The Experts below are selected from a list of 303 Experts worldwide ranked by ideXlab platform

Tetsuya Suzuki - One of the best experts on this subject based on the ideXlab platform.

  • Micro-hardness, microstructures and thermal stability of (Ti,Cr,Al,Si)N films deposited by cathodic Arc Method
    Vacuum, 2008
    Co-Authors: H. Ezura, K. Ichijo, Hiroyuki Hasegawa, K. Yamamoto, Atsushi Hotta, Tetsuya Suzuki
    Abstract:

    Abstract (Ti,Cr,Al,Si)N films were deposited by cathodic Arc Method using TiCrAlSi alloy cathodes. It was found that the microstructures of (Ti,Cr,Al,Si)N were closely related to (Al+Si) content. The crystal structure of (Ti,Cr,Al,Si)N was NaCl-type structure up to the (Al+Si) content of 0.60, where it changed to a hexagonal structure. The maximum hardness of 33 GPa was obtained at the lowest (Al+Si) content of 0.56, still in the cubic structure. The micro-hardness decreased down to 28 GPa as the crystal structure changed from NaCl-type to wurtzite-type. To investigate the thermal stabilities of (Ti,Cr,Al,Si)N, the films were annealed in a vacuum furnace. In Ti 0.20 Cr 0.20 Al 0.55 Si 0.05 N with cubic structure, the phase segregation occurred by annealing at over 900 °C, while Ti 0.22 Cr 0.22 Al 0.44 Si 0.12 N remained in cubic phase up to 1000 °C. The micro-hardness of Ti 0.20 Cr 0.20 Al 0.55 Si 0.05 N increased and that of Ti 0.22 Cr 0.22 Al 0.44 Si 0.12 N decreased at 1000 °C. Ti 0.20 Cr 0.11 Al 0.58 Si 0.11 N with a cubic and hexagonal mixture phase held its (c,h)-mixture phase up to 1000 °C, while there was an indication of an increase both in micro-hardness and in cubic ratio after annealing. In this paper, the micro-hardness and microstructure of (Ti,Cr,Al,Si)N are discussed as a function of annealing temperature and investigated by X-ray diffraction and electron microscopy.

  • Characterization of quaternary (Cr,Al)N-based films synthesized by the cathodic Arc Method
    Surface and Coatings Technology, 2007
    Co-Authors: Hiroyuki Hasegawa, T. Sato, K. Ohashi, S. Tsukamoto, Tetsuya Suzuki
    Abstract:

    Abstract Chromium aluminum nitride based films were synthesized by the cathodic Arc Method using an alloy cathode, and annealed in a vacuum chamber at 800, 900 and 1000 °C. XRD analyses showed that the (Cr,Al,Si,Y)N films maintained a cubic phase up to 800 °C, but changed to a mixed phase after post-annealing at temperatures of more than 900 °C. Cr2N segregation and partial transformation from a cubic to hexagonal phase at over 800 °C were confirmed for (Cr,Al,Si)N and (Cr,Al,Y)N. The lattice parameters for cubic (Cr,Al,Si)N and (Cr,Al,Y)N (0.416 nm) decreased to 0.411 nm and 0.413 nm, respectively, after annealing at 900 °C. The lattice parameter for (Cr,Al,Si,Y)N changed from 0.417 nm to 0.413 nm after annealing at 900 °C. The microhardness of (Cr,Al,Y)N was kept constant at 800 °C, whereas that of (Cr,Al,Si)N and (Cr,Al,Si,Y)N increased slightly between 800 and 900 °C. In this study, hardness, microstructure and lattice parameters were analyzed and discussed as a function of the annealing temperature.

  • Microstructures of (Ti,Cr,Al,Si)N films synthesized by cathodic Arc Method
    Surface & Coatings Technology, 2006
    Co-Authors: K. Ichijo, Hiroyuki Hasegawa, Tetsuya Suzuki
    Abstract:

    Abstract (Ti,Cr,Al,Si)N films were deposited on WC and Si substrate by cathodic Arc Method with TiCrAlSi alloy cathodes. At lower (Al + Si) contents from 0.56 to 0.60, the crystal structure of (Ti,Cr,Al,Si)N had NaCl type cubic structure. With increasing (Al + Si) contents, the NaCl structure changed to a hexagonal structure. The maximum hardness of (Ti,Cr,Al,Si)N was 31 GPa at 0.56 of (Si + Al) contents. Corresponding with structural changes from NaCl to wurtzite, microhardness decreased down to 26 GPa. TEM photographs indicated that embedding Si atom was effective to decreased grain sizes of 5–10 nm. In this paper, relationships between microstructure and microhardness as a function of Si and Al contents are discussed based on the phase transformation, analyzed by X-ray diffraction Method and transmission electron microscopy.

