Transmission Electron Microscopes

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The Experts below are selected from a list of 84735 Experts worldwide ranked by ideXlab platform

Joachim Frank - One of the best experts on this subject based on the ideXlab platform.

Robert A Grassucci - One of the best experts on this subject based on the ideXlab platform.

M Shimojo - One of the best experts on this subject based on the ideXlab platform.

  • selective growth and characterization of nanostructures with Transmission Electron Microscopes
    Applied Surface Science, 2005
    Co-Authors: M Shimojo, S Bysakh, Kazutaka Mitsuishi, M Tanaka, M Song, Kazuo Furuya
    Abstract:

    A new type of Electron beam-induced reactions is reported. Focused Electron beams, the probe size of which is about 0.8 nm, were irradiated on carbon and Si substrates with an introduction of an aluminum trichloride or a gold trichloride gas in the chamber. Nanometer-sized carbon and Si rods were formed using carbon and Si substrates, respectively, by moving the beam position at a certain speed. As no aluminum, gold or chlorine was found in the rods, it is considered that chloride gases behaved as a sort of catalysis.

  • application of Transmission Electron Microscopes to nanometre sized fabrication by means of Electron beam induced deposition
    Journal of Microscopy, 2004
    Co-Authors: M Shimojo, Kazutaka Mitsuishi, M Tanaka, Ming Han, Kazuo Furuya
    Abstract:

    Electron beam-induced deposition was carried out using a scanning Transmission Electron microscope with a field emission gun to fabricate nanometre-sized structures. A small amount of a metal-organic gas was introduced near the substrate in the microscope chamber, and focused Electron beams were irradiated. Two- and three-dimensional structures were fabricated by scanning the beam position. The minimum line width of the freestanding structures was 8 nm at a constant gas flux used. This line width of 8 nm is considered to be achieved by employing a high accelerating voltage, which leads to a small probe size, and the optimum scanning speed.

  • Electron induced nanodeposition of tungsten using field emission scanning and Transmission Electron Microscopes
    Journal of Vacuum Science & Technology B, 2004
    Co-Authors: M Shimojo, Kazutaka Mitsuishi, Akane Tameike, Kazuo Furuya
    Abstract:

    Electron beam induced chemical vapor deposition (EBI-CVD) is one of the promising methods for nanofabrication. EBI-CVD has generally been carried out in conventional scanning Electron Microscopes and the minimum size of the deposits was in the range between 20 and 300 nm. In this study, a field emission gun scanning Electron microscope (FE-SEM) and a field emission gun Transmission Electron microscope (FE-TEM) with gas introduction systems were employed for deposition using a W(CO)6 precursor in order to reduce the size of deposits. Dots, 15–20 nm in diameter, were produced using the FE-SEM. The dots consist mainly of tungsten with small amounts of carbon and oxygen. By using the FE-TEM, the diameter of the dots can be reduced to 3.5 nm. The relationship between probe size and dot diameter is discussed. Rods, the diameter of which was 8 nm, were also fabricated by scanning the beam position in the FE-TEM. Deposits produced by FE-TEM are smaller than those by conventional Electron Microscopes.

Charles W Allen - One of the best experts on this subject based on the ideXlab platform.

  • in situ ion and Electron irradiation effects studies in Transmission Electron Microscopes
    Ultramicroscopy, 1994
    Co-Authors: Charles W Allen
    Abstract:

    Abstract Interfacing an ion accelerator to a Transmission Electron microscope (TEM) allows the analytical functions of TEM imaging and diffraction to be employed during ion-irradiation effects studies. The techniques and special procedures for performing quantitative TEM studies employing in situ ion and Electron irradiation are summarized in the context of several irradiation-induced amorphization and irradiation-assisted crystallization studies, which illustrate the dynamics of this approach in the materials science of irradiation effects.

  • facilities for in situ ion beam studies in Transmission Electron Microscopes
    Laser and Ion Beam Modification of Materials#R##N#Proceedings of the Symposium U: Material Synthesis and Modification by Ion Beams and Laser Beams of , 1993
    Co-Authors: Charles W Allen, Somei Ohnuki, Heishichiro Takahashi
    Abstract:

    Interfacing an ion accelerator to a Transmission Electron microscope (TEM) allows the analytical functions of TEM imaging and Electron diffraction from very small regions to be employed during ion-irradiation effects studies. At present there are ten such installations in Japan, one in France and one in the USA. General specifications of facilities which are operational in 1993 are summarized, and additional facilities which are planned or being proposed are briefly described.

Kazuo Furuya - One of the best experts on this subject based on the ideXlab platform.

  • selective growth and characterization of nanostructures with Transmission Electron Microscopes
    Applied Surface Science, 2005
    Co-Authors: M Shimojo, S Bysakh, Kazutaka Mitsuishi, M Tanaka, M Song, Kazuo Furuya
    Abstract:

    A new type of Electron beam-induced reactions is reported. Focused Electron beams, the probe size of which is about 0.8 nm, were irradiated on carbon and Si substrates with an introduction of an aluminum trichloride or a gold trichloride gas in the chamber. Nanometer-sized carbon and Si rods were formed using carbon and Si substrates, respectively, by moving the beam position at a certain speed. As no aluminum, gold or chlorine was found in the rods, it is considered that chloride gases behaved as a sort of catalysis.

  • application of Transmission Electron Microscopes to nanometre sized fabrication by means of Electron beam induced deposition
    Journal of Microscopy, 2004
    Co-Authors: M Shimojo, Kazutaka Mitsuishi, M Tanaka, Ming Han, Kazuo Furuya
    Abstract:

    Electron beam-induced deposition was carried out using a scanning Transmission Electron microscope with a field emission gun to fabricate nanometre-sized structures. A small amount of a metal-organic gas was introduced near the substrate in the microscope chamber, and focused Electron beams were irradiated. Two- and three-dimensional structures were fabricated by scanning the beam position. The minimum line width of the freestanding structures was 8 nm at a constant gas flux used. This line width of 8 nm is considered to be achieved by employing a high accelerating voltage, which leads to a small probe size, and the optimum scanning speed.

  • Electron induced nanodeposition of tungsten using field emission scanning and Transmission Electron Microscopes
    Journal of Vacuum Science & Technology B, 2004
    Co-Authors: M Shimojo, Kazutaka Mitsuishi, Akane Tameike, Kazuo Furuya
    Abstract:

    Electron beam induced chemical vapor deposition (EBI-CVD) is one of the promising methods for nanofabrication. EBI-CVD has generally been carried out in conventional scanning Electron Microscopes and the minimum size of the deposits was in the range between 20 and 300 nm. In this study, a field emission gun scanning Electron microscope (FE-SEM) and a field emission gun Transmission Electron microscope (FE-TEM) with gas introduction systems were employed for deposition using a W(CO)6 precursor in order to reduce the size of deposits. Dots, 15–20 nm in diameter, were produced using the FE-SEM. The dots consist mainly of tungsten with small amounts of carbon and oxygen. By using the FE-TEM, the diameter of the dots can be reduced to 3.5 nm. The relationship between probe size and dot diameter is discussed. Rods, the diameter of which was 8 nm, were also fabricated by scanning the beam position in the FE-TEM. Deposits produced by FE-TEM are smaller than those by conventional Electron Microscopes.