The Experts below are selected from a list of 279 Experts worldwide ranked by ideXlab platform
Sheng-di Lin - One of the best experts on this subject based on the ideXlab platform.
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Nano- to atomic-scale epitaxial Aluminum Films on Si substrate grown by molecular beam epitaxy
AIP Advances, 2019Co-Authors: Yi Hsun Tsai, Yen Yu Ting, Sheng-di LinAbstract:We demonstrate nano- to atomic-scale epitaxial Aluminum Film growth on Si(111) substrate by molecular beam epitaxy. Excellent quality of these Aluminum Films, including sub-nanometer surface roughness, narrow linewidth of X-ray diffraction peak, clear transmission electron diffraction, and high optical reflectivity in ultra-violet, have been obtained with a reproducible growth recipe. The atomic-scale metallic Aluminum Film is formed by the self-limiting oxidation on the 3-nm-thick sample in air and the metallic state is confirmed with X-ray photoemission spectroscopy. Our work paves the way to future integration of Aluminum-based plasmonic and superconducting devices on Si platform.
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Atomic-scale epitaxial Aluminum Film on GaAs substrate
AIP Advances, 2017Co-Authors: Yen Ting Fan, Chi-te Liang, Peng Yu Chen, Sheng-di LinAbstract:Atomic-scale metal Films exhibit intriguing size-dependent Film stability, electrical conductivity, superconductivity, and chemical reactivity. With advancing methods for preparing ultra-thin and atomically smooth metal Films, clear evidences of the quantum size effect have been experimentally collected in the past two decades. However, with the problems of small-area fabrication, Film oxidation in air, and highly-sensitive interfaces between the metal, substrate, and capping layer, the uses of the quantized metallic Films for further ex-situ investigations and applications have been seriously limited. To this end, we develop a large-area fabrication method for continuous atomic-scale Aluminum Film. The self-limited oxidation of Aluminum protects and quantizes the metallic Film and enables ex-situ characterizations and device processing in air. Structure analysis and electrical measurements on the prepared Films imply the quantum size effect in the atomic-scale Aluminum Film. Our work opens the way for fu...
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single crystalline Aluminum Film for ultraviolet plasmonic nanolasers
Scientific Reports, 2016Co-Authors: Bo Tsun Chou, Shih-wei Lin, Yu Hsun Chou, Weijen Hsueh, Tzyrong Lin, Yi Cheng Chung, Sheng-di LinAbstract:Significant advances have been made in the development of plasmonic devices in the past decade. Plasmonic nanolasers, which display interesting properties, have come to play an important role in biomedicine, chemical sensors, information technology, and optical integrated circuits. However, nanoscale plasmonic devices, particularly those operating in the ultraviolet regime, are extremely sensitive to the metal and interface quality. Thus, these factors have a significant bearing on the development of ultraviolet plasmonic devices. Here, by addressing these material-related issues, we demonstrate a low-threshold, high-characteristic-temperature metal-oxide-semiconductor ZnO nanolaser that operates at room temperature. The template for the ZnO nanowires consists of a flat single-crystalline Al Film grown by molecular beam epitaxy and an ultrasmooth Al2O3 spacer layer synthesized by atomic layer deposition. By effectively reducing the surface plasmon scattering and metal intrinsic absorption losses, the high-quality metal Film and the sharp interfaces formed between the layers boost the device performance. This work should pave the way for the use of ultraviolet plasmonic nanolasers and related devices in a wider range of applications.
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single crystalline Aluminum Film for ultraviolet plasmonic nanolasers
arXiv: Mesoscale and Nanoscale Physics, 2015Co-Authors: Bo Tsun Chou, Shih-wei Lin, Yu Hsun Chou, Yichen Chung, Weijen Hsueh, Tzyrong Lin, Sheng-di LinAbstract:Plasmonic devices have advanced significantly in the past decade. Being one of the most intriguing devices, plamonic nanolasers plays an important role in biomedicine, chemical sensor, information technology, and optical integrated circuits. However, nanoscale plasmonic devices, particularly in ultraviolet regime, are extremely sensitive to metal and interface quality, which renders the development of ultraviolet plasmonics. Here, by addressing the material issues, we demonstrate a low threshold, high characteristic temperature metal-oxide-semiconductor ZnO nanolaser working at room temperature. The template for ZnO nanowires consists of a flat single-crystalline Aluminum Film grown by molecular beam epitaxy and an ultra-smooth Al2O3 spacer layer prepared by atomic layer deposition. By effectively reducing surface plasmon scattering loss and metal intrinsic absorption loss, the high-quality metal Film and sharp interfaces between layers boost the device performance. Our work paves the way for future applications using ultraviolet plasmonic nanolasers and related devices.
Shih-wei Lin - One of the best experts on this subject based on the ideXlab platform.
