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Petr Vasina - One of the best experts on this subject based on the ideXlab platform.
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Titanium Atom and Ion Number Density Evolution in Reactive HiPIMS with Oxygen‚ Nitrogen and Acetylene Gas
2019Co-Authors: Matej Fekete, Daniel Lundin, Katarina Bernatova, Peter Klein, Jaroslav Hnilica, Petr VasinaAbstract:Reactive high power impulse magnetron sputtering (R-HiPIMS) offers a great opportunity for high quality coating production thus understanding the processes accompanying deposition is of great importance. The hysteresis curve in R-HiPIMS generally exhibits a narrower shape compared to dcMS‚ or it can even be entirely suppressed‚ which is beneficial for high-rate deposition of stoichiometric compound films. The main reason of the hysteresis suppression is not yet completely understood. A recently developed effective branching fraction method is utilized to determine absolute ground state number densities of sputtered Titanium species from the optical-emission signal. We report on evolutions of Titanium Atom and ion ground state densities in R-HiPIMS discharges in oxygen‚ nitrogen and acetylene gases for constant mean power and pulse duration‚ when varying the repetition frequency. A fast feedback system is employed to allow working in the transition region of the hysteresis curve in a well-controlled manner. The ionization fraction of sputtered species increases with the partial pressure of the reactive gas. The increased ionization of Titanium is attributed to the combination of the following effects: a longer residual time of sputtered species in the target vicinity; a higher maximal discharge current attained at the end of the pulse; lower amount of sputtered species due to the target poisoning which may positively affect electron distribution function. It is furthermore found that the hysteresis curve shape changes when varying the repetition frequency at the same mean power. The difference is more pronounced for R-HiPIMS with higher sputtered species ionization fraction. The experimental results are compared to the results obtained by a reactive ionization region model (R-IRM). The absolute ground state number densities of Ti Atoms and Ti ions measured at the target vicinity are also substituted into the Berg model modified to include ion back attraction‚ and a rather good match between the measurements and simulation results for different experimental conditions is found.
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Titanium Atom and ion number density evolution in reactive high power impulse magnetron sputtering
2018Co-Authors: Matej Fekete, Daniel Lundin, Katarina Bernatova, Peter Klein, Jaroslav Hnilica, Petr VasinaAbstract:The hysteresis curve in R-HiPIMS generally exhibits a narrower shape compared to dcMS, or it can even be entirely suppressed, which is beneficial for high-rate deposition of stoichiometric compound films. However, the main effect behind the hysteresis suppression is not yet completely understood. We report on evolutions of Titanium Atom, and ion ground state densities in R-HiPIMS discharges in oxygen for constant mean power and pulse duration, when varying the repetition frequency.
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Titanium Atom and ion number density evolution in reactive hipims
2017Co-Authors: Matej Fekete, Katarina Bernatova, Peter Klein, Jaroslav Hnilica, Petr VasinaAbstract:The shape of the hysteresis curve in R-HiPIMS was noticeable different from that one of dc magnetron sputtering operation at the same mean power – the transition from the metallic to compound mode and vice versa were shifted to lower reactive gas supply and the width of the hysteresis curve was reduced. These changes were more pronounced for R-HiPIMS processes with higher ionized fraction of the sputtered species. The modified Berg model assuming that a part of the sputtered and ionized species are back-attracted to the target was developed.
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evolution of Titanium Atom and ion density in reactive hipims impact on hysteresis curve shape
2017Co-Authors: Matej Fekete, Katarina Bernatova, Peter Klein, Jaroslav Hnilica, Petr VasinaAbstract:Likewise as the reactive dc or pulsed-dc sputtering, the R-HiPIMS undergoes hysteresis behaviour, however the hysteresis may be minimised or even suppressed by optimizing the R-HiPIMS process parameters. The exact mechanism behind the hysteresis suppression is still unknown and therefore this issue is yet highly disputed in the scientific community. In this paper, we report the evolution of the sputtered Ti Atom and ion ground state densities in R-HiPIMS for both nitrogen and oxygen gasses.