  • Effects of boron contents on microstructures and microhardness in CrxAlyN films synthesized by cathodic Arc Method
    Surface and Coatings Technology, 2006
    Co-Authors: T. Sato, Hiroyuki Hasegawa, Tomonari Yamamoto, Tetsuya Suzuki
    Abstract:

    Abstract Cr x Al y B z N films were synthesized by the cathodic Arc Method, using Cr x Al y B z alloy cathode with differing z values from 0 to 0.10 and investigated with respect to crystal structures, lattice parameters and microhardness. The microhardness of Cr x Al y B z N increased from 27 ( z  = 0) to 33 GPa ( z  = 0.10). The lattice parameters of Cr x Al y B z N decreased from 0.413 ( z  = 0) to 0.410 nm ( z  = 0.10), keeping the cubic structure. The columnar structure of Cr x Al y B z N disappeared and grain size decreased with incorporations of B atoms. In this study, Cr x Al y B z N films were characterized by X-ray and electron microscopy analysis and the relationship between microstructure and microhardness was discussed as a function of B contents.

  • Effects of Al contents on microstructures of Cr1−XAlXN and Zr1−XAlXN films synthesized by cathodic Arc Method
    Surface and Coatings Technology, 2005
    Co-Authors: Hiroyuki Hasegawa, Masahiro Kawate, Tetsuya Suzuki
    Abstract:

    Abstract Cr 1− X Al X N and Zr 1− X Al X N (0≤×≤1.0) films were synthesized by the cathodic Arc Method using alloy and metal targets. The X-ray diffraction patterns showed that the Cr 1− X Al X N changed from cubic structure at X =0.6 to hexagonal structure at X =0.7. The peaks of Zr 1− X Al X N showed the NaCl structure at X =0.37 and changed to wurtzite structure at X =0.50. The lattice parameter of Cr 1− X Al X N films changed from 0.416 nm ( X =0) to 0.413 nm ( X =1.0), and that of Zr 1− X Al X N changed from 0.458 nm ( X =0) to 0.444 nm ( X =0.37). The maximum microhardness of Cr 1− X Al X N and Zr 1− X Al X N films was 27 GPa ( X =0.6) and 29 GPa ( X =0.37), respectively. Changes in microstructures-related transition from the cubic to hexagonal were studied, and corresponding hardness changes were discussed in Cr 1− X Al X N and Zr 1− X Al X N.

Hiroyuki Hasegawa - One of the best experts on this subject based on the ideXlab platform.

  • Micro-hardness, microstructures and thermal stability of (Ti,Cr,Al,Si)N films deposited by cathodic Arc Method
    Vacuum, 2008
    Co-Authors: H. Ezura, K. Ichijo, Hiroyuki Hasegawa, K. Yamamoto, Atsushi Hotta, Tetsuya Suzuki
    Abstract:

    Abstract (Ti,Cr,Al,Si)N films were deposited by cathodic Arc Method using TiCrAlSi alloy cathodes. It was found that the microstructures of (Ti,Cr,Al,Si)N were closely related to (Al+Si) content. The crystal structure of (Ti,Cr,Al,Si)N was NaCl-type structure up to the (Al+Si) content of 0.60, where it changed to a hexagonal structure. The maximum hardness of 33 GPa was obtained at the lowest (Al+Si) content of 0.56, still in the cubic structure. The micro-hardness decreased down to 28 GPa as the crystal structure changed from NaCl-type to wurtzite-type. To investigate the thermal stabilities of (Ti,Cr,Al,Si)N, the films were annealed in a vacuum furnace. In Ti 0.20 Cr 0.20 Al 0.55 Si 0.05 N with cubic structure, the phase segregation occurred by annealing at over 900 °C, while Ti 0.22 Cr 0.22 Al 0.44 Si 0.12 N remained in cubic phase up to 1000 °C. The micro-hardness of Ti 0.20 Cr 0.20 Al 0.55 Si 0.05 N increased and that of Ti 0.22 Cr 0.22 Al 0.44 Si 0.12 N decreased at 1000 °C. Ti 0.20 Cr 0.11 Al 0.58 Si 0.11 N with a cubic and hexagonal mixture phase held its (c,h)-mixture phase up to 1000 °C, while there was an indication of an increase both in micro-hardness and in cubic ratio after annealing. In this paper, the micro-hardness and microstructure of (Ti,Cr,Al,Si)N are discussed as a function of annealing temperature and investigated by X-ray diffraction and electron microscopy.

  • Characterization of quaternary (Cr,Al)N-based films synthesized by the cathodic Arc Method
    Surface and Coatings Technology, 2007
    Co-Authors: Hiroyuki Hasegawa, T. Sato, K. Ohashi, S. Tsukamoto, Tetsuya Suzuki
    Abstract:

    Abstract Chromium aluminum nitride based films were synthesized by the cathodic Arc Method using an alloy cathode, and annealed in a vacuum chamber at 800, 900 and 1000 °C. XRD analyses showed that the (Cr,Al,Si,Y)N films maintained a cubic phase up to 800 °C, but changed to a mixed phase after post-annealing at temperatures of more than 900 °C. Cr2N segregation and partial transformation from a cubic to hexagonal phase at over 800 °C were confirmed for (Cr,Al,Si)N and (Cr,Al,Y)N. The lattice parameters for cubic (Cr,Al,Si)N and (Cr,Al,Y)N (0.416 nm) decreased to 0.411 nm and 0.413 nm, respectively, after annealing at 900 °C. The lattice parameter for (Cr,Al,Si,Y)N changed from 0.417 nm to 0.413 nm after annealing at 900 °C. The microhardness of (Cr,Al,Y)N was kept constant at 800 °C, whereas that of (Cr,Al,Si)N and (Cr,Al,Si,Y)N increased slightly between 800 and 900 °C. In this study, hardness, microstructure and lattice parameters were analyzed and discussed as a function of the annealing temperature.

  • Microstructures of (Ti,Cr,Al,Si)N films synthesized by cathodic Arc Method
    Surface & Coatings Technology, 2006
    Co-Authors: K. Ichijo, Hiroyuki Hasegawa, Tetsuya Suzuki
    Abstract:

    Abstract (Ti,Cr,Al,Si)N films were deposited on WC and Si substrate by cathodic Arc Method with TiCrAlSi alloy cathodes. At lower (Al + Si) contents from 0.56 to 0.60, the crystal structure of (Ti,Cr,Al,Si)N had NaCl type cubic structure. With increasing (Al + Si) contents, the NaCl structure changed to a hexagonal structure. The maximum hardness of (Ti,Cr,Al,Si)N was 31 GPa at 0.56 of (Si + Al) contents. Corresponding with structural changes from NaCl to wurtzite, microhardness decreased down to 26 GPa. TEM photographs indicated that embedding Si atom was effective to decreased grain sizes of 5–10 nm. In this paper, relationships between microstructure and microhardness as a function of Si and Al contents are discussed based on the phase transformation, analyzed by X-ray diffraction Method and transmission electron microscopy.

  • Effects of boron contents on microstructures and microhardness in CrxAlyN films synthesized by cathodic Arc Method
    Surface and Coatings Technology, 2006
    Co-Authors: T. Sato, Hiroyuki Hasegawa, Tomonari Yamamoto, Tetsuya Suzuki
    Abstract:

    Abstract Cr x Al y B z N films were synthesized by the cathodic Arc Method, using Cr x Al y B z alloy cathode with differing z values from 0 to 0.10 and investigated with respect to crystal structures, lattice parameters and microhardness. The microhardness of Cr x Al y B z N increased from 27 ( z  = 0) to 33 GPa ( z  = 0.10). The lattice parameters of Cr x Al y B z N decreased from 0.413 ( z  = 0) to 0.410 nm ( z  = 0.10), keeping the cubic structure. The columnar structure of Cr x Al y B z N disappeared and grain size decreased with incorporations of B atoms. In this study, Cr x Al y B z N films were characterized by X-ray and electron microscopy analysis and the relationship between microstructure and microhardness was discussed as a function of B contents.

