The Experts below are selected from a list of 360 Experts worldwide ranked by ideXlab platform
Massimiliano Cavallini - One of the best experts on this subject based on the ideXlab platform.
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Micro- and Nanopatterning by lithographically controlled wetting
Nature Protocols, 2012Co-Authors: Massimiliano Cavallini, Denis Gentili, Pierpaolo Greco, Francesco Valle, Fabio BiscariniAbstract:This protocol describes how to perform lithographically controlled wetting (LCW). LCW enables large-area patterning of microstructures and nanostructures of soluble materials, either organic or inorganic, including biological compounds in buffer solutions or compounds for cell guidance. LCW exploits the capillary forces of menisci established under the protrusions of a stamp placed in contact with a liquid film. In the space confined by each meniscus, the self-organization of the deposited solute yields highly ordered structures that replicate the motif of the stamp protrusions. The method does not require any particular infrastructure and can be accomplished by using simple tools such as compact discs or microscopy grids. Compared with other printing methods, LCW is universal for soluble materials, as it does not require chemical binding or other specific interactions between the solute and the surface. A process cycle takes from 2 to 36 h to be completed, depending on the choice of materials.
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Progress in Micro- and Nanopatterning via Electrochemical Lithography
The Journal of Physical Chemistry C, 2009Co-Authors: Felice C. Simeone, Cristiano Albonetti, Massimiliano CavalliniAbstract:In this paper we present a critical overview on recent progress in electrochemical methods for Nanopatterning and nanofabrication. In the first part we consider recent advancements in serial methods, which are mostly based on scanning probe microscopy. We also show applications for Nanopatterning, electropolymerization, and dots fabrication. In the second part, we consider the up-grading from serial to parallel with particular attention to the most recent and promising progress. We show the most interesting results highlighting the problems, limits, and future directions.
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Nanopatterning soluble multifunctional materials by unconventional wet lithography
Advanced Materials, 2009Co-Authors: Massimiliano Cavallini, Cristiano Albonetti, Fabio BiscariniAbstract:Molecular multifunctional materials have potential applications in many fields of technology, such as electronics, optics and optoelectronics, information storage, sensing, and energy conversion and storage. These materials are designed exhibit enhanced properties, and at the same time are endowed with functional groups that control their interactions, and hence self-organization, into a variety ofsupramolecular architectures. Since most of the multifunctional materials are soluble, lithographic methods suitable for solutions are attracting increasing interest for the manufacturing of the new materials and their applications. The aim of this paper is to highlight some of the recent advances of solution-based fabrication of multifunctional materials. We explain and examine the principles, processes, materials, and limitations of this class of patterning techniques, which we term unconventional wet lithographies (UWLs). We describe their ability to yield patterns and structures whose feature sizes range from nanometers to micrometers. In the following sections, we focus our attention on micromolding in capillaries, lithographically controlled wetting, and grid-assisted deposition, the most used methods demonstrated to lead to fully operating devices.
Lijing Cheng - One of the best experts on this subject based on the ideXlab platform.
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metal assisted focused ion beam Nanopatterning
Nanotechnology, 2016Co-Authors: Akash Kannegulla, Lijing ChengAbstract:Focused-ion beam milling is a versatile technique for maskless nanofabrication. However, the nonuniform ion beam profile and material redeposition tend to disfigure the surface morphology near the milling areas and degrade the fidelity of nanoscale pattern transfer, limiting the applicability of the technique. The ion-beam induced damage can deteriorate the performance of photonic devices and hinders the precision of template fabrication for nanoimprint lithography. To solve the issue, we present a metal assisted focused-ion beam (MAFIB) process in which a removable sacrificial aluminum layer is utilized to protect the working material. The new technique ensures smooth surfaces and fine milling edges; in addition, it permits direct formation of v-shaped grooves with tunable angles on dielectric substrates or metal films, silver for instance, which are rarely achieved by using traditional nanolithography followed by anisotropic etching processes. MAFIB was successfully demonstrated to directly create nanopatterns on different types of substrates with high fidelity and reproducibility. The technique provides the capability and flexibility necessary to fabricate nanophotonic devices and nanoimprint templates.
Rodolfo Cuerno - One of the best experts on this subject based on the ideXlab platform.
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self organized Nanopatterning of silicon surfaces by ion beam sputtering
Materials Science & Engineering R-reports, 2014Co-Authors: Javier Munozgarcia, Mario Castro, L Vazquez, R Gago, A Redondocubero, A Morenobarrado, Rodolfo CuernoAbstract:Abstract In recent years Ion Beam Sputtering (IBS) has revealed itself as a powerful technique to induce surface nanopatterns with a large number of potential applications. These structures are produced in rather short processing times and over relatively large areas, for a wide range of materials, such as metals, insulators, and semiconductors. In particular, silicon has become a paradigmatic system due to its technological relevance, as well as to its mono-elemental nature, wide availability, and production with extreme flatness. Thus, this review focuses on the IBS Nanopatterning of silicon surfaces from the experimental and the theoretical points of view. First, the main experimental results and applications are described under the light of the recently established evidence on the key role played by simultaneous impurity incorporation during irradiation, which has opened a new scenario for an improved understanding of the phenomenon. Second, the progress and state-of-art of the theoretical descriptions of the IBS Nanopatterning process for this type of targets are discussed. We summarize the historical approach to IBS through simulation techniques, with an emphasis on recent information from Molecular Dynamics methods, and provide a brief overview of the earlier and most recent continuum models for pure and compound systems.