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determination of Titanium Atom and ion densities in sputter deposition plasmas by optical emission spectroscopy
Plasma Sources Science and Technology, 2015Co-Authors: Petr Vasina, Matej Fekete, Peter Klein, Jaroslav Hnilica, Lenka Dosoudilova, Pavel Dvořak, Zdeněk NavratilAbstract:The thorough characterizations of deposition plasma lead to important achievements in the fundamental understanding of the deposition process, with a clear impact on the development of technology. Measurement of the spatial and, in the case of pulse excited plasma, also temporal evolution, of the concentrations of sputtered Atoms and ions is a primary task in the diagnostics of any sputter deposition plasma. However, it is difficult to estimate absolute number densities of the sputtered species (Atoms and ions) in ground states directly from optical emission spectroscopy, because the species in the ground levels do not produce any optical signal. A method using effective branching fractions enables us to determine the density of non-radiating species from the intensities of self-absorbed spectral lines. The branching fractions method described in the first part of this paper was applied to determine the ground state densities of the sputtered Titanium Atoms and ions. The method is based on fitting the theoretically calculated branching fractions to experimentally measured ratios of the relative intensities of carefully selected resonant Titanium Atomic and ionic lines. The sputtered species density is determined in our experimental setup with a relative uncertainty of less than 5% for the dc driven magnetron and typically 15% for time-resolved measurements of high- power impulse magnetron sputtering (HiPIMS) discharge. In the second part of the paper, the method was applied to determine the evolution of Titanium Atom and ion densities in three typical cases ranging from the dc driven sputter process to HiPIMS.
Matej Fekete - One of the best experts on this subject based on the ideXlab platform.
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Titanium Atom and Ion Number Density Evolution in Reactive HiPIMS with Oxygen‚ Nitrogen and Acetylene Gas
2019Co-Authors: Matej Fekete, Daniel Lundin, Katarina Bernatova, Peter Klein, Jaroslav Hnilica, Petr VasinaAbstract:Reactive high power impulse magnetron sputtering (R-HiPIMS) offers a great opportunity for high quality coating production thus understanding the processes accompanying deposition is of great importance. The hysteresis curve in R-HiPIMS generally exhibits a narrower shape compared to dcMS‚ or it can even be entirely suppressed‚ which is beneficial for high-rate deposition of stoichiometric compound films. The main reason of the hysteresis suppression is not yet completely understood. A recently developed effective branching fraction method is utilized to determine absolute ground state number densities of sputtered Titanium species from the optical-emission signal. We report on evolutions of Titanium Atom and ion ground state densities in R-HiPIMS discharges in oxygen‚ nitrogen and acetylene gases for constant mean power and pulse duration‚ when varying the repetition frequency. A fast feedback system is employed to allow working in the transition region of the hysteresis curve in a well-controlled manner. The ionization fraction of sputtered species increases with the partial pressure of the reactive gas. The increased ionization of Titanium is attributed to the combination of the following effects: a longer residual time of sputtered species in the target vicinity; a higher maximal discharge current attained at the end of the pulse; lower amount of sputtered species due to the target poisoning which may positively affect electron distribution function. It is furthermore found that the hysteresis curve shape changes when varying the repetition frequency at the same mean power. The difference is more pronounced for R-HiPIMS with higher sputtered species ionization fraction. The experimental results are compared to the results obtained by a reactive ionization region model (R-IRM). The absolute ground state number densities of Ti Atoms and Ti ions measured at the target vicinity are also substituted into the Berg model modified to include ion back attraction‚ and a rather good match between the measurements and simulation results for different experimental conditions is found.
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Titanium Atom and ion number density evolution in reactive high power impulse magnetron sputtering
2018Co-Authors: Matej Fekete, Daniel Lundin, Katarina Bernatova, Peter Klein, Jaroslav Hnilica, Petr VasinaAbstract:The hysteresis curve in R-HiPIMS generally exhibits a narrower shape compared to dcMS, or it can even be entirely suppressed, which is beneficial for high-rate deposition of stoichiometric compound films. However, the main effect behind the hysteresis suppression is not yet completely understood. We report on evolutions of Titanium Atom, and ion ground state densities in R-HiPIMS discharges in oxygen for constant mean power and pulse duration, when varying the repetition frequency.
