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M. Miyazaki - One of the best experts on this subject based on the ideXlab platform.

  • Moisture Resistance of the low-emissivity coatings with a layer structure of Al-doped ZnO/Ag/Al-doped ZnO
    Thin Solid Films, 2001
    Co-Authors: E. Ando, M. Miyazaki
    Abstract:

    Abstract The Moisture durability of sputtered low-emissivity (low-e) coatings with a single silver layer structure of ZnO/Ag/ZnO/glass and Al-doped ZnO/Ag/Al-doped ZnO/glass was investigated. Zinc oxide and aluminum-doped zinc oxide (AZO) films were reactively deposited from pure Zn, 99Zn1Al, 97Zn3Al, 95Zn5Al, 90Zn10Al (at.%) targets. The aluminum content in the AZO films was measured by secondary ion mass spectroscopy (SIMS). The deposition rate and internal stress of the AZO films were measured. After a Moisture durability test at 50°C in 95% relative humidity for 12 days, the coatings were analyzed using optical microscopy, X-ray diffraction (XRD) and scanning electron microscopy (SEM). It was observed that the Al addition reduced the internal stress of the oxide films, and the AZO/Ag/AZO coatings had a better Moisture Resistance. However, the Al addition led to a decreased deposition rate of the oxide films, and the addition of excess Al resulted in a different Moisture degradation with a hazy appearance that might be due to an undesirable hydrate formation in the low-e coating.

  • Moisture Resistance of the low emissivity coatings with a layer structure of al doped zno ag al doped zno
    Thin Solid Films, 2001
    Co-Authors: E. Ando, M. Miyazaki
    Abstract:

    Abstract The Moisture durability of sputtered low-emissivity (low-e) coatings with a single silver layer structure of ZnO/Ag/ZnO/glass and Al-doped ZnO/Ag/Al-doped ZnO/glass was investigated. Zinc oxide and aluminum-doped zinc oxide (AZO) films were reactively deposited from pure Zn, 99Zn1Al, 97Zn3Al, 95Zn5Al, 90Zn10Al (at.%) targets. The aluminum content in the AZO films was measured by secondary ion mass spectroscopy (SIMS). The deposition rate and internal stress of the AZO films were measured. After a Moisture durability test at 50°C in 95% relative humidity for 12 days, the coatings were analyzed using optical microscopy, X-ray diffraction (XRD) and scanning electron microscopy (SEM). It was observed that the Al addition reduced the internal stress of the oxide films, and the AZO/Ag/AZO coatings had a better Moisture Resistance. However, the Al addition led to a decreased deposition rate of the oxide films, and the addition of excess Al resulted in a different Moisture degradation with a hazy appearance that might be due to an undesirable hydrate formation in the low-e coating.

  • Moisture Resistance of the low-emissivity coatings with a layer structure of Al-doped ZnO/Ag/Al-doped ZnO
    Thin Solid Films, 2001
    Co-Authors: E. Ando, M. Miyazaki
    Abstract:

    The Moisture durability of sputtered low-emissivity (low-e) coatings with a single silver layer structure of ZnO/Ag/ZnO/glass and Al-doped ZnO/Ag/Al-doped ZnO/glass was investigated. Zinc oxide and aluminum-doped zinc oxide (AZO) films were reactively deposited from pure Zn, 99Zn-1Al, 97Zn-3Al, 95Zn-5Al, 90Zn-10Al (at.%) targets. The aluminum content in the AZO films was measured by secondary ion mass spectroscopy (SIMS). The deposition rate and internal stress of the AZO films were measured. After a Moisture durability test at 50°C in 95% relative humidity for 12 days, the coatings were analyzed using optical microscopy, X-ray diffraction (XRD) and scanning electron microscopy (SEM). It was observed that the Al addition reduced the internal stress of the oxide films, and the AZO/Ag/AZO coatings had a better Moisture Resistance. However, the Al addition led to a decreased deposition rate of the oxide films, and the addition of excess Al resulted in a different Moisture degradation with a hazy appearance that might be due to an undesirable hydrate formation in the low-e coating. © 2001 Elsevier Science B.V.

Falk Liebner - One of the best experts on this subject based on the ideXlab platform.

  • conformal ultrathin coating by scco2 mediated pmma deposition a facile approach to add Moisture Resistance to lightweight ordered nanocellulose aerogels
    Chemistry of Materials, 2018
    Co-Authors: Sven F Plappert, Sakeena Quraishi, Jeanmarie Nedelec, Johannes Konnerth, Harald Rennhofer, Helga C Lichtenegger, Falk Liebner
    Abstract:

    A facile approach for adding Moisture Resistance to transparent nematic aerogels composed of individualized cellulose nanofibers (i-CNF) at full preservation of the anisotropic aerogel structure is presented. Sequential nitroxide-mediated oxidation and mechanical cellulose fiber delamination were applied to obtain i-CNF dispersions in water. Nematic ordering caused by repulsive forces between i-CNF surface carboxylate groups was set by acid-induced hydrogen bonding and gelation, respectively. Solvent exchange to acetone, impregnation with the PMMA, scCO2-mediated antisolvent precipitation of the secondary polymer, and scCO2 extraction of interstitial acetone afforded highly hydrophobic nanocomposite aerogels. Birefringence studies utilizing polarized light and the Michel–Levy Chart to evaluate interference patterns revealed that nematic i-CNF ordering is virtually not affected by the respective surface modification and scCO2 drying steps. Morphological studies provide evidence that the large internal surf...