  • Effects of Al contents on microstructures of Cr1−XAlXN and Zr1−XAlXN films synthesized by cathodic Arc Method
    Surface and Coatings Technology, 2005
    Co-Authors: Hiroyuki Hasegawa, Masahiro Kawate, Tetsuya Suzuki
    Abstract:

    Abstract Cr 1− X Al X N and Zr 1− X Al X N (0≤×≤1.0) films were synthesized by the cathodic Arc Method using alloy and metal targets. The X-ray diffraction patterns showed that the Cr 1− X Al X N changed from cubic structure at X =0.6 to hexagonal structure at X =0.7. The peaks of Zr 1− X Al X N showed the NaCl structure at X =0.37 and changed to wurtzite structure at X =0.50. The lattice parameter of Cr 1− X Al X N films changed from 0.416 nm ( X =0) to 0.413 nm ( X =1.0), and that of Zr 1− X Al X N changed from 0.458 nm ( X =0) to 0.444 nm ( X =0.37). The maximum microhardness of Cr 1− X Al X N and Zr 1− X Al X N films was 27 GPa ( X =0.6) and 29 GPa ( X =0.37), respectively. Changes in microstructures-related transition from the cubic to hexagonal were studied, and corresponding hardness changes were discussed in Cr 1− X Al X N and Zr 1− X Al X N.

C.p. Lungu - One of the best experts on this subject based on the ideXlab platform.

  • Combinatorial Fe–Co thin film magnetic structures obtained by thermionic vacuum Arc Method
    Surface and Coatings Technology, 2014
    Co-Authors: I. Jepu, C.p. Lungu, Corneliu Porosnicu, Victor Kuncser, I. Mustata, Catalin Luculescu, Gabriela Iacobescu, A. Marin, Victor Ciupina
    Abstract:

    Abstract Magnetoresistive Fe–Co based thin film structures were produced using thermionic vacuum Arc Method. The purpose of this work was to obtain significant magnetic response on different granular combinatorial structures. The Giant Magnetoresistive (GMR) and combination between GMR and Tunneling Magnetoresistive (TMR) properties of the thin film structures were the aim of the work. The proposed Method in order to obtain the desired granular structures is based on electron beam emitted by an externally heated cathode, accelerated by a high anodic potential. The work consisted in preparing two sets of samples, first being a combination between Fe–Co as magnetic materials embedded in a Cu matrix, with a total thickness of 200 nm. The second structure was a combination between Fe–Co (50%–50%) alloy, embedded in a matrix of Cu combined with MgO with a thickness of 200 nm. Both sets of samples were obtained by three simultaneous types of discharges. Because of the substrate positioning in respect with the three anode–cathode systems, different material concentrations were obtained, confirmed by Energy Dispersive Spectroscopy (EDS) measurement results. Structural and morphological properties were investigated using Scanning Electron Microscopy; Atomic Force Microscopy and EDS. Electrical properties of the obtained samples were studied using the 4 point measurement Method. The magnetic properties were first studied using a non-destructive optical Method called MOKE (Magneto-Optical Kerr Effect). Electrical resistance behavior of the granular type structures was studied for different values of the magnetic field, up to 0.3 T, at different values of the sample temperature. The magnetoresistive effect obtained for the two sets of samples varied from 1.5% to 81% in respect with the substrate positioning and sample temperature for a constant magnetic field.

  • Investigation of the SiC thin films synthetized by Thermionic Vacuum Arc Method (TVA)
    The European Physical Journal D, 2012
    Co-Authors: Victor Ciupina, C.p. Lungu, Rodica Vladoiu, Virginia Dinca, M. Contulov, Aurelia Mandes, P. Popov, Gabriel Prodan
    Abstract:

    Thermionic Vacuum Arc Method (TVA) was used for the first time to prepare SiC thin films. This Method is very suitable for deposition of high purity thin films with compact structure and extremely smooth in vacuum conditions. The nanocomposites were investigated using Transmission Electron Microscopy (TEM) analyses provided with HR-TEM and SAED facilities. The structure of the films can be indexed as following three forms: cubic structure of SiC (F4-3m) a = 0.4348 nm, cubic Si (Fd3m) a = 0.54307 nm and graphite (P63/mmc) a = 0.2456 nm; c = 0.6696 nm. The morphology, topography, wettability and wear properties were also performed by SEE system and by Raman Spectroscopy, increasing the interest for emerging applications.