-
Titanium Atom and ion number density evolution in reactive hipims
2017Co-Authors: Matej Fekete, Katarina Bernatova, Peter Klein, Jaroslav Hnilica, Petr VasinaAbstract:The shape of the hysteresis curve in R-HiPIMS was noticeable different from that one of dc magnetron sputtering operation at the same mean power – the transition from the metallic to compound mode and vice versa were shifted to lower reactive gas supply and the width of the hysteresis curve was reduced. These changes were more pronounced for R-HiPIMS processes with higher ionized fraction of the sputtered species. The modified Berg model assuming that a part of the sputtered and ionized species are back-attracted to the target was developed.
-
evolution of Titanium Atom and ion density in reactive hipims impact on hysteresis curve shape
2017Co-Authors: Matej Fekete, Katarina Bernatova, Peter Klein, Jaroslav Hnilica, Petr VasinaAbstract:Likewise as the reactive dc or pulsed-dc sputtering, the R-HiPIMS undergoes hysteresis behaviour, however the hysteresis may be minimised or even suppressed by optimizing the R-HiPIMS process parameters. The exact mechanism behind the hysteresis suppression is still unknown and therefore this issue is yet highly disputed in the scientific community. In this paper, we report the evolution of the sputtered Ti Atom and ion ground state densities in R-HiPIMS for both nitrogen and oxygen gasses.
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determination of Titanium Atom and ion densities in sputter deposition plasmas by optical emission spectroscopy
Plasma Sources Science and Technology, 2015Co-Authors: Petr Vasina, Matej Fekete, Peter Klein, Jaroslav Hnilica, Lenka Dosoudilova, Pavel Dvořak, Zdeněk NavratilAbstract:The thorough characterizations of deposition plasma lead to important achievements in the fundamental understanding of the deposition process, with a clear impact on the development of technology. Measurement of the spatial and, in the case of pulse excited plasma, also temporal evolution, of the concentrations of sputtered Atoms and ions is a primary task in the diagnostics of any sputter deposition plasma. However, it is difficult to estimate absolute number densities of the sputtered species (Atoms and ions) in ground states directly from optical emission spectroscopy, because the species in the ground levels do not produce any optical signal. A method using effective branching fractions enables us to determine the density of non-radiating species from the intensities of self-absorbed spectral lines. The branching fractions method described in the first part of this paper was applied to determine the ground state densities of the sputtered Titanium Atoms and ions. The method is based on fitting the theoretically calculated branching fractions to experimentally measured ratios of the relative intensities of carefully selected resonant Titanium Atomic and ionic lines. The sputtered species density is determined in our experimental setup with a relative uncertainty of less than 5% for the dc driven magnetron and typically 15% for time-resolved measurements of high- power impulse magnetron sputtering (HiPIMS) discharge. In the second part of the paper, the method was applied to determine the evolution of Titanium Atom and ion densities in three typical cases ranging from the dc driven sputter process to HiPIMS.
Jaroslav Hnilica - One of the best experts on this subject based on the ideXlab platform.
