Teflon

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Andrew Macmillan - One of the best experts on this subject based on the ideXlab platform.

Joachim K. Krauss - One of the best experts on this subject based on the ideXlab platform.

  • Treatment of recurrent trigeminal neuralgia due to Teflon granuloma
    The Journal of Headache and Pain, 2010
    Co-Authors: Hans-holger Capelle, Almuth Brandis, Christoph A. Tschan, Joachim K. Krauss
    Abstract:

    Recurrent trigeminal neuralgia after microvascular decompression (MVD) may be due to insufficient decompression, dislocation of the implant to pad the neurovascular contact, or the development of granuloma. Here, we report on our experience with Teflon granuloma including its treatment and histopathological examination. In a series of 200 patients with trigeminal neuralgia MVD was performed with Teflon felt according to Jannetta’s technique. In three patients with recurrent facial pain Teflon granuloma was found to be the cause for recurrence. In each instance, the granuloma was removed for histopathological examination. Mean age at the first procedure was 62.3 years and at the second procedure 66.3 years. Recurrence of pain occurred between 1 and 8.5 years after the first procedure. MRI scans demonstrated local gadolineum enhancement in the cerebellopontine angle, and CT scans showed local calcification. Intraoperatively dense fibrous tissue was found at the site of the Teflon granuloma. Histopathological examination revealed foreign body granuloma with multinuclear giant cells, collagen-rich hyalinized scar tissue, focal hemosiderin depositions, and microcalcifications. The Teflon granuloma was completely removed, and a new Teflon felt was used for re-decompression. Patients were free of pain after the second procedure at a mean of 40.3 months of follow-up. Teflon granuloma is a rare cause for recurrent facial pain after MVD. Small bleeding into the Teflon felt at surgery might trigger its development. A feasible treatment option is surgical re-exploration, nerve preserving removal of the granuloma, and repeat MVD.

Robert T Sataloff - One of the best experts on this subject based on the ideXlab platform.

  • Radiologic assessment of laryngeal Teflon injection
    Journal of Voice, 2005
    Co-Authors: Robert T Sataloff, David P. Mayer, Joseph R. Spiegel
    Abstract:

    Summary Injection of Teflon lateral to the vocalis muscle improves voice quality, cough, and helps prevent aspiration in patients with unilateral vocalfold paralysis. Unsatisfactory results may be associated with Teflon being injected either too superficially or in excessive or insufficient quantities. Evaluation and treatment of patients with poor results following Teflon injection of the vocal folds are notoriously difficult. Although radiologic studies are not used widely in these patients, they may be extremely helpful. Cross-sectional imaging using computed tomography of a larynx after Teflon injection demonstrates the position and amount of the material easily and may be especially helpful in planning revision surgery

  • lipoinjection for unilateral vocal cord paralysis
    Laryngoscope, 1991
    Co-Authors: Diran O Mikaelian, Louis D Lowry, Robert T Sataloff
    Abstract:

    Injection of Teflon® paste is a commonly accepted procedure to improve the caliber of voice in unilateral vocal cord paralysis. There are several drawbacks to Teflon injection, among them respiratory obstruction (from overinjected Teflon) and unsatisfactory voice quality (Teflon causes stiffness of the vocal folds). This paper is a preliminary report on lipoinjection instead of Teflon injection into a paralyzed vocal fold. Fat appears to impart a soft bulkiness to the injected cord, while allowing it to retain its vibratory qualities. It is autologous material and can be retrieved if excessively overinjected. The fate of autologous fat injected into a paralyzed vocal cord remains unknown. Most of the literature on lipoinjection concerns repairs of depressed scars or breast augmentation. Our longest follow-up has been 12 months. Three patients have had this procedure, and the results appear to be very encouraging.

Liduo Wang - One of the best experts on this subject based on the ideXlab platform.

