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P Kruit - One of the best experts on this subject based on the ideXlab platform.

  • integrated multi electron beam blanker array for sub 10 nm electron beam induced deposition
    Journal of Vacuum Science & Technology B, 2006
    Co-Authors: Yanxia Zhang, M J Van Bruggen, C T H Heerkens, P Kruit
    Abstract:

    An integrated multi-electron-beam blanker array is proposed for the multi-electron-beam source reported by van Bruggen et al. [J. Vac. Sci. Technol. B 23, 2833 (2005)], which aims at the throughput improvement of sub-10‐nm electron beam induced deposition. The integrated blanker array consists of a current limiting Aperture array, a blanker array, and a microAperture-lens array. The integrated blanker array generates 100 individually controlled beamlets, projecting the virtual source image in the principle plane of the field lens. The electrostatic cross-talk, charging, and contamination are reduced by the grounded current limiting Aperture Plate above the blankers. The blanker array and microAperture-lens array are fabricated on a first wafer, while the current limiting Aperture array is fabricated on a second, 100μm thick wafer. The wafers will be bonded with an alignment accuracy of approximately 200nm. The first test chips, where the blankers are grouped and controlled by external circuitries, are und...

  • development of a multi electron beam source for sub 10 nm electron beam induced deposition
    Journal of Vacuum Science & Technology B, 2005
    Co-Authors: M J Van Bruggen, B Van Someren, P Kruit
    Abstract:

    A multibeam electron beam induced deposition (EBID) system is presented that aims at the fabrication of sub-10nm structures with EBID. This system consists of a multibeam source (MBS) module, delivering 100 virtual sources and a standard scanning electron microscope column to image the 100 sources onto a wafer. In this paper, the concept for the MBS is presented: starting with a single Schottky field emission gun, its broad beam is divided into 100 individually focused sub-beams. This is accomplished with an Aperture Plate with small current-limiting Apertures on the side irradiated by the beam and larger holes on the other side, acting as Aperture lenses due to the presence of a macroelectrode in front of it. With this concept, in addition to the miniature Aperture lenses, a negative macrolens effect is established that can serve to compensate for both the third-order geometric and first-order chromatic aberration of the collimator lens in front of the Aperture Plate. A simple aberration model is present...

M J Van Bruggen - One of the best experts on this subject based on the ideXlab platform.

  • integrated multi electron beam blanker array for sub 10 nm electron beam induced deposition
    Journal of Vacuum Science & Technology B, 2006
    Co-Authors: Yanxia Zhang, M J Van Bruggen, C T H Heerkens, P Kruit
    Abstract:

    An integrated multi-electron-beam blanker array is proposed for the multi-electron-beam source reported by van Bruggen et al. [J. Vac. Sci. Technol. B 23, 2833 (2005)], which aims at the throughput improvement of sub-10‐nm electron beam induced deposition. The integrated blanker array consists of a current limiting Aperture array, a blanker array, and a microAperture-lens array. The integrated blanker array generates 100 individually controlled beamlets, projecting the virtual source image in the principle plane of the field lens. The electrostatic cross-talk, charging, and contamination are reduced by the grounded current limiting Aperture Plate above the blankers. The blanker array and microAperture-lens array are fabricated on a first wafer, while the current limiting Aperture array is fabricated on a second, 100μm thick wafer. The wafers will be bonded with an alignment accuracy of approximately 200nm. The first test chips, where the blankers are grouped and controlled by external circuitries, are und...

