The Experts below are selected from a list of 52494 Experts worldwide ranked by ideXlab platform

Sven Rodt - One of the best experts on this subject based on the ideXlab platform.

  • deterministic integration of quantum dots into on chip multimode interference beamsplitters using in situ electron beam lithography
    Nano Letters, 2018
    Co-Authors: Peter Schnauber, Johannes Schall, Samir Bounouar, Suk-in Park, Geun-hwan Ryu, Tobias Heindel, Sven Burger, Jin-dong Song, Theresa Hohne, Sven Rodt
    Abstract:

    The development of multinode quantum optical circuits has attracted great attention in recent years. In particular, interfacing quantum-light sources, gates, and detectors on a single chip is highly desirable for the realization of large networks. In this context, fabrication techniques that enable the deterministic integration of preselected quantum-light emitters into nanophotonic elements play a key role when moving forward to circuits containing multiple emitters. Here, we present the deterministic integration of an InAs quantum dot into a 50/50 multimode interference beamsplitter via in situ electron beam lithography. We demonstrate the combined emitter-gate Interface Functionality by measuring triggered single-photon emission on-chip with g(2)(0) = 0.13 ± 0.02. Due to its high patterning resolution as well as spectral and spatial control, in situ electron beam lithography allows for integration of preselected quantum emitters into complex photonic systems. Being a scalable single-step approach, it p...

  • Deterministic Integration of Quantum Dots into on-Chip Multimode Interference Beamsplitters Using in Situ Electron Beam Lithography
    2018
    Co-Authors: Peter Schnauber, Johannes Schall, Samir Bounouar, Theresa Höhne, Suk-in Park, Geun-hwan Ryu, Tobias Heindel, Sven Burger, Jin-dong Song, Sven Rodt
    Abstract:

    The development of multinode quantum optical circuits has attracted great attention in recent years. In particular, interfacing quantum-light sources, gates, and detectors on a single chip is highly desirable for the realization of large networks. In this context, fabrication techniques that enable the deterministic integration of preselected quantum-light emitters into nanophotonic elements play a key role when moving forward to circuits containing multiple emitters. Here, we present the deterministic integration of an InAs quantum dot into a 50/50 multimode interference beamsplitter via in situ electron beam lithography. We demonstrate the combined emitter-gate Interface Functionality by measuring triggered single-photon emission on-chip with g(2)(0) = 0.13 ± 0.02. Due to its high patterning resolution as well as spectral and spatial control, in situ electron beam lithography allows for integration of preselected quantum emitters into complex photonic systems. Being a scalable single-step approach, it paves the way toward multinode, fully integrated quantum photonic chips

Peter Schnauber - One of the best experts on this subject based on the ideXlab platform.

  • deterministic integration of quantum dots into on chip multimode interference beamsplitters using in situ electron beam lithography
    Nano Letters, 2018
    Co-Authors: Peter Schnauber, Johannes Schall, Samir Bounouar, Suk-in Park, Geun-hwan Ryu, Tobias Heindel, Sven Burger, Jin-dong Song, Theresa Hohne, Sven Rodt
    Abstract:

    The development of multinode quantum optical circuits has attracted great attention in recent years. In particular, interfacing quantum-light sources, gates, and detectors on a single chip is highly desirable for the realization of large networks. In this context, fabrication techniques that enable the deterministic integration of preselected quantum-light emitters into nanophotonic elements play a key role when moving forward to circuits containing multiple emitters. Here, we present the deterministic integration of an InAs quantum dot into a 50/50 multimode interference beamsplitter via in situ electron beam lithography. We demonstrate the combined emitter-gate Interface Functionality by measuring triggered single-photon emission on-chip with g(2)(0) = 0.13 ± 0.02. Due to its high patterning resolution as well as spectral and spatial control, in situ electron beam lithography allows for integration of preselected quantum emitters into complex photonic systems. Being a scalable single-step approach, it p...