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Titanium Atom and Ion Number Density Evolution in Reactive HiPIMS with Oxygen‚ Nitrogen and Acetylene Gas
2019Co-Authors: Matej Fekete, Daniel Lundin, Katarina Bernatova, Peter Klein, Jaroslav Hnilica, Petr VasinaAbstract:Reactive high power impulse magnetron sputtering (R-HiPIMS) offers a great opportunity for high quality coating production thus understanding the processes accompanying deposition is of great importance. The hysteresis curve in R-HiPIMS generally exhibits a narrower shape compared to dcMS‚ or it can even be entirely suppressed‚ which is beneficial for high-rate deposition of stoichiometric compound films. The main reason of the hysteresis suppression is not yet completely understood. A recently developed effective branching fraction method is utilized to determine absolute ground state number densities of sputtered Titanium species from the optical-emission signal. We report on evolutions of Titanium Atom and ion ground state densities in R-HiPIMS discharges in oxygen‚ nitrogen and acetylene gases for constant mean power and pulse duration‚ when varying the repetition frequency. A fast feedback system is employed to allow working in the transition region of the hysteresis curve in a well-controlled manner. The ionization fraction of sputtered species increases with the partial pressure of the reactive gas. The increased ionization of Titanium is attributed to the combination of the following effects: a longer residual time of sputtered species in the target vicinity; a higher maximal discharge current attained at the end of the pulse; lower amount of sputtered species due to the target poisoning which may positively affect electron distribution function. It is furthermore found that the hysteresis curve shape changes when varying the repetition frequency at the same mean power. The difference is more pronounced for R-HiPIMS with higher sputtered species ionization fraction. The experimental results are compared to the results obtained by a reactive ionization region model (R-IRM). The absolute ground state number densities of Ti Atoms and Ti ions measured at the target vicinity are also substituted into the Berg model modified to include ion back attraction‚ and a rather good match between the measurements and simulation results for different experimental conditions is found.
-
Titanium Atom and ion number density evolution in reactive high power impulse magnetron sputtering
2018Co-Authors: Matej Fekete, Daniel Lundin, Katarina Bernatova, Peter Klein, Jaroslav Hnilica, Petr VasinaAbstract:The hysteresis curve in R-HiPIMS generally exhibits a narrower shape compared to dcMS, or it can even be entirely suppressed, which is beneficial for high-rate deposition of stoichiometric compound films. However, the main effect behind the hysteresis suppression is not yet completely understood. We report on evolutions of Titanium Atom, and ion ground state densities in R-HiPIMS discharges in oxygen for constant mean power and pulse duration, when varying the repetition frequency.
-
Titanium Atom and ion number density evolution in reactive hipims
2017Co-Authors: Matej Fekete, Katarina Bernatova, Peter Klein, Jaroslav Hnilica, Petr VasinaAbstract:The shape of the hysteresis curve in R-HiPIMS was noticeable different from that one of dc magnetron sputtering operation at the same mean power – the transition from the metallic to compound mode and vice versa were shifted to lower reactive gas supply and the width of the hysteresis curve was reduced. These changes were more pronounced for R-HiPIMS processes with higher ionized fraction of the sputtered species. The modified Berg model assuming that a part of the sputtered and ionized species are back-attracted to the target was developed.
-
evolution of Titanium Atom and ion density in reactive hipims impact on hysteresis curve shape
2017Co-Authors: Matej Fekete, Katarina Bernatova, Peter Klein, Jaroslav Hnilica, Petr VasinaAbstract:Likewise as the reactive dc or pulsed-dc sputtering, the R-HiPIMS undergoes hysteresis behaviour, however the hysteresis may be minimised or even suppressed by optimizing the R-HiPIMS process parameters. The exact mechanism behind the hysteresis suppression is still unknown and therefore this issue is yet highly disputed in the scientific community. In this paper, we report the evolution of the sputtered Ti Atom and ion ground state densities in R-HiPIMS for both nitrogen and oxygen gasses.
-
determination of Titanium Atom and ion densities in sputter deposition plasmas by optical emission spectroscopy
Plasma Sources Science and Technology, 2015Co-Authors: Petr Vasina, Matej Fekete, Peter Klein, Jaroslav Hnilica, Lenka Dosoudilova, Pavel Dvořak, Zdeněk NavratilAbstract:The thorough characterizations of deposition plasma lead to important achievements in the fundamental understanding of the deposition process, with a clear impact on the development of technology. Measurement of the spatial and, in the case of pulse excited plasma, also temporal evolution, of the concentrations of sputtered Atoms and ions is a primary task in the diagnostics of any sputter deposition plasma. However, it is difficult to estimate absolute number densities of the sputtered species (Atoms and ions) in ground states directly from optical emission spectroscopy, because the species in the ground levels do not produce any optical signal. A method using effective branching fractions enables us to determine the density of non-radiating species from the intensities of self-absorbed spectral lines. The branching fractions method described in the first part of this paper was applied to determine the ground state densities of the sputtered Titanium Atoms and ions. The method is based on fitting the theoretically calculated branching fractions to experimentally measured ratios of the relative intensities of carefully selected resonant Titanium Atomic and ionic lines. The sputtered species density is determined in our experimental setup with a relative uncertainty of less than 5% for the dc driven magnetron and typically 15% for time-resolved measurements of high- power impulse magnetron sputtering (HiPIMS) discharge. In the second part of the paper, the method was applied to determine the evolution of Titanium Atom and ion densities in three typical cases ranging from the dc driven sputter process to HiPIMS.
