The Experts below are selected from a list of 8049 Experts worldwide ranked by ideXlab platform

Osamu Hashimoto - One of the best experts on this subject based on the ideXlab platform.

  • Design of thin wave absorbers using closely placed divided conductive Film and Resistive Film
    2011
    Co-Authors: Yuki Tsuda, Takenori Yasuzumi, Osamu Hashimoto
    Abstract:

    In this paper, design of thin wave absorbers using an admittance-sheet composed of closely placed Resistive Film and divided conductive Film is studied. The admittance of the sheet has frequency dependence because of the mutual influence between the Films. The matching frequency of the absorber depends on its thickness (< λ/4) and susceptance of the sheet. Likewise the reflection value at the frequency depends on conductance of the sheet. Then, the design charts of the absorbers to perfect match at target frequencies are illustrated, and demonstrated the practicality by simulation of the reflection characteristics of the absorbers which designed based on it.

  • A Thin Wave Absorber Using Closely Placed Divided Conductive Film and Resistive Film
    IEEE Antennas and Wireless Propagation Letters, 2011
    Co-Authors: Yuki Tsuda, Takenori Yasuzumi, Osamu Hashimoto
    Abstract:

    In this letter, the design for a thin wave absorber using an admittance sheet composed of closely placed Resistive Film and divided conductive Film is studied. The admittance of the sheet has frequency dependence because of the mutual influence between the Films. The matching frequency of the absorber depends on its thickness (

  • study of temperature distribution of λ 4 type em absorber using Resistive Film under high power injection
    European Microwave Conference, 2006
    Co-Authors: Shinya Watanabe, Osamu Hashimoto, K Saito, A Taniguchi, T Saito, Hiroshi Kurihara
    Abstract:

    In this paper, first, FDTD, Semi-Implicit Method for Pressure Linked Equations (SIMPLE), Monte Carlo and Radiative Energy Absorption Distribution (READ) methods are combined to calculate electromagnetic field and all the heat transfer phenomena of heat transport, heat transfer by air convection and heat radiation (It is called FDTD-SIMPLE-MR method.). The temperature distribution of λ/4 type EM-absorber using Resistive Film under high power injection is calculated using FDTD-SIMPLE-MR method. Next, the high power injection experiment is conducted using an absorber and high power RF instruments to get the temperature distribution experimentally. Finally, the calculated and measured temperature distributions of the absorber are compared. As a result, the calculated temperature distribution by FDTD-SIMPLE-MR method agrees well with the measured one and the validity of FDTD-SIMPLE-MR method is confirmed.

  • Investigation on EM wave absorbers by using Resistive Film with capacitive reactance
    IEICE Transactions on Electronics, 2005
    Co-Authors: Hiroshi Kurihara, Toshifumi Saito, Koji Takizawa, Osamu Hashimoto
    Abstract:

    It is known that the thickness of the λ/4 type EM wave absorber having a Resistive Film with the capacitive reactance is thinner than 1/4 wavelength. This paper investigates EM wave absorbers using the Resistive Film with capacitive reactance. We introduced the impedance into the Resistive Film, and then clarified the relationship between the impedance and the matching thickness in the single layer EM wave absorber. Practically, we carried out to grasp the impedance of the Resistive Films, which were prepared using the conductive flake powder. As the results, we have proven that the matching thickness in the single layer EM wave absorber could be realized 0.17 λ - 0.09 λ in the frequency range from 2 GHz to 8 GHz by using these Resistive Films. We also fabricated the single Resistive layer and the double Resistive layers EM wave absorber using these Resistive Films for Dedicated Short Range Communications (DSRC) and wireless Local Area Network (LAN), in which the matching thickness could be reduced to 45% and 30%, respectively, as compared with the each absorber using the non-capacitive reactance.

  • temperature distribution analysis of spl lambda 4 type em absorber using Resistive Film
    International Symposium on Electromagnetic Compatibility, 2005
    Co-Authors: Shinya Watanabe, K Iino, K Saito, Osamu Hashimoto
    Abstract:

    This paper describes the temperature distribution analysis of lambda/4 type EM-absorber using Resistive Film when high electric power is injected to the absorber. For the temperature analysis, FDTD method is used to analyze electromagnetics and SIMPLE (semi-implicit method for pressure linked equations) method is used for calculation of heat transport and air convection enabling to analyze local heat transfer more strictly than heat transport equation (HTE) method which is the traditional heat transport analysis method. And we propose four types of wave absorbers to analyze these temperature distribution on the Resistive Film to find the best type with least temperature rise. As a result, when glass and metal plates are used for spacer and reflector, respectively, the absorber proved to be the best one from a view point of temperature descent. And it is shown that the temperature range does not cause the change of absorbing characteristics in the analysis but the temperature rise exceeds 160 degC, the characteristics may change

Yar Ming Wang - One of the best experts on this subject based on the ideXlab platform.

