart Kuyken - One of the best experts on this subject based on the ideXlab platform.

Utsav Dave - One of the best experts on this subject based on the ideXlab platform.

Gunther Roelkens - One of the best experts on this subject based on the ideXlab platform.

Kaili Zhang - One of the best experts on this subject based on the ideXlab platform.

  • development of a nano al cuo based energetic material on Silicon Substrate
    Applied Physics Letters, 2007
    Co-Authors: Kaili Zhang, Carole Rossi, Christophe Tenailleau, G Ardila A Rodriguez, Pierre Alphonse
    Abstract:

    Nanoenergetic materials (nEMs) have improved performances compared to their bulk counterpart or microcounterpart. The authors propose an approach to synthesize an Al∕CuO based nEM that has several advantages over previous investigations such as enhanced contact, reduced impurities and Al oxidation, tailored dimensions, and easier integration into microsystem. CuO nanowires are synthesized by thermally annealing Cu film deposited onto Silicon. Nano-Al is integrated with the nanowires to realize an Al∕CuO based nEM. The synthesized nEM is characterized by scanning electron microscopy, high resolution transmission electron microscopy, x-ray diffraction, differential thermal analysis, and differential scanning calorimetry.

  • synthesis of large area and aligned copper oxide nanowires from copper thin film on Silicon Substrate
    Nanotechnology, 2007
    Co-Authors: Kaili Zhang, Carole Rossi, Christophe Tenailleau, Pierre Alphonse, Jeanyves Chaneching
    Abstract:

    Large-area and aligned copper oxide nanowires have been synthesized by thermal annealing of copper thin films deposited onto Silicon Substrate. The effects of the film deposition method, annealing temperature, film thickness, annealing gas, and patterning by photolithography are systematically investigated. Long and aligned nanowires can only be formed within a narrow temperature range from 400 to 500°C. Electroplated copper film is favourable for the nanowire growth, compared to that deposited by thermal evaporation. Annealing copper thin film in static air produces large-area, uniform, but not well vertically aligned nanowires along the thin film surface. Annealing copper thin film under a N2/O2 gas flow generates vertically aligned, but not very uniform nanowires on large areas. Patterning copper thin film by photolithography helps to synthesize large-area, uniform, and vertically aligned nanowires along the film surface. The copper thin film is converted into bicrystal CuO nanowires, Cu2O film, and also perhaps some CuO film after the thermal treatment in static air. Only CuO in the form of bicrystal nanowires and thin film is observed after the copper thin film is annealed under a N2/O2 gas flow.