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Rob Ameloot - One of the best experts on this subject based on the ideXlab platform.
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Chemical Vapour Deposition of zeolitic imidazolate framework thin films
Nature Materials, 2016Co-Authors: Ivo Stassen, Gianluca Grenci, Willem Vanderlinden, Steven De Feyter, Paolo Falcaro, Mark Styles, Hans van Gorp, Philippe Vereecken, Rob AmelootAbstract:Integrating metal–organic frameworks (MOFs) in microelectronics has disruptive potential because of the unique properties of these microporous crystalline materials. Suitable film Deposition methods are crucial to leverage MOFs in this field. Conventional solvent-based procedures, typically adapted from powder preparation routes, are incompatible with nanofabrication because of corrosion and contamination risks. We demonstrate a Chemical Vapour Deposition process (MOF-CVD) that enables high-quality films of ZIF-8, a prototypical MOF material, with a uniform and controlled thickness, even on high-aspect-ratio features. Furthermore, we demonstrate how MOF-CVD enables previously inaccessible routes such as lift-off patterning and depositing MOF films on fragile features. The compatibility of MOF-CVD with existing infrastructure, both in research and production facilities, will greatly facilitate MOF integration in microelectronics. MOF-CVD is the first Vapour-phase Deposition method for any type of microporous crystalline network solid and marks a milestone in processing such materials. The authors show that thin films of microporous metal–organic frameworks can be deposited on a broad range of substrates and on high-aspect-ratio features by means of Chemical Vapour Deposition.
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Chemical Vapour Deposition of zeolitic imidazolate framework thin films
Nature materials, 2015Co-Authors: Ivo Stassen, Mark J. Styles, Gianluca Grenci, Hans Van Gorp, Willem Vanderlinden, Steven De Feyter, Paolo Falcaro, Dirk De Vos, Philippe M. Vereecken, Rob AmelootAbstract:The authors show that thin films of microporous metal–organic frameworks can be deposited on a broad range of substrates and on high-aspect-ratio features by means of Chemical Vapour Deposition.
J.a. Chavez-carvayar - One of the best experts on this subject based on the ideXlab platform.
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Acrylic-acid route for the fast Chemical Vapour Deposition of titanium carbide films
Journal of Materials Processing Technology, 1997Co-Authors: Susana López, S. Granados, Stephen Muhl, Octavio Alvarez-fregoso, J.a. Chavez-carvayarAbstract:Abstract Titanium carbide, TiC, possesses remarkable thermal stability (melting point 3067°C), is one of the hardest materials known (9–10 Mohs) and is essentially unaffected by acids and aqueous alkali. These properties make TiC a very useful material for such diverse applications as first-wall coatings for fusion reactors, protective coatings for cuttings tools, and low-friction coating for bearings. With present industrial technology, coatings can be deposited by Chemical Vapour Deposition and plasma-associated Chemical Vapour Deposition from hydrogen, methane and titanium tetrachloride, but these methods require high temperatures, in excess of 1200°C. In this work, a fast Chemical Vapour Deposition (CVD) method for preparing thin films of TiC using acrylic acid and titanium tetrachloride at 800°C is reported.
Ivo Stassen - One of the best experts on this subject based on the ideXlab platform.
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Chemical Vapour Deposition of zeolitic imidazolate framework thin films
Nature Materials, 2016Co-Authors: Ivo Stassen, Gianluca Grenci, Willem Vanderlinden, Steven De Feyter, Paolo Falcaro, Mark Styles, Hans van Gorp, Philippe Vereecken, Rob AmelootAbstract:Integrating metal–organic frameworks (MOFs) in microelectronics has disruptive potential because of the unique properties of these microporous crystalline materials. Suitable film Deposition methods are crucial to leverage MOFs in this field. Conventional solvent-based procedures, typically adapted from powder preparation routes, are incompatible with nanofabrication because of corrosion and contamination risks. We demonstrate a Chemical Vapour Deposition process (MOF-CVD) that enables high-quality films of ZIF-8, a prototypical MOF material, with a uniform and controlled thickness, even on high-aspect-ratio features. Furthermore, we demonstrate how MOF-CVD enables previously inaccessible routes such as lift-off patterning and depositing MOF films on fragile features. The compatibility of MOF-CVD with existing infrastructure, both in research and production facilities, will greatly facilitate MOF integration in microelectronics. MOF-CVD is the first Vapour-phase Deposition method for any type of microporous crystalline network solid and marks a milestone in processing such materials. The authors show that thin films of microporous metal–organic frameworks can be deposited on a broad range of substrates and on high-aspect-ratio features by means of Chemical Vapour Deposition.