  • Efficient light emitting diodes with Teflon buffer layer
    Synthetic Metals, 2002
    Co-Authors: Yong Qiu, Liduo Wang, Yudi Gao, Deqiang Zhang
    Abstract:

    Abstract The polytetrafluoroethylene (Teflon) was utilized as buffer layer to improve the performance of organic light emitting diodes (OLEDs). In the ITO/Teflon/ N , N ′-diphenyl- N , N ′-(3-methylphenyl)-1,1′-biphenyl-4,4′-diamine (TPD)/tris(8-hydroxy-quinoline) aluminum (Alq 3 )/Ca/Ag device, the Teflon film helped to enhance the hole tunneling injection and effectively impede indium diffusion from the ITO electrode. Compared with the devices without Teflon, the turn-on voltage was lowered by 1.5 V due to the introduction of Teflon buffer, and the optimized devices exhibited a luminous efficiency double that of the devices without Teflon layer, and the device lifetime proved to be dramatically increased.

  • structure and microtribological behavior of Teflon and Teflon si3n4 micro assembling film
    Thin Solid Films, 1999
    Co-Authors: Jihui Wang, Xinchun Lu, Hengde Li, Liduo Wang
    Abstract:

    Abstract Micro-assembling Teflon/Si 3 N 4 multilayer film was developed by ion beam alternating sputtering Teflon and Si 3 N 4 ceramic targets. The structural, mechanical and microtribological properties were studied by PHI-5300, FTIR, XRD and atomic force and friction force microscope (AFM/FFM). The results show that the multilayer consists of Si 3 N 4 component and crystalline Teflon. The hardness of the multilayer is less than that of Si 3 N 4 ; but the toughness of Teflon/Si 3 N 4 is greatly improved. The friction coefficient of Teflon/Si 3 N 4 multilayer is lower than that of Si 3 N 4 film, and the wear resistance of Teflon/Si 3 N 4 multilayer is much greater than that of Teflon film. The friction force of Teflon/Si 3 N 4 film is linear with the load in nanoscale. The worn track will be formed in Teflon and Teflon/Si 3 N 4 film when the load is greater than 70 nN.

  • Structure and microtribological behavior of Teflon and Teflon/Si3N4 micro-assembling film
    Thin Solid Films, 1999
    Co-Authors: Jihui Wang, Shizhu Wen, Liduo Wang
    Abstract:

    Abstract Micro-assembling Teflon/Si 3 N 4 multilayer film was developed by ion beam alternating sputtering Teflon and Si 3 N 4 ceramic targets. The structural, mechanical and microtribological properties were studied by PHI-5300, FTIR, XRD and atomic force and friction force microscope (AFM/FFM). The results show that the multilayer consists of Si 3 N 4 component and crystalline Teflon. The hardness of the multilayer is less than that of Si 3 N 4 ; but the toughness of Teflon/Si 3 N 4 is greatly improved. The friction coefficient of Teflon/Si 3 N 4 multilayer is lower than that of Si 3 N 4 film, and the wear resistance of Teflon/Si 3 N 4 multilayer is much greater than that of Teflon film. The friction force of Teflon/Si 3 N 4 film is linear with the load in nanoscale. The worn track will be formed in Teflon and Teflon/Si 3 N 4 film when the load is greater than 70 nN.

  • Structure and microtribological behavior of Teflon and Teflon/Si 3 N 4 micro-assembling film
    Thin Solid Films, 1999
    Co-Authors: Jihui Wang, Shizhu Wen, Liduo Wang
    Abstract:

    Micro-assembling Teflon/Si3N4 multilayer film was developed by ion beam alternating sputtering Teflon and Si3N4 ceramic targets. The structural, mechanical and microtribological properties were studied by PHI-5300, FTIR, XRD and atomic force and friction force microscope (AFM/FFM). The results show that the multilayer consists of Si3N4 component and crystalline Teflon. The hardness of the multilayer is less than that of Si3N4; but the toughness of Teflon/Si3N4 is greatly improved. The friction coefficient of Teflon/Si3N4 multilayer is lower than that of Si3N4 film, and the wear resistance of Teflon/Si3N4 multilayer is much greater than that of Teflon film. The friction force of Teflon/ Si3N4 film is linear with the load in nanoscale. The worn track will be formed in Teflon and Teflon/Si3N4 film when the load is greater than 70 nN. (C) 1999 Published by Elsevier Science Ltd. All rights reserved

Karen Macmillan - One of the best experts on this subject based on the ideXlab platform.