The Experts below are selected from a list of 360 Experts worldwide ranked by ideXlab platform

Michael J Brett - One of the best experts on this subject based on the ideXlab platform.

  • surface area characterization of obliquely Deposited Metal oxide nanostructured thin films
    Langmuir, 2010
    Co-Authors: Kathleen M Krause, M T Taschuk, Kenneth D Harris, David A Rider, Nicholas G Wakefield, Jeremy C Sit, Jillian M Buriak, Matthias Thommes, Michael J Brett
    Abstract:

    The glancing angle deposition (GLAD) technique is used to fabricate nanostructured thin films with high surface area. Quantifying this property is important for optimizing GLAD-based device performance. Our group has used high-sensitivity krypton gas adsorption and the complementary technique of cyclic voltammetry to measure surface area as a function of deposition angle, thickness, and morphological characteristics for several Metal oxide thin films. In this work, we studied amorphous titanium dioxide (TiO2), amorphous silicon dioxide (SiO2), and polycrystalline indium tin oxide (ITO) nanostructures with vertical and helical post morphologies over a range of oblique deposition angles from 0 to 86°. Krypton gas sorption isotherms, evaluated using the Brunauer−Emmettt−Teller (BET) method, revealed maximum surface area enhancements of 880 ± 110, 980 ± 125, and 210 ± 30 times the footprint area (equivalently 300 ± 40, 570 ± 70, and 50 ± 6 m2 g−1) for vertical posts TiO2, SiO2, and ITO. We also applied the cy...

  • surface area characterization of obliquely Deposited Metal oxide nanostructured thin films
    Langmuir, 2010
    Co-Authors: Kathleen M Krause, M T Taschuk, Kenneth D Harris, David A Rider, Nicholas G Wakefield, Jeremy C Sit, Jillian M Buriak, Matthias Thommes, Michael J Brett
    Abstract:

    The glancing angle deposition (GLAD) technique is used to fabricate nanostructured thin films with high surface area. Quantifying this property is important for optimizing GLAD-based device perform...

Kathleen M Krause - One of the best experts on this subject based on the ideXlab platform.

  • surface area characterization of obliquely Deposited Metal oxide nanostructured thin films
    Langmuir, 2010
    Co-Authors: Kathleen M Krause, M T Taschuk, Kenneth D Harris, David A Rider, Nicholas G Wakefield, Jeremy C Sit, Jillian M Buriak, Matthias Thommes, Michael J Brett
    Abstract:

    The glancing angle deposition (GLAD) technique is used to fabricate nanostructured thin films with high surface area. Quantifying this property is important for optimizing GLAD-based device performance. Our group has used high-sensitivity krypton gas adsorption and the complementary technique of cyclic voltammetry to measure surface area as a function of deposition angle, thickness, and morphological characteristics for several Metal oxide thin films. In this work, we studied amorphous titanium dioxide (TiO2), amorphous silicon dioxide (SiO2), and polycrystalline indium tin oxide (ITO) nanostructures with vertical and helical post morphologies over a range of oblique deposition angles from 0 to 86°. Krypton gas sorption isotherms, evaluated using the Brunauer−Emmettt−Teller (BET) method, revealed maximum surface area enhancements of 880 ± 110, 980 ± 125, and 210 ± 30 times the footprint area (equivalently 300 ± 40, 570 ± 70, and 50 ± 6 m2 g−1) for vertical posts TiO2, SiO2, and ITO. We also applied the cy...

  • surface area characterization of obliquely Deposited Metal oxide nanostructured thin films
    Langmuir, 2010
    Co-Authors: Kathleen M Krause, M T Taschuk, Kenneth D Harris, David A Rider, Nicholas G Wakefield, Jeremy C Sit, Jillian M Buriak, Matthias Thommes, Michael J Brett
    Abstract:

    The glancing angle deposition (GLAD) technique is used to fabricate nanostructured thin films with high surface area. Quantifying this property is important for optimizing GLAD-based device perform...

Jillian M Buriak - One of the best experts on this subject based on the ideXlab platform.

  • surface area characterization of obliquely Deposited Metal oxide nanostructured thin films
    Langmuir, 2010
    Co-Authors: Kathleen M Krause, M T Taschuk, Kenneth D Harris, David A Rider, Nicholas G Wakefield, Jeremy C Sit, Jillian M Buriak, Matthias Thommes, Michael J Brett
    Abstract:

    The glancing angle deposition (GLAD) technique is used to fabricate nanostructured thin films with high surface area. Quantifying this property is important for optimizing GLAD-based device performance. Our group has used high-sensitivity krypton gas adsorption and the complementary technique of cyclic voltammetry to measure surface area as a function of deposition angle, thickness, and morphological characteristics for several Metal oxide thin films. In this work, we studied amorphous titanium dioxide (TiO2), amorphous silicon dioxide (SiO2), and polycrystalline indium tin oxide (ITO) nanostructures with vertical and helical post morphologies over a range of oblique deposition angles from 0 to 86°. Krypton gas sorption isotherms, evaluated using the Brunauer−Emmettt−Teller (BET) method, revealed maximum surface area enhancements of 880 ± 110, 980 ± 125, and 210 ± 30 times the footprint area (equivalently 300 ± 40, 570 ± 70, and 50 ± 6 m2 g−1) for vertical posts TiO2, SiO2, and ITO. We also applied the cy...

  • surface area characterization of obliquely Deposited Metal oxide nanostructured thin films
    Langmuir, 2010
    Co-Authors: Kathleen M Krause, M T Taschuk, Kenneth D Harris, David A Rider, Nicholas G Wakefield, Jeremy C Sit, Jillian M Buriak, Matthias Thommes, Michael J Brett
    Abstract:

    The glancing angle deposition (GLAD) technique is used to fabricate nanostructured thin films with high surface area. Quantifying this property is important for optimizing GLAD-based device perform...

C D Lokhande - One of the best experts on this subject based on the ideXlab platform.

  • recent status of chemical bath Deposited Metal chalcogenide and Metal oxide thin films
    Current Applied Physics, 2011
    Co-Authors: S M Pawar, B S Pawar, J H Kim, Ohshim Joo, C D Lokhande
    Abstract:

    Abstract Presently nanocrystalline materials have opened a new chapter in the field of electronic applications, since material properties could be changed by changing the crystallite size and/or thickness of the film. The synthesis of nanocrystalline Metal chalcogenide and Metal oxide thin films by chemical bath deposition (CBD) method is currently attracting considerable attention as it is relatively inexpensive, simple and convenient for large area deposition. Using CBD and modified CBD (which is also known as successive ionic layer adsorption and reaction, SILAR) methods, a large number of thin films have been Deposited. This review is on the status of synthesizing thin films of Metal chalcogenide and Metal oxides by CBD and SILAR. Properties and applications of the thin films are also summarized.

Younan Xia - One of the best experts on this subject based on the ideXlab platform.

  • shape controlled synthesis of colloidal Metal nanocrystals by replicating the surface atomic structure on the seed
    Advanced Materials, 2018
    Co-Authors: Kyle D. Gilroy, Younan Xia, Ming Zhao, Shuifen Xie, Xuan Yang, Dong Qin
    Abstract:

    Controlling the surface structure of Metal nanocrystals while maximizing the utilization efficiency of the atoms is a subject of great importance. An emerging strategy that has captured the attention of many research groups involves the conformal deposition of one Metal as an ultrathin shell (typically 1-6 atomic layers) onto the surface of a seed made of another Metal and covered by a set of well-defined facets. This approach forces the Deposited Metal to faithfully replicate the surface atomic structure of the seed while at the same time serving to minimize the usage of the Deposited Metal. Here, the recent progress in this area is discussed and analyzed by focusing on the synthetic and mechanistic requisites necessary for achieving surface atomic replication of precious Metals. Other related methods are discussed, including the one-pot synthesis, electrochemical deposition, and skin-layer formation through thermal annealing. To close, some of the synergies that arise when the thickness of the Deposited shell is decreased controllably down to a few atomic layers are highlighted, along with how the control of thickness can be used to uncover the optimal physicochemical properties necessary for boosting the performance toward a range of catalytic reactions.