The Experts below are selected from a list of 285 Experts worldwide ranked by ideXlab platform
James R. Morrison - One of the best experts on this subject based on the ideXlab platform.
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Controlled Wafer Release in Clustered Photolithography Tools: Flexible Flow Line Job Release Scheduling and an LMOLP Heuristic
IEEE Transactions on Automation Science and Engineering, 2015Co-Authors: Kyungsu Park, James R. MorrisonAbstract:As a clustered photolithography tool (CPT) in semiconductor wafer manufacturing can cost as much as US$100 million, it must be operated efficiently. To maximize throughput, wafers are generally admitted to a CPT opportunistically, that is, as soon as they are available and the tool can accept them. Here, our goal is to develop release methods that retain throughput but increase manufacturing agility. As Petri net methods prove intractable, we develop a heuristic based on the use of flexible flow line models for the CPT. Such models are appropriate when the tool throughput for each class of wafers is dictated by the Bottleneck Process time plus unavoidable robot handling overhead. The heart of the heuristic is a lexicographic multiple objective linear program (LMOLP). It first ensures that wafers exit the tool as early as possible and subsequently delays the wafer admission to minimize the mean residency time.
Kyungsu Park - One of the best experts on this subject based on the ideXlab platform.
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Controlled Wafer Release in Clustered Photolithography Tools: Flexible Flow Line Job Release Scheduling and an LMOLP Heuristic
IEEE Transactions on Automation Science and Engineering, 2015Co-Authors: Kyungsu Park, James R. MorrisonAbstract:As a clustered photolithography tool (CPT) in semiconductor wafer manufacturing can cost as much as US$100 million, it must be operated efficiently. To maximize throughput, wafers are generally admitted to a CPT opportunistically, that is, as soon as they are available and the tool can accept them. Here, our goal is to develop release methods that retain throughput but increase manufacturing agility. As Petri net methods prove intractable, we develop a heuristic based on the use of flexible flow line models for the CPT. Such models are appropriate when the tool throughput for each class of wafers is dictated by the Bottleneck Process time plus unavoidable robot handling overhead. The heart of the heuristic is a lexicographic multiple objective linear program (LMOLP). It first ensures that wafers exit the tool as early as possible and subsequently delays the wafer admission to minimize the mean residency time.
Cynthia L. M. Pereira - One of the best experts on this subject based on the ideXlab platform.
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Field-Induced Slow Magnetic Relaxation of a Six-Coordinate Mononuclear Manganese(II) and Cobalt(II) Oxamate Complexes.
Inorganic chemistry, 2020Co-Authors: Tamyris T. Da Cunha, Vitor M. M. Barbosa, Willian X. C. Oliveira, Emerson F. Pedroso, Diana M A García, Wallace C. Nunes, Cynthia L. M. PereiraAbstract:Two air-stable, isostructural, mononuclear six-coordinate manganese(II) and cobalt(II) oxamate complexes, [M(4-HOpa)2(H2O)2] [4-HOpa = N-4-hydroxyphenyloxamate; M= Mn2+ (1) or Co2+ (2)], exhibit field-induced slow magnetic relaxation. A Bottleneck Process is observed throughout the temperature range of 2-20 K for 1, while for 2, it dominates only at low temperatures (2-4 K). Additionally, the Raman Process [n = 6.9(2)] is responsible for an increase in the relaxation time at higher temperatures to 2.
Tian-rong Bai - One of the best experts on this subject based on the ideXlab platform.
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The Improvement of Production Bottleneck Process in J Company Automobile Assembly Line
DEStech Transactions on Computer Science and Engineering, 2017Co-Authors: Tian-rong BaiAbstract:The 21st century is an era of rapid scientific and technological development, the manufacturing sector, the production methods are constantly undergoing change. Due to the rapid changes in market demand, how to further improve the efficiency of production lines to meet market demand, more and more importance in enterprises. This requires at existing production facilities remain unchanged, continue to solve the production line in the “Bottleneck” problem, to achieve the purpose of optimizing the production line. Based on the J company car assembly line research, industrial engineering according to the method identified limit their productivity Bottleneck Process and propose ways to improve the Process simplified from three aspects, MTM method and the learning curve theory, we have made reduce operating time Bottleneck Process to take time below the lifting of restrictions on the assembly line productivity. Finally, through analytic hierarchy Process evaluation above methods to obtain the most suitable method for improving further propose the optimal solution.
Tamyris T. Da Cunha - One of the best experts on this subject based on the ideXlab platform.
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Field-Induced Slow Magnetic Relaxation of a Six-Coordinate Mononuclear Manganese(II) and Cobalt(II) Oxamate Complexes.
Inorganic chemistry, 2020Co-Authors: Tamyris T. Da Cunha, Vitor M. M. Barbosa, Willian X. C. Oliveira, Emerson F. Pedroso, Diana M A García, Wallace C. Nunes, Cynthia L. M. PereiraAbstract:Two air-stable, isostructural, mononuclear six-coordinate manganese(II) and cobalt(II) oxamate complexes, [M(4-HOpa)2(H2O)2] [4-HOpa = N-4-hydroxyphenyloxamate; M= Mn2+ (1) or Co2+ (2)], exhibit field-induced slow magnetic relaxation. A Bottleneck Process is observed throughout the temperature range of 2-20 K for 1, while for 2, it dominates only at low temperatures (2-4 K). Additionally, the Raman Process [n = 6.9(2)] is responsible for an increase in the relaxation time at higher temperatures to 2.