  • development of a multi electron beam source for sub 10 nm electron beam induced deposition
    Journal of Vacuum Science & Technology B, 2005
    Co-Authors: M J Van Bruggen, B Van Someren, P Kruit
    Abstract:

    A multibeam electron beam induced deposition (EBID) system is presented that aims at the fabrication of sub-10nm structures with EBID. This system consists of a multibeam source (MBS) module, delivering 100 virtual sources and a standard scanning electron microscope column to image the 100 sources onto a wafer. In this paper, the concept for the MBS is presented: starting with a single Schottky field emission gun, its broad beam is divided into 100 individually focused sub-beams. This is accomplished with an Aperture Plate with small current-limiting Apertures on the side irradiated by the beam and larger holes on the other side, acting as Aperture lenses due to the presence of a macroelectrode in front of it. With this concept, in addition to the miniature Aperture lenses, a negative macrolens effect is established that can serve to compensate for both the third-order geometric and first-order chromatic aberration of the collimator lens in front of the Aperture Plate. A simple aberration model is present...

Changfu You - One of the best experts on this subject based on the ideXlab platform.

  • enhancement of mass transfer between flue gas and slurry in the wet flue gas desulfurization spray tower
    Energy & Fuels, 2018
    Co-Authors: Zhen Chen, Haiming Wang, Jiankun Zhuo, Changfu You
    Abstract:

    This paper presents an enhancement method to improve the desulfurization performance of wet flue gas desulfurization (WFGD) by adding a flow pattern controlling (FPC) device in the spraying tower. The FPC device is characterized by a modular design and composed of FPC units that are fixed under the spraying layers of the desulfurization tower. Two kinds of FPC units, each with a different scale, are designed (i.e., unit A and unit B). The effects of the FPC unit and operational parameters on the desulfurization process are determined by experimentation. The experiments show that the FPC unit significantly improves the desulfurization performance compared to the common spraying column without an Aperture Plate. The flow regime significantly changes and large amounts of bubbles develop above the perforated Plate in the FPC unit, which is beneficial to enhance gas–liquid mass transfer. The design style and structural parameters of the FPC unit both significantly influence the desulfurization performance. Acc...

M Kanoh - One of the best experts on this subject based on the ideXlab platform.

  • electron beam direct writing system ex 8d employing character projection exposure method
    Journal of Vacuum Science & Technology B, 1993
    Co-Authors: Kiyoshi Hattori, Ryoichi Yoshikawa, Hirotsugu Wada, Hideo Kusakabe, Toshio Yamaguchi, Shunko Magoshi, A Miyagaki, Satoshi Yamasaki, Tadahiro Takigawa, M Kanoh
    Abstract:

    An electron‐beam direct writing system which adopts character projection methods in addition to conventional variable‐shaped beam methods, has been constructed for 0.15 μm class ultra‐large scale integration pattern fabrication. This system is a modified version of our variable‐shaped beam machine. The electron optical system adopts a three stage octapole deflector for a 2 mm field and installs an Aperture Plate exchange mechanism for character projection. The objective lens system was designed so that the beam resolution is 0.04 μm. An optimization study to write a 1G‐dynamic random access memory pattern with 0.15 μm design rules showed that a preferable character size and number are 2.5 μm and 48, respectively. The writing speed of this system is designed to be 110 s a chip, using the characters for memory cells as well as peripheral circuits. An advanced beam calibration method has been developed for beam current density and for character size, direction, and position. This method effectively adjusts t...

  • electron beam direct writing system ex 8d employing character projection exposure method
    Journal of Vacuum Science & Technology B, 1993
    Co-Authors: Kiyoshi Hattori, Ryoichi Yoshikawa, Hirotsugu Wada, Hideo Kusakabe, Toshio Yamaguchi, Shunko Magoshi, A Miyagaki, Satoshi Yamasaki, Tadahiro Takigawa, M Kanoh
    Abstract:

    An electron‐beam direct writing system which adopts character projection methods in addition to conventional variable‐shaped beam methods, has been constructed for 0.15 μm class ultra‐large scale integration pattern fabrication. This system is a modified version of our variable‐shaped beam machine. The electron optical system adopts a three stage octapole deflector for a 2 mm field and installs an Aperture Plate exchange mechanism for character projection. The objective lens system was designed so that the beam resolution is 0.04 μm. An optimization study to write a 1G‐dynamic random access memory pattern with 0.15 μm design rules showed that a preferable character size and number are 2.5 μm and 48, respectively. The writing speed of this system is designed to be 110 s a chip, using the characters for memory cells as well as peripheral circuits. An advanced beam calibration method has been developed for beam current density and for character size, direction, and position. This method effectively adjusts the current density for each character to be the same on wafers. The beam position is accurately corrected by analyzing the obtained beam intensity distribution.