  • Conformal Ultrathin Coating by scCO 2 -Mediated PMMA Deposition: A Facile Approach To Add Moisture Resistance to Lightweight Ordered Nanocellulose Aerogels
    Chemistry of Materials, 2018
    Co-Authors: Sven F Plappert, Sakeena Quraishi, Jeanmarie Nedelec, Johannes Konnerth, Harald Rennhofer, Helga C Lichtenegger, Falk Liebner
    Abstract:

    A facile approach for adding Moisture Resistance to transparent nematic aerogels composed of individualized cellulose nanofibers (i-CNF) at full preservation of the anisotropic aerogel structure is presented. Sequential nitroxide-mediated oxidation and mechanical cellulose fiber delamination were applied to obtain i-CNF dispersions in water. Nematic ordering caused by repulsive forces between i-CNF surface carboxylate groups was set by acid-induced hydrogen bonding and gelation, respectively. Solvent exchange to acetone, impregnation with the PMMA, scCO2-mediated antisolvent precipitation of the secondary polymer, and scCO2 extraction of interstitial acetone afforded highly hydrophobic nanocomposite aerogels. Birefringence studies utilizing polarized light and the Michel–Levy Chart to evaluate interference patterns revealed that nematic i-CNF ordering is virtually not affected by the respective surface modification and scCO2 drying steps. Morphological studies provide evidence that the large internal surface (>500 m2 g–1) of the hybrid aerogels consists of a homogeneous ultrathin PMMA (mono)layer that virtually does not affect the high porosity (≥99%) and transparency (>77% transmission, 600 nm, 2.13 mm thickness) inherent to i-CNF aerogels. The obtained materials exhibited excellent Resistance toward Moisture as apparent from the high water contact angle (119.4° ± 7.5). As PMMA imparts the aerogel stiffness and hydrophobicity, aggregation of nanofibrils in moist environment or under vacuum conditions can be avoided even at ultralow densities as low as 9.6 mg cm–3.

Hongling Chen - One of the best experts on this subject based on the ideXlab platform.

  • transparent superhydrophobic films possessing high thermal stability and improved Moisture Resistance from the deposition of mtms based aerogels
    Colloids and Surfaces A: Physicochemical and Engineering Aspects, 2014
    Co-Authors: Hongling Chen
    Abstract:

    Abstract Highly transparent superhydrophobic silica aerogel films with high water contact angle (>160°) and low sliding angle ( 2 adsorption–desorption behavior and pore size distribution of as-prepared films were discussed herein to get the film with optimum performance. The optimum film exhibits superhydrophobicity (CA, 161° and SA, 4°), high transparency (transmittance closes to 90%) and good thermal stability (up to 500 °C). Note that the optimum film directly from sol–gel process exhibits poor Moisture Resistance. The low density, high volume-fraction porosity structure and methyl groups on the surface are the cause of superhydrophobicity of the film. Low density and high volume-fraction porosity structure are also responsible for the thermal stability of the as-prepared film, and the poor Moisture Resistance is ascribed to the untreated hydroxyl groups on the surface of the film. The Moisture Resistance of film can be improved by further treatment with cetyltrimethoxysilane (CTMS). The film switches from superhydrophobic (161°) to superhydrophilic (0°) after heat-treated at 600 °C.

E. Ando - One of the best experts on this subject based on the ideXlab platform.

  • Moisture Resistance of the low-emissivity coatings with a layer structure of Al-doped ZnO/Ag/Al-doped ZnO
    Thin Solid Films, 2001
    Co-Authors: E. Ando, M. Miyazaki
    Abstract:

    Abstract The Moisture durability of sputtered low-emissivity (low-e) coatings with a single silver layer structure of ZnO/Ag/ZnO/glass and Al-doped ZnO/Ag/Al-doped ZnO/glass was investigated. Zinc oxide and aluminum-doped zinc oxide (AZO) films were reactively deposited from pure Zn, 99Zn1Al, 97Zn3Al, 95Zn5Al, 90Zn10Al (at.%) targets. The aluminum content in the AZO films was measured by secondary ion mass spectroscopy (SIMS). The deposition rate and internal stress of the AZO films were measured. After a Moisture durability test at 50°C in 95% relative humidity for 12 days, the coatings were analyzed using optical microscopy, X-ray diffraction (XRD) and scanning electron microscopy (SEM). It was observed that the Al addition reduced the internal stress of the oxide films, and the AZO/Ag/AZO coatings had a better Moisture Resistance. However, the Al addition led to a decreased deposition rate of the oxide films, and the addition of excess Al resulted in a different Moisture degradation with a hazy appearance that might be due to an undesirable hydrate formation in the low-e coating.

