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Fayun Li - One of the best experts on this subject based on the ideXlab platform.

  • the effect of h2 ccl4 mixture plasma treatment on tio2 Photocatalytic Oxidation of aromatic air contaminants under both uv and visible light
    Chemical Engineering Journal, 2014
    Co-Authors: Shaozheng Hu, Fayun Li
    Abstract:

    Abstract The effect of H 2 –CCl 4 mixture plasma treatment on TiO 2 Photocatalytic Oxidation of aromatic air contaminants under both UV and visible light was reported. X-ray diffraction (XRD), UV–Vis spectroscopy, photoluminescence (PL), Temperature-programmed desorption (TPD), and X-ray photoelectron spectroscopy (XPS) were used to characterize the prepared TiO 2 nanoparticles. Carbon atoms were doped into TiO 2 by replacing titanium atoms whereas chlorine located on TiO 2 surface to form Ti–Cl bond via the coordination with Ti 4+ sites by plasma treatment. The carbon doping amount and surface chlorine content of TiO 2 under H 2 –CCl 4 mixture plasma treatment were obviously higher than that under single CCl 4 plasma treatment. H 2 –CCl 4 mixture plasma treated catalyst exhibited much higher Photocatalytic Oxidation performances of benzene and toluene than that of single CCl 4 plasma treated catalyst and P25 under both UV and visible light. Chlorine radicals formed under illumination are effective in oxidizing aromatic side groups, but ineffective in reactions with the aromatic ring, thus benzene conversions were lower than that of toluene under both UV and visible light. The possible mechanism was proposed.

  • a convenient n2 ccl4 mixture plasma treatment to improve tio2 Photocatalytic Oxidation of aromatic air contaminants under both uv and visible light
    Applied Surface Science, 2013
    Co-Authors: Shaozheng Hu, Fayun Li
    Abstract:

    Abstract A convenient N 2 –CCl 4 mixture plasma treatment to improve TiO 2 Photocatalytic Oxidation of aromatic air contaminants under both UV and visible light was reported. X-ray diffraction (XRD), N 2 adsorption, UV–vis spectroscopy, photoluminescence (PL), and X-ray photoelectron spectroscopy (XPS) were used to characterize the prepared TiO 2 catalysts. The microstructures of the TiO 2 catalysts were preserved after plasma treatments. Chlorine ions did not doped into TiO 2 lattice but located on TiO 2 surface via the coordination with Ti 4+ sites. The doping N content of prepared TiO 2 catalyst increased obviously by using this N 2 –CCl 4 mixture plasma method. The activities were tested in the Photocatalytic Oxidation of benzene and toluene under both UV and visible light. Chlorine radicals which formed under illumination are effective in oxidizing aromatic side groups, but ineffective in reactions with the aromatic ring.

Detlef W Bahnemann - One of the best experts on this subject based on the ideXlab platform.

  • light intensity dependence of the kinetics of the Photocatalytic Oxidation of nitrogen ii oxide at the surface of tio2
    Physical Chemistry Chemical Physics, 2013
    Co-Authors: Ralf Dillert, Astrid Engel, Julia Grose, Patrick Lindner, Detlef W Bahnemann
    Abstract:

    Air pollution by nitrogen oxides represents a serious environmental problem in urban areas where numerous sources of these pollutants are concentrated. One approach to reduce the concentration of these air pollutants is their light-induced Oxidation in the presence of molecular oxygen and a Photocatalytically active building material which uses titanium dioxide as the photocatalyst. Herein, results of an investigation concerning the influence of the photon flux and the pollutant concentration on the rate of the Photocatalytic Oxidation of nitrogen(II) oxide in the presence of molecular oxygen and UV(A) irradiated titanium dioxide powder are presented. A Langmuir–Hinshelwood-type rate law for the Photocatalytic NO Oxidation inside the photoreactor comprising four kinetic parameters is derived being suitable to describe the influence of the pollutant concentration and the photon flux on the rate of the Photocatalytic Oxidation of nitrogen(II) oxide.