Hoffmann W. - One of the best experts on this subject based on the ideXlab platform.

  • The Michigan Infrared Test Thermal ELT N-band (MITTEN) Cryostat
    2020
    Co-Authors: Bowens R., Viges E., Meyer M. R., Atkinson D., Monnier J., Morgenstern M., Leisenring J., Hoffmann W.
    Abstract:

    We introduce the Michigan Infrared Test Thermal ELT N-band (MITTEN) Cryostat, a new facility for testing infrared detectors with a focus on mid-infrared (MIR) wavelengths (8-13 microns). New generations of large format, deep well, fast readout MIR detectors are now becoming available to the astronomical community. As one example, Teledyne Imaging Sensors (TIS) has introduced a long-wave Mercury-Cadmium-Telluride (MCT) array, GeoSnap, with high quantum efficiency (> 65 %) and improved noise properties compared to previous generation Si:As blocked impurity band (BIB) detectors. GeoSnap promises improved sensitivities, and efficiencies, for future background-limited MIR instruments, in particular with future extremely large telescopes (ELTs). We describe our new test facility suitable for measuring characteristics of these detectors, such as read noise, dark current, linearity, gain, pixel operability, quantum efficiency, and point source imaging performance relative to a background scene, as well as multiple point sources of differing contrast. MITTEN has an internal light source, and soon an accompanying filter wheel and Aperture Plate, reimaged onto the detector using an Offner relay. The baseline temperature of the cryostat interior is maintained < 40 K and the optical bench maintains a temperature of 16 K using a two-stage pulse-tube cryocooler package from Cryomech. No measurable background radiation from the cryostat interior has yet been detected.Comment: 10 pages, 6 figures, To appear in the SPIE Proceedings 'Astronomical Telescopes and Instrumentation' (2020

  • The Michigan Infrared Test Thermal ELT N-band (MITTEN) cryostat
    'SPIE-Intl Soc Optical Eng', 2020
    Co-Authors: Bowens R., Viges E., Atkinson D., Monnier J., Morgenstern M., Leisenring J., Meyer M.r., Hoffmann W.
    Abstract:

    We introduce the Michigan Infrared Test Thermal ELT N-band (MITTEN) Cryostat, a new facility for testing infrared detectors with a focus on mid-infrared (MIR) wavelengths (8-13 microns). New generations of large format, deep well, fast readout MIR detectors are now becoming available to the astronomical community. As one example, Teledyne Imaging Sensors (TIS) has introduced a long-wave Mercury-Cadmium-Telluride (MCT) array, GeoSnap, with high quantum efficiency (> 65 %) and improved noise properties compared to previous generation Si:As blocked impurity band (BIB) detectors. GeoSnap promises improved sensitivities, and efficiencies, for future background-limited MIR instruments, in particular with future extremely large telescopes (ELTs). We describe our new test facility suitable for measuring characteristics of these detectors, such as read noise, dark current, linearity, gain, pixel operability, quantum efficiency, and point source imaging performance relative to a background scene, as well as multiple point sources of differing contrast. MITTEN has an internal light source, and soon an accompanying filter wheel and Aperture Plate, re-imaged onto the detector using an Offner relay. The baseline temperature of the cryostat interior is maintained < 40 K and the optical bench maintains a temperature of 16 K using a two-stage pulse-tube cryocooler package from Cryomech. No measurable background radiation from the cryostat interior has yet been detected. © 2020 SPIEImmediate accessThis item from the UA Faculty Publications collection is made available by the University of Arizona with support from the University of Arizona Libraries. If you have questions, please contact us at repository@u.library.arizona.edu