  • effect of alloy types on the anodizing process of aluminum
    Surface & Coatings Technology, 2006
    Co-Authors: I Tsangarakikaplanoglou, S. Theohari, Th Dimogerontakis, Yar Ming Wang
    Abstract:

    Specimens of AA 5083 and AA 6111 (unheat- and heat-treated) were investigated in comparison with the pure aluminum during anodizing in sulfuric acid bath using electrochemical techniques, SEM/EDS and XRF. The alloy type affects the kinetics of anodizing but certain qualitative characteristics and the basic aspects of the anodizing mechanism are similar for the alloys and pure aluminum. We found that for AA 6111 alloy, the stage of rearrangement of the pores during anodizing before the current reaches a steady-state value is missing due to enrichment of the alloying elements at the oxide/metal interface. For alloys under certain anodizing conditions, formation of a Resistive Film at the bottom of the pores results in decreasing anodizing current. This phenomenon is more prevalent for AA 5083 alloy than for AA 6111. For AA 6111 alloy, the heat treatment affects anodizing kinetics and improves the anodizing efficiency. Understanding the effect of alloy types on anodizing process under various operating conditions (voltage, temperature and sulfuric acid concentration) will enable us to optimize porous oxide structures for improved coating performance in color ability and corrosion resistance.

Shinya Watanabe - One of the best experts on this subject based on the ideXlab platform.

  • study of temperature distribution of λ 4 type em absorber using Resistive Film under high power injection
    European Microwave Conference, 2006
    Co-Authors: Shinya Watanabe, Osamu Hashimoto, K Saito, A Taniguchi, T Saito, Hiroshi Kurihara
    Abstract:

    In this paper, first, FDTD, Semi-Implicit Method for Pressure Linked Equations (SIMPLE), Monte Carlo and Radiative Energy Absorption Distribution (READ) methods are combined to calculate electromagnetic field and all the heat transfer phenomena of heat transport, heat transfer by air convection and heat radiation (It is called FDTD-SIMPLE-MR method.). The temperature distribution of λ/4 type EM-absorber using Resistive Film under high power injection is calculated using FDTD-SIMPLE-MR method. Next, the high power injection experiment is conducted using an absorber and high power RF instruments to get the temperature distribution experimentally. Finally, the calculated and measured temperature distributions of the absorber are compared. As a result, the calculated temperature distribution by FDTD-SIMPLE-MR method agrees well with the measured one and the validity of FDTD-SIMPLE-MR method is confirmed.

  • temperature distribution analysis of spl lambda 4 type em absorber using Resistive Film
    International Symposium on Electromagnetic Compatibility, 2005
    Co-Authors: Shinya Watanabe, K Iino, K Saito, Osamu Hashimoto
    Abstract:

    This paper describes the temperature distribution analysis of lambda/4 type EM-absorber using Resistive Film when high electric power is injected to the absorber. For the temperature analysis, FDTD method is used to analyze electromagnetics and SIMPLE (semi-implicit method for pressure linked equations) method is used for calculation of heat transport and air convection enabling to analyze local heat transfer more strictly than heat transport equation (HTE) method which is the traditional heat transport analysis method. And we propose four types of wave absorbers to analyze these temperature distribution on the Resistive Film to find the best type with least temperature rise. As a result, when glass and metal plates are used for spacer and reflector, respectively, the absorber proved to be the best one from a view point of temperature descent. And it is shown that the temperature range does not cause the change of absorbing characteristics in the analysis but the temperature rise exceeds 160 degC, the characteristics may change

  • Temperature distribution analysis of /spl lambda//4 type EM-absorber using Resistive Film
    2005 International Symposium on Electromagnetic Compatibility 2005. EMC 2005., 2005
    Co-Authors: Shinya Watanabe, K Iino, K Saito, O. Hashimoto
    Abstract:

    This paper describes the temperature distribution analysis of lambda/4 type EM-absorber using Resistive Film when high electric power is injected to the absorber. For the temperature analysis, FDTD method is used to analyze electromagnetics and SIMPLE (semi-implicit method for pressure linked equations) method is used for calculation of heat transport and air convection enabling to analyze local heat transfer more strictly than heat transport equation (HTE) method which is the traditional heat transport analysis method. And we propose four types of wave absorbers to analyze these temperature distribution on the Resistive Film to find the best type with least temperature rise. As a result, when glass and metal plates are used for spacer and reflector, respectively, the absorber proved to be the best one from a view point of temperature descent. And it is shown that the temperature range does not cause the change of absorbing characteristics in the analysis but the temperature rise exceeds 160 degC, the characteristics may change

K Saito - One of the best experts on this subject based on the ideXlab platform.

