The Experts below are selected from a list of 1755 Experts worldwide ranked by ideXlab platform
Zuobin Wang - One of the best experts on this subject based on the ideXlab platform.
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response of mg63 osteoblast cells to surface modification of ti 6al 4v implant alloy by Laser Interference Lithography
Journal of Bionic Engineering, 2017Co-Authors: Wenjun Li, Zuobin Wang, Jiajia Wang, Yingmin Qu, Xinyue Wang, Xu Di, Bojian LiangAbstract:Abstract The response of human osteoblast-like osteosarcoma cells (MG63) to surface modification of Ti-6Al-4V implant alloy was investigated by Laser Interference Lithography (LIL). In this work, Laser Interference Lithography was employed to fabricate the microstructures of grooves, dots and dimples onto the surfaces of Ti-6Al-4V samples. Two and three beam LIL systems were developed to carry out the experiments. The Laser treatment resulted in the increases of the roughness and the contact angle of water on the implant alloy surfaces. The proliferation of osteoblasts was analyzed by MTT (3-(4,5-dimethyl-2-thiazolyl)-2,5-diphenyl-2-H-tetrazolium bromide) assay for the time periods of 4 hours, 2 days, 3 days, and 6 days. The MTT test results demonstrated that the Laser treatment surfaces had a positive impact on the proliferation of osteoblast cells after 24 hours. The alloy surface morphology and the morphological changes of MG63 cells cultured on the Laser textured Ti-6Al-4V surface were observed by Scanning Electron Microscope (SEM). The SEM results indicated that the osteoblast cells were aligned on grooved surfaces and they were prolonged with the structures. Enzymatic detachment results showed that the 20 µm grooved structures provided the better cell adhesion to the textured Ti-6Al-4V surfaces.
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Surface texturing on stainless steel by direct Laser Interference Lithography
2017 IEEE International Conference on Manipulation Manufacturing and Measurement on the Nanoscale (3M-NANO), 2017Co-Authors: Miao Yu, Dayou Li, Zuobin Wang, Dong Li, Jiao MengAbstract:A method for the surface texturing of well-designed and high controllable micro dimple structures on stainless steel by direct Laser Interference Lithography (DLIL) is presented. The method offers its innovation that the micro circular dimple structures can be fabricated directly by controlling the process of three-beam Laser Interference. Different exposure durations have been studied to achieve the optimum value of the dimple diameter and density in order to reduce the friction coefficient of stainless steel. The dry sliding test of friction coefficients were performed by mechanical tester (UMT-TriboLab) under normal loads of 15 N. The results indicate that the micro circular dimple structures with the average dimple diameter of 4.2 μm and density of 23 percent have about 77% reduction of friction coefficient compared with untreated surfaces.
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Bio-inspired hierarchical patterning of silicon by Laser Interference Lithography
Applied Optics, 2016Co-Authors: Yaowei Hu, Zhankun Weng, Zuobin Wang, Miao Yu, Dapeng WangAbstract:This paper presents a facile approach for the rapid and maskless fabrication of hierarchical structures by multibeam Laser Interference. In the work, three- and four-beam Laser Interference lithographies were proposed to fabricate ordered multiscale surface structures instead of six or more beam Interference with a complicated system setup. The pitch and shape of hierarchical structures can be controlled by adjusting the parameters of incident light. The experiment results have shown that the hierarchical anisotropy and isotropy surface structures can be fabricated by this method with the control of the parameters of each incident beam, which is in accordance with the theoretical analysis and computer simulations.
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Determination of beam incidence conditions based on the analysis of Laser Interference patterns
Optik, 2015Co-Authors: Dapeng Wang, Zuobin Wang, Yong Yue, Chunlei Tan, Renxi Qiu, Carsten MapleAbstract:Beam incidence conditions in the formation of two-, three- and four-beam Laser Interference patterns are presented and studied in this paper. In a Laser Interference Lithography (LIL) process, it is of importance to determine and control beam incidence conditions based on the analysis of Laser Interference patterns for system calibration as any slight change of incident angles or intensities of beams will introduce significant variations of periods and contrasts of Interference patterns. In this work, Interference patterns were captured by a He–Ne Laser Interference system under different incidence conditions, the pattern period measurement was achieved by cross-correlation with, and the pattern contrast was calculated by image processing. Subsequently, the incident angles and intensities of beams were determined based on the analysis of spatial distributions of interfering beams. As a consequence, the relationship between the beam incidence conditions and Interference patterns is revealed. The proposed method is useful for the calibration of LIL processes and for reverse engineering applications.
