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Rodica Vladoiu - One of the best experts on this subject based on the ideXlab platform.

  • Magnesium plasma diagnostics by heated probe and characterization of the Mg thin films deposited by thermionic vacuum Arc Technology
    Plasma Sources Science and Technology, 2015
    Co-Authors: Rodica Vladoiu, Aurelia Mandes, Virginia Dinca Balan, Gabriel Prodan, Pavel Kudrna, Milan Tichý
    Abstract:

    The aim of this paper is to report on magnesium plasma diagnostics and to investigate the properties of thin Mg films deposited on Si and glass substrates by using thermionic vacuum Arc (TVA) Technology. TVA is an original deposition method using a combination of anodic Arc and powerful electron gun system (up to 600 W) for the growth of thin films from solid precursors under a vacuum of 10−6Torr. Due to the comparatively high deposition rate as well as comparatively high plasma potential—around 0.5 kV—plasma diagnostics were carried out by a heated probe that prevents layer deposition on the probe surface. The estimated value of electron density was in the order of 1.0 × 1016m−3 and the electron temperature varied between 4 × 104 and 1.2 × 105 K (corresponding to two different discharge conditions). The thin Mg films were investigated using SEM images and TEM analyses provided with HR-TEM and SAED facilities. According to the SAED patterns the structure of the films can be indexed as two forms: hexagonal structure for Mg and cubic structure for MgO; the peak value of grain size distribution was 91.29 nm in diameter for Mg TVA/Si and 61.06 nm for Mg TVA/Gl.

  • Growth and characteristics of tantalum oxide thin films deposited using thermionic vacuum Arc Technology
    Journal of Applied Physics, 2010
    Co-Authors: Rodica Vladoiu, Victor Ciupina, Aurelia Mandes, Virginia Dinca, Madalina Prodan, Geavit Musa
    Abstract:

    Tantalum pentoxide (Ta2O5) thin films were synthesized using thermionic vacuum Arc (TVA) Technology. TVA is an original deposition method using a combination of anodic Arc and electron gun system for the growth of thin films from solid precursors under vacuum of 10−6 Torr. The properties of the deposited Ta2O5 thin films were investigated in terms of wettability, refractive index, morphology, and structure. The surface free energy was determined by means of surface energy evaluation system indicating a hydrophilic character and the refractive index was measured by Filmetrics F20 device. The morphology was determined from bright field transmission electron microscopy (TEM) image performed by Philips CM 120 ST TEM system. It exhibits nanoparticles of 3–6 nm diameter smoothly distributed. Selected area electron diffraction pattern revealed the contrast fringes given by complex polycrystalline particles included in the amorphous film. The measured fringes could be indexed using monoclinic structure of Ta2O5.

  • Investigation of Properties of Boron Thin Film Deposited By Thermionic Vacuum Arc Technology
    AIP Conference Proceedings, 2007
    Co-Authors: N. Ekem, Tamer Akan, Suat Pat, M. Z. Balbag, M. I. Cenik, E. Karakas, Rodica Vladoiu, Geavit Musa
    Abstract:

    In this study, we first used boron as anode material in the TVA system. We also present boron thin film deposition using TVA Technology.

  • Gaseous Thermionic Vacuum Arc(G-TVA) - : an extension of TVA (Thermionic Vacuum Arc) input materials from solid samples to gases and liquids for carbon thin film deposition
    Journal of Optoelectronics and Advanced Materials, 2007
    Co-Authors: Geavit Musa, C. P. Lungu, C. Surdu Bob, V. Ciupina, Rodica Vladoiu
    Abstract:

    The aim of this paper is to find out the possibilities to extend the area of applications of Thermionic Vacuum Arc Technology developed by our group for high quality thin fim deposition. We named this new Technology Gaseous Thermionic Vacuum Arc (G-TVA). Through using a sintered filter various gaseous flows can be obtained, a process which is similar to anode evaporation under electron bombardment of anode by electrons as in the case of TVA discharge. The first step in our programme is to generate G-TVA discharges in carbon compounds like methane, acetylene, etc and to compare the obtained results with hydrogen free carbon films obtained using TVA.

