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Messaoud Benounis - One of the best experts on this subject based on the ideXlab platform.
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novel phosphate selective poly vinyl chloride co vinyl acetate co vinyl alcohol membrane optode with carrier based on Tin Compound
Sensors and Actuators B-chemical, 2015Co-Authors: Messaoud BenounisAbstract:Abstract A new phosphate-selective poly[vinylchloride-co-vinylacetate-co-vinylalcohol] membrane with Trioctyl-Tin-chloride (Carrier I) and Methylenebis[dibromo(phenyl)stannane] (carrier II) were proposed to invert the Hofmeister behaviour and to form strong complexes with the hydrophilic target anion. Plasticizers effect and selectivities for phosphate over many common anions, such as nitrate, chloride, fluoride and bicarbonate, at pH 3.6 are studied for several membranes formulations. We show that the phosphate selectivity is better and comparable to required values for membranes based on Tin Compound plasticized with low dielectric constant solvent and the sensor exhibits a LOD of about 6.5 × 10−08 M with a linear response towards phosphate ion over a wide concentration range of 10−5–10−3 M. The response times and lifetime of copolymer-membranes-optodes were studied. The response times of the membranes with copolymer based on carriers I and II were 20 s and 40 s, when changing from 10−4 M phosphate to 10−3 M. The lifetime of the copolymer-based-membrane was higher than that of PVC-based-membrane with the same carrier and the optode is adequate for phosphate ion detection in real water.
Werner Ponikwar - One of the best experts on this subject based on the ideXlab platform.
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Hexasupersilyl‐triprismo‐hexastannane (tBu3Si)6Sn6—The First Molecular Tin Compound Containing a Sn6 Prism
Angewandte Chemie International Edition, 1999Co-Authors: Nils Wiberg, Hans-wolfram Lerner, Heinrich Nöth, Werner PonikwarAbstract:Dark violet hexastannane (tBu3 Si)6 Sn6 displays a new framework motif for molecular Tin Compounds, in which six Sn atoms are located at the corners of a trigonal prism. The Compound can be synthesized according to Equation (a). R*=SitBu3 .
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hexasupersilyl triprismo hexastannane tbu3si 6sn6 the first molecular Tin Compound containing a sn6 prism
Angewandte Chemie, 1999Co-Authors: Nils Wiberg, Hans-wolfram Lerner, Heinrich Nöth, Werner PonikwarAbstract:Dark violet hexastannane (tBu3 Si)6 Sn6 displays a new framework motif for molecular Tin Compounds, in which six Sn atoms are located at the corners of a trigonal prism. The Compound can be synthesized according to Equation (a). R*=SitBu3 .
Regine Herbstirmer - One of the best experts on this subject based on the ideXlab platform.
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synthesis of monomeric divalent Tin ii Compounds with terminal chloride amide and triflate substituents
European Journal of Inorganic Chemistry, 2010Co-Authors: Malte P Kritzlerkosch, Selvarajan Nagendran, Tobias Beck, Herbert W. Roesky, Regine HerbstirmerAbstract:Monomeric three-coordinate (amidinato)Tin chloride [PhC-(NtBu) 2 SnCl] (1) was prepared by the reaction of N,N'-di-tert-butylcarbodiimide, phenyllithium and SnCl 2 . The metathesis reaction of 1 with AgSO 3 CF 3 and (Me 3 Si) 2 NLi afforded the formation of PhC(NtBu) 2 SnOTf (Tf = CF 3 SO 2 ) (2) and PhC(NtBu) 2 SnN(SiMe 3 ) 2 (3). The reductive dehalogenation of 1 with L-selectride resulted in the formation of the four-coordinate homoleptic Tin Compound Ph 2 C 2 (NtBu) 4 Sn (4). Compounds 1, 2, 3, and 4 were characterized by single-crystal structural analysis. Furthermore, 1 was treated with Fe 2 (CO) 9 to afford the Lewis acid-base adduct 5.
Katsuya Akamatsu - One of the best experts on this subject based on the ideXlab platform.
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simultaneous duplex process of Tin coaTing and nitriding by active screen plasma nitriding
Surface & Coatings Technology, 2013Co-Authors: Akio Nishimoto, Hiroaki Nii, Ryota Narita, Katsuya AkamatsuAbstract:Abstract Nitriding steel sample SACM 645 was nitrided by active screen plasma nitriding (ASPN) using a titanium screen to form simultaneously Tin coaTing/nitrogen-diffusion layer on the sample surface. ASPN experiments were carried out using a DC plasma-nitriding unit. The sample was placed on the sample stage in a floaTing potential and a cathodic potential. A titanium double screen was mounted on the cathodic stage around the sample stage. ASPN treatments at 0%-bias and 100%-bias were performed in a nitrogen–hydrogen atmosphere with 75% N2 + 25% H2 for 0–54 ks at 873 K under 100 Pa. After nitriding, the nitrided microstructure was examined with a scanning electron microscope, glow discharge optical emission spectroscopy and X-ray diffraction studies. In addition, the hardness of the surface and the cross‐sections of the nitrided sample were measured using a Vickers microhardness tester under a 0.1-N load. The thickness of the Tin layer grew linearly with increasing nitriding time. In this case, the deposition rate of the Tin layer was 0.22 μm/h. The nitrided layer formed by ASPN at 100%-bias consisted of a Tin Compound layer followed by a nitrogen-diffusion layer.
Zdenek Tolde - One of the best experts on this subject based on the ideXlab platform.
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the microstructure and surface hardness of ti6al4v alloy implanted with nitrogen ions at an elevated temperature
Journal of Alloys and Compounds, 2015Co-Authors: Petr Vlcak, Frantisek Cerny, Jan Drahokoupil, Josef Sepitka, Zdenek ToldeAbstract:Abstract The effect of an elevated temperature during nitrogen ion implantation on the microstructure and on the surface hardness of Ti6Al4V titanium alloy was examined. The implantation process was carried out at fluences of 1 ⋅ 10 17 , 2.7 ⋅ 10 17 and 6 ⋅ 10 17 cm −2 and at ion energy 90 keV. The implanted samples were annealed at 500 °C during the implantation process. X-ray diffraction analysis was performed to obtain a phase characterization and a phase quantification in the implanted sample surface. The surface hardness was investigated by nanoindentation tesTing, and the nitrogen depth distribution was measured by Rutherford Backscattering Spectroscopy. Elevated temperature led to increased formation of a Tin Compound. It was found that a mixture of Tin and an α-Ti(+N) solid solution had a predominant amount of Tin for samples with fluence of 2.7 ⋅ 10 17 cm −2 or higher. Elevated temperature during ion implantation caused an increase in surface hardening more towards the depth of the substrate in comparison with room temperature implantation. The hardness showed a remarkably significant increase at a fluence of 1 ⋅ 10 17 and 2.7 ⋅ 10 17 cm −2 compared to samples implanted at the same fluences and at room temperature. There is a discussion of such mechanisms that explain the observed hardening more towards the depth of the substrate, and the increase in hardness.