  • Deterministic Integration of Quantum Dots into on-Chip Multimode Interference Beamsplitters Using in Situ Electron Beam Lithography
    2018
    Co-Authors: Peter Schnauber, Johannes Schall, Samir Bounouar, Theresa Höhne, Suk-in Park, Geun-hwan Ryu, Tobias Heindel, Sven Burger, Jin-dong Song, Sven Rodt
    Abstract:

    The development of multinode quantum optical circuits has attracted great attention in recent years. In particular, interfacing quantum-light sources, gates, and detectors on a single chip is highly desirable for the realization of large networks. In this context, fabrication techniques that enable the deterministic integration of preselected quantum-light emitters into nanophotonic elements play a key role when moving forward to circuits containing multiple emitters. Here, we present the deterministic integration of an InAs quantum dot into a 50/50 multimode interference beamsplitter via in situ electron beam lithography. We demonstrate the combined emitter-gate Interface Functionality by measuring triggered single-photon emission on-chip with g(2)(0) = 0.13 ± 0.02. Due to its high patterning resolution as well as spectral and spatial control, in situ electron beam lithography allows for integration of preselected quantum emitters into complex photonic systems. Being a scalable single-step approach, it paves the way toward multinode, fully integrated quantum photonic chips

Jin-dong Song - One of the best experts on this subject based on the ideXlab platform.

  • deterministic integration of quantum dots into on chip multimode interference beamsplitters using in situ electron beam lithography
    Nano Letters, 2018
    Co-Authors: Peter Schnauber, Johannes Schall, Samir Bounouar, Suk-in Park, Geun-hwan Ryu, Tobias Heindel, Sven Burger, Jin-dong Song, Theresa Hohne, Sven Rodt
    Abstract:

    The development of multinode quantum optical circuits has attracted great attention in recent years. In particular, interfacing quantum-light sources, gates, and detectors on a single chip is highly desirable for the realization of large networks. In this context, fabrication techniques that enable the deterministic integration of preselected quantum-light emitters into nanophotonic elements play a key role when moving forward to circuits containing multiple emitters. Here, we present the deterministic integration of an InAs quantum dot into a 50/50 multimode interference beamsplitter via in situ electron beam lithography. We demonstrate the combined emitter-gate Interface Functionality by measuring triggered single-photon emission on-chip with g(2)(0) = 0.13 ± 0.02. Due to its high patterning resolution as well as spectral and spatial control, in situ electron beam lithography allows for integration of preselected quantum emitters into complex photonic systems. Being a scalable single-step approach, it p...

  • Deterministic Integration of Quantum Dots into on-Chip Multimode Interference Beamsplitters Using in Situ Electron Beam Lithography
    2018
    Co-Authors: Peter Schnauber, Johannes Schall, Samir Bounouar, Theresa Höhne, Suk-in Park, Geun-hwan Ryu, Tobias Heindel, Sven Burger, Jin-dong Song, Sven Rodt
    Abstract:

    The development of multinode quantum optical circuits has attracted great attention in recent years. In particular, interfacing quantum-light sources, gates, and detectors on a single chip is highly desirable for the realization of large networks. In this context, fabrication techniques that enable the deterministic integration of preselected quantum-light emitters into nanophotonic elements play a key role when moving forward to circuits containing multiple emitters. Here, we present the deterministic integration of an InAs quantum dot into a 50/50 multimode interference beamsplitter via in situ electron beam lithography. We demonstrate the combined emitter-gate Interface Functionality by measuring triggered single-photon emission on-chip with g(2)(0) = 0.13 ± 0.02. Due to its high patterning resolution as well as spectral and spatial control, in situ electron beam lithography allows for integration of preselected quantum emitters into complex photonic systems. Being a scalable single-step approach, it paves the way toward multinode, fully integrated quantum photonic chips

Sven Burger - One of the best experts on this subject based on the ideXlab platform.

  • deterministic integration of quantum dots into on chip multimode interference beamsplitters using in situ electron beam lithography
    Nano Letters, 2018
    Co-Authors: Peter Schnauber, Johannes Schall, Samir Bounouar, Suk-in Park, Geun-hwan Ryu, Tobias Heindel, Sven Burger, Jin-dong Song, Theresa Hohne, Sven Rodt
    Abstract:

    The development of multinode quantum optical circuits has attracted great attention in recent years. In particular, interfacing quantum-light sources, gates, and detectors on a single chip is highly desirable for the realization of large networks. In this context, fabrication techniques that enable the deterministic integration of preselected quantum-light emitters into nanophotonic elements play a key role when moving forward to circuits containing multiple emitters. Here, we present the deterministic integration of an InAs quantum dot into a 50/50 multimode interference beamsplitter via in situ electron beam lithography. We demonstrate the combined emitter-gate Interface Functionality by measuring triggered single-photon emission on-chip with g(2)(0) = 0.13 ± 0.02. Due to its high patterning resolution as well as spectral and spatial control, in situ electron beam lithography allows for integration of preselected quantum emitters into complex photonic systems. Being a scalable single-step approach, it p...