Geavit Musa - One of the best experts on this subject based on the ideXlab platform.

  • Growth and characteristics of tantalum oxide thin films deposited using thermionic vacuum Arc Technology
    Journal of Applied Physics, 2010
    Co-Authors: Rodica Vladoiu, Victor Ciupina, Aurelia Mandes, Virginia Dinca, Madalina Prodan, Geavit Musa
    Abstract:

    Tantalum pentoxide (Ta2O5) thin films were synthesized using thermionic vacuum Arc (TVA) Technology. TVA is an original deposition method using a combination of anodic Arc and electron gun system for the growth of thin films from solid precursors under vacuum of 10−6 Torr. The properties of the deposited Ta2O5 thin films were investigated in terms of wettability, refractive index, morphology, and structure. The surface free energy was determined by means of surface energy evaluation system indicating a hydrophilic character and the refractive index was measured by Filmetrics F20 device. The morphology was determined from bright field transmission electron microscopy (TEM) image performed by Philips CM 120 ST TEM system. It exhibits nanoparticles of 3–6 nm diameter smoothly distributed. Selected area electron diffraction pattern revealed the contrast fringes given by complex polycrystalline particles included in the amorphous film. The measured fringes could be indexed using monoclinic structure of Ta2O5.

  • Investigation of Properties of Boron Thin Film Deposited By Thermionic Vacuum Arc Technology
    AIP Conference Proceedings, 2007
    Co-Authors: N. Ekem, Tamer Akan, Suat Pat, M. Z. Balbag, M. I. Cenik, E. Karakas, Rodica Vladoiu, Geavit Musa
    Abstract:

    In this study, we first used boron as anode material in the TVA system. We also present boron thin film deposition using TVA Technology.

  • Gaseous Thermionic Vacuum Arc(G-TVA) - : an extension of TVA (Thermionic Vacuum Arc) input materials from solid samples to gases and liquids for carbon thin film deposition
    Journal of Optoelectronics and Advanced Materials, 2007
    Co-Authors: Geavit Musa, C. P. Lungu, C. Surdu Bob, V. Ciupina, Rodica Vladoiu
    Abstract:

    The aim of this paper is to find out the possibilities to extend the area of applications of Thermionic Vacuum Arc Technology developed by our group for high quality thin fim deposition. We named this new Technology Gaseous Thermionic Vacuum Arc (G-TVA). Through using a sintered filter various gaseous flows can be obtained, a process which is similar to anode evaporation under electron bombardment of anode by electrons as in the case of TVA discharge. The first step in our programme is to generate G-TVA discharges in carbon compounds like methane, acetylene, etc and to compare the obtained results with hydrogen free carbon films obtained using TVA.

Aurelia Mandes - One of the best experts on this subject based on the ideXlab platform.

  • Titanium-based thin films for protective coatings prepared by TVA (Thermionic Vacuum Arc) Technology
    MATEC Web of Conferences, 2018
    Co-Authors: R Vladoiu, Aurelia Mandes, Virginia Dinca, G Prodan
    Abstract:

    The aim of the present work is to achieve the controlled synthesis of Ti and Mg thin films, with compact structure and extremely smooth surface, by using the Thermionic Vacuum Arc (TVA) Technology, from elemental powder of titanium and magnesium. The thin film exhibits an amorphous structure, with polycrystalline grain mainly being Mg hexagonal phase and small amount of hexagonal Ti. Grain mean size was estimated to be ~120nm by statistical analysis of measured Feret diameter of projected area of grain. The phases were tested by mean of Cohen method applied to electron diffraction results. No oxide (MgO, TiO2,) lines could be identified from electron diffraction. Debye-Scherrer dimension, estimated from electron diffraction profile is ~4 nm. The analysis of amorphous part from diffraction profile show different coordination number for Mg and Ti atoms.