Peter Klein - One of the best experts on this subject based on the ideXlab platform.
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Titanium Atom and Ion Number Density Evolution in Reactive HiPIMS with Oxygen‚ Nitrogen and Acetylene Gas
2019Co-Authors: Matej Fekete, Daniel Lundin, Katarina Bernatova, Peter Klein, Jaroslav Hnilica, Petr VasinaAbstract:Reactive high power impulse magnetron sputtering (R-HiPIMS) offers a great opportunity for high quality coating production thus understanding the processes accompanying deposition is of great importance. The hysteresis curve in R-HiPIMS generally exhibits a narrower shape compared to dcMS‚ or it can even be entirely suppressed‚ which is beneficial for high-rate deposition of stoichiometric compound films. The main reason of the hysteresis suppression is not yet completely understood. A recently developed effective branching fraction method is utilized to determine absolute ground state number densities of sputtered Titanium species from the optical-emission signal. We report on evolutions of Titanium Atom and ion ground state densities in R-HiPIMS discharges in oxygen‚ nitrogen and acetylene gases for constant mean power and pulse duration‚ when varying the repetition frequency. A fast feedback system is employed to allow working in the transition region of the hysteresis curve in a well-controlled manner. The ionization fraction of sputtered species increases with the partial pressure of the reactive gas. The increased ionization of Titanium is attributed to the combination of the following effects: a longer residual time of sputtered species in the target vicinity; a higher maximal discharge current attained at the end of the pulse; lower amount of sputtered species due to the target poisoning which may positively affect electron distribution function. It is furthermore found that the hysteresis curve shape changes when varying the repetition frequency at the same mean power. The difference is more pronounced for R-HiPIMS with higher sputtered species ionization fraction. The experimental results are compared to the results obtained by a reactive ionization region model (R-IRM). The absolute ground state number densities of Ti Atoms and Ti ions measured at the target vicinity are also substituted into the Berg model modified to include ion back attraction‚ and a rather good match between the measurements and simulation results for different experimental conditions is found.
-
Titanium Atom and ion number density evolution in reactive high power impulse magnetron sputtering
2018Co-Authors: Matej Fekete, Daniel Lundin, Katarina Bernatova, Peter Klein, Jaroslav Hnilica, Petr VasinaAbstract:The hysteresis curve in R-HiPIMS generally exhibits a narrower shape compared to dcMS, or it can even be entirely suppressed, which is beneficial for high-rate deposition of stoichiometric compound films. However, the main effect behind the hysteresis suppression is not yet completely understood. We report on evolutions of Titanium Atom, and ion ground state densities in R-HiPIMS discharges in oxygen for constant mean power and pulse duration, when varying the repetition frequency.
-
Titanium Atom and ion number density evolution in reactive hipims
2017Co-Authors: Matej Fekete, Katarina Bernatova, Peter Klein, Jaroslav Hnilica, Petr VasinaAbstract:The shape of the hysteresis curve in R-HiPIMS was noticeable different from that one of dc magnetron sputtering operation at the same mean power – the transition from the metallic to compound mode and vice versa were shifted to lower reactive gas supply and the width of the hysteresis curve was reduced. These changes were more pronounced for R-HiPIMS processes with higher ionized fraction of the sputtered species. The modified Berg model assuming that a part of the sputtered and ionized species are back-attracted to the target was developed.
-
evolution of Titanium Atom and ion density in reactive hipims impact on hysteresis curve shape
2017Co-Authors: Matej Fekete, Katarina Bernatova, Peter Klein, Jaroslav Hnilica, Petr VasinaAbstract:Likewise as the reactive dc or pulsed-dc sputtering, the R-HiPIMS undergoes hysteresis behaviour, however the hysteresis may be minimised or even suppressed by optimizing the R-HiPIMS process parameters. The exact mechanism behind the hysteresis suppression is still unknown and therefore this issue is yet highly disputed in the scientific community. In this paper, we report the evolution of the sputtered Ti Atom and ion ground state densities in R-HiPIMS for both nitrogen and oxygen gasses.
-
determination of Titanium Atom and ion densities in sputter deposition plasmas by optical emission spectroscopy
Plasma Sources Science and Technology, 2015Co-Authors: Petr Vasina, Matej Fekete, Peter Klein, Jaroslav Hnilica, Lenka Dosoudilova, Pavel Dvořak, Zdeněk NavratilAbstract:The thorough characterizations of deposition plasma lead to important achievements in the fundamental understanding of the deposition process, with a clear impact on the development of technology. Measurement of the spatial and, in the case of pulse excited plasma, also temporal evolution, of the concentrations of sputtered Atoms and ions is a primary task in the diagnostics of any sputter deposition plasma. However, it is difficult to estimate absolute number densities of the sputtered species (Atoms and ions) in ground states directly from optical emission spectroscopy, because the species in the ground levels do not produce any optical signal. A method using effective branching fractions enables us to determine the density of non-radiating species from the intensities of self-absorbed spectral lines. The branching fractions method described in the first part of this paper was applied to determine the ground state densities of the sputtered Titanium Atoms and ions. The method is based on fitting the theoretically calculated branching fractions to experimentally measured ratios of the relative intensities of carefully selected resonant Titanium Atomic and ionic lines. The sputtered species density is determined in our experimental setup with a relative uncertainty of less than 5% for the dc driven magnetron and typically 15% for time-resolved measurements of high- power impulse magnetron sputtering (HiPIMS) discharge. In the second part of the paper, the method was applied to determine the evolution of Titanium Atom and ion densities in three typical cases ranging from the dc driven sputter process to HiPIMS.
Zdeněk Navratil - One of the best experts on this subject based on the ideXlab platform.
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determination of Titanium Atom and ion densities in sputter deposition plasmas by optical emission spectroscopy
Plasma Sources Science and Technology, 2015Co-Authors: Petr Vasina, Matej Fekete, Peter Klein, Jaroslav Hnilica, Lenka Dosoudilova, Pavel Dvořak, Zdeněk NavratilAbstract:The thorough characterizations of deposition plasma lead to important achievements in the fundamental understanding of the deposition process, with a clear impact on the development of technology. Measurement of the spatial and, in the case of pulse excited plasma, also temporal evolution, of the concentrations of sputtered Atoms and ions is a primary task in the diagnostics of any sputter deposition plasma. However, it is difficult to estimate absolute number densities of the sputtered species (Atoms and ions) in ground states directly from optical emission spectroscopy, because the species in the ground levels do not produce any optical signal. A method using effective branching fractions enables us to determine the density of non-radiating species from the intensities of self-absorbed spectral lines. The branching fractions method described in the first part of this paper was applied to determine the ground state densities of the sputtered Titanium Atoms and ions. The method is based on fitting the theoretically calculated branching fractions to experimentally measured ratios of the relative intensities of carefully selected resonant Titanium Atomic and ionic lines. The sputtered species density is determined in our experimental setup with a relative uncertainty of less than 5% for the dc driven magnetron and typically 15% for time-resolved measurements of high- power impulse magnetron sputtering (HiPIMS) discharge. In the second part of the paper, the method was applied to determine the evolution of Titanium Atom and ion densities in three typical cases ranging from the dc driven sputter process to HiPIMS.
