The Experts below are selected from a list of 234 Experts worldwide ranked by ideXlab platform
Randolph K. Belter - One of the best experts on this subject based on the ideXlab platform.
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Addition reactions of organometallic reagents to Nitrogen Trifluoride and enhanced alkyl–alkyl coupling by NF3
Journal of Fluorine Chemistry, 2015Co-Authors: Randolph K. BelterAbstract:Abstract A survey of the reaction of Nitrogen Trifluoride (NF 3 ) with various organometallic reagents finds that organomagnesium (Grignard) reagents are the most useful for producing N , N -difluoroaminoalkanes. Alkyl–alkyl coupling is a persistant side reaction. Organolithiums are marginally effective. Organocopper, organozinc reagents undergo primarily alkyl–alkyl coupling catalyzed by the presence of NF 3 . Organocalcium and organoaluminum reagents are unreactive.
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difluoroalkylamines from high temperature vapor phase reactions of Nitrogen Trifluoride with alkanes ethers and benzene
Journal of Fluorine Chemistry, 2011Co-Authors: Randolph K. BelterAbstract:Abstract At temperatures around 400 °C, Nitrogen Trifluoride (NF 3 ) readily reacts with alkanes and benzene as well as ethers. In all cases, products were N,N-difluoroamines. This is in contrast to difluoroamination of benzylic substrates where the initial N,N-difluoroamines underwent eliminations or rearrangements and were not isolated. Cyclic and acyclic alkanes generated N,N-difluoroaminoalkanes. Benzene substituted on the ring to form N,N-difluoroaniline. Ethers reacted to generate α-N,N-difluoroamino ethers. Little direct fluorination was observed.
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high temperature vapor phase reactions of Nitrogen Trifluoride with benzylic substrates
ChemInform, 2011Co-Authors: Randolph K. BelterAbstract:The reaction of Nitrogen Trifluoride with benzylic substrates at 400°C in the vapor phase does not give the expected fluorinated products.
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high temperature vapor phase reactions of Nitrogen Trifluoride with benzylic substrates
Journal of Fluorine Chemistry, 2011Co-Authors: Randolph K. BelterAbstract:Abstract At temperatures around 400 °C, Nitrogen Trifluoride (NF 3 ) readily reacts with benzylic substrates. Products vary with the substrate, but are all the result of difluoroamination at the benzylic position. Toluene and ethylbenzene produce benzonitrile. Cumene produces α-methylstyrene. Diphenylmethane produces benzanilide. Little or no direct fluorination or radical dimerization is observed.
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Nitrogen Trifluoride as an oxidative co-reagent in high temperature vapor phase hydrofluorinations
Journal of Fluorine Chemistry, 2006Co-Authors: Randolph K. Belter, Mark S. Sweval, Yuichi IikuboAbstract:Abstract Nitrogen Trifluoride (NF 3 ) has proven to be a useful additive in high temperature vapor phase hydrofluorination reactions of chlorocarbons. The activity of chromium-based catalysts is maintained by introducing a co-stream of NF 3 into the reagent chlorocarbon and HF stream. NF 3 is a desirable additive instead of O 2 as there is no water generation due to its use.
John H Holloway - One of the best experts on this subject based on the ideXlab platform.
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rotational spectrum of the Nitrogen Trifluoride chlorine monofluoride complex and the inductive effect of groups r ch3 h f on r3n clf interactions
Chemical Physics Letters, 1998Co-Authors: Eric R Waclawik, A C Legon, John H HollowayAbstract:Abstract Rotational constants B 0 , centrifugal distortion constants D J and D JK , and nuclear quadrupole coupling constants χ aa ( 14 N ) and χ aa (Cl) were determined by pulsed-nozzle, Fourier transform microwave spectroscopy for the isotopomers F 3 14 N ⋯ 35 ClF and F 3 14 N ⋯ 37 ClF of a complex formed by Nitrogen Trifluoride and chlorine monofluoride. The distance r (N⋯Cl) and the intermolecular stretching force constant k σ for this symmetric-top species are compared with those of several axially symmetric complexes B⋯ClF in which a Nitrogen atom of the base B interacts with ClF. In particular, it is shown that r (N⋯Cl) decreases along the series R 3 N⋯ClF, where R=F, H or CH 3 , while k σ increases dramatically.
