The Experts below are selected from a list of 1656 Experts worldwide ranked by ideXlab platform
Jiao Lin - One of the best experts on this subject based on the ideXlab platform.
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Angular-momentum Nanometrology in an ultrathin plasmonic topological insulator film
Nature Communications, 2018Co-Authors: Zengji Yue, Haoran Ren, Shibiao Wei, Jiao LinAbstract:Complementary metal–oxide–semiconductor (CMOS) technology has provided a highly sensitive detection platform for high-resolution optical imaging, sensing and metrology. Although the detection of optical beams carrying angular momentum have been explored with nanophotonic methods, the metrology of optical angular momentum has been limited to bulk optics. We demonstrate angular-momentum Nanometrology through the spatial displacement engineering of plasmonic angular momentum modes in a CMOS-compatible plasmonic topological insulator material. The generation and propagation of surface plasmon polaritons on the surface of an ultrathin topological insulator Sb2Te3 film with a thickness of 100 nm is confirmed, exhibiting plasmonic figures of merit superior to noble metal plasmonics in the ultraviolet-visible frequency range. Angular-momentum Nanometrology with a low crosstalk of less than −20 dB is achieved. This compact high-precision angular-momentum Nanometrology opens an unprecedented opportunity for on-chip manipulation of optical angular momentum for high-capacity information processing, ultrasensitive molecular sensing, and ultracompact multi-functional optoelectronic devices.Multiplexed vortex light beams are promising for optical communications, but efficient mode sorting is so far limited to bulk optics. Here the authors develop a scalable vortex beam sorter that uses a plasmonic topological insulator structure to spatially separate the modes to resolve them on a standard CMOS detector.
Gian Bartolo Picotto - One of the best experts on this subject based on the ideXlab platform.
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Comparison on Nanometrology: Nano 2?Step height
Metrologia, 2003Co-Authors: Ludger Koenders, R Bergmans, Jørgen Garnæs, J Haycocks, N Korolev, T Kurosawa, F. Meli, B C Park, G S. Peng, Gian Bartolo PicottoAbstract:The ability to measure step height and to calibrate step height artefacts is of vital interest in Nanometrology. On that score the WGDM7 decided in 1998 to include measurements of step heights in a series of comparisons on the field of Nanometrology. The comparison about step height (NANO2) started in September 2000 with the Physikalisch-Technische Bundesanstalt (PTB) as pilot laboratory. Fourteen national metrology institutes worldwide participated in this comparison. A set of five step height standards in the range from 7 nm to 800 nm was used for the comparison. The lateral size of the structures of the step height standards was chosen so that the height could be measured by different types of instruments, for example, interference microscopes, stylus instruments and scanning probe microscopes (SPM). The reference values were calculated as the weighted mean of all measurements that fulfilled the En?
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comparison on Nanometrology nano 2 step height
Metrologia, 2003Co-Authors: Ludger Koenders, R Bergmans, Jørgen Garnæs, J Haycocks, N Korolev, T Kurosawa, F. Meli, B C Park, G S. Peng, Gian Bartolo PicottoAbstract:The ability to measure step height and to calibrate step height artefacts is of vital interest in Nanometrology. On that score the WGDM7 decided in 1998 to include measurements of step heights in a series of comparisons on the field of Nanometrology. The comparison about step height (NANO2) started in September 2000 with the Physikalisch-Technische Bundesanstalt (PTB) as pilot laboratory. Fourteen national metrology institutes worldwide participated in this comparison. A set of five step height standards in the range from 7 nm to 800 nm was used for the comparison. The lateral size of the structures of the step height standards was chosen so that the height could be measured by different types of instruments, for example, interference microscopes, stylus instruments and scanning probe microscopes (SPM). The reference values were calculated as the weighted mean of all measurements that fulfilled the En?
Zengji Yue - One of the best experts on this subject based on the ideXlab platform.
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Angular-momentum Nanometrology in an ultrathin plasmonic topological insulator film
Nature Communications, 2018Co-Authors: Zengji Yue, Haoran Ren, Shibiao Wei, Jiao LinAbstract:Complementary metal–oxide–semiconductor (CMOS) technology has provided a highly sensitive detection platform for high-resolution optical imaging, sensing and metrology. Although the detection of optical beams carrying angular momentum have been explored with nanophotonic methods, the metrology of optical angular momentum has been limited to bulk optics. We demonstrate angular-momentum Nanometrology through the spatial displacement engineering of plasmonic angular momentum modes in a CMOS-compatible plasmonic topological insulator material. The generation and propagation of surface plasmon polaritons on the surface of an ultrathin topological insulator Sb2Te3 film with a thickness of 100 nm is confirmed, exhibiting plasmonic figures of merit superior to noble metal plasmonics in the ultraviolet-visible frequency range. Angular-momentum Nanometrology with a low crosstalk of less than −20 dB is achieved. This compact high-precision angular-momentum Nanometrology opens an unprecedented opportunity for on-chip manipulation of optical angular momentum for high-capacity information processing, ultrasensitive molecular sensing, and ultracompact multi-functional optoelectronic devices.Multiplexed vortex light beams are promising for optical communications, but efficient mode sorting is so far limited to bulk optics. Here the authors develop a scalable vortex beam sorter that uses a plasmonic topological insulator structure to spatially separate the modes to resolve them on a standard CMOS detector.
