The Experts below are selected from a list of 276 Experts worldwide ranked by ideXlab platform

Th Detzel - One of the best experts on this subject based on the ideXlab platform.

  • growth of ultrathin iron films on cu 001 an ion scattering spectroscopy study
    Surface Science, 1993
    Co-Authors: Th Detzel, N Memmel, Th Fauster
    Abstract:

    Abstract Low-energy ion scattering has been applied to study the pseudomorphic growth of ultrathin fee iron films on a Cu(001) Single-Crystal Surface. At all coverages — even as low as 0.1 monolayer (ML) — iron is found to about equal amounts in both the Surface and the first subSurface layer, since part of the iron atoms are incorporated into the original copper Surface. This is particular evident for the 0.1 ML film, which does not exhibit any iron defects, such as steps or adatoms. Instead copper Surface defects become visible upon iron deposition. Near 2 ML the substrate is covered for the most part by a relatively smooth bilayer indicating the coalescence of the iron islands. Up to a film thickness of around 6 ML the Surface defect density of the iron layers decreases with increasing coverage and raises again at larger coverages. Above ∽ 10 ML the pseudomorphic fee growth breaks down and domains of bcc iron with (110) orientation are formed.

Zhongqun Tian - One of the best experts on this subject based on the ideXlab platform.

Th Fauster - One of the best experts on this subject based on the ideXlab platform.

  • growth of ultrathin iron films on cu 001 an ion scattering spectroscopy study
    Surface Science, 1993
    Co-Authors: Th Detzel, N Memmel, Th Fauster
    Abstract:

    Abstract Low-energy ion scattering has been applied to study the pseudomorphic growth of ultrathin fee iron films on a Cu(001) Single-Crystal Surface. At all coverages — even as low as 0.1 monolayer (ML) — iron is found to about equal amounts in both the Surface and the first subSurface layer, since part of the iron atoms are incorporated into the original copper Surface. This is particular evident for the 0.1 ML film, which does not exhibit any iron defects, such as steps or adatoms. Instead copper Surface defects become visible upon iron deposition. Near 2 ML the substrate is covered for the most part by a relatively smooth bilayer indicating the coalescence of the iron islands. Up to a film thickness of around 6 ML the Surface defect density of the iron layers decreases with increasing coverage and raises again at larger coverages. Above ∽ 10 ML the pseudomorphic fee growth breaks down and domains of bcc iron with (110) orientation are formed.

Hiroshi Daimon - One of the best experts on this subject based on the ideXlab platform.

  • electron hole recombination on zno 0001 Single Crystal Surface studied by time resolved soft x ray photoelectron spectroscopy
    Applied Physics Letters, 2014
    Co-Authors: Ryu Yukawa, Susumu Yamamoto, Kenichi Ozawa, Masato Emori, M Ogawa, Sh Yamamoto, K Fujikawa, Rei Hobara, S Kitagawa, Hiroshi Daimon
    Abstract:

    Time-resolved soft X-ray photoelectron spectroscopy (PES) experiments were performed with time scales from picoseconds to nanoseconds to trace relaxation of Surface photovoltage on the ZnO(0001) Single Crystal Surface in real time. The band diagram of the Surface has been obtained numerically using PES data, showing a depletion layer which extends to 1 μm. Temporal evolution of the photovoltage effect is well explained by a recombination process of a thermionic model, giving the photoexcited carrier lifetime of about 1 ps at the Surface under the flat band condition. This lifetime agrees with a temporal range reported by the previous time-resolved optical experiments.

Michael Bowker - One of the best experts on this subject based on the ideXlab platform.

  • measurement of the Surface growth kinetics of reduced tio2 110 during reoxidation using time resolved scanning tunneling microscopy
    Physical Review B, 2002
    Co-Authors: R D Smith, R A Bennett, Michael Bowker
    Abstract:

    We have employed variable-temperature scanning tunneling microscopy (STM) to follow the kinetics of reoxidation of a nonstoichiometric TiO2 (110) Single-Crystal Surface. The Surface is seen to grow during reoxidation between 573 and 1000 K and at pressures from 5A—10-8 to 2A—10-6 mbar O2. The reaction proceeds by combination of gas-phase O2 with mobile interstitial Ti3+ from the bulk. The Surface is observed to grow new layers of TiO2 in a cyclic process, resulting in the formation of alternate layers of (1A—1) and cross-linked (1A—2). The growth rate was calculated by measuring the area of new material grown on consecutive STM images of the same area. The rate shows a linear dependence upon oxygen pressure, with an Arrhenius plot indicating an activation barrier of ∼25±4 kJ mol-1 (0.25±0.04 eV/O2 molecule) for the Surface reaction.