  • Nanodiamond crystallites embedded in carbon films prepared by thermionic vacuum Arc Method
    Diamond and Related Materials, 2011
    Co-Authors: C.p. Lungu, C.e.a. Grigorescu, M. I. Rusu, I. Jepu, Corneliu Porosnicu, A. M. Lungu, I.d. Feraru, D. Savastru
    Abstract:

    Abstract Nanostructured carbon films with thicknesses of 100 and 200 nm have been deposited from pure vapour carbon plasma using an original thermionic vacuum Arc Method. Silicon single crystalline wafers, glass and stainless steel held at 400 °C were used for substrates. The films consist of diamond nanoparticles of 5 nm diameter on the average embedded in a disordered graphite matrix as revealed by HRTEM, XPS and visible Raman measurements. The graphitic cluster diameters L a range from 1.5 to 2.3 nm. Thicker films (200 nm) on stainless steel exhibit the largest clusters.

  • Low friction properties of nano-structured C-Ni films prepared by thermionic vacuum Arc Method
    International Journal of Surface Science and Engineering, 2010
    Co-Authors: C.p. Lungu, A. M. Lungu, P. Chiru, O.g. Pompilian, A. Tudor, Rosaria Brescia
    Abstract:

    Nano-structured C-Ni coatings were prepared using the thermionic vacuum Arc Method and tribological properties were evaluated in order to obtain carbon-metal layers to act as solid lubricants. The C-Ni films prepared by TVA Method were characterised as a metallic complex of nano-crystals (5 nm average diameter) surrounded by carbon amorphous structures with a strong graphitisation tendency. The coefficients of friction of the coatings, measured using a CSM ball-on-disc tribometer, were in the range of 0.19-0.27 3-5 times lower than the uncoated substrates.

  • Influence of the bias voltage on the formation of beryllium films by a thermionic vacuum Arc Method
    Journal of Nuclear Materials, 2009
    Co-Authors: A. Anghel, I. Mustata, Corneliu Porosnicu, C.p. Lungu
    Abstract:

    Abstract Beryllium is intended to be used as suggested material for the first wall in the thermonuclear power plants. Some tiles of the first wall will be of inconel coated by a beryllium layer that must be adherent to the substrate and have a compact structure in order to resist as much as possible the dramatic interaction with the high energetic plasma particles, ions, electrons and neutrons. Applying bias voltages (−200 to + 700 V) on the substrates, the morphology of the prepared Be layers using the original thermionic vacuum Arc Method developed at NILPRP was controlled in order to obtain smooth surfaces, free of holes and lamellar structures. The prepared films were studied and characterized by scanning electron microscopy (SEM), atomic force microscopy (AFM), X-ray photoelectron spectroscopy (XPS) and Auger spectroscopy (AES). The films prepared using negative bias voltages were found to be more compact and smooth with an average roughness (Rms) of 7 nm.

Masahiro Ozaki - One of the best experts on this subject based on the ideXlab platform.

  • KES (2) - Examination of effects of character size on accuracy of writer recognition by new local Arc Method
    Lecture Notes in Computer Science, 2006
    Co-Authors: Masahiro Ozaki, Yoshinori Adachi, Naohiro Ishii
    Abstract:

    In the previous studies, authors proposed a new local Arc Method with new similarity evaluation function to the off-line writer recognition, and obtained high recognition ratios. However, the calculated similarity values are comparatively close each other. Therefore, it is very difficult to improve the accuracy any more. In this study, it is assumed that the amount of the characteristic features appeared to the curvature distribution may be different as the difference of the character size. Then, similarity values of five character sizes were compared, and the optimum character size for the new local Arc Method was examined. As a result, it turned out that the similarity values are greatly influenced by the character size, and the best character size and Arc chord length are obtained for the writer recognition by the new local Arc Method.

  • Examination of Effects of Character Size on Accuracy of Writer Recognition by New Local Arc Method
    Lecture Notes in Computer Science, 2006
    Co-Authors: Masahiro Ozaki, Yoshinori Adachi, Naohiro Ishii
    Abstract:

    In the previous studies, authors proposed a new local Arc Method with new similarity evaluation function to the off-line writer recognition, and obtained high recognition ratios. However, the calculated similarity values are comparatively close each other. Therefore, it is very difficult to improve the accuracy any more. In this study, it is assumed that the amount of the characteristic features appeared to the curvature distribution may be different as the difference of the character size. Then, similarity values of five character sizes were compared, and the optimum character size for the new local Arc Method was examined. As a result, it turned out that the similarity values are greatly influenced by the character size, and the best character size and Arc chord length are obtained for the writer recognition by the new local Arc Method.