  • influence of inlet concentration and light intensity on the Photocatalytic Oxidation of nitrogen ii oxide at the surface of aeroxide tio2 p25
    Journal of Hazardous Materials, 2012
    Co-Authors: Ralf Dillert, Astrid Engel, Julia Stotzner, Detlef W Bahnemann
    Abstract:

    Abstract Air pollution by nitrogen oxides represents a serious environmental problem in urban areas where numerous sources of these pollutants are concentrated. One approach to reduce the concentration of these air pollutants is the light-induced Oxidation in the presence of molecular oxygen and a Photocatalytically active building material, e.g., paints, roof tiles, or pavement stones. Herein, results of an investigation concerning the Photocatalytic Oxidation of nitrogen(II) oxide (NO) in the presence of molecular oxygen and UV(A) irradiated TiO2 powder are presented. The standard operating procedure described in ISO 22197-1 which was developed to characterize the Photocatalytic activity of air-cleaning products was successfully applied to determine the Photocatalytic activity of a bare TiO2 powder. The experimental data reveal that at the light intensity stipulated by the operation procedure the amount of NO removed from the gas phase by Photocatalytic Oxidation is strongly affected by small changes of this light intensity as well as of the NO concentration in the gas stream in the photoreactor. Therefore, these parameters have to be controlled very carefully. Based upon the experimental data obtained in this study a rate law for the Photocatalytic NO Oxidation inside the photoreactor is derived.

Shinya Higashimoto - One of the best experts on this subject based on the ideXlab platform.

Shaozheng Hu - One of the best experts on this subject based on the ideXlab platform.

  • the effect of h2 ccl4 mixture plasma treatment on tio2 Photocatalytic Oxidation of aromatic air contaminants under both uv and visible light
    Chemical Engineering Journal, 2014
    Co-Authors: Shaozheng Hu, Fayun Li
    Abstract:

    Abstract The effect of H 2 –CCl 4 mixture plasma treatment on TiO 2 Photocatalytic Oxidation of aromatic air contaminants under both UV and visible light was reported. X-ray diffraction (XRD), UV–Vis spectroscopy, photoluminescence (PL), Temperature-programmed desorption (TPD), and X-ray photoelectron spectroscopy (XPS) were used to characterize the prepared TiO 2 nanoparticles. Carbon atoms were doped into TiO 2 by replacing titanium atoms whereas chlorine located on TiO 2 surface to form Ti–Cl bond via the coordination with Ti 4+ sites by plasma treatment. The carbon doping amount and surface chlorine content of TiO 2 under H 2 –CCl 4 mixture plasma treatment were obviously higher than that under single CCl 4 plasma treatment. H 2 –CCl 4 mixture plasma treated catalyst exhibited much higher Photocatalytic Oxidation performances of benzene and toluene than that of single CCl 4 plasma treated catalyst and P25 under both UV and visible light. Chlorine radicals formed under illumination are effective in oxidizing aromatic side groups, but ineffective in reactions with the aromatic ring, thus benzene conversions were lower than that of toluene under both UV and visible light. The possible mechanism was proposed.

  • a convenient n2 ccl4 mixture plasma treatment to improve tio2 Photocatalytic Oxidation of aromatic air contaminants under both uv and visible light
    Applied Surface Science, 2013
    Co-Authors: Shaozheng Hu, Fayun Li
    Abstract:

    Abstract A convenient N 2 –CCl 4 mixture plasma treatment to improve TiO 2 Photocatalytic Oxidation of aromatic air contaminants under both UV and visible light was reported. X-ray diffraction (XRD), N 2 adsorption, UV–vis spectroscopy, photoluminescence (PL), and X-ray photoelectron spectroscopy (XPS) were used to characterize the prepared TiO 2 catalysts. The microstructures of the TiO 2 catalysts were preserved after plasma treatments. Chlorine ions did not doped into TiO 2 lattice but located on TiO 2 surface via the coordination with Ti 4+ sites. The doping N content of prepared TiO 2 catalyst increased obviously by using this N 2 –CCl 4 mixture plasma method. The activities were tested in the Photocatalytic Oxidation of benzene and toluene under both UV and visible light. Chlorine radicals which formed under illumination are effective in oxidizing aromatic side groups, but ineffective in reactions with the aromatic ring.

Masakazu Anpo - One of the best experts on this subject based on the ideXlab platform.