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fabrication of moth eye structures on silicon by direct six beam Laser Interference Lithography
Journal of Applied Physics, 2014Co-Authors: Zuobin Wang, Dapeng Wang, Ziang Zhang, Zhankun WengAbstract:This paper presents a new method for the generation of cross-scale Laser Interference patterns and the fabrication of moth-eye structures on silicon. In the method, moth-eye structures were produced on a surface of silicon wafer using direct six-beam Laser Interference Lithography to improve the antireflection performance of the material surface. The periodic dot arrays of the moth-eye structures were formed due to the ablation of the irradiance distribution of Interference patterns on the wafer surface. The shape, size, and distribution of the moth-eye structures can be adjusted by controlling the wavelength, incidence angles, and exposure doses in a direct six-beam Laser Interference Lithography setup. The theoretical and experimental results have shown that direct six-beam Laser Interference Lithography can provide a way to fabricate cross-scale moth-eye structures for antireflection applications.
Carsten Maple - One of the best experts on this subject based on the ideXlab platform.
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Determination of beam incidence conditions based on the analysis of Laser Interference patterns
Optik, 2015Co-Authors: Dapeng Wang, Zuobin Wang, Yong Yue, Chunlei Tan, Renxi Qiu, Carsten MapleAbstract:Beam incidence conditions in the formation of two-, three- and four-beam Laser Interference patterns are presented and studied in this paper. In a Laser Interference Lithography (LIL) process, it is of importance to determine and control beam incidence conditions based on the analysis of Laser Interference patterns for system calibration as any slight change of incident angles or intensities of beams will introduce significant variations of periods and contrasts of Interference patterns. In this work, Interference patterns were captured by a He–Ne Laser Interference system under different incidence conditions, the pattern period measurement was achieved by cross-correlation with, and the pattern contrast was calculated by image processing. Subsequently, the incident angles and intensities of beams were determined based on the analysis of spatial distributions of interfering beams. As a consequence, the relationship between the beam incidence conditions and Interference patterns is revealed. The proposed method is useful for the calibration of LIL processes and for reverse engineering applications.
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direct modification of silicon surface by nanosecond Laser Interference Lithography
Applied Surface Science, 2013Co-Authors: Dayou Li, Zuobin Wang, Dapeng Wang, Ziang Zhang, Carsten MapleAbstract:Periodic and quasi-periodic structures on silicon surface have numerous significant applications in photoelectronics and surface engineering. A number of technologies have been developed to fabricate the structures in various research fields. In this work, we take the strategy of direct nanosecond Laser Interference Lithography technology, and focus on the silicon material to create different well-defined surface structures based on theoretical analysis of the formation of Laser Interference patterns. Two, three and four-beam Laser Interference systems were set up to fabricate the grating, regular triangle and square structures on silicon surfaces, respectively. From the AFM micrographs, the critical features of structures have a dependence on Laser fluences. For a relative low Laser fluence, grating and dot structures formed with bumps due to the Marangoni Effect. With the increase of Laser fluences, melt and evaporation behaviors can be responsible for the Laser modification. By properly selecting the process parameters, well-defined grating and dot structures can been achieved. It can be demonstrated that direct Laser Interference Lithography is a facile and efficient technology with the advantage of a single process procedure over macroscale areas for the fabrication of micro and nano structures.
