Local Thickness

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Yoshikazu Takeda - One of the best experts on this subject based on the ideXlab platform.

Yuya Maeda - One of the best experts on this subject based on the ideXlab platform.

Marek Malac - One of the best experts on this subject based on the ideXlab platform.

  • Local Thickness measurement through scattering contrast and electron energy loss spectroscopy
    Micron, 2012
    Co-Authors: Huairuo Zhang, R F Egerton, Marek Malac
    Abstract:

    Abstract Scattering contrast measurements were performed on thin films of amorphous carbon and polycrystalline Au, as well as single-crystal MgO nanocubes. Based on the exponential absorption law, mass-Thickness can be obtained within 10% accuracy by measuring the incident and transmitted intensities in the same image. For mass-Thickness measurement of a thin amorphous specimen, a small collection semiangle improves the measurement sensitivity, whereas for the measurement of polycrystalline or single-crystal specimens, a large collection semiangle should be used to reduce diffraction-contrast effects. EELS Thickness measurements on MgO nanocubes suggest that the Kramers–Kronig sum-rule method (with correction for plural and surface scattering) gives 10% accuracy at medium collection semiangles but overestimates the Thickness at small collection semiangles, due to underestimation of the surface-mode scattering. The log-ratio method, with a formula for inelastic mean free path proposed by Malis et al. (1988) , provides 10% accuracy at small collection semiangle, while that proposed by Iakoubovskii et al. (2008a) is preferable for medium and large collection semiangles. As a result of this work, we provide recommendations of preferred methods and conditions for Local-Thickness measurement in the TEM.

  • Local Thickness Measurement in TEM
    Microscopy and Microanalysis, 2010
    Co-Authors: Huairuo Zhang, Ray F. Egerton, Marek Malac
    Abstract:

    Extended abstract of a paper presented at Microscopy and Microanalysis 2010 in Portland, Oregon, USA, August 1 – August 5, 2010.

Toshio Sasaki - One of the best experts on this subject based on the ideXlab platform.

Shigeo Arai - One of the best experts on this subject based on the ideXlab platform.