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Rotational spectrum of the Nitrogen Trifluoride–chlorine monofluoride complex and the inductive effect of groups R=CH3, H, F on R3N/ClF interactions
Chemical Physics Letters, 1998Co-Authors: Eric R Waclawik, A C Legon, John H HollowayAbstract:Abstract Rotational constants B 0 , centrifugal distortion constants D J and D JK , and nuclear quadrupole coupling constants χ aa ( 14 N ) and χ aa (Cl) were determined by pulsed-nozzle, Fourier transform microwave spectroscopy for the isotopomers F 3 14 N ⋯ 35 ClF and F 3 14 N ⋯ 37 ClF of a complex formed by Nitrogen Trifluoride and chlorine monofluoride. The distance r (N⋯Cl) and the intermolecular stretching force constant k σ for this symmetric-top species are compared with those of several axially symmetric complexes B⋯ClF in which a Nitrogen atom of the base B interacts with ClF. In particular, it is shown that r (N⋯Cl) decreases along the series R 3 N⋯ClF, where R=F, H or CH 3 , while k σ increases dramatically.
Yoshinori Hara - One of the best experts on this subject based on the ideXlab platform.
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growth of znse thin films by metalorganic chemical vapor deposition using Nitrogen Trifluoride
Applied Surface Science, 1997Co-Authors: Y Noda, Tetsuya Ishikawa, Mitsuharu Yamabe, Yoshinori HaraAbstract:The radical-assisted metalorganic chemical vapor deposition (MOCVD) of ZnSe films on GaAs (100) was performed at 723 K under atmospheric pressure by using rf-heated horizontal reactor. Diethylzinc (DEZn) and diethylselenide (DESe) as source materials were carried by H 2 gas, where the [VI]/[II] ratio was kept at 1. Nitrogen Trifluoride (NF 3 ) was used as co-reactant. With an increase of NF 3 flux, the growth rate was drastically enhanced, which might be due to dealkylation by chain reactions between DESe and NF 3 . Photoluminescence of the ZnSe films measured for the films grown with small NF 3 flux indicated the donor-acceptor (D-A) pair emission. The Hall coefficient measured using Au Ohmic contacts indicated the hole concentration in the order of magnitude of 10 22 m -3 . The results suggest that the Nitrogen atoms from NF 3 might be incorporated into the grown films as acceptors.
Wentien Tsai - One of the best experts on this subject based on the ideXlab platform.
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environmental and health risk analysis of Nitrogen Trifluoride nf3 a toxic and potent greenhouse gas
Journal of Hazardous Materials, 2008Co-Authors: Wentien TsaiAbstract:Abstract This article aimed at the introduction of Nitrogen Trifluoride (NF3) and its decomposition products into its hazards to the environment and health because this perfluorocompound is a toxic and potent greenhouse gas not blanketed into the Kyoto Protocol. This paper also predicted the global NF3 emissions from the electronics industry on the basis of the methodologies recommended by the Intergovernmental Panel on Climate Change (IPCC), and further discussed its atmospheric implications according to the estimation of environmental fate for NF3. It showed that the vaporization of NF3 from the water bodies to the atmosphere is very high according to its predicted value (ca. 6.0 × 105 MPa) of Henry's law constant (KH). Furthermore, NF3 emitted from the electronics industry around the world in 2006 was estimated to be between 3.6 and 56 metric tonnes and it will be on increasing trend in the near future. Although the accumulative amount of NF3 in the atmosphere currently should be very negligible based on the predicted ratio (the order of 10−6 to 10−7) of equivalent CO2 emission from NF3 to total equivalent CO2 emissions from potent greenhouse gases, it is necessary to adopt the available abatement and also monitor the concentration of NF3 in the workplaces for reducing the overall environmental and health impacts of various semiconductor processes.
