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The Experts below are selected from a list of 38901 Experts worldwide ranked by ideXlab platform

Kevin L Moore - One of the best experts on this subject based on the ideXlab platform.

Yangquan Chen - One of the best experts on this subject based on the ideXlab platform.

Song Hu - One of the best experts on this subject based on the ideXlab platform.

  • An optical modulation based focus method for optical projection lithography
    5th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design Manufacturing and Testing of Micro- and Nano-Optical De, 2010
    Co-Authors: Wangfu Chen, Song Hu
    Abstract:

    An optical modulation method based focus and level scheme is presented for optical projection lithography. The main parts of the focus system are analyzed respectively. Several kinds of modulation methods are adopted to realize nanometer resolution, including grating modulation, polarization modulation and optic-elastic modulation. The grating modulation is realized by imaging objective grating to the surface of modulation grating and then the modulation light is sent to polarization part. The polarization modulation is based on birefringence which can divide optical signal into two parts and each part represents the position and focus error of silicon wafer. Two or more equipments can implement wafer leveling. By introducing optic-elastic modulation, high signal-to-noise is Obtained. Analytical Result indicates that focusing resolution at nanometer level can be realized.

Wangfu Chen - One of the best experts on this subject based on the ideXlab platform.

  • An optical modulation based focus method for optical projection lithography
    5th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design Manufacturing and Testing of Micro- and Nano-Optical De, 2010
    Co-Authors: Wangfu Chen, Song Hu
    Abstract:

    An optical modulation method based focus and level scheme is presented for optical projection lithography. The main parts of the focus system are analyzed respectively. Several kinds of modulation methods are adopted to realize nanometer resolution, including grating modulation, polarization modulation and optic-elastic modulation. The grating modulation is realized by imaging objective grating to the surface of modulation grating and then the modulation light is sent to polarization part. The polarization modulation is based on birefringence which can divide optical signal into two parts and each part represents the position and focus error of silicon wafer. Two or more equipments can implement wafer leveling. By introducing optic-elastic modulation, high signal-to-noise is Obtained. Analytical Result indicates that focusing resolution at nanometer level can be realized.

Wolfhard Wegscheider - One of the best experts on this subject based on the ideXlab platform.

  • Evaluation of proficiency testing Results taking into account their uncertainties
    Accreditation and Quality Assurance, 2001
    Co-Authors: Ilya Kuselman, Ioannis Papadakis, Wolfhard Wegscheider
    Abstract:

    A new composite score for the evaluation of performance of proficiency testing participants is proposed. The score is based on a combination of the z-score, uncertainty of a participant’s measurement Result and uncertainty of the proficiency testing scheme’s assigned value. The use of such a composite score will allow evaluation not only of the participant’s ability to determine an analyte in corresponding matrix, but also their understanding of the uncertainty in the Obtained Analytical Result. The score may be helpful for the laboratory’s quality system and for laboratory accreditation according to ISO 17025.