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Taik Min Lee - One of the best experts on this subject based on the ideXlab platform.
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Reverse Offset Printing of Transparent Metal Mesh Electrodes using an Imprinted Disposable Cliché
International Journal of Precision Engineering and Manufacturing, 2015Co-Authors: Young-man Choi, Inyoung Kim, Taik Min Lee, Eonseok Lee, Yunseok Jang, Jae Hong Park, Chung-mo Yang, Woo Choong Kim, Kwon SinAbstract:The cliches used in reverse Offset Printing are typically fabricated using photolithography and etching processes applied to a Si wafer or glass substrate. Because those fabrication processes make cliches cost high, they are cleaned and reused in repeated Printing processes. The cleaning process tends to reduce the quality and throughput of reverse Offset Printing techniques. This paper describes reverse Offset Printing using a noble disposable cliche. Disposable cliches may be used once or a few times, and then they may be discarded. They are fabricated by imPrinting methods applied to an ultraviolet curable resin on a flexible plastic film. The high adhesion of the plastic film facilitates patterning on the disposable cliches and yields patterns similar to those achieved using hard cliches. The disposable cliches and roll-to-plate reverse Offset Printing methods were used to fabricate highly transparent conductive electrodes consisting of metal meshes with a linewidth of 3.6 µm. The transmittance of the metal mesh electrodes was 98% and the sheet resistance was 80 Ω/□.
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Mechanism of reverse-Offset Printing
Journal of Micromechanics and Microengineering, 2015Co-Authors: Young-man Choi, Eonseok Lee, Taik Min LeeAbstract:We propose a mechanism for reverse-Offset Printing based on a mathematical model. In reverse-Offset Printing, high resolution is achieved by patterning a coated, thin ink film with an intaglio-patterned clich?. By using the relationships among the ink blanket adhesion strength, the ink clich? adhesion strength, and the ink cohesion strength, a criterion for successful patterning is derived. We found that there is a Printing window in the ink blanket adhesion strength that depends on the shear strength of the ink film and the dimensions of the pattern. The Printing window diminishes as the line width decreases, resulting in a minimum printable line width. The proposed mechanism was verified by Printing patterns with various shapes and dimensions.
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investigation on synchronization of the Offset Printing process for fine patterning and precision overlay
Journal of Applied Physics, 2014Co-Authors: Dong Woo Kang, Inyoung Kim, Young-man Choi, Eonseok Lee, Bongmin Kim, Hyunchang Kim, Seung Hyun Lee, Dukkyun Yoon, Taik Min LeeAbstract:Offset Printing processes are promising candidates for producing printed electronics due to their capacity for fine patterning and suitability for mass production. To print high-resolution patterns with good overlay using Offset Printing, the velocities of two contact surfaces, which ink is transferred between, should be synchronized perfectly. However, an exact velocity of the contact surfaces is unknown due to several imperfections, including tolerances, blanket swelling, and velocity ripple, which prevents the system from being operated in the synchronized condition. In this paper, a novel method of measurement based on the sticking model of friction force was proposed to determine the best synchronized condition, i.e., the condition in which the rate of synchronization error is minimized. It was verified by experiment that the friction force can accurately represent the rate of synchronization error. Based on the measurement results of the synchronization error, the allowable margin of synchronization error when Printing high-resolution patterns was investigated experimentally using reverse Offset Printing. There is a region where the patterning performance is unchanged even though the synchronization error is varied, and this may be viewed as indirect evidence that printability performance is secured when there is no slip at the contact interface. To understand what happens at the contact surfaces during ink transfer, the deformation model of the blanket's surface was developed. The model estimates how much deformation on the blanket's surface can be borne by the synchronization error when there is no slip at the contact interface. In addition, the model shows that the synchronization error results in scale variation in the machine direction (MD), which means that the Printing registration in the MD can be adjusted actively by controlling the synchronization if there is a sufficient margin of synchronization error to guarantee printability. The effect of synchronization on the Printing registration was verified experimentally using gravure Offset Printing. The variations in synchronization result in the differences in the MD scale, and the measured MD scale matches exactly with the modeled MD scale.