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single crystalline Aluminum Film for ultraviolet plasmonic nanolasers
Scientific Reports, 2016Co-Authors: Bo Tsun Chou, Shih-wei Lin, Yu Hsun Chou, Weijen Hsueh, Tzyrong Lin, Yi Cheng Chung, Sheng-di LinAbstract:Significant advances have been made in the development of plasmonic devices in the past decade. Plasmonic nanolasers, which display interesting properties, have come to play an important role in biomedicine, chemical sensors, information technology, and optical integrated circuits. However, nanoscale plasmonic devices, particularly those operating in the ultraviolet regime, are extremely sensitive to the metal and interface quality. Thus, these factors have a significant bearing on the development of ultraviolet plasmonic devices. Here, by addressing these material-related issues, we demonstrate a low-threshold, high-characteristic-temperature metal-oxide-semiconductor ZnO nanolaser that operates at room temperature. The template for the ZnO nanowires consists of a flat single-crystalline Al Film grown by molecular beam epitaxy and an ultrasmooth Al2O3 spacer layer synthesized by atomic layer deposition. By effectively reducing the surface plasmon scattering and metal intrinsic absorption losses, the high-quality metal Film and the sharp interfaces formed between the layers boost the device performance. This work should pave the way for the use of ultraviolet plasmonic nanolasers and related devices in a wider range of applications.
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single crystalline Aluminum Film for ultraviolet plasmonic nanolasers
arXiv: Mesoscale and Nanoscale Physics, 2015Co-Authors: Bo Tsun Chou, Shih-wei Lin, Yu Hsun Chou, Yichen Chung, Weijen Hsueh, Tzyrong Lin, Sheng-di LinAbstract:Plasmonic devices have advanced significantly in the past decade. Being one of the most intriguing devices, plamonic nanolasers plays an important role in biomedicine, chemical sensor, information technology, and optical integrated circuits. However, nanoscale plasmonic devices, particularly in ultraviolet regime, are extremely sensitive to metal and interface quality, which renders the development of ultraviolet plasmonics. Here, by addressing the material issues, we demonstrate a low threshold, high characteristic temperature metal-oxide-semiconductor ZnO nanolaser working at room temperature. The template for ZnO nanowires consists of a flat single-crystalline Aluminum Film grown by molecular beam epitaxy and an ultra-smooth Al2O3 spacer layer prepared by atomic layer deposition. By effectively reducing surface plasmon scattering loss and metal intrinsic absorption loss, the high-quality metal Film and sharp interfaces between layers boost the device performance. Our work paves the way for future applications using ultraviolet plasmonic nanolasers and related devices.
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Pure electron-electron dephasing in percolative Aluminum ultrathin Film grown by molecular beam epitaxy
Nanoscale Research Letters, 2015Co-Authors: Shih-wei Lin, Yue Han Wu, Li Chang, Chi-te LiangAbstract:We have successfully grown ultrathin continuous Aluminum Film by molecular beam epitaxy. This percolative Aluminum Film is single crystalline and strain free as characterized by transmission electron microscopy and atomic force microscopy. The weak anti-localization effect is observed in the temperature range of 1.4 to 10 K with this sample, and it reveals that, for the first time, the dephasing is purely caused by electron-electron inelastic scattering in Aluminum.
Bo Tsun Chou - One of the best experts on this subject based on the ideXlab platform.
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single crystalline Aluminum Film for ultraviolet plasmonic nanolasers
Scientific Reports, 2016Co-Authors: Bo Tsun Chou, Shih-wei Lin, Yu Hsun Chou, Weijen Hsueh, Tzyrong Lin, Yi Cheng Chung, Sheng-di LinAbstract:Significant advances have been made in the development of plasmonic devices in the past decade. Plasmonic nanolasers, which display interesting properties, have come to play an important role in biomedicine, chemical sensors, information technology, and optical integrated circuits. However, nanoscale plasmonic devices, particularly those operating in the ultraviolet regime, are extremely sensitive to the metal and interface quality. Thus, these factors have a significant bearing on the development of ultraviolet plasmonic devices. Here, by addressing these material-related issues, we demonstrate a low-threshold, high-characteristic-temperature metal-oxide-semiconductor ZnO nanolaser that operates at room temperature. The template for the ZnO nanowires consists of a flat single-crystalline Al Film grown by molecular beam epitaxy and an ultrasmooth Al2O3 spacer layer synthesized by atomic layer deposition. By effectively reducing the surface plasmon scattering and metal intrinsic absorption losses, the high-quality metal Film and the sharp interfaces formed between the layers boost the device performance. This work should pave the way for the use of ultraviolet plasmonic nanolasers and related devices in a wider range of applications.
