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Shengquan Wang - One of the best experts on this subject based on the ideXlab platform.
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pmc _ infty infinite order scale setting method using the principle of maximum Conformality and preserving the intrinsic Conformality
arXiv: High Energy Physics - Phenomenology, 2021Co-Authors: Leonardo Di Giustino, Stanley J Brodsky, Shengquan WangAbstract:We show results for Thrust and C-parameter in $e^+ e^-$ annihilation to 3 jets obtained using the recently developed new method for eliminating the scale ambiguity and the scheme dependence in pQCD namely the Infinite-Order Scale-Setting method using the Principle of Maximum Conformality (PMC$_\infty$). This method preserves an important underlying property of gauge theories: intrinsic Conformality (iCF). It leads to a remarkably efficient method to eliminate the conventional renormalization scale ambiguity at any order in pQCD. A comparison with Conventional Scale Setting method (CSS) is also shown.
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infinite order scale setting using the principle of maximum Conformality a remarkably efficient method for eliminating renormalization scale ambiguities for perturbative qcd
Physical Review D, 2020Co-Authors: Leonardo Di Giustino, Stanley J Brodsky, Shengquan WangAbstract:We identify a property of renormalizable SU(N)/U(1) gauge theories, intrinsic Conformality (iCF), which underlies the scale invariance of physical observables and leads to a remarkably efficient method to solve the conventional renormalization scale ambiguity at every order in perturbative QCD (pQCD): the ${\mathrm{PMC}}_{\ensuremath{\infty}}$. This new method reflects the underlying conformal properties displayed by pQCD at next-to-next-to-leading order, eliminates the scheme dependence of pQCD predictions, and is consistent with the general properties of the principle of maximum Conformality (PMC). We introduce a new method to identify conformal and $\ensuremath{\beta}$-terms which can be applied from either a numerical or an analytical calculations. We illustrate the ${\mathrm{PMC}}_{\ensuremath{\infty}}$ for the thrust and C-parameter distributions in ${e}^{+}{e}^{\ensuremath{-}}$ annihilation and then show how to apply this new method to general observables in QCD. We point out how the implementation of the ${\mathrm{PMC}}_{\ensuremath{\infty}}$ can significantly improve the precision of pQCD predictions; its implementation in a multiloop analysis also simplifies the calculation of higher order corrections in a general renormalizable gauge theory.
Harm C. M. Knoops - One of the best experts on this subject based on the ideXlab platform.
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film Conformality and extracted recombination probabilities of o atoms during plasma assisted atomic layer deposition of sio2 tio2 al2o3 and hfo2
Journal of Physical Chemistry C, 2019Co-Authors: Karsten Arts, Riikka L Puurunen, Mikko Utriainen, Wilhelmus M. M. Kessels, Harm C. M. KnoopsAbstract:Surface recombination of plasma radicals is generally considered to limit film Conformality during plasma-assisted atomic layer deposition (ALD). Here, we experimentally studied film penetration in...
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Sticking probabilities of H2O and Al(CH3)3 during atomic layer deposition of Al2O3 extracted from their impact on film Conformality
Journal of Vacuum Science & Technology A, 2019Co-Authors: Karsten Arts, Feng Gao, Riikka L Puurunen, Vincent Vandalon, Mikko Utriainen, Wilhelmus M. M. Kessels, Harm C. M. KnoopsAbstract:The Conformality of a film grown by atomic layer deposition (ALD) is strongly affected by the reactivities of the precursor and coreactant, which can be expressed in terms of their sticking probabilities toward the surface. We show that the leading front of the thickness profile in high-aspect-ratio structures gives direct information on the sticking probabilities of the reactants under most conditions. The slope of the front has been used to determine the sticking probabilities of Al(CH3)3 and H2O during ALD of Al2O3. The determined values are (0.5–2) × 10−3 for Al(CH3)3 and (0.8–2) × 10−4 for H2O at a set-point temperature of 275 °C, corresponding to an estimated substrate temperature of ∼220 °C. Additionally, the thickness profiles reveal soft-saturation behavior during the H2O step, most dominantly at reduced temperatures, which can limit the Conformality of Al2O3 grown by ALD. This work thus provides insights regarding quantitative information on sticking probabilities and Conformality during ALD, which is valuable for gaining a deeper understanding of ALD kinetics.
