The Experts below are selected from a list of 153 Experts worldwide ranked by ideXlab platform
Mario C. Marconi - One of the best experts on this subject based on the ideXlab platform.
-
Single-shot imaging of nanoscale dynamics by extreme Ultraviolet Microscopy
CLEO:2011 - Laser Applications to Photonic Applications, 2011Co-Authors: Sergio Carbajo, Fernando Brizuela, Anne Sakdinawat, Yanwei Liu, W. Chao, E. H. Anderson, Alexander V. Vinogradov, I. A. Artioukov, David T. Attwood, Mario C. MarconiAbstract:Snap-shot imaging with nanometer spatial resolution and nanosecond temporal resolution is used to make movies of the interaction dynamics of nanostructures.
-
Analysis of extreme Ultraviolet Microscopy images of patterned nanostructures based on a correlation method
Journal of the Optical Society of America B, 2008Co-Authors: Przemyslaw Wachulak, C. Brewer, Fernando Brizuela, Carmen S. Menoni, Weilun Chao, Erik H. Anderson, Randy A. Bartels, Jorge J. Rocca, Mario C. MarconiAbstract:A method to analyze extreme Ultraviolet Microscopy images of nanostructures that allows for the simultaneous determination of an object’s feature size and image resolution is presented. It is based on the correlation between the image and a set of templates of known resolution generated from the original image using Gaussian filters. The analysis was applied to images obtained with a Fresnel zone plate microscope that uses a 13.2 nm wavelength laser light for illumination. The object’s feature size and the resolution obtained with this method are shown to be in very good agreement with independent measurements of both magnitudes. © 2008 Optical Society of America OCIS codes: 100.2000, 100.2960, 110.0180.
-
Analysis of resolution and feature size in extreme Ultraviolet Microscopy images
2008 Conference on Lasers and Electro-Optics, 2008Co-Authors: Mario C. Marconi, Przemyslaw Wachulak, C. Brewer, Fernando Brizuela, Carmen S. Menoni, Randy A. Bartels, Jorge J. Rocca, E. H. Anderson, Weilun ChaoAbstract:We describe a correlation algorithm that allows for the simultaneous determination of object size and resolution in images of nanoscale objects. The method was used to analyze images recorded with a 13.2 nm laser.
-
Single-shot extreme Ultraviolet Microscopy with 54 nm resolution using a desktop-size capillary discharge laser
LEOS 2008 - 21st Annual Meeting of the IEEE Lasers and Electro-Optics Society, 2008Co-Authors: Fernando Brizuela, C. Brewer, Carmen S. Menoni, Weilun Chao, Erik H. Anderson, Jorge J. Rocca, Mario C. Marconi, Dale Martz, David Attwood, A. V. VinogradovAbstract:A compact full-field photon-based microscope based on a desktop-size 46.9 nm wavelength extreme Ultraviolet laser that captures images with a single nanosecond laser pulse and with a measured spatial resolution of 54 nm is described.
Hiroo Kinoshita - One of the best experts on this subject based on the ideXlab platform.
-
Demonstrating 30-nm spatial resolution of three-multilayer-mirror objective for extreme Ultraviolet Microscopy: Imaging test by observing lithography mask
Applied Physics Express, 2014Co-Authors: Mitsunori Toyoda, Kenjiro Yamasoe, Akifumi Tokimasa, Kentaro Uchida, Tetsuo Harada, Tsuneo Terasawa, Tsuyoshi Amano, Takeo Watanabe, Mihiro Yanagihara, Hiroo KinoshitaAbstract:To confirm the high spatial resolution expected in extreme Ultraviolet (EUV) Microscopy, fine grating patterns with a half-pitch of less than 100 nm on a lithography mask were imaged using a full-field microscope based on a multilayer-mirror objective. When the tilted illumination technique is applied to this novel imaging system, a spatial resolution better than 20 nm can be expected at a wavelength of 13.5 nm. We demonstrated high resolution via EUV reflection images of test patterns with a half-pitch between 30 and 80 nm.