  • Deterministic Integration of Quantum Dots into on-Chip Multimode Interference Beamsplitters Using in Situ Electron Beam Lithography
    2018
    Co-Authors: Peter Schnauber, Johannes Schall, Samir Bounouar, Theresa Höhne, Suk-in Park, Geun-hwan Ryu, Tobias Heindel, Sven Burger, Jin-dong Song, Sven Rodt
    Abstract:

    The development of multinode quantum optical circuits has attracted great attention in recent years. In particular, interfacing quantum-light sources, gates, and detectors on a single chip is highly desirable for the realization of large networks. In this context, fabrication techniques that enable the deterministic integration of preselected quantum-light emitters into nanophotonic elements play a key role when moving forward to circuits containing multiple emitters. Here, we present the deterministic integration of an InAs quantum dot into a 50/50 multimode interference beamsplitter via in situ electron beam lithography. We demonstrate the combined emitter-gate Interface Functionality by measuring triggered single-photon emission on-chip with g(2)(0) = 0.13 ± 0.02. Due to its high patterning resolution as well as spectral and spatial control, in situ electron beam lithography allows for integration of preselected quantum emitters into complex photonic systems. Being a scalable single-step approach, it paves the way toward multinode, fully integrated quantum photonic chips

Tobias Heindel - One of the best experts on this subject based on the ideXlab platform.

  • deterministic integration of quantum dots into on chip multimode interference beamsplitters using in situ electron beam lithography
    Nano Letters, 2018
    Co-Authors: Peter Schnauber, Johannes Schall, Samir Bounouar, Suk-in Park, Geun-hwan Ryu, Tobias Heindel, Sven Burger, Jin-dong Song, Theresa Hohne, Sven Rodt
    Abstract:

    The development of multinode quantum optical circuits has attracted great attention in recent years. In particular, interfacing quantum-light sources, gates, and detectors on a single chip is highly desirable for the realization of large networks. In this context, fabrication techniques that enable the deterministic integration of preselected quantum-light emitters into nanophotonic elements play a key role when moving forward to circuits containing multiple emitters. Here, we present the deterministic integration of an InAs quantum dot into a 50/50 multimode interference beamsplitter via in situ electron beam lithography. We demonstrate the combined emitter-gate Interface Functionality by measuring triggered single-photon emission on-chip with g(2)(0) = 0.13 ± 0.02. Due to its high patterning resolution as well as spectral and spatial control, in situ electron beam lithography allows for integration of preselected quantum emitters into complex photonic systems. Being a scalable single-step approach, it p...

  • Deterministic Integration of Quantum Dots into on-Chip Multimode Interference Beamsplitters Using in Situ Electron Beam Lithography
    2018
    Co-Authors: Peter Schnauber, Johannes Schall, Samir Bounouar, Theresa Höhne, Suk-in Park, Geun-hwan Ryu, Tobias Heindel, Sven Burger, Jin-dong Song, Sven Rodt
    Abstract:

    The development of multinode quantum optical circuits has attracted great attention in recent years. In particular, interfacing quantum-light sources, gates, and detectors on a single chip is highly desirable for the realization of large networks. In this context, fabrication techniques that enable the deterministic integration of preselected quantum-light emitters into nanophotonic elements play a key role when moving forward to circuits containing multiple emitters. Here, we present the deterministic integration of an InAs quantum dot into a 50/50 multimode interference beamsplitter via in situ electron beam lithography. We demonstrate the combined emitter-gate Interface Functionality by measuring triggered single-photon emission on-chip with g(2)(0) = 0.13 ± 0.02. Due to its high patterning resolution as well as spectral and spatial control, in situ electron beam lithography allows for integration of preselected quantum emitters into complex photonic systems. Being a scalable single-step approach, it paves the way toward multinode, fully integrated quantum photonic chips