Ludger Koenders - One of the best experts on this subject based on the ideXlab platform.
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recent developments in dimensional Nanometrology using afms
Measurement Science and Technology, 2011Co-Authors: Andrew Yacoot, Ludger KoendersAbstract:Scanning probe microscopes, in particular the atomic force microscope (AFM), have developed into sophisticated instruments that, throughout the world, are no longer used just for imaging, but for quantitative measurements. A role of the national measurement institutes has been to provide traceable metrology for these instruments. This paper presents a brief overview as to how this has been achieved, highlights the future requirements for metrology to support developments in AFM technology and describes work in progress to meet this need.
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The European Nanometrology landscape
Nanotechnology, 2011Co-Authors: Richard Leach, Robert D. Boyd, Theresa Burke, Hans-ulrich Danzebrink, Kai Dirscherl, Thorsten Dziomba, Mark Gee, Ludger Koenders, Valérie Morazzani, Allan PidduckAbstract:This review paper summarizes the European Nanometrology landscape from a technical perspective. Dimensional and chemical Nanometrology are discussed first as they underpin many of the developments in other areas of Nanometrology. Applications for the measurement of thin film parameters are followed by two of the most widely relevant families of functional properties: measurement of mechanical and electrical properties at the nanoscale. Nanostructured materials and surfaces, which are seen as key materials areas having specific metrology challenges, are covered next. The final section describes biological Nanometrology, which is perhaps the most interdisciplinary applications area, and presents unique challenges. Within each area, a review is provided of current status, the capabilities and limitations of current techniques and instruments, and future directions being driven by emerging industrial measurement requirements. Issues of traceability, standardization, national and international programmes, regulation and skills development will be discussed in a future paper.
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Comparison on Nanometrology: Nano 2?Step height
Metrologia, 2003Co-Authors: Ludger Koenders, R Bergmans, Jørgen Garnæs, J Haycocks, N Korolev, T Kurosawa, F. Meli, B C Park, G S. Peng, Gian Bartolo PicottoAbstract:The ability to measure step height and to calibrate step height artefacts is of vital interest in Nanometrology. On that score the WGDM7 decided in 1998 to include measurements of step heights in a series of comparisons on the field of Nanometrology. The comparison about step height (NANO2) started in September 2000 with the Physikalisch-Technische Bundesanstalt (PTB) as pilot laboratory. Fourteen national metrology institutes worldwide participated in this comparison. A set of five step height standards in the range from 7 nm to 800 nm was used for the comparison. The lateral size of the structures of the step height standards was chosen so that the height could be measured by different types of instruments, for example, interference microscopes, stylus instruments and scanning probe microscopes (SPM). The reference values were calculated as the weighted mean of all measurements that fulfilled the En?
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comparison on Nanometrology nano 2 step height
Metrologia, 2003Co-Authors: Ludger Koenders, R Bergmans, Jørgen Garnæs, J Haycocks, N Korolev, T Kurosawa, F. Meli, B C Park, G S. Peng, Gian Bartolo PicottoAbstract:The ability to measure step height and to calibrate step height artefacts is of vital interest in Nanometrology. On that score the WGDM7 decided in 1998 to include measurements of step heights in a series of comparisons on the field of Nanometrology. The comparison about step height (NANO2) started in September 2000 with the Physikalisch-Technische Bundesanstalt (PTB) as pilot laboratory. Fourteen national metrology institutes worldwide participated in this comparison. A set of five step height standards in the range from 7 nm to 800 nm was used for the comparison. The lateral size of the structures of the step height standards was chosen so that the height could be measured by different types of instruments, for example, interference microscopes, stylus instruments and scanning probe microscopes (SPM). The reference values were calculated as the weighted mean of all measurements that fulfilled the En?
Shibiao Wei - One of the best experts on this subject based on the ideXlab platform.
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Angular-momentum Nanometrology in an ultrathin plasmonic topological insulator film
Nature Communications, 2018Co-Authors: Zengji Yue, Haoran Ren, Shibiao Wei, Jiao LinAbstract:Complementary metal–oxide–semiconductor (CMOS) technology has provided a highly sensitive detection platform for high-resolution optical imaging, sensing and metrology. Although the detection of optical beams carrying angular momentum have been explored with nanophotonic methods, the metrology of optical angular momentum has been limited to bulk optics. We demonstrate angular-momentum Nanometrology through the spatial displacement engineering of plasmonic angular momentum modes in a CMOS-compatible plasmonic topological insulator material. The generation and propagation of surface plasmon polaritons on the surface of an ultrathin topological insulator Sb2Te3 film with a thickness of 100 nm is confirmed, exhibiting plasmonic figures of merit superior to noble metal plasmonics in the ultraviolet-visible frequency range. Angular-momentum Nanometrology with a low crosstalk of less than −20 dB is achieved. This compact high-precision angular-momentum Nanometrology opens an unprecedented opportunity for on-chip manipulation of optical angular momentum for high-capacity information processing, ultrasensitive molecular sensing, and ultracompact multi-functional optoelectronic devices.Multiplexed vortex light beams are promising for optical communications, but efficient mode sorting is so far limited to bulk optics. Here the authors develop a scalable vortex beam sorter that uses a plasmonic topological insulator structure to spatially separate the modes to resolve them on a standard CMOS detector.