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Formulation and Characterization of CuIn1-xGaxSe2Ink for Gravure Offset Printing
Japanese Journal of Applied Physics, 2013Co-Authors: Inyoung Kim, Hyun-suk Han, Sun-woo Kwak, Bongmin Kim, Yunseok Jang, Taik Min LeeAbstract:CuIn1-xGaxSe2 (CIGS) paste for gravure Offset Printing was formulated by changing the amount of additives to determine the critical factor for gravure Offset Printing quality. With the addition of poly(vinyl pyrrolidone) (PVP), the viscosity and yield stress of CIGS ink decreased and shear thinning behavior disappeared. However, PVP effectively enhanced ink cohesion and elastic modulus, which critically affected the printability of the CIGS paste. Intense pulsed light (IPL) treatment in air made the microstructure of CIGS film denser without a phase change or oxidation. The gravure Offset Printing technique and IPL treatment were considered a good combination for a continuous and fast CIGS film growth process.
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Effect of ink cohesive force on gravure Offset Printing
Microelectronic Engineering, 2012Co-Authors: Inyoung Kim, Taik Min Lee, Sun-woo Kwak, Kwang-seop Kim, Jae-hyun Kim, Hak-joo LeeAbstract:In order to understand the ink transfer mechanism of contact Printing, a novel method for measuring ink cohesive force was designed and a new apparatus was fabricated through replicating a gravure Offset Printing process. Measured results showed that the cohesive force of Ag ink increased during the Printing process due to solvent absorption into a polydimethylsiloxane (PDMS) blanket material, which enhanced ink transfer from a cliche to a substrate. This enhanced ink transfer mechanism was discussed with the results of changes in ink viscosity and cohesive force and contact angle.
Levonas Manusadzianas - One of the best experts on this subject based on the ideXlab platform.
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Microbiological degradation of a spent Offset-Printing developer.
Journal of hazardous materials, 2004Co-Authors: Tomas Vengris, Rima Binkiene, Rita Butkiene, Ona Nivinskiene, Vytautas Melvydas, Levonas ManusadzianasAbstract:To decontaminate spent Offset-Printing developer Polychrome 4003, several microorganisms were separated from the soil that has been used for developer dumping for 3 years. Two organism cultures were isolated and identified to genus Geomyces pannorum and Bacteria spp. These organisms, as well as commercial Septic Gobbler (SG) bacteria, were used to decontaminate the developer. Reduction of both the chemical oxygen demand (COD) and the amount of total identified organic compounds reached 30% after 40 day treatment of waste suspension by G. pannorum and Bacteria spp. A substantially higher degree of COD reduction by approximately 80% and the total amount of identified organic compounds by approximately 90% was achieved when SG bacteria have been applied for the same period. According to a rapid electrophysiological test with macrophytic algae Nitellopsis obtusa, the toxicity of spent Offset-Printing developer Polychrome 4003 was classified as extremely toxic (>100 toxic units, T.U.), and it remained at the same level after treatment with G. pannorum and Bacteria spp. More effective biodegradation with SG bacteria diminished toxicity substantially.
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Microbiological degradation of a spent Offset-Printing developer.
Journal of Hazardous Materials, 2004Co-Authors: Tomas Vengris, Vytautas Melvydas, Rima Binkienė, Rita Butkienė, Ona Nivinskienė, Levonas ManusadzianasAbstract:To decontaminate spent Offset-Printing developer Polychrome 4003, several microorganisms were separated from the soil that has been used for developer dumping for 3 years. Two organism cultures were isolated and identified to genus Geomyces pannorum and Bacteria spp. These organisms, as well as commercial Septic Gobbler (SG) bacteria, were used to decontaminate the developer. Reduction of both the chemical oxygen demand (COD) and the amount of total identified organic compounds reached 30% after 40 day treatment of waste suspension by G. pannorum and Bacteria spp. A substantially higher degree of COD reduction by ∼80% and the total amount of identified organic compounds by ∼90% was achieved when SG bacteria have been applied for the same period. According to a rapid electrophysiological test with macrophytic algae Nitellopsis obtusa, the toxicity of spent Offset-Printing developer Polychrome 4003 was classified as extremely toxic (>100 toxic units, T.U.), and it remained at the same level after treatment with G. pannorum and Bacteria spp. More effective biodegradation with SG bacteria diminished toxicity substantially.
Tomas Vengris - One of the best experts on this subject based on the ideXlab platform.
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Microbiological degradation of a spent Offset-Printing developer.
Journal of hazardous materials, 2004Co-Authors: Tomas Vengris, Rima Binkiene, Rita Butkