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Zhengxiu Fan - One of the best experts on this subject based on the ideXlab platform.

  • Controllable nanostructure and optical properties of ZrO2 thin films by Glancing Angle deposition
    Applied Physics A, 2012
    Co-Authors: Sumei Wang, Zhengxiu Fan, Xurong Zhao, Jianda Shao
    Abstract:

    In this paper, nanostructured ZrO2 films were prepared by electron beam evaporation with the Glancing Angle deposition (GLAD) technique. Columnar films with voids in between formed owing to the self-shadowing effect and the limited diffusion of deposited atoms. The microstructure evolves from slanted columnar structure to helical and pillar structures as the substrate rotational speed increases. The diameter of the columns is in the range of 30–50 nm. A higher rotational speed favors a larger nodule size and a greater surface roughness. Due to the porous structure, the refractive index n of GLAD ZrO2 films varies from 1.75 to 1.80, lower than that of bulk material. A maximum value of birefringence (Δn=0.03) is obtained in a slanted columnar structure, and the relationship between birefringence and microstructure orientation is discussed. Our results demonstrate that Glancing Angle deposition is a feasible approach for designing the nanostructure and optical properties of thin films.

  • Graded Index Broadband Antireflection Coating by Glancing Angle Deposition and Its Application in Laser System
    Optical Interference Coatings, 2007
    Co-Authors: Zicai Shen, Jianda Shao, Zhengxiu Fan
    Abstract:

    ZrO2 and SiO2 broadband antireflection (AR) coatings are prepared by Glancing Angle deposition. These AR coatings exhibiting excellent optical properties and high damage threshold is applicable to used in high-energy laser system.

  • Glancing Angle deposited thin films and their applications in laser systems
    Laser-Induced Damage in Optical Materials: 2006, 2006
    Co-Authors: Jianda Shao, Sumei Wang, Zicai Shen, Zhengxiu Fan
    Abstract:

    ABSTRACT Glancing Angle deposition (GLAD) is a novel way to produce nanostructural thin films with engineered porosity, and it is possible to make new optical components in laser systems. In this paper, ZrO 2 , SiO 2 and TiO 2 thin films were grown by electron beam evaporation with GLAD technique. Different mi crostructures were observed. The optical properties, such as transmittance and refractive index were characterized. As application of the GLAD thin films, several optical components were designed and fabricated, such as graded-index rugate filter, br oadband antireflection coating and phase retardater for visible and near infrared laser systems. Finally, laser-induced damage threshold were measured and discussed. Key Words: thin films; Glancing Angle deposition; nanostructure; optical component; laser-induced damage threshold 1. INTRODUCTION Recently, Glancing Angle deposition (GLAD) technique has attracted considerable attention for de signing the novel morphology of the nanostructured films [1, 2]. This technique employs substrate inclination and substrate rotation, which were driven by two step motors controlled by a computerized program [3, 4]. As a result of enhanced shadowing effect and limited atom diffusion during film growth, the GLAD thin films have high porosity and anisotropic growth behavior . GLAD technique has been shown to be capable of producing films with various microstructures, such as vertical columns [5], helix [6], which is hardly obtained from the normal incidence vapor deposition. Thus, many novel physical and chemical properties of thin films can also be easily engineered. In this paper, ZrO

  • Structural and optical properties of nanostructured TiO2 thin films fabricated by Glancing Angle deposition
    Journal of Alloys and Compounds, 2006
    Co-Authors: Sumei Wang, Jianda Shao, Guodong Xia, Zhengxiu Fan
    Abstract:

    TiO2 films deposited by electron beam evaporation with Glancing Angle deposition (GLAD) technique were reported. The influence of flux Angle on the surface morphology and the microstructure was investigated by scanning electron microscopy. The GLAD TiO2 films are anisotropy with highly orientated nanostructure of the slanted columns. With the increase of flux Angle, refractive index and packing density decrease. This is caused by the shadowing effect dominating film growth. The anisotropic structure of TiO2 films results in optical birefringence, which reaches its maximum at the flux Angle alpha = 65 degrees. The maximum birefringence of GLAD TiO2 films is higher than that of common bulk materials. It is suggested that Glancing Angle deposition may offer an effective method to obtain tailorable refractive index and birefringence in a large continuous range. (c) 2006 Elsevier B.V. All rights reserved.

  • ZrO2 films with variable refractive index by Glancing Angle deposition
    Chinese Optics Letters, 2006
    Co-Authors: Sumei Wang, Jianda Shao, Degang Deng, Zhengxiu Fan
    Abstract:

    When optical film is deposited at oblique Angle incidences, the film becomes porously, and the film effective refractive index will decrease. Six porous ZrO2 films are fabricated by the Glancing Angle deposition (GLAD) technique with the different incidence Angles. By changing the substrate tilt Angle from 0 to 85 degrees, the film refractive index varies from 1.92 to 1.27.

Jianda Shao - One of the best experts on this subject based on the ideXlab platform.

  • broadband antireflection film by Glancing Angle deposition
    Optical Materials, 2021
    Co-Authors: Cao Feng, Jianguo Wang, Weili Zhang, Shijie Liu, Jianda Shao
    Abstract:

    Abstract A broadband antireflection film was prepared with SiO2 by Glancing Angle deposition. The refractive index of the SiO2 film was tuned from 1.15 to 1.45 by adjusting the deposition Angle. A novel broadband antireflection film was designed with the graded index film. The average reflectivity of antireflection film is less than 0.41% between 400 nm and 1800 nm wavelength range at 0° incident Angle.

  • Controllable nanostructure and optical properties of ZrO2 thin films by Glancing Angle deposition
    Applied Physics A, 2012
    Co-Authors: Sumei Wang, Zhengxiu Fan, Xurong Zhao, Jianda Shao
    Abstract:

    In this paper, nanostructured ZrO2 films were prepared by electron beam evaporation with the Glancing Angle deposition (GLAD) technique. Columnar films with voids in between formed owing to the self-shadowing effect and the limited diffusion of deposited atoms. The microstructure evolves from slanted columnar structure to helical and pillar structures as the substrate rotational speed increases. The diameter of the columns is in the range of 30–50 nm. A higher rotational speed favors a larger nodule size and a greater surface roughness. Due to the porous structure, the refractive index n of GLAD ZrO2 films varies from 1.75 to 1.80, lower than that of bulk material. A maximum value of birefringence (Δn=0.03) is obtained in a slanted columnar structure, and the relationship between birefringence and microstructure orientation is discussed. Our results demonstrate that Glancing Angle deposition is a feasible approach for designing the nanostructure and optical properties of thin films.

  • Graded Index Broadband Antireflection Coating by Glancing Angle Deposition and Its Application in Laser System
    Optical Interference Coatings, 2007
    Co-Authors: Zicai Shen, Jianda Shao, Zhengxiu Fan
    Abstract:

    ZrO2 and SiO2 broadband antireflection (AR) coatings are prepared by Glancing Angle deposition. These AR coatings exhibiting excellent optical properties and high damage threshold is applicable to used in high-energy laser system.

  • Glancing Angle deposited thin films and their applications in laser systems
    Laser-Induced Damage in Optical Materials: 2006, 2006
    Co-Authors: Jianda Shao, Sumei Wang, Zicai Shen, Zhengxiu Fan
    Abstract:

    ABSTRACT Glancing Angle deposition (GLAD) is a novel way to produce nanostructural thin films with engineered porosity, and it is possible to make new optical components in laser systems. In this paper, ZrO 2 , SiO 2 and TiO 2 thin films were grown by electron beam evaporation with GLAD technique. Different mi crostructures were observed. The optical properties, such as transmittance and refractive index were characterized. As application of the GLAD thin films, several optical components were designed and fabricated, such as graded-index rugate filter, br oadband antireflection coating and phase retardater for visible and near infrared laser systems. Finally, laser-induced damage threshold were measured and discussed. Key Words: thin films; Glancing Angle deposition; nanostructure; optical component; laser-induced damage threshold 1. INTRODUCTION Recently, Glancing Angle deposition (GLAD) technique has attracted considerable attention for de signing the novel morphology of the nanostructured films [1, 2]. This technique employs substrate inclination and substrate rotation, which were driven by two step motors controlled by a computerized program [3, 4]. As a result of enhanced shadowing effect and limited atom diffusion during film growth, the GLAD thin films have high porosity and anisotropic growth behavior . GLAD technique has been shown to be capable of producing films with various microstructures, such as vertical columns [5], helix [6], which is hardly obtained from the normal incidence vapor deposition. Thus, many novel physical and chemical properties of thin films can also be easily engineered. In this paper, ZrO

  • Structural and optical properties of nanostructured TiO2 thin films fabricated by Glancing Angle deposition
    Journal of Alloys and Compounds, 2006
    Co-Authors: Sumei Wang, Jianda Shao, Guodong Xia, Zhengxiu Fan
    Abstract:

    TiO2 films deposited by electron beam evaporation with Glancing Angle deposition (GLAD) technique were reported. The influence of flux Angle on the surface morphology and the microstructure was investigated by scanning electron microscopy. The GLAD TiO2 films are anisotropy with highly orientated nanostructure of the slanted columns. With the increase of flux Angle, refractive index and packing density decrease. This is caused by the shadowing effect dominating film growth. The anisotropic structure of TiO2 films results in optical birefringence, which reaches its maximum at the flux Angle alpha = 65 degrees. The maximum birefringence of GLAD TiO2 films is higher than that of common bulk materials. It is suggested that Glancing Angle deposition may offer an effective method to obtain tailorable refractive index and birefringence in a large continuous range. (c) 2006 Elsevier B.V. All rights reserved.

Sumei Wang - One of the best experts on this subject based on the ideXlab platform.

  • Controllable nanostructure and optical properties of ZrO2 thin films by Glancing Angle deposition
    Applied Physics A, 2012
    Co-Authors: Sumei Wang, Zhengxiu Fan, Xurong Zhao, Jianda Shao
    Abstract:

    In this paper, nanostructured ZrO2 films were prepared by electron beam evaporation with the Glancing Angle deposition (GLAD) technique. Columnar films with voids in between formed owing to the self-shadowing effect and the limited diffusion of deposited atoms. The microstructure evolves from slanted columnar structure to helical and pillar structures as the substrate rotational speed increases. The diameter of the columns is in the range of 30–50 nm. A higher rotational speed favors a larger nodule size and a greater surface roughness. Due to the porous structure, the refractive index n of GLAD ZrO2 films varies from 1.75 to 1.80, lower than that of bulk material. A maximum value of birefringence (Δn=0.03) is obtained in a slanted columnar structure, and the relationship between birefringence and microstructure orientation is discussed. Our results demonstrate that Glancing Angle deposition is a feasible approach for designing the nanostructure and optical properties of thin films.

  • Glancing Angle deposited thin films and their applications in laser systems
    Laser-Induced Damage in Optical Materials: 2006, 2006
    Co-Authors: Jianda Shao, Sumei Wang, Zicai Shen, Zhengxiu Fan
    Abstract:

    ABSTRACT Glancing Angle deposition (GLAD) is a novel way to produce nanostructural thin films with engineered porosity, and it is possible to make new optical components in laser systems. In this paper, ZrO 2 , SiO 2 and TiO 2 thin films were grown by electron beam evaporation with GLAD technique. Different mi crostructures were observed. The optical properties, such as transmittance and refractive index were characterized. As application of the GLAD thin films, several optical components were designed and fabricated, such as graded-index rugate filter, br oadband antireflection coating and phase retardater for visible and near infrared laser systems. Finally, laser-induced damage threshold were measured and discussed. Key Words: thin films; Glancing Angle deposition; nanostructure; optical component; laser-induced damage threshold 1. INTRODUCTION Recently, Glancing Angle deposition (GLAD) technique has attracted considerable attention for de signing the novel morphology of the nanostructured films [1, 2]. This technique employs substrate inclination and substrate rotation, which were driven by two step motors controlled by a computerized program [3, 4]. As a result of enhanced shadowing effect and limited atom diffusion during film growth, the GLAD thin films have high porosity and anisotropic growth behavior . GLAD technique has been shown to be capable of producing films with various microstructures, such as vertical columns [5], helix [6], which is hardly obtained from the normal incidence vapor deposition. Thus, many novel physical and chemical properties of thin films can also be easily engineered. In this paper, ZrO