-
Study of Critical Dimensions of Printable Phase Defects Using an Extreme Ultraviolet Microscope
Japanese Journal of Applied Physics, 2009Co-Authors: Yoshito Kamaji, Takeo Watanabe, Takahiro Yoshizumi, Takashi Sugiyama, T. Uno, Kei Takase, Hiroo KinoshitaAbstract:We constructed an extreme Ultraviolet Microscopy (EUVM) system for actinic mask inspection that consists of Schwarzschild optics and an X-ray zooming tube. This system was used to inspect completed extreme Ultraviolet lithography (EUVL) masks and Mo/Si coated substrates on ultralow expansion (ULE) glass. We also have fabricated programmed phase defects on the blanks used for inspection. The EUVM system was capable of resolving a programmed line-pit defect with a width of 40 nm and a depth of 10 nm and also that with a width of 70 nm and a depth of 2 nm. However, a 75-nm-wide, 1.5-nm-deep pit defect was not resolved. The EUVM system was also capable of resolving programmed hole-pit defects with widths ranging from 35 to 170 nm and depths ranging from 2.2 to 2.5 nm. However, 20-nm-wide, 1.5-nm-deep hole-pit defects were not resolved. These results agree with the simulation results perfectly. Thus, in this study, critical dimensions of a pit defects on mask blanks were determined to be a width of 20 nm and a depth of 2 nm.
-
Study on critical dimension of printable phase defects using an EUV microscope
Microelectronic Engineering, 2008Co-Authors: Hiroo Kinoshita, Takahiro Yoshizumi, M. Osugi, J. Kishimoto, Takashi Sugiyama, T. Uno, Takeo WatanabeAbstract:We constructed an extreme Ultraviolet Microscopy (EUVM) system for actinic mask inspection that consists of Schwarzschild optics and an X-ray zooming tube. This system was used to inspect finished extreme Ultraviolet lithography (EUVL) masks and Mo/Si glass substrates. A clear EUVM image of a 300-nm-wide pattern on a 6025 glass mask was obtained. The resolution was estimated to be 50nm or less from this pattern. Programmed phase defects on the glass substrate were also used for inspection. The EUV microscope was able to resolve a programmed pit defect with a width of 40nm and a depth of 10nm and also one with a width of 70nm and a depth of 2nm. However, a 75-nm-wide 1.5-nm-deep pit defect was not resolved. Thus, in this study, one critical dimension of a pit defect was estimated to be a depth of 2nm.
-
Aerial Image Mask Inspection System for Extreme Ultraviolet Lithography
Japanese Journal of Applied Physics, 2007Co-Authors: Hiroo Kinoshita, Kazuhiro Hamamoto, Nobuyuki Sakaya, Morio Hosoya, Takeo WatanabeAbstract:We constructed an extreme Ultraviolet Microscopy (EUVM) system for actinic mask inspection that consists of Schwarzschild optics and an X-ray zooming tube. Using this system, a finished extreme Ultraviolet lithography (EUVL) mask and Mo/Si glass substrates were inspected. An EUVM image of a 100-nm-width pattern on a 6025 glass mask was clealy observed. The resolution was estimated to be 50 nm or less from this pattern. The programmed phase defect on the glass substrate was also used for inspection. By using the EUV microscope, a programmed phase defect with widths of 90, 100, and 110 nm, a bump of 5 nm and a length of 400 µm was observed finely. The programmed phase defect of a 100-nm-wide and 2-nm-deep pit was also observed. Thus, in this research, the observation of a programmed phase defect was advanced using the EUV microscope, which succeeded in observing a topological defect structure image of a multilayer film. These results show that it is possible to detect the internal reflectance distribution of a multilayer film under the EUV microscope, without depending on surface pertubation.
Fernando Brizuela - One of the best experts on this subject based on the ideXlab platform.
-
Single-shot imaging of nanoscale dynamics by extreme Ultraviolet Microscopy
CLEO:2011 - Laser Applications to Photonic Applications, 2011Co-Authors: Sergio Carbajo, Fernando Brizuela, Anne Sakdinawat, Yanwei Liu, W. Chao, E. H. Anderson, Alexander V. Vinogradov, I. A. Artioukov, David T. Attwood, Mario C. MarconiAbstract:Snap-shot imaging with nanometer spatial resolution and nanosecond temporal resolution is used to make movies of the interaction dynamics of nanostructures.
-
Analysis of extreme Ultraviolet Microscopy images of patterned nanostructures based on a correlation method
Journal of the Optical Society of America B, 2008Co-Authors: Przemyslaw Wachulak, C. Brewer, Fernando Brizuela, Carmen S. Menoni, Weilun Chao, Erik H. Anderson, Randy A. Bartels, Jorge J. Rocca, Mario C. MarconiAbstract:A method to analyze extreme Ultraviolet Microscopy images of nanostructures that allows for the simultaneous determination of an object’s feature size and image resolution is presented. It is based on the correlation between the image and a set of templates of known resolution generated from the original image using Gaussian filters. The analysis was applied to images obtained with a Fresnel zone plate microscope that uses a 13.2 nm wavelength laser light for illumination. The object’s feature size and the resolution obtained with this method are shown to be in very good agreement with independent measurements of both magnitudes. © 2008 Optical Society of America OCIS codes: 100.2000, 100.2960, 110.0180.
-
Analysis of resolution and feature size in extreme Ultraviolet Microscopy images
2008 Conference on Lasers and Electro-Optics, 2008Co-Authors: Mario C. Marconi, Przemyslaw Wachulak, C. Brewer, Fernando Brizuela, Carmen S. Menoni, Randy A. Bartels, Jorge J. Rocca, E. H. Anderson, Weilun ChaoAbstract:We describe a correlation algorithm that allows for the simultaneous determination of object size and resolution in images of nanoscale objects. The method was used to analyze images recorded with a 13.2 nm laser.
-
Single-shot extreme Ultraviolet Microscopy with 54 nm resolution using a desktop-size capillary discharge laser
LEOS 2008 - 21st Annual Meeting of the IEEE Lasers and Electro-Optics Society, 2008Co-Authors: Fernando Brizuela, C. Brewer, Carmen S. Menoni, Weilun Chao, Erik H. Anderson, Jorge J. Rocca, Mario C. Marconi, Dale Martz, David Attwood, A. V. VinogradovAbstract:A compact full-field photon-based microscope based on a desktop-size 46.9 nm wavelength extreme Ultraviolet laser that captures images with a single nanosecond laser pulse and with a measured spatial resolution of 54 nm is described.
Francisco E Robles - One of the best experts on this subject based on the ideXlab platform.
-
application of deep Ultraviolet Microscopy in hematological assessment of neutropenia
Optical Diagnostics and Sensing XXI: Toward Point-of-Care Diagnostics, 2021Co-Authors: Ashkan Ojaghi, Paloma Casteleiro Costa, Francisco E RoblesAbstract:Neutropenia is a condition where the hematopoietic system has a suppressed production of neutrophils, a type of white blood cell that is critical for fighting infections. This condition affects half to nearly eighty percent of cancer patients receiving chemotherapy, depending on the type of malignancy. Neutropenia can also be congenital or acquired from autoimmune disorders or nutritional deficits, in addition to cancer. Neutropenia, formally defined as <1500 neutrophils/µL in peripheral blood, puts patients at an increased risk of life-threatening infections. Thus, it is critical to constantly monitor neutrophil counts for many patients. Hematological analysis of neutropenia is performed by highly trained personnel at certified laboratories via complete blood count (CBC) and visual inspection which require complex, time-consuming, and expensive sample preparation and instrumentation. Thus, an easy-to-use, label- and reagent-free, and inexpensive hematology analysis device is highly desirable to circumvent these limitations and allow point-of-care disease monitoring and diagnosis. In this work, we demonstrate the application of deep-Ultraviolet (UV) Microscopy as label-free method for rapid and facile neutropenia detection. Our approach provides key hematological information and enables quantitative assessment of live blood cells based on their molecular and structural signatures in minutes. Here we show the ability of deep-UV Microscopy to clearly identify patients with moderate and severe neutropenia based on an automated blood smear analysis. We also demonstrate a pseudo-colorization scheme which recapitulates the gold-standard Giemsa stains and allows visual inspection and enumeration of various blood cells types. This work has significant implications for developing a simple and low-cost point-of-care device that can ultimately improve the care and quality of life of many neutropenia and cancer patients.
-
Application of deep-Ultraviolet Microscopy in hematological assessment of neutropenia
Optical Diagnostics and Sensing XXI: Toward Point-of-Care Diagnostics, 2021Co-Authors: Ashkan Ojaghi, Paloma Casteleiro Costa, Francisco E RoblesAbstract:Neutropenia is a condition where the hematopoietic system has a suppressed production of neutrophils, a type of white blood cell that is critical for fighting infections. This condition affects half to nearly eighty percent of cancer patients receiving chemotherapy, depending on the type of malignancy. Neutropenia can also be congenital or acquired from autoimmune disorders or nutritional deficits, in addition to cancer. Neutropenia, formally defined as
-
label free hematology analysis using deep Ultraviolet Microscopy
Proceedings of the National Academy of Sciences of the United States of America, 2020Co-Authors: Ashkan Ojaghi, Gabriel Carrazana, Christina Caruso, Asad Abbas, David R Myers, Wilbur A Lam, Francisco E RoblesAbstract:Hematological analysis, via a complete blood count (CBC) and Microscopy, is critical for screening, diagnosing, and monitoring blood conditions and diseases but requires complex equipment, multiple chemical reagents, laborious system calibration and procedures, and highly trained personnel for operation. Here we introduce a hematological assay based on label-free molecular imaging with deep-Ultraviolet Microscopy that can provide fast quantitative information of key hematological parameters to facilitate and improve hematological analysis. We demonstrate that this label-free approach yields 1) a quantitative five-part white blood cell differential, 2) quantitative red blood cell and hemoglobin characterization, 3) clear identification of platelets, and 4) detailed subcellular morphology. Analysis of tens of thousands of live cells is achieved in minutes without any sample preparation. Finally, we introduce a pseudocolorization scheme that accurately recapitulates the appearance of cells under conventional staining protocols for microscopic analysis of blood smears and bone marrow aspirates. Diagnostic efficacy is evaluated by a panel of hematologists performing a blind analysis of blood smears from healthy donors and thrombocytopenic and sickle cell disease patients. This work has significant implications toward simplifying and improving CBC and blood smear analysis, which is currently performed manually via bright-field Microscopy, and toward the development of a low-cost, easy-to-use, and fast hematological analyzer as a point-of-care device and for low-resource settings.
Thomas Wilhein - One of the best experts on this subject based on the ideXlab platform.
-
fabrication of fresnel zone plates by ion beam lithography and application as objective lenses in extreme Ultraviolet Microscopy at 13 nm wavelength
Optics Letters, 2012Co-Authors: Johannes Overbuschmann, Julia Hengster, Stephan Irsen, Thomas WilheinAbstract:Fresnel zone plates are used for imaging at extreme Ultraviolet and soft x-ray wavelengths. Fabricating these zone plates is challenging due to small structure sizes (<150 nm) and complex nanostructuring processes. Fabrication techniques such as electron-beam lithography followed by etching and electroplating processes have been developed over the years. We are reporting on the development of a technique incorporating focused gallium ion-beam lithography to fabricate Fresnel zone plates with 120 nm outermost structure size in a process that combines pattern exposure and structure transfer in one single step. The fabricated zone plates were successfully applied in a microscopic setup at λ=13 nm wavelength.
-
Fabrication of Fresnel zone plates by ion-beam lithography and application as objective lenses in extreme Ultraviolet Microscopy at 13 nm wavelength
Optics letters, 2012Co-Authors: Johannes Overbuschmann, Julia Hengster, Stephan Irsen, Thomas WilheinAbstract:Fresnel zone plates are used for imaging at extreme Ultraviolet and soft x-ray wavelengths. Fabricating these zone plates is challenging due to small structure sizes (