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effects of polarization on four beam Laser Interference Lithography
Applied Physics Letters, 2013Co-Authors: Dapeng Wang, Zuobin Wang, Ziang Zhang, Yong Yue, Carsten MapleAbstract:This paper demonstrates that polarization plays an important role in the formation of Interference patterns, pattern contrasts, and periods in four-beam Interference Lithography. Three different polarization modes are presented to study the effects of polarization on four-beam Laser Interference based on theoretical analysis, simulations, and experiments. A four-beam Laser Interference system was set up to modify the silicon surface. It was found that the secondary periodicity or modulation was the result of the misaligned or unequal incident angles only in the case of the TE-TE-TM-TM mode. The resulting patterns have shown a good correspondence with the theoretical analysis and simulations.
Mun Seok Jeong - One of the best experts on this subject based on the ideXlab platform.
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Indium gallium nitride-based ultraviolet, blue, and green lightemitting diodes functionalized with shallow periodic hole patterns
'Springer Science and Business Media LLC', 2018Co-Authors: Hyun Jeong, Rafael Salas-montiel, Gilles Lerondel, Mun Seok JeongAbstract:In this study, we investigated the improvement in the light output power of indium gallium nitride ( InGaN)- based ultraviolet ( UV), blue, and green light- emitting diodes ( LEDs) by fabricating shallow periodic hole patterns ( PHPs) on the LED surface through Laser Interference Lithography and inductively coupled plasma etching. Noticeably, different enhancements were observed in the light output powers of the UV, blue, and green LEDs with negligible changes in the electrical properties in the light output power versus current and current versus voltage curves. In addition, confocal scanning electroluminescence microscopy is employed to verify the correlation between the enhancement in the light output power of the LEDs with PHPs and carrier localization of InGaN/ GaN multiple quantum wells. Light propagation through the PHPs on the UV, blue, and green LEDs is simulated using a threedimensional finite- difference time- domain method to confirm the experimental results. Finally, we suggest optimal conditions of PHPs for improving the light output power of InGaN LEDs based on the experimental and theoretical results. © The Author(s) 2017101sciescopu
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Indium gallium nitride-based ultraviolet, blue, and green light-emitting diodes functionalized with shallow periodic hole patterns
Scientific Reports, 2017Co-Authors: Hyun Jeong, Rafael Salas-montiel, Gilles Lerondel, Mun Seok JeongAbstract:In this study, we investigated the improvement in the light output power of indium gallium nitride (InGaN)-based ultraviolet (UV), blue, and green light-emitting diodes (LEDs) by fabricating shallow periodic hole patterns (PHPs) on the LED surface through Laser Interference Lithography and inductively coupled plasma etching. Noticeably, different enhancements were observed in the light output powers of the UV, blue, and green LEDs with negligible changes in the electrical properties in the light output power versus current and current versus voltage curves. In addition, confocal scanning electroluminescence microscopy is employed to verify the correlation between the enhancement in the light output power of the LEDs with PHPs and carrier localization of InGaN/GaN multiple quantum wells. Light propagation through the PHPs on the UV, blue, and green LEDs is simulated using a three-dimensional finite-difference time-domain method to confirm the experimental results. Finally, we suggest optimal conditions of PHPs for improving the light output power of InGaN LEDs based on the experimental and theoretical results.
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polymer templated hydrothermal growth of vertically aligned single crystal zno nanorods and morphological transformations using structural polarity
Advanced Functional Materials, 2010Co-Authors: Ki Seok Kim, Hyun Jeong, Mun Seok Jeong, Gun Young JungAbstract:Position-configurable, vertical, single-crystalline ZnO nanorod arrays are fabricated via a polymer-templated hydrothermal growth method at a low temperature of 93 °C. A sol-gel processed dense c-oriented ZnO seed layer film is employed to grow nanorods along the c-axis direction [0001] regardless of any substrate crystal mismatches. Here, one-beam Laser-Interference Lithography is utilized to fabricate nanoscale holes over an entire 2-in. wafer during the preparation of the polymer template. As such, vertically aligned ZnO nanorods can be grown from the seed layer exposed at the bottom of each hole. Furthermore, morphological transformations of the ZnO nanorods into pencil-like, needle-like, tubular, tree-like, and spherical shapes are obtained by controlling the growth conditions and utilizing the structural polarity of the ZnO nanorods.