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self organized surface Nanopatterning by ion beam sputtering
arXiv: Materials Science, 2009Co-Authors: Javier Munozgarcia, Mario Castro, Rodolfo Cuerno, L Vazquez, J A Sanchezgarcia, R GagoAbstract:The production of self-organized surface nanopatterns by ion beam sputtering (IBS) at low (<10 keV) and intermediate (10–100 keV) energies has emerged in the last decade as a promising bottom-up nanostructuring tool. The technique is remarkably universal, being applicable to metals, semiconductors or insulators, and it enables large degree of control over the main pattern features with high throughput (it requires low process time and can be used over extended areas). However, there is a wide scatter in the experimental results obtained as a function of system type and process parameters. In parallel, diverse theoretical models have been developed that differ in their capabilities to reproduce such a wide range of experimental features. We provide an overview of the most recent studies on the production of nanoripple, nanohole and nanodot periodic nanostructures by IBS, with special attention to the comparison between experiments and (continuum) models, and with a focus on those issues that remain open or, at least, ambiguous. The pattern properties to be considered are those of potential increased technological importance, such as the variation of size, shape, distance and ordering of the nanostructures as a function of parameters such as ion energy, target temperature and sputtering time (i.e., fluence). Finally, reported and proposed applications of IBS nanopatterns are briefly presented showing, in this way, the high-potential functionality of IBS nanostructured surfaces.
Jon A. Preece - One of the best experts on this subject based on the ideXlab platform.
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Bio-Nanopatterning of Surfaces
Nanoscale Research Letters, 2007Co-Authors: Paula M. Mendes, Chun L. Yeung, Jon A. PreeceAbstract:ABSTRACT: Bio-Nanopatterning of surfaces is a very active interdisciplinary field of research at the interface between biotechnology and nanotechnology. Precise patterning of biomolecules on surfaces with nanometre resolution has great potential in many medical and biological applications ranging from molecular diagnostics to advanced platforms for fundamental studies of molecular and cell biology. Bio-Nanopatterning technology has advanced at a rapid pace in the last few years with a variety of patterning methodologies being developed for immobilising biomolecules such as DNA, peptides, proteins and viruses at the nanoscale on a broad range of substrates. In this review, the status of research and development are described, with particular focus on the recent advances on the use of nanolithographic techniques as tools for biomolecule immobilisation at the nanoscale. Present strengths and weaknesses, as well future challenges on the different nanolithographic bio-Nanopatterning approaches are discussed.
Sang Ouk Kim - One of the best experts on this subject based on the ideXlab platform.
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high performance nanopattern triboelectric generator by block copolymer lithography
Nano Energy, 2015Co-Authors: Daewon Kim, Ju Young Kim, Sang Ouk Kim, Seungbae Jeon, Myeonglok Seol, Yangkyu ChoiAbstract:Large-area Nanopatterning is introduced on a flexible gold substrate by block copolymer (BCP) lithography. We fabricate ultrahigh power energy harvesting nanogenerators based on contactelectrification principle exploiting the effective contact area enhancement by block copolymer lithography. Owing to the facile and effective surface area enhancement by BCP Nanopatterning, significant enhancement of triboelectric charge induction is attained. Output currents from TENG increased at least 16 times after BCP Nanopatterning. This nanogenerator can generate remarkably high output voltage and current, which can directly light up 504 serially connected LEDs. The resultant nanogenerator attains the maximum instantaneous current of 1.6 mA and output power of 93.2 W/m 2 . Electrical energy generated by single cycle of impact force is 0.54 mJ, and the average electrical energy is 114.89 mW. Those values indicate one of the highest device performance ever reported for the TENGs based on contact-separation mode thus far.
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Directed self-assembly of block copolymers for universal Nanopatterning
Soft Matter, 2013Co-Authors: Bong Hoon Kim, Ju Young Kim, Sang Ouk KimAbstract:Block copolymers (BCP) are self-assembling polymeric materials that have been extensively investigated for several decades. Recently, directed self-assembly (DSA) of BCPs has received enormous research attention from both academia and industry as next-generation nanolithography technology. This article provides a brief introduction to (i) the spontaneous and directed self-assembly of BCPs, (ii) the orientation and lateral ordering of BCP nanopatterns and their relationships with DSA strategies, (iii) various potential applications of BCP Nanopatterning, and (iv) mussel-inspired BCP Nanopatterning for arbitrary substrate materials including low surface energy materials.
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mussel inspired block copolymer lithography for low surface energy materials of teflon graphene and gold
Advanced Materials, 2011Co-Authors: Bong Hoon Kim, Dong Ok Shin, Ju Young Kim, Duck Hyun Lee, Hu Young Jeong, Seonki Hong, Je Moon Yun, Chong Min Koo, Haeshin Lee, Sang Ouk KimAbstract:Mussel-inspired interfacial engineering is synergistically integrated with block copolymer (BCP) lithography for the surface Nanopatterning of low surface energy substrate materials, including, Teflon, graphene, and gold. The image shows the Teflon nanowires and their excellent superhydrophobicity.
