The Experts below are selected from a list of 95802 Experts worldwide ranked by ideXlab platform
Dawn M. Tilbury - One of the best experts on this subject based on the ideXlab platform.
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virtual Metrology and feedback control for semiconductor manufacturing processes using recursive partial least squares
Journal of Process Control, 2008Co-Authors: Aftab A Khan, James Moyne, Dawn M. TilburyAbstract:Abstract Virtual Metrology (VM) is the prediction of Metrology variables (either measurable or non-measurable) using process state and product information. In the past few years VM has been proposed as a method to augment existing Metrology and has the potential to be used in control schemes for improved process control in terms of both accuracy and speed. In this paper, we propose a VM based approach for process control of semiconductor manufacturing processes on a wafer-to-wafer (W2W) basis. VM is realized by utilizing the pre-process Metrology data and more importantly the process data from the underlying tools that is generally collected in real-time for fault detection (FD) purposes. The approach is developed for a multi-input multi-output (MIMO) process that may experience Metrology delays, consistent process drifts, and sudden shifts in process drifts. The partial least squares (PLS) modeling technique is applied in a novel way to derive a linear regression model for the underlying process, suitable for VM purposes. A recursive moving-window approach is developed to update the VM module whenever Metrology data is available. The VM data is then utilized to develop a W2W process control capability using a common run-to-run control technique. The proposed approach is applied to a simulated MIMO process and the results show considerable improvement in wafer quality as compared to other control solutions that only use lot-to-lot Metrology information.
Aftab A Khan - One of the best experts on this subject based on the ideXlab platform.
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virtual Metrology and feedback control for semiconductor manufacturing processes using recursive partial least squares
Journal of Process Control, 2008Co-Authors: Aftab A Khan, James Moyne, Dawn M. TilburyAbstract:Abstract Virtual Metrology (VM) is the prediction of Metrology variables (either measurable or non-measurable) using process state and product information. In the past few years VM has been proposed as a method to augment existing Metrology and has the potential to be used in control schemes for improved process control in terms of both accuracy and speed. In this paper, we propose a VM based approach for process control of semiconductor manufacturing processes on a wafer-to-wafer (W2W) basis. VM is realized by utilizing the pre-process Metrology data and more importantly the process data from the underlying tools that is generally collected in real-time for fault detection (FD) purposes. The approach is developed for a multi-input multi-output (MIMO) process that may experience Metrology delays, consistent process drifts, and sudden shifts in process drifts. The partial least squares (PLS) modeling technique is applied in a novel way to derive a linear regression model for the underlying process, suitable for VM purposes. A recursive moving-window approach is developed to update the VM module whenever Metrology data is available. The VM data is then utilized to develop a W2W process control capability using a common run-to-run control technique. The proposed approach is applied to a simulated MIMO process and the results show considerable improvement in wafer quality as compared to other control solutions that only use lot-to-lot Metrology information.
Donald R. Larson - One of the best experts on this subject based on the ideXlab platform.
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Pulse Metrology – Part 2
IEEE Instrumentation & Measurement Magazine, 2012Co-Authors: Nicholas G. Paulter, Donald R. LarsonAbstract:This article is the second part of a two-part series discussing pulse Metrology. One who is doing pulse measurement needs to know what has been measured, to what accuracy, and with what uncertainty. Part 1 introduced the field of Metrology and began an explanation of standards in pulse Metrology and some of the commonly used pulse terms [1].
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Pulse Metrology: Part 1
IEEE Instrumentation & Measurement Magazine, 2011Co-Authors: Nicholas G. Paulter, Donald R. LarsonAbstract:This tutorial is the first part of a two-part series on pulse Metrology. Part one provides a brief introduction to the field of Metrology in general and to pulse Metrology. Metrology involves the important concepts of traceability to fundamental units, measurement uncertainty, and reproducibility and repeatability of measurement. These aspects are not automatically included in measurements.
James Moyne - One of the best experts on this subject based on the ideXlab platform.
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virtual Metrology and feedback control for semiconductor manufacturing processes using recursive partial least squares
Journal of Process Control, 2008Co-Authors: Aftab A Khan, James Moyne, Dawn M. TilburyAbstract:Abstract Virtual Metrology (VM) is the prediction of Metrology variables (either measurable or non-measurable) using process state and product information. In the past few years VM has been proposed as a method to augment existing Metrology and has the potential to be used in control schemes for improved process control in terms of both accuracy and speed. In this paper, we propose a VM based approach for process control of semiconductor manufacturing processes on a wafer-to-wafer (W2W) basis. VM is realized by utilizing the pre-process Metrology data and more importantly the process data from the underlying tools that is generally collected in real-time for fault detection (FD) purposes. The approach is developed for a multi-input multi-output (MIMO) process that may experience Metrology delays, consistent process drifts, and sudden shifts in process drifts. The partial least squares (PLS) modeling technique is applied in a novel way to derive a linear regression model for the underlying process, suitable for VM purposes. A recursive moving-window approach is developed to update the VM module whenever Metrology data is available. The VM data is then utilized to develop a W2W process control capability using a common run-to-run control technique. The proposed approach is applied to a simulated MIMO process and the results show considerable improvement in wafer quality as compared to other control solutions that only use lot-to-lot Metrology information.
Nicholas G. Paulter - One of the best experts on this subject based on the ideXlab platform.
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Pulse Metrology – Part 2
IEEE Instrumentation & Measurement Magazine, 2012Co-Authors: Nicholas G. Paulter, Donald R. LarsonAbstract:This article is the second part of a two-part series discussing pulse Metrology. One who is doing pulse measurement needs to know what has been measured, to what accuracy, and with what uncertainty. Part 1 introduced the field of Metrology and began an explanation of standards in pulse Metrology and some of the commonly used pulse terms [1].
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Pulse Metrology: Part 1
IEEE Instrumentation & Measurement Magazine, 2011Co-Authors: Nicholas G. Paulter, Donald R. LarsonAbstract:This tutorial is the first part of a two-part series on pulse Metrology. Part one provides a brief introduction to the field of Metrology in general and to pulse Metrology. Metrology involves the important concepts of traceability to fundamental units, measurement uncertainty, and reproducibility and repeatability of measurement. These aspects are not automatically included in measurements.