  • Magnesium plasma diagnostics by heated probe and characterization of the Mg thin films deposited by thermionic vacuum Arc Technology
    Plasma Sources Science and Technology, 2015
    Co-Authors: Rodica Vladoiu, Aurelia Mandes, Virginia Dinca Balan, Gabriel Prodan, Pavel Kudrna, Milan Tichý
    Abstract:

    The aim of this paper is to report on magnesium plasma diagnostics and to investigate the properties of thin Mg films deposited on Si and glass substrates by using thermionic vacuum Arc (TVA) Technology. TVA is an original deposition method using a combination of anodic Arc and powerful electron gun system (up to 600 W) for the growth of thin films from solid precursors under a vacuum of 10−6Torr. Due to the comparatively high deposition rate as well as comparatively high plasma potential—around 0.5 kV—plasma diagnostics were carried out by a heated probe that prevents layer deposition on the probe surface. The estimated value of electron density was in the order of 1.0 × 1016m−3 and the electron temperature varied between 4 × 104 and 1.2 × 105 K (corresponding to two different discharge conditions). The thin Mg films were investigated using SEM images and TEM analyses provided with HR-TEM and SAED facilities. According to the SAED patterns the structure of the films can be indexed as two forms: hexagonal structure for Mg and cubic structure for MgO; the peak value of grain size distribution was 91.29 nm in diameter for Mg TVA/Si and 61.06 nm for Mg TVA/Gl.

  • Growth and characteristics of tantalum oxide thin films deposited using thermionic vacuum Arc Technology
    Journal of Applied Physics, 2010
    Co-Authors: Rodica Vladoiu, Victor Ciupina, Aurelia Mandes, Virginia Dinca, Madalina Prodan, Geavit Musa
    Abstract:

    Tantalum pentoxide (Ta2O5) thin films were synthesized using thermionic vacuum Arc (TVA) Technology. TVA is an original deposition method using a combination of anodic Arc and electron gun system for the growth of thin films from solid precursors under vacuum of 10−6 Torr. The properties of the deposited Ta2O5 thin films were investigated in terms of wettability, refractive index, morphology, and structure. The surface free energy was determined by means of surface energy evaluation system indicating a hydrophilic character and the refractive index was measured by Filmetrics F20 device. The morphology was determined from bright field transmission electron microscopy (TEM) image performed by Philips CM 120 ST TEM system. It exhibits nanoparticles of 3–6 nm diameter smoothly distributed. Selected area electron diffraction pattern revealed the contrast fringes given by complex polycrystalline particles included in the amorphous film. The measured fringes could be indexed using monoclinic structure of Ta2O5.

Chun-chih Huang - One of the best experts on this subject based on the ideXlab platform.

Ru-yuan Yang - One of the best experts on this subject based on the ideXlab platform.

  • Properties of low-temperature deposited ZnO thin films prepared by cathodic vacuum Arc Technology on different flexible substrates
    Thin Solid Films, 2013
    Co-Authors: Cheng-tang Pan, Ru-yuan Yang, Min-hang Weng, Chien-wei Huang
    Abstract:

    Un-doped zinc oxide (ZnO) films were deposited on three different substrates (polyethylene terephthalate (PET), polyvinyl butyral (PVB) and polyimide (PI)) at a low temperature (< 75 °C) by cathode vacuum Arc deposition. The microstructure, optical and electrical properties of the deposited films were investigated and discussed. All the deposited films reveal a preferred orientation with the c-axis perpendicular to the substrate, and an average transmittance of over 85% in the visible region. The calculated optical band gaps are around 2.6, 3.14 and 3.18 eV, respectively, for the ZnO films deposited on the PI, PVB and PET substrates. The lowest resistivity and the highest Hall mobility are 5.31 × 10− 3 Ω-cm and 15.16 cm2/V-s for the ZnO film deposited on the PET substrate.

  • Low-temperature deposited ZnO thin films on the flexible substrate by cathodic vacuum Arc Technology
    Applied Surface Science, 2011
    Co-Authors: Ru-yuan Yang, Min-hang Weng, Cheng-tang Pan, Chin-min Hsiung, Chun-chih Huang
    Abstract:

    Abstract In this paper, un-doped zinc oxide (ZnO) films with various thicknesses (150, 250, 350, 450 and 550 nm) were successfully prepared onto PET substrates using cathodic vacuum Arc technique at low-temperature ( −3  Ω cm could be achieved for the un-doped ZnO film with thickness of 550 nm.