  • Structural and optical properties of nanostructured TiO2 thin films fabricated by Glancing Angle deposition
    Journal of Alloys and Compounds, 2006
    Co-Authors: Sumei Wang, Jianda Shao, Guodong Xia, Zhengxiu Fan
    Abstract:

    TiO2 films deposited by electron beam evaporation with Glancing Angle deposition (GLAD) technique were reported. The influence of flux Angle on the surface morphology and the microstructure was investigated by scanning electron microscopy. The GLAD TiO2 films are anisotropy with highly orientated nanostructure of the slanted columns. With the increase of flux Angle, refractive index and packing density decrease. This is caused by the shadowing effect dominating film growth. The anisotropic structure of TiO2 films results in optical birefringence, which reaches its maximum at the flux Angle alpha = 65 degrees. The maximum birefringence of GLAD TiO2 films is higher than that of common bulk materials. It is suggested that Glancing Angle deposition may offer an effective method to obtain tailorable refractive index and birefringence in a large continuous range. (c) 2006 Elsevier B.V. All rights reserved.

  • ZrO2 films with variable refractive index by Glancing Angle deposition
    Chinese Optics Letters, 2006
    Co-Authors: Sumei Wang, Jianda Shao, Degang Deng, Zhengxiu Fan
    Abstract:

    When optical film is deposited at oblique Angle incidences, the film becomes porously, and the film effective refractive index will decrease. Six porous ZrO2 films are fabricated by the Glancing Angle deposition (GLAD) technique with the different incidence Angles. By changing the substrate tilt Angle from 0 to 85 degrees, the film refractive index varies from 1.92 to 1.27.

  • ZnS thin films fabricated by electron beam evaporation with Glancing Angle deposition
    2nd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies, 2006
    Co-Authors: Sumei Wang, Jianda Shao, Guodong Xia, Zhengxiu Fan
    Abstract:

    GLAD ZnS films prepared by electron beam evaporation method with Glancing Angle deposition technique are reported. The influence of different oblique Angle on the structure and optical properties is investigated using atomic force microscopy and transmittance spectra. The GLAD ZnS films exhibit a porous structure with isolated island and columnar formed. The surface roughness increases with the increase of oblique Angle. The refractive indexes of GLAD ZnS films are lower than that of corresponding bulk materials. The maximal birefringence is obtained at oblique Angle α=80o, which is ascribed to the orientated growth and anistropic structure of GLAD films. Therefore, the Glancing Angle deposition technique is a promising technique to obtain enhanced birefringence property.

James B. Oliver - One of the best experts on this subject based on the ideXlab platform.

Kai Nordlund - One of the best experts on this subject based on the ideXlab platform.

  • Roughness scaling in titanium thin films: A three-dimensional molecular dynamics study of rotational and static Glancing Angle deposition
    Applied Surface Science, 2013
    Co-Authors: Matilda Backholm, Morten Foss, Kai Nordlund
    Abstract:

    Three-dimensional molecular dynamics simulations of the Glancing Angle deposition of titanium was performed both with and without substrate rotation for different deposition Angles (α = 85°, 80°, 55°, and 0°). The surface roughness of the final films, all consisting of 10,000 deposited atoms, was calculated at different length scales of the substrate. The roughness scaling was shown to be, within error, identical for the rotational and static Glancing Angle deposited thin films.

  • Roughness of Glancing Angle deposited titanium thin films: an experimental and computational study
    Nanotechnology, 2012
    Co-Authors: Matilda Backholm, Morten Foss, Kai Nordlund
    Abstract:

    The characterization of roughness at the nanoscale by the means of atomic force microscopy (AFM) was performed on high aspect ratio Glancing Angle deposited titanium thin films. With the use of scanning electron microscopy as well as x-ray photoelectron spectroscopy, it was shown that the AFM measurements gave rise to incorrect roughness values for the films consisting of the highest aspect ratio structures. By correcting for this experimental artefact, the difference between the saturated roughness value of a film grown with conventional physical vapour deposition and films grown with a Glancing Angle of deposition was shown to behave as a power law function of the deposition Angle, with a saturated roughness exponent of κ = 7.1 ± 0.2. This power law scaling was confirmed by three-dimensional molecular dynamics simulations of Glancing Angle deposition, where the saturated roughness exponent was calculated to κ = 6.7 ± 0.4.