The Experts below are selected from a list of 28653 Experts worldwide ranked by ideXlab platform

Fumiyuki Nihey - One of the best experts on this subject based on the ideXlab platform.

  • highly uniform thin film transistors printed on flexible plastic films with morphology controlled carbon nanotube network channels
    Applied Physics Express, 2012
    Co-Authors: Hideaki Numata, Hiroyuki Endoh, Kazuki Ihara, Takeshi Saito, Fumiyuki Nihey
    Abstract:

    Carbon nanotube (CNT) transistor arrays were fabricated on plastic films by printing. All the device elements were directly patterned by maskless printing without any additional Patterning Process, and minimum materials were used. During fabrication, the morphology of the CNT random network was controlled by an adsorption mechanism on the surface to be printed, which resulted in excellent and uniform electrical properties. The field-effect mobility was further improved by post-treatment to modify the morphology of the CNT network. These results are promising for realizing printed electronics integrated with CNT transistors.

Oliver Brand - One of the best experts on this subject based on the ideXlab platform.

  • Size-Scalable and High-Density Liquid-Metal-Based Soft Electronic Passive Components and Circuits Using Soft Lithography
    Advanced Functional Materials, 2017
    Co-Authors: Min Gu Kim, Hommood Alrowais, Spyridon Pavlidis, Oliver Brand
    Abstract:

    The use of conducting liquids with high electrical conductivity, such as eutectic gallium–indium (EGaIn), has great potential in electronics applications requiring stretchability and deformability beyond conventional flexible electronics relying on solid conductors. An advanced liquid metal thin-line Patterning Process based on soft lithography and a compatible vertical integration technique are presented that enable size-scalable and high-density EGaIn-based, soft microelectronic components and circuits. The advanced liquid metal thin-line Patterning Process based on poly(dimethylsiloxane) (PDMS) substrates and soft lithography techniques allows for simultaneous Patterning of uniform and residue-free EGaIn lines with line width from single micrometers to several millimeters at room temperature and under ambient pressure. Using this fabrication technique, passive electronic components and circuits are investigated under elastic deformations using numerical and experimental approaches. In addition, soft through-PDMS vias with high aspect ratio are demonstrated for multilayer interconnections in 2.5D and 3D integration approaches. To highlight the system-level potential of the Patterning technique, a chemical sensor based on an integrated LC resonance circuit with a microfluidic-tunable interdigitated capacitor and a planar spiral inductor is fabricated and characterized. Finally, to show the flexibility and stretchability of the resulting electronics, circuits with embedded light emitting diodes (LEDs) are investigated under bending, twisting, and stretching deformations.

Kilwon Cho - One of the best experts on this subject based on the ideXlab platform.

  • Patterning the organic electrodes of all organic thin film transistors with a simple spray printing technique
    Applied Physics Letters, 2006
    Co-Authors: Yunseok Jang, Yeong Don Park, Jung Ah Lim, Hwa Sung Lee, Wi Hyoung Lee, Kilwon Cho
    Abstract:

    The authors have demonstrated the application of spray printing technique for Patterning organic electrodes of all-organic transistor on flexible polymeric substrate. Our spray printing technique is a simple, fast, and easy Patterning Process. The performance of the device obtained with the spray printing technique is shown to be comparable to that of the device with deposited metal electrodes (gold). Thus this spray printing technique provides a method for Patterning the electrodes of all-organic transistors.

Kwang-suk Jang - One of the best experts on this subject based on the ideXlab platform.

  • Facile photo-Patterning of source and drain electrodes with photo-sensitive polyimide for organic thin-film transistors
    Synthetic Metals, 2013
    Co-Authors: Jun-young Yoon, Duyoung Wee, Yun Ho Kim, Sunho Jeong, Sung-kwon Hong, Kwang-suk Jang
    Abstract:

    Abstract We report a facile and cost-effective photo-Patterning Process to obtain patterned source and drain electrodes in organic thin-film transistors (OTFTs). Instead of conventional photoresist, photo-sensitive polyimide (PSPI) was used in the photo-Patterning Process. PSPI with cinnamate moieties could be crosslinked by UV-light exposure without any photoinitiator. After the photo-Patterning Process of this work, gold/PSPI bilayer electrodes were easily prepared and they were used as source and drain electrodes of the pentacene OTFT. The field effect carrier mobility, threshold voltage and on/off current ratio of the pentacene OTFT with the gold/PSPI bilayer electrodes were 0.067 cm 2 /V s, −5.3 V and 1.4 × 10 4 , respectively.

Ralph G Nuzzo - One of the best experts on this subject based on the ideXlab platform.

  • masterless soft lithography Patterning uv ozone induced adhesion on poly dimethylsiloxane surfaces
    Langmuir, 2005
    Co-Authors: William R Childs, Michael J Motala, Keon Jae Lee, Ralph G Nuzzo
    Abstract:

    A novel microreactor-based photomask capable of effecting high resolution, large area Patterning of UV/ozone (UVO) treatments of poly(dimethylsiloxane) (PDMS) surfaces is described. This tool forms the basis of two new soft lithographic Patterning techniques that significantly extend the design rules of decal transfer lithography (DTL). The first technique, photodefined cohesive mechanical failure, fuses the design rules of photolithography with the contact-based adhesive transfer of PDMS in DTL. In a second powerful variation, the UVO masks described in this work enable a masterless soft lithographic Patterning Process. This latter method, UVO-patterned adhesive transfer, allows the direct transfer of PDMS-based polymer microstructures from a slab of polymer to silicon and other material surfaces. Both methods exploit the improved Process qualities that result from the use of a deuterium discharge lamp to affect the UVO treatment to pattern complex, large area PDMS patterns with limiting feature sizes ex...