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single crystalline Aluminum Film for ultraviolet plasmonic nanolasers
arXiv: Mesoscale and Nanoscale Physics, 2015Co-Authors: Bo Tsun Chou, Shih-wei Lin, Yu Hsun Chou, Yichen Chung, Weijen Hsueh, Tzyrong Lin, Sheng-di LinAbstract:Plasmonic devices have advanced significantly in the past decade. Being one of the most intriguing devices, plamonic nanolasers plays an important role in biomedicine, chemical sensor, information technology, and optical integrated circuits. However, nanoscale plasmonic devices, particularly in ultraviolet regime, are extremely sensitive to metal and interface quality, which renders the development of ultraviolet plasmonics. Here, by addressing the material issues, we demonstrate a low threshold, high characteristic temperature metal-oxide-semiconductor ZnO nanolaser working at room temperature. The template for ZnO nanowires consists of a flat single-crystalline Aluminum Film grown by molecular beam epitaxy and an ultra-smooth Al2O3 spacer layer prepared by atomic layer deposition. By effectively reducing surface plasmon scattering loss and metal intrinsic absorption loss, the high-quality metal Film and sharp interfaces between layers boost the device performance. Our work paves the way for future applications using ultraviolet plasmonic nanolasers and related devices.
Yasuo Koide - One of the best experts on this subject based on the ideXlab platform.
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polarization independent visible color filter comprising an Aluminum Film with surface plasmon enhanced transmission through a subwavelength array of holes
Applied Physics Letters, 2011Co-Authors: Daisuke Inoue, Atsushi Miura, Tsuyoshi Nomura, Hisayoshi Fujikawa, Kazuo Sato, Naoki Ikeda, Daiju Tsuya, Yoshimasa Sugimoto, Yasuo KoideAbstract:The enhanced transmission through periodic arrays of sub-wavelength holes in optically-thick metallic Films has many potential applications, such as in wavelength filters, light extraction from light emission diodes, and subwavelength photolithography. A color filter comprising arrays of subwavelength holes in an Aluminum Film has been fabricated. In addition to the simplicity of the process, the Aluminum Film enables the excitation of visible-range surface plasmons due to its high plasma frequency. Periodic nanostructures in the Aluminum Film open the way for new visible color filters.
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RGB color filter comprising Aluminum Film with surface plasmon enhanced transmission through sub-wavelength hole-arrays
2009 IEEE LEOS International Conference on Optical MEMS and Nanophotonics, 2009Co-Authors: Daisuke Inoue, Atsushi Miura, Tsuyoshi Nomura, Hisayoshi Fujikawa, Kazuo Sato, Naoki Ikeda, Daiju Tsuya, Yoshimasa Sugimoto, Yasuo Koide, Kiyoshi AsakawaAbstract:A color filter comprising an Aluminum Film with arrays of sub-wavelength holes has been fabricated. In addition to processability, the Aluminum Film enables the excitation of visible-range SP due to its high plasma frequency.
Tzyrong Lin - One of the best experts on this subject based on the ideXlab platform.
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single crystalline Aluminum Film for ultraviolet plasmonic nanolasers
Scientific Reports, 2016Co-Authors: Bo Tsun Chou, Shih-wei Lin, Yu Hsun Chou, Weijen Hsueh, Tzyrong Lin, Yi Cheng Chung, Sheng-di LinAbstract:Significant advances have been made in the development of plasmonic devices in the past decade. Plasmonic nanolasers, which display interesting properties, have come to play an important role in biomedicine, chemical sensors, information technology, and optical integrated circuits. However, nanoscale plasmonic devices, particularly those operating in the ultraviolet regime, are extremely sensitive to the metal and interface quality. Thus, these factors have a significant bearing on the development of ultraviolet plasmonic devices. Here, by addressing these material-related issues, we demonstrate a low-threshold, high-characteristic-temperature metal-oxide-semiconductor ZnO nanolaser that operates at room temperature. The template for the ZnO nanowires consists of a flat single-crystalline Al Film grown by molecular beam epitaxy and an ultrasmooth Al2O3 spacer layer synthesized by atomic layer deposition. By effectively reducing the surface plasmon scattering and metal intrinsic absorption losses, the high-quality metal Film and the sharp interfaces formed between the layers boost the device performance. This work should pave the way for the use of ultraviolet plasmonic nanolasers and related devices in a wider range of applications.
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single crystalline Aluminum Film for ultraviolet plasmonic nanolasers
arXiv: Mesoscale and Nanoscale Physics, 2015Co-Authors: Bo Tsun Chou, Shih-wei Lin, Yu Hsun Chou, Yichen Chung, Weijen Hsueh, Tzyrong Lin, Sheng-di LinAbstract:Plasmonic devices have advanced significantly in the past decade. Being one of the most intriguing devices, plamonic nanolasers plays an important role in biomedicine, chemical sensor, information technology, and optical integrated circuits. However, nanoscale plasmonic devices, particularly in ultraviolet regime, are extremely sensitive to metal and interface quality, which renders the development of ultraviolet plasmonics. Here, by addressing the material issues, we demonstrate a low threshold, high characteristic temperature metal-oxide-semiconductor ZnO nanolaser working at room temperature. The template for ZnO nanowires consists of a flat single-crystalline Aluminum Film grown by molecular beam epitaxy and an ultra-smooth Al2O3 spacer layer prepared by atomic layer deposition. By effectively reducing surface plasmon scattering loss and metal intrinsic absorption loss, the high-quality metal Film and sharp interfaces between layers boost the device performance. Our work paves the way for future applications using ultraviolet plasmonic nanolasers and related devices.