X-Ray Photoelectron Spectroscopy

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Michel W Barsoum - One of the best experts on this subject based on the ideXlab platform.

Jun Kawai - One of the best experts on this subject based on the ideXlab platform.

  • Total reflection X-Ray Photoelectron Spectroscopy: A review
    Journal of Electron Spectroscopy and Related Phenomena, 2009
    Co-Authors: Jun Kawai

    Abstract Total reflection X-Ray Photoelectron Spectroscopy (TRXPS) is reviewed and all the published papers on TRXPS until the end of 2009 are included. Special emphasis is on the historical development. Applications are also described for each report. The background reduction is the most important effect of total reflection, but interference effect, relation to inelastic mean free path, change of probing depth are also discussed.

  • A numerical simulation of total reflection X-Ray Photoelectron Spectroscopy (TRXPS)
    Spectrochimica Acta Part B: Atomic Spectroscopy, 1992
    Co-Authors: Jun Kawai, Michio Takami, Masanori Fujinami, Yoshihiro Hashiguchi, Shinjiro Hayakawa, Yohichi Gohshi

    Abstract Numerical simulations of “total reflection X-Ray Photoelectron Spectroscopy (TRXPS)” are presented. Monochromatized X-Rays impinge on a specular sample with a glancing angle smaller than the critical angle of total reflection. Under this condition, the X-Rays cannot penetrate deeper than the evanescent length, usually 20–40 A depending on the sample material, the wavelength of the X-Rays, and the incident angle. The intensity of X-Rays in the evanescent region can be as much as four times stronger than the incident X-Ray intensity because of the standing-wave formation on the surface. Therefore, the Photoelectron signal of atoms in the surface region is intensified. As a consequence, TRXPS is an even more powerful tool for the study of surface chemistry and physics than ordinary X-Ray Photoelectron Spectroscopy (XPS). Moreover the signal to background ratio is improved at least twice if compared with that of the ordinary XPS because the number of inelastically scattered Photoelectrons is reduced.

D. Todoran - One of the best experts on this subject based on the ideXlab platform.

  • X-Ray Photoelectron Spectroscopy and magnetism of GdNi3Al16
    Journal of Magnetism and Magnetic Materials, 2001
    Co-Authors: M. Coldea, Viorel Pop, Manfred Neumann, S.g. Chiuzbaian, D. Todoran

    Abstract The magnetic properties of GdNi 3 Al 16 have been investigated using both magnetic measurements in the temperature range 5–300 K and X-Ray Photoelectron Spectroscopy. GdNi 3 Al 16 orders antiferromagnetically at T N =23 K. A metamagnetic transition is observed around 6 T. The magnetic susceptibility obeys Curie–Weiss law with μ eff =8.13  μ B /f.u. and θ p =−41 K. The Ni-3d band is filled and the excess magnetic moment of Gd ions is related mainly to 5d electron polarization.

Sven Tougaard - One of the best experts on this subject based on the ideXlab platform.

  • Probing deeper by hard X-Ray Photoelectron Spectroscopy
    Applied Physics Letters, 2014
    Co-Authors: P. Risterucci, Olivier Renault, E. Martinez, B. Detlefs, Vincent Delaye, Jörg Zegenhagen, C. Gaumer, Geneviève Grenet, Sven Tougaard

    We report an hard X-Ray Photoelectron Spectroscopy method combining high excitation energy (15 keV) and improved modelling of the core-level energy loss features. It provides depth distribution of deeply buried layers with very high sensitivity. We show that a conventional approach relying on intensities of the core-level peaks is unreliable due to intense plasmon losses. We reliably determine the depth distribution of 1 ML La in a high-κ/metal gate stack capped with 50 nm a-Si. The method extends the sensitivity of Photoelectron Spectroscopy to depths beyond 50 nm.

  • Algorithm for automatic X-Ray Photoelectron Spectroscopy data processing and X-Ray Photoelectron Spectroscopy imaging
    Journal of Vacuum Science & Technology A: Vacuum Surfaces and Films, 2005
    Co-Authors: Sven Tougaard

    It is well known that X-Ray Photoelectron Spectroscopy (XPS) quantification based only on the measured XPS-peak intensity can lead to large errors. The problem, which is caused by the strong depth dependence of the intensity contribution due to inelastic electron scattering, was solved by developing algorithms for analysis of the energy distribution of emitted electrons. These algorithms are now widely used but since their practical application requires operator interaction, they are not well suited for automatic data processing. A simplified algorithm that is sufficiently robust (i.e., insensitive to variations in analysis procedure) to be suitable for automation was suggested recently [J. Vac. Sci. Technol. A21, 1081 (2003)]. For each XPS peak, this algorithm determines the total amount of the corresponding atoms within the outermost approximately three inelastic electron mean free paths and it also gives an estimate of their depth distribution. Since the algorithm can be automated, it should also prove...

Joseph Halim - One of the best experts on this subject based on the ideXlab platform.