The Experts below are selected from a list of 285 Experts worldwide ranked by ideXlab platform
Detlev Ristau - One of the best experts on this subject based on the ideXlab platform.
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Spatial separatIon effects in a guiding procedure in a modified Ion-Beam-Sputtering process
Light: Science & Applications, 2016Co-Authors: Sina Malobabic, Marco Jupé, Detlev RistauAbstract:A thin-film coating depositIon process that uses magnetic control fields offers reduced contaminatIon and improved control. The technique, developed by scientists at Laser Zentrum Hannover in Germany, is based on Ion-Beam Sputtering, a well-established scheme for fabricating optical coatings, whereby a stream of Ions are used to eject atoms from a target onto a substrate. The team’s innovatIon is to introduce magnetic fields that guide the sputtered material to the substrate. The approach removes the need for movable mechanical components in the depositIon apparatus, which can act as contaminatIon sources. It also provides fine control over the thickness and refractive index of the layer being deposited. Experiments with a TiO_2/Al_2O_3 sputter target demonstrated that the approach can fabricate highly reflecting coated mirrors for visible light. In the present state of the art, Ion Beam Sputtering is used to produce low-loss dielectric optics. During the manufacturing of a dielectric layer stack, the depositIon material must be changed, which requires rapid mechanical movement of vacuum components. These mechanical components can be regarded as a risk factor for contaminatIon during the coating process, which limits the quality of high-end laser components. To minimize the particle contaminatIon, we present a novel depositIon concept that does not require movable components to change the coating material during the coating process. A magnetic field guiding technique has been developed, which enables the tuning of the refractive index in the layer structure by Sputtering mixtures with varying compositIons of two materials using a single-Ion source. The versatility of this new concept is demonstrated for a high-reflectIon mirror.
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Towards a magnetic field separatIon in Ion Beam Sputtering processes
Thin Solid Films, 2015Co-Authors: Sina Malobabic, Marco Jupé, Puja Kadhkoda, Detlev RistauAbstract:Abstract Defects embedded in coatings due to particle contaminatIon are considered as a primary factor limiting the quality of optical coatings in Ion Beam Sputtering. An approach combining the conventIonal Ion Beam Sputtering process with a magnetic separator in order to remove these particles from film growth is presented. The separator provides a bent axial magnetic field that guides the material flux towards the substrate positIoned at the exit of the separator. Since there is no line of sight between target and substrate, the separator prevents that the particles generated in the target area can reach the substrate. In this context, optical components were manufactured that reveal a particle density three times lower than optical components which were deposited using a conventIonal Ion Beam Sputtering process.
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Multiple scale modeling of Al2O3 thin film growth in an Ion Beam Sputtering process
Optical Systems Design 2015: Advances in Optical Thin Films V, 2015Co-Authors: Marcus Turowski, Thomas Melzig, Marco Jupé, Andreas Pflug, Detlev RistauAbstract:ABSTRACT A multiple scale model approach is presented in order to investigate Al 2 O 3 thin film growth in the framework of an existing Ion Beam Sputtering (IBS) coating process. Therefore, several simulatIon techniques are combined via optimized interfaces for realizing the concept of a virtual coater. Characteristic coating process parameters of the IBS coating plant are applied as input parameters to model the material transport in the chamber, the energy and angular distributIon of the coating material at the substrate, the formatIon of structural thin film properties, and the optical as wel l as the electronic layer properties. The resulting thin film properties are validated to the data of an experimental IBS Al 2 O 3 single layer prepared applying the underlying coating facility. The comparison accounts for a good agreement between the modeled layer properties using the virtual coater concept and the experimental characterizatIon data. Keywords: Modeling, thin film growth, Direct SimulatIon Monte Carlo, Molecular Dynamics, Density FunctIonal Theory, Ion Beam Sputtering
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Optical properties of fluorocarbon thin films prepared by Ion Beam Sputtering of PTFE
Optical Interference Coatings, 2013Co-Authors: Melanie Gauch, Henrik Ehlers, Matthias Ließmann, Detlev RistauAbstract:Ion Beam Sputtering was used to produce Polytetrafluoroethylene (PTFE) thin films for optical coatings. We investigate the chemical structure and the optical parameters such as refractive index, absorptIon and scattering of these films.
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Online DetectIon of Ozone in Ion Beam Sputtering
Optical Interference Coatings, 2010Co-Authors: Carsten Schmitz, Henrik Ehlers, Detlev RistauAbstract:The contents of oxygen species are measured in the reactive atmosphere of an Ion Beam Sputtering process. Based on oxygen sensor concepts, a reliable early detectIon for absorptIon in TiO2layers is studied.