  • Moisture Resistance of the low emissivity coatings with a layer structure of al doped zno ag al doped zno
    Thin Solid Films, 2001
    Co-Authors: E. Ando, M. Miyazaki
    Abstract:

    Abstract The Moisture durability of sputtered low-emissivity (low-e) coatings with a single silver layer structure of ZnO/Ag/ZnO/glass and Al-doped ZnO/Ag/Al-doped ZnO/glass was investigated. Zinc oxide and aluminum-doped zinc oxide (AZO) films were reactively deposited from pure Zn, 99Zn1Al, 97Zn3Al, 95Zn5Al, 90Zn10Al (at.%) targets. The aluminum content in the AZO films was measured by secondary ion mass spectroscopy (SIMS). The deposition rate and internal stress of the AZO films were measured. After a Moisture durability test at 50°C in 95% relative humidity for 12 days, the coatings were analyzed using optical microscopy, X-ray diffraction (XRD) and scanning electron microscopy (SEM). It was observed that the Al addition reduced the internal stress of the oxide films, and the AZO/Ag/AZO coatings had a better Moisture Resistance. However, the Al addition led to a decreased deposition rate of the oxide films, and the addition of excess Al resulted in a different Moisture degradation with a hazy appearance that might be due to an undesirable hydrate formation in the low-e coating.

  • Moisture Resistance of the low-emissivity coatings with a layer structure of Al-doped ZnO/Ag/Al-doped ZnO
    Thin Solid Films, 2001
    Co-Authors: E. Ando, M. Miyazaki
    Abstract:

    The Moisture durability of sputtered low-emissivity (low-e) coatings with a single silver layer structure of ZnO/Ag/ZnO/glass and Al-doped ZnO/Ag/Al-doped ZnO/glass was investigated. Zinc oxide and aluminum-doped zinc oxide (AZO) films were reactively deposited from pure Zn, 99Zn-1Al, 97Zn-3Al, 95Zn-5Al, 90Zn-10Al (at.%) targets. The aluminum content in the AZO films was measured by secondary ion mass spectroscopy (SIMS). The deposition rate and internal stress of the AZO films were measured. After a Moisture durability test at 50°C in 95% relative humidity for 12 days, the coatings were analyzed using optical microscopy, X-ray diffraction (XRD) and scanning electron microscopy (SEM). It was observed that the Al addition reduced the internal stress of the oxide films, and the AZO/Ag/AZO coatings had a better Moisture Resistance. However, the Al addition led to a decreased deposition rate of the oxide films, and the addition of excess Al resulted in a different Moisture degradation with a hazy appearance that might be due to an undesirable hydrate formation in the low-e coating. © 2001 Elsevier Science B.V.

J. Schmitz - One of the best experts on this subject based on the ideXlab platform.

  • Moisture Resistance of SU-8 and KMPR as structural material
    Microelectronic Engineering, 2020
    Co-Authors: V.m. Blanco Carballo, J. Melai, C. Salm, J. Schmitz
    Abstract:

    This paper treats the Moisture Resistance of SU-8 and KMPR, two photoresists considered as structural material in microsystems. Our experiments focus on the Moisture Resistance of newly developed radiation imaging detectors containing these resists. Since these microsystems will be used unpackaged, they are susceptible to all kinds of environmental conditions. Already after 1 day of exposure to a humid condition the structural integrity and adhesion of SU-8 structures, measured by a shear test is drastically reduced. KMPR photoresist shows much stronger Moisture Resistance properties, making it a suitable alternative in our application

  • Moisture Resistance of su 8 and kmpr as structural material for integrated gaseous detectors
    11th Annual Workshop on Semiconductor Advances for Future Electronics and Sensors SAFE 2008, 2008
    Co-Authors: V Blanco M Carballo, J. Melai, C. Salm, J. Schmitz
    Abstract:

    This paper treats the Moisture Resistance of SU-8 and KMPR, two photoresists considered as structural material in microsystems. Our experiments focus on the Moisture Resistance of newly developed radiation imaging detectors containing these resists. Since these microsystems will be used unpackaged, they are susceptible to all kinds of environmental conditions. Already after one day of exposure to a humid condition the structural integrity and adhesion of SU-8 structures, measured by a shear test is drastically reduced. KMPR photoresist shows much stronger Moisture Resistance properties, making it a suitable alternative in our application. © 2008 Elsevier Science. All rights reserved.