  • study of temperature distribution of λ 4 type em absorber using Resistive Film under high power injection
    European Microwave Conference, 2006
    Co-Authors: Shinya Watanabe, Osamu Hashimoto, K Saito, A Taniguchi, T Saito, Hiroshi Kurihara
    Abstract:

    In this paper, first, FDTD, Semi-Implicit Method for Pressure Linked Equations (SIMPLE), Monte Carlo and Radiative Energy Absorption Distribution (READ) methods are combined to calculate electromagnetic field and all the heat transfer phenomena of heat transport, heat transfer by air convection and heat radiation (It is called FDTD-SIMPLE-MR method.). The temperature distribution of λ/4 type EM-absorber using Resistive Film under high power injection is calculated using FDTD-SIMPLE-MR method. Next, the high power injection experiment is conducted using an absorber and high power RF instruments to get the temperature distribution experimentally. Finally, the calculated and measured temperature distributions of the absorber are compared. As a result, the calculated temperature distribution by FDTD-SIMPLE-MR method agrees well with the measured one and the validity of FDTD-SIMPLE-MR method is confirmed.

  • temperature distribution analysis of spl lambda 4 type em absorber using Resistive Film
    International Symposium on Electromagnetic Compatibility, 2005
    Co-Authors: Shinya Watanabe, K Iino, K Saito, Osamu Hashimoto
    Abstract:

    This paper describes the temperature distribution analysis of lambda/4 type EM-absorber using Resistive Film when high electric power is injected to the absorber. For the temperature analysis, FDTD method is used to analyze electromagnetics and SIMPLE (semi-implicit method for pressure linked equations) method is used for calculation of heat transport and air convection enabling to analyze local heat transfer more strictly than heat transport equation (HTE) method which is the traditional heat transport analysis method. And we propose four types of wave absorbers to analyze these temperature distribution on the Resistive Film to find the best type with least temperature rise. As a result, when glass and metal plates are used for spacer and reflector, respectively, the absorber proved to be the best one from a view point of temperature descent. And it is shown that the temperature range does not cause the change of absorbing characteristics in the analysis but the temperature rise exceeds 160 degC, the characteristics may change

  • Temperature distribution analysis of /spl lambda//4 type EM-absorber using Resistive Film
    2005 International Symposium on Electromagnetic Compatibility 2005. EMC 2005., 2005
    Co-Authors: Shinya Watanabe, K Iino, K Saito, O. Hashimoto
    Abstract:

    This paper describes the temperature distribution analysis of lambda/4 type EM-absorber using Resistive Film when high electric power is injected to the absorber. For the temperature analysis, FDTD method is used to analyze electromagnetics and SIMPLE (semi-implicit method for pressure linked equations) method is used for calculation of heat transport and air convection enabling to analyze local heat transfer more strictly than heat transport equation (HTE) method which is the traditional heat transport analysis method. And we propose four types of wave absorbers to analyze these temperature distribution on the Resistive Film to find the best type with least temperature rise. As a result, when glass and metal plates are used for spacer and reflector, respectively, the absorber proved to be the best one from a view point of temperature descent. And it is shown that the temperature range does not cause the change of absorbing characteristics in the analysis but the temperature rise exceeds 160 degC, the characteristics may change

Ivanka Stanimirović - One of the best experts on this subject based on the ideXlab platform.

  • Statistical Description of High-Voltage Pulse Trimming of RuO 2 and Bi 2 Ru 2 O 7 -Based Thick Resistive Films
    IEEE Transactions on Electron Devices, 2020
    Co-Authors: Z. Stanimirovic, Ivanka Stanimirović
    Abstract:

    The revival of thick-Film technology can be attributed to the increasing demand for thick-Film resistors that are being used both as sensing and as Resistive elements in various contemporary applications such as various types of micro-electromechanical system (MEMS) sensors based on low temperature co-fired ceramic (LTCC) technology. New stricter requirements that, among others, include precise resistance values and increasing use of buried components brought to the focus the high-voltage pulse trimming process that can provide precise and reliable resistance tuning. In order to improve understanding of experimental findings related to resistors trimmed using energy of high-voltage pulses, this article focuses on statistical approach to high-voltage pulse trimming of RuO2 and Bi2Ru2O7-based thick Resistive Films. The bimodal conductance distribution model is used in the analysis of trimming effects on the Resistive Film and in evaluation of low-frequency noise induced by the high-voltage pulse trimming process where conduction fluctuations noise is caused by fluctuations of two local conductances. Expressions for the total conductance and the relative voltage noise spectrum of thick Resistive Film are given and analyzed using experimental investigations.