  • KES (1) - Writer recognition by using new seArching algorithm in new local Arc Method
    Lecture Notes in Computer Science, 2005
    Co-Authors: Masahiro Ozaki, Yoshinori Adachi, Naohiro Ishii
    Abstract:

    In the previous studies, authors proposed a new local Arc Method with new similarity evaluation function to the off-line writer recognition, and are obtaining high recognition ratios. However, to calculate the similarity value of the author from the product of the similarity values of three or four kinds of characters, the difference of author similarity value becomes sometimes quite small. Then, it may not be stable recognition Method. In this study, the new local Arc Method was modified to give more information of writers. And by examining the characteristic of the feature of new local Arc Method, it was found that the feature of each writer was possible to be extracted. Especially, even when the difference between author similarity values is small, stable writer recognition becomes possible.

  • KES - A New Similarity Evaluation Function for Writer Recognition of Chinese Character
    Lecture Notes in Computer Science, 2004
    Co-Authors: Yoshinori Adachi, Min Liu, Masahiro Ozaki
    Abstract:

    In new local Arc Method which we have proposed before, the author has been specified from curvature distributions of three different kinds of characters. This time, a new Method to obtain similarities from a superposition of four similarity values obtained from two chord lengths and two different kinds of characters, was tried in order to apply the new local Arc Method to the Chinese character (Simplified characters). As the result, the writer recognition became possible at the accuracy which could not be realized by the simple new local Arc Method. And by this Method, writer recognition became possible by fewer kinds of characters.

Naohiro Ishii - One of the best experts on this subject based on the ideXlab platform.

  • KES (2) - Examination of effects of character size on accuracy of writer recognition by new local Arc Method
    Lecture Notes in Computer Science, 2006
    Co-Authors: Masahiro Ozaki, Yoshinori Adachi, Naohiro Ishii
    Abstract:

    In the previous studies, authors proposed a new local Arc Method with new similarity evaluation function to the off-line writer recognition, and obtained high recognition ratios. However, the calculated similarity values are comparatively close each other. Therefore, it is very difficult to improve the accuracy any more. In this study, it is assumed that the amount of the characteristic features appeared to the curvature distribution may be different as the difference of the character size. Then, similarity values of five character sizes were compared, and the optimum character size for the new local Arc Method was examined. As a result, it turned out that the similarity values are greatly influenced by the character size, and the best character size and Arc chord length are obtained for the writer recognition by the new local Arc Method.

  • Examination of Effects of Character Size on Accuracy of Writer Recognition by New Local Arc Method
    Lecture Notes in Computer Science, 2006
    Co-Authors: Masahiro Ozaki, Yoshinori Adachi, Naohiro Ishii
    Abstract:

    In the previous studies, authors proposed a new local Arc Method with new similarity evaluation function to the off-line writer recognition, and obtained high recognition ratios. However, the calculated similarity values are comparatively close each other. Therefore, it is very difficult to improve the accuracy any more. In this study, it is assumed that the amount of the characteristic features appeared to the curvature distribution may be different as the difference of the character size. Then, similarity values of five character sizes were compared, and the optimum character size for the new local Arc Method was examined. As a result, it turned out that the similarity values are greatly influenced by the character size, and the best character size and Arc chord length are obtained for the writer recognition by the new local Arc Method.

  • KES (1) - Writer recognition by using new seArching algorithm in new local Arc Method
    Lecture Notes in Computer Science, 2005
    Co-Authors: Masahiro Ozaki, Yoshinori Adachi, Naohiro Ishii
    Abstract:

    In the previous studies, authors proposed a new local Arc Method with new similarity evaluation function to the off-line writer recognition, and are obtaining high recognition ratios. However, to calculate the similarity value of the author from the product of the similarity values of three or four kinds of characters, the difference of author similarity value becomes sometimes quite small. Then, it may not be stable recognition Method. In this study, the new local Arc Method was modified to give more information of writers. And by examining the characteristic of the feature of new local Arc Method, it was found that the feature of each writer was possible to be extracted. Especially, even when the difference between author similarity values is small, stable writer recognition becomes possible.