Gabriele Sicuro - One of the best experts on this subject based on the ideXlab platform.
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criticality and Conformality in the random dimer model
Physical Review E, 2021Co-Authors: Sergio Caracciolo, R Fabbricatore, Marco Gherardi, Raffaele Marino, Giorgio Parisi, Gabriele SicuroAbstract:In critical systems, the effect of a localized perturbation affects points that are arbitrarily far from the perturbation location. In this paper, we study the effect of localized perturbations on the solution of the random dimer problem in two dimensions. By means of an accurate numerical analysis, we show that a local perturbation of the optimal covering induces an excitation whose size is extensive with finite probability. We compute the fractal dimension of the excitations and scaling exponents. In particular, excitations in random dimer problems on nonbipartite lattices have the same statistical properties of domain walls in spin glass. Excitations produced in bipartite lattices, instead, are compatible with a loop-erased self-avoiding random walk process. In both cases, we find evidence of conformal invariance of the excitations that is compatible with ${\mathrm{SLE}}_{\ensuremath{\kappa}}$ with parameter $\ensuremath{\kappa}$ depending on the bipartiteness of the underlying lattice only.
Riikka L Puurunen - One of the best experts on this subject based on the ideXlab platform.
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film Conformality and extracted recombination probabilities of o atoms during plasma assisted atomic layer deposition of sio2 tio2 al2o3 and hfo2
Journal of Physical Chemistry C, 2019Co-Authors: Karsten Arts, Riikka L Puurunen, Mikko Utriainen, Wilhelmus M. M. Kessels, Harm C. M. KnoopsAbstract:Surface recombination of plasma radicals is generally considered to limit film Conformality during plasma-assisted atomic layer deposition (ALD). Here, we experimentally studied film penetration in...
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Sticking probabilities of H2O and Al(CH3)3 during atomic layer deposition of Al2O3 extracted from their impact on film Conformality
Journal of Vacuum Science & Technology A, 2019Co-Authors: Karsten Arts, Feng Gao, Riikka L Puurunen, Vincent Vandalon, Mikko Utriainen, Wilhelmus M. M. Kessels, Harm C. M. KnoopsAbstract:The Conformality of a film grown by atomic layer deposition (ALD) is strongly affected by the reactivities of the precursor and coreactant, which can be expressed in terms of their sticking probabilities toward the surface. We show that the leading front of the thickness profile in high-aspect-ratio structures gives direct information on the sticking probabilities of the reactants under most conditions. The slope of the front has been used to determine the sticking probabilities of Al(CH3)3 and H2O during ALD of Al2O3. The determined values are (0.5–2) × 10−3 for Al(CH3)3 and (0.8–2) × 10−4 for H2O at a set-point temperature of 275 °C, corresponding to an estimated substrate temperature of ∼220 °C. Additionally, the thickness profiles reveal soft-saturation behavior during the H2O step, most dominantly at reduced temperatures, which can limit the Conformality of Al2O3 grown by ALD. This work thus provides insights regarding quantitative information on sticking probabilities and Conformality during ALD, which is valuable for gaining a deeper understanding of ALD kinetics.
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nucleation and Conformality of iridium and iridium oxide thin films grown by atomic layer deposition
Langmuir, 2016Co-Authors: Miika Mattinen, Mikko Ritala, Jani Hamalainen, Feng Gao, Pasi Jalkanen, Kenichiro Mizohata, J Raisanen, Riikka L Puurunen, Markku LeskelaAbstract:Nucleation and Conformality are important issues, when depositing thin films for demanding applications. In this study, iridium and iridium dioxide (IrO2) films were deposited by atomic layer deposition (ALD), using five different processes. Different reactants, namely, O2, air, consecutive O2 and H2 (O2 + H2), and consecutive O3 and H2 (O3 + H2) pulses were used with iridium acetylacetonate [Ir(acac)3] to deposit Ir, while IrO2 was deposited using Ir(acac)3 and O3. Nucleation was studied using a combination of methods for film thickness and morphology evaluation. In Conformality studies, microscopic lateral high-aspect-ratio (LHAR) test structures, specifically designed for accurate and versatile Conformality testing of ALD films, were used. The order of nucleation, from the fastest to the slowest, was O2 + H2 > air ≈ O2 > O3 > O3 + H2, whereas the order of Conformality, from the best to the worst, was O3 + H2 > O2 + H2 > O2 > O3. In the O3 process, a change in film composition from IrO2 to metallic Ir w...