J Kennedy - One of the best experts on this subject based on the ideXlab platform.
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effects of annealing on the structural and optical properties of zinc sulfide thin films deposited by Ion Beam Sputtering
Materials Science in Semiconductor Processing, 2014Co-Authors: J Kennedy, P P Murmu, P Gupta, D A Carder, Shen V Chong, J LeveneurAbstract:Abstract We report the structural and optical properties of ZnS thin films fabricated by Ion-Beam Sputtering. X-ray diffractIon (XRD) and transmissIon electron microscopy (TEM) results revealed a polycrystalline ZnS film with zinc blende phase as manifested by diffractIon from the (111), (220) and (311) planes. Annealing resulted in the appearance of a metastable wurtzite phase with a concentratIon up to 26.6%. An energy bandgap, estimated from absorptIon spectra, was found to vary between 3.32 and 3.40 eV. The lower energy of this bandgap, as compared to bulk ZnS, is associated with the structural point defects along with mixed zinc blende and wurtzite phases of the polycrystalline ZnS films. Ion Beam Sputtering depositIon can be used to tune the optical bandgap for potential applicatIons in optoelectronic materials.
J Leveneur - One of the best experts on this subject based on the ideXlab platform.
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effects of annealing on the structural and optical properties of zinc sulfide thin films deposited by Ion Beam Sputtering
Materials Science in Semiconductor Processing, 2014Co-Authors: J Kennedy, P P Murmu, P Gupta, D A Carder, Shen V Chong, J LeveneurAbstract:Abstract We report the structural and optical properties of ZnS thin films fabricated by Ion-Beam Sputtering. X-ray diffractIon (XRD) and transmissIon electron microscopy (TEM) results revealed a polycrystalline ZnS film with zinc blende phase as manifested by diffractIon from the (111), (220) and (311) planes. Annealing resulted in the appearance of a metastable wurtzite phase with a concentratIon up to 26.6%. An energy bandgap, estimated from absorptIon spectra, was found to vary between 3.32 and 3.40 eV. The lower energy of this bandgap, as compared to bulk ZnS, is associated with the structural point defects along with mixed zinc blende and wurtzite phases of the polycrystalline ZnS films. Ion Beam Sputtering depositIon can be used to tune the optical bandgap for potential applicatIons in optoelectronic materials.
D A Carder - One of the best experts on this subject based on the ideXlab platform.
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effects of annealing on the structural and optical properties of zinc sulfide thin films deposited by Ion Beam Sputtering
Materials Science in Semiconductor Processing, 2014Co-Authors: J Kennedy, P P Murmu, P Gupta, D A Carder, Shen V Chong, J LeveneurAbstract:Abstract We report the structural and optical properties of ZnS thin films fabricated by Ion-Beam Sputtering. X-ray diffractIon (XRD) and transmissIon electron microscopy (TEM) results revealed a polycrystalline ZnS film with zinc blende phase as manifested by diffractIon from the (111), (220) and (311) planes. Annealing resulted in the appearance of a metastable wurtzite phase with a concentratIon up to 26.6%. An energy bandgap, estimated from absorptIon spectra, was found to vary between 3.32 and 3.40 eV. The lower energy of this bandgap, as compared to bulk ZnS, is associated with the structural point defects along with mixed zinc blende and wurtzite phases of the polycrystalline ZnS films. Ion Beam Sputtering depositIon can be used to tune the optical bandgap for potential applicatIons in optoelectronic materials.
P Gupta - One of the best experts on this subject based on the ideXlab platform.
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effects of annealing on the structural and optical properties of zinc sulfide thin films deposited by Ion Beam Sputtering
Materials Science in Semiconductor Processing, 2014Co-Authors: J Kennedy, P P Murmu, P Gupta, D A Carder, Shen V Chong, J LeveneurAbstract:Abstract We report the structural and optical properties of ZnS thin films fabricated by Ion-Beam Sputtering. X-ray diffractIon (XRD) and transmissIon electron microscopy (TEM) results revealed a polycrystalline ZnS film with zinc blende phase as manifested by diffractIon from the (111), (220) and (311) planes. Annealing resulted in the appearance of a metastable wurtzite phase with a concentratIon up to 26.6%. An energy bandgap, estimated from absorptIon spectra, was found to vary between 3.32 and 3.40 eV. The lower energy of this bandgap, as compared to bulk ZnS, is associated with the structural point defects along with mixed zinc blende and wurtzite phases of the polycrystalline ZnS films. Ion Beam Sputtering depositIon can be used to tune the optical bandgap for potential applicatIons in optoelectronic materials.