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Chemical Vapour Deposition of zeolitic imidazolate framework thin films
Nature materials, 2015Co-Authors: Ivo Stassen, Mark J. Styles, Gianluca Grenci, Hans Van Gorp, Willem Vanderlinden, Steven De Feyter, Paolo Falcaro, Dirk De Vos, Philippe M. Vereecken, Rob AmelootAbstract:The authors show that thin films of microporous metal–organic frameworks can be deposited on a broad range of substrates and on high-aspect-ratio features by means of Chemical Vapour Deposition.
Ivan P Parkin - One of the best experts on this subject based on the ideXlab platform.
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Chemical Vapour Deposition of titanium chalcogenides and pnictides and tungsten oxide thin films
NEW J CHEM, 2006Co-Authors: Ivan P ParkinAbstract:This perspective article focuses on the formation of titanium chalcogenides and pnictides and tungsten oxides by Chemical Vapour Deposition. Attention is focused on the role of the precursor and on the different microstructures that can be produced under different conditions.
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Chemical Vapour Deposition of crystalline thin films of tantalum phosphide
Materials Letters, 2003Co-Authors: Christopher S. Blackman, Ivan P Parkin, Claire J. Carmalt, Shane A. O'neill, Kieran C. Molloy, Leonardo ApostolicoAbstract:Tantalum phosphide coatings were prepared by Chemical Vapour Deposition reaction of TaCl5 and PH2Cy at 350-500 degreesC. The films are hard, stable to corrosive environments and show reflection properties in the infrared. (C) 2002 Elsevier Science B.V. All rights reserved.
Paolo Falcaro - One of the best experts on this subject based on the ideXlab platform.
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Chemical Vapour Deposition of zeolitic imidazolate framework thin films
Nature Materials, 2016Co-Authors: Ivo Stassen, Gianluca Grenci, Willem Vanderlinden, Steven De Feyter, Paolo Falcaro, Mark Styles, Hans van Gorp, Philippe Vereecken, Rob AmelootAbstract:Integrating metal–organic frameworks (MOFs) in microelectronics has disruptive potential because of the unique properties of these microporous crystalline materials. Suitable film Deposition methods are crucial to leverage MOFs in this field. Conventional solvent-based procedures, typically adapted from powder preparation routes, are incompatible with nanofabrication because of corrosion and contamination risks. We demonstrate a Chemical Vapour Deposition process (MOF-CVD) that enables high-quality films of ZIF-8, a prototypical MOF material, with a uniform and controlled thickness, even on high-aspect-ratio features. Furthermore, we demonstrate how MOF-CVD enables previously inaccessible routes such as lift-off patterning and depositing MOF films on fragile features. The compatibility of MOF-CVD with existing infrastructure, both in research and production facilities, will greatly facilitate MOF integration in microelectronics. MOF-CVD is the first Vapour-phase Deposition method for any type of microporous crystalline network solid and marks a milestone in processing such materials. The authors show that thin films of microporous metal–organic frameworks can be deposited on a broad range of substrates and on high-aspect-ratio features by means of Chemical Vapour Deposition.
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Chemical Vapour Deposition of zeolitic imidazolate framework thin films
Nature materials, 2015Co-Authors: Ivo Stassen, Mark J. Styles, Gianluca Grenci, Hans Van Gorp, Willem Vanderlinden, Steven De Feyter, Paolo Falcaro, Dirk De Vos, Philippe M. Vereecken, Rob AmelootAbstract:The authors show that thin films of microporous metal–organic frameworks can be deposited on a broad range of substrates and on high-aspect-ratio features by means of Chemical Vapour Deposition.