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Environmental and health risk analysis of Nitrogen Trifluoride (NF(3)), a toxic and potent greenhouse gas.
Journal of hazardous materials, 2008Co-Authors: Wentien TsaiAbstract:This article aimed at the introduction of Nitrogen Trifluoride (NF(3)) and its decomposition products into its hazards to the environment and health because this perfluorocompound is a toxic and potent greenhouse gas not blanketed into the Kyoto Protocol. This paper also predicted the global NF(3) emissions from the electronics industry on the basis of the methodologies recommended by the Intergovernmental Panel on Climate Change (IPCC), and further discussed its atmospheric implications according to the estimation of environmental fate for NF(3). It showed that the vaporization of NF(3) from the water bodies to the atmosphere is very high according to its predicted value (ca. 6.0 x 10(5)MPa) of Henry's law constant (K(H)). Furthermore, NF(3) emitted from the electronics industry around the world in 2006 was estimated to be between 3.6 and 56 metric tonnes and it will be on increasing trend in the near future. Although the accumulative amount of NF(3) in the atmosphere currently should be very negligible based on the predicted ratio (the order of 10(-6) to 10(-7)) of equivalent CO(2) emission from NF(3) to total equivalent CO(2) emissions from potent greenhouse gases, it is necessary to adopt the available abatement and also monitor the concentration of NF(3) in the workplaces for reducing the overall environmental and health impacts of various semiconductor processes.
Eric R Waclawik - One of the best experts on this subject based on the ideXlab platform.
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rotational spectrum of the Nitrogen Trifluoride chlorine monofluoride complex and the inductive effect of groups r ch3 h f on r3n clf interactions
Chemical Physics Letters, 1998Co-Authors: Eric R Waclawik, A C Legon, John H HollowayAbstract:Abstract Rotational constants B 0 , centrifugal distortion constants D J and D JK , and nuclear quadrupole coupling constants χ aa ( 14 N ) and χ aa (Cl) were determined by pulsed-nozzle, Fourier transform microwave spectroscopy for the isotopomers F 3 14 N ⋯ 35 ClF and F 3 14 N ⋯ 37 ClF of a complex formed by Nitrogen Trifluoride and chlorine monofluoride. The distance r (N⋯Cl) and the intermolecular stretching force constant k σ for this symmetric-top species are compared with those of several axially symmetric complexes B⋯ClF in which a Nitrogen atom of the base B interacts with ClF. In particular, it is shown that r (N⋯Cl) decreases along the series R 3 N⋯ClF, where R=F, H or CH 3 , while k σ increases dramatically.
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Rotational spectrum of the Nitrogen Trifluoride–chlorine monofluoride complex and the inductive effect of groups R=CH3, H, F on R3N/ClF interactions
Chemical Physics Letters, 1998Co-Authors: Eric R Waclawik, A C Legon, John H HollowayAbstract:Abstract Rotational constants B 0 , centrifugal distortion constants D J and D JK , and nuclear quadrupole coupling constants χ aa ( 14 N ) and χ aa (Cl) were determined by pulsed-nozzle, Fourier transform microwave spectroscopy for the isotopomers F 3 14 N ⋯ 35 ClF and F 3 14 N ⋯ 37 ClF of a complex formed by Nitrogen Trifluoride and chlorine monofluoride. The distance r (N⋯Cl) and the intermolecular stretching force constant k σ for this symmetric-top species are compared with those of several axially symmetric complexes B⋯ClF in which a Nitrogen atom of the base B interacts with ClF. In particular, it is shown that r (N⋯Cl) decreases along the series R 3 N⋯ClF, where R=F, H or CH 3 , while k σ increases dramatically.