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microscopic silicon based lateral high aspect ratio structures for thin film Conformality analysis
Journal of Vacuum Science and Technology, 2015Co-Authors: Feng Gao, Sanna Arpiainen, Riikka L PuurunenAbstract:Film Conformality is one of the major drivers for the interest in atomic layer deposition (ALD) processes. This work presents new silicon-based microscopic lateral high-aspect-ratio (LHAR) test structures for the analysis of the Conformality of thin films deposited by ALD and by other chemical vapor deposition means. The microscopic LHAR structures consist of a lateral cavity inside silicon with a roof supported by pillars. The cavity length (e.g., 20–5000 μm) and cavity height (e.g., 200–1000 nm) can be varied, giving aspect ratios of, e.g., 20:1 to 25 000:1. Film Conformality can be analyzed with the microscopic LHAR by several means, as demonstrated for the ALD Al2O3 and TiO2 processes from Me3Al/H2O and TiCl4/H2O. The microscopic LHAR test structures introduced in this work expose a new parameter space for thin film Conformality investigations expected to prove useful in the development, tuning and modeling of ALD and other chemical vapor deposition processes.
Leonardo Di Giustino - One of the best experts on this subject based on the ideXlab platform.
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pmc _ infty infinite order scale setting method using the principle of maximum Conformality and preserving the intrinsic Conformality
arXiv: High Energy Physics - Phenomenology, 2021Co-Authors: Leonardo Di Giustino, Stanley J Brodsky, Shengquan WangAbstract:We show results for Thrust and C-parameter in $e^+ e^-$ annihilation to 3 jets obtained using the recently developed new method for eliminating the scale ambiguity and the scheme dependence in pQCD namely the Infinite-Order Scale-Setting method using the Principle of Maximum Conformality (PMC$_\infty$). This method preserves an important underlying property of gauge theories: intrinsic Conformality (iCF). It leads to a remarkably efficient method to eliminate the conventional renormalization scale ambiguity at any order in pQCD. A comparison with Conventional Scale Setting method (CSS) is also shown.
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infinite order scale setting using the principle of maximum Conformality a remarkably efficient method for eliminating renormalization scale ambiguities for perturbative qcd
Physical Review D, 2020Co-Authors: Leonardo Di Giustino, Stanley J Brodsky, Shengquan WangAbstract:We identify a property of renormalizable SU(N)/U(1) gauge theories, intrinsic Conformality (iCF), which underlies the scale invariance of physical observables and leads to a remarkably efficient method to solve the conventional renormalization scale ambiguity at every order in perturbative QCD (pQCD): the ${\mathrm{PMC}}_{\ensuremath{\infty}}$. This new method reflects the underlying conformal properties displayed by pQCD at next-to-next-to-leading order, eliminates the scheme dependence of pQCD predictions, and is consistent with the general properties of the principle of maximum Conformality (PMC). We introduce a new method to identify conformal and $\ensuremath{\beta}$-terms which can be applied from either a numerical or an analytical calculations. We illustrate the ${\mathrm{PMC}}_{\ensuremath{\infty}}$ for the thrust and C-parameter distributions in ${e}^{+}{e}^{\ensuremath{-}}$ annihilation and then show how to apply this new method to general observables in QCD. We point out how the implementation of the ${\mathrm{PMC}}_{\ensuremath{\infty}}$ can significantly improve the precision of pQCD predictions; its implementation in a multiloop analysis also simplifies the calculation of higher order corrections in a general renormalizable gauge theory.