Minghui Hong - One of the best experts on this subject based on the ideXlab platform.
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design and fabrication of broadband ultralow reflectivity black si surfaces by Laser micro nanoprocessing
Light-Science & Applications, 2014Co-Authors: Jing Yang, Fangfang Luo, Tsung Sheng Kao, Jinghua Teng, Xiangang Luo, Minghui HongAbstract:Light collection efficiency is an important factor that affects the performance of many optical and optoelectronic devices. In these devices, the high reflectivity of interfaces can hinder efficient light collection. To minimize unwanted reflection, anti-reflection surfaces can be fabricated by micro/nanopatterning. In this paper, we investigate the fabrication of broadband anti-reflection Si surfaces by Laser micro/nanoprocessing. Laser direct writing is applied to create microstructures on Si surfaces that reduce light reflection by light trapping. In addition, Laser Interference Lithography and metal assisted chemical etching are adopted to fabricate the Si nanowire arrays. The anti-reflection performance is greatly improved by the high aspect ratio subwavelength structures, which create gradients of refractive index from the ambient air to the substrate. Furthermore, by decoration of the Si nanowires with metallic nanoparticles, surface plasmon resonance can be used to further control the broadband reflections, reducing the reflection to below 1.0% across from 300 to 1200 nm. An average reflection of 0.8% is achieved.
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Laser precision engineering from microfabrication to nanoprocessing
Laser & Photonics Reviews, 2010Co-Authors: Tow C Chong, Minghui HongAbstract:Laser precision engineering is being extensively applied in industries for device microfabrication due to its unique advantages of being a dry and noncontact process, coupled with the availability of reliable light sources and affordable system cost. To further reduce the feature size to the nanometer scale, the optical diffraction limit has to be overcome. With the combination of advanced processing tools such as SPM, NSOM, transparent and metallic particles, feature sizes as small as 20 nm have been achieved by near-field Laser irradiation, which has extended the application scope of Laser precision engineering significantly. Meanwhile, parallel Laser processing has been actively pursued to realize large-area and high-throughput nanofabrication by the use of microlens arrays (MLA). Laser thermal Lithography using a DVD optical storage process has also been developed to achieve low-cost and high-speed nanofabrication. Laser Interference Lithography, another large area nanofabrication technique, is also capable of fabricating sub-100 nm periodic structures. To further reduce the feature size to the atomic scale, atomic Lithography using Laser cooling to localize atoms is being developed, bringing Laser-processing technology to a new era of atomic engineering.
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Surface Nano-fabrication by Laser Precision Engineering
The Review of Laser Engineering, 2008Co-Authors: Minghui Hong, Yi Zhou, Tow C ChongAbstract:Research progress on Laser nano-fabrication with the combination of AFM, NSOM and transparent particles mask is reviewed. With the combination of other advanced processing tools, Laser irradiation can push the processing feature size down to ~ 20 nm. However, Laser nano-fabrication with single optics brings about the technical challenge of slow processing speed. Parallel Laser nano-patterning was recently developed to achieve large area and high speed nano-fabrication with Laser irradiation through a micro-lens array. Laser Interference Lithography is also studied to fabricate 100 nm functional periodic nanostructures on substrate surfaces.
Dapeng Wang - One of the best experts on this subject based on the ideXlab platform.
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Bio-inspired hierarchical patterning of silicon by Laser Interference Lithography
Applied Optics, 2016Co-Authors: Yaowei Hu, Zhankun Weng, Zuobin Wang, Miao Yu, Dapeng WangAbstract:This paper presents a facile approach for the rapid and maskless fabrication of hierarchical structures by multibeam Laser Interference. In the work, three- and four-beam Laser Interference lithographies were proposed to fabricate ordered multiscale surface structures instead of six or more beam Interference with a complicated system setup. The pitch and shape of hierarchical structures can be controlled by adjusting the parameters of incident light. The experiment results have shown that the hierarchical anisotropy and isotropy surface structures can be fabricated by this method with the control of the parameters of each incident beam, which is in accordance with the theoretical analysis and computer simulations.
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Determination of beam incidence conditions based on the analysis of Laser Interference patterns
Optik, 2015Co-Authors: Dapeng Wang, Zuobin Wang, Yong Yue, Chunlei Tan, Renxi Qiu, Carsten MapleAbstract:Beam incidence conditions in the formation of two-, three- and four-beam Laser Interference patterns are presented and studied in this paper. In a Laser Interference Lithography (LIL) process, it is of importance to determine and control beam incidence conditions based on the analysis of Laser Interference patterns for system calibration as any slight change of incident angles or intensities of beams will introduce significant variations of periods and contrasts of Interference patterns. In this work, Interference patterns were captured by a He–Ne Laser Interference system under different incidence conditions, the pattern period measurement was achieved by cross-correlation with, and the pattern contrast was calculated by image processing. Subsequently, the incident angles and intensities of beams were determined based on the analysis of spatial distributions of interfering beams. As a consequence, the relationship between the beam incidence conditions and Interference patterns is revealed. The proposed method is useful for the calibration of LIL processes and for reverse engineering applications.
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fabrication of moth eye structures on silicon by direct six beam Laser Interference Lithography
Journal of Applied Physics, 2014Co-Authors: Zuobin Wang, Dapeng Wang, Ziang Zhang, Zhankun WengAbstract:This paper presents a new method for the generation of cross-scale Laser Interference patterns and the fabrication of moth-eye structures on silicon. In the method, moth-eye structures were produced on a surface of silicon wafer using direct six-beam Laser Interference Lithography to improve the antireflection performance of the material surface. The periodic dot arrays of the moth-eye structures were formed due to the ablation of the irradiance distribution of Interference patterns on the wafer surface. The shape, size, and distribution of the moth-eye structures can be adjusted by controlling the wavelength, incidence angles, and exposure doses in a direct six-beam Laser Interference Lithography setup. The theoretical and experimental results have shown that direct six-beam Laser Interference Lithography can provide a way to fabricate cross-scale moth-eye structures for antireflection applications.
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direct modification of silicon surface by nanosecond Laser Interference Lithography
Applied Surface Science, 2013Co-Authors: Dayou Li, Zuobin Wang, Dapeng Wang, Ziang Zhang, Carsten MapleAbstract:Periodic and quasi-periodic structures on silicon surface have numerous significant applications in photoelectronics and surface engineering. A number of technologies have been developed to fabricate the structures in various research fields. In this work, we take the strategy of direct nanosecond Laser Interference Lithography technology, and focus on the silicon material to create different well-defined surface structures based on theoretical analysis of the formation of Laser Interference patterns. Two, three and four-beam Laser Interference systems were set up to fabricate the grating, regular triangle and square structures on silicon surfaces, respectively. From the AFM micrographs, the critical features of structures have a dependence on Laser fluences. For a relative low Laser fluence, grating and dot structures formed with bumps due to the Marangoni Effect. With the increase of Laser fluences, melt and evaporation behaviors can be responsible for the Laser modification. By properly selecting the process parameters, well-defined grating and dot structures can been achieved. It can be demonstrated that direct Laser Interference Lithography is a facile and efficient technology with the advantage of a single process procedure over macroscale areas for the fabrication of micro and nano structures.
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effects of polarization on four beam Laser Interference Lithography
Applied Physics Letters, 2013Co-Authors: Dapeng Wang, Zuobin Wang, Ziang Zhang, Yong Yue, Carsten MapleAbstract:This paper demonstrates that polarization plays an important role in the formation of Interference patterns, pattern contrasts, and periods in four-beam Interference Lithography. Three different polarization modes are presented to study the effects of polarization on four-beam Laser Interference based on theoretical analysis, simulations, and experiments. A four-beam Laser Interference system was set up to modify the silicon surface. It was found that the secondary periodicity or modulation was the result of the misaligned or unequal incident angles only in the case of the TE-TE-TM-TM mode. The resulting patterns have shown a good correspondence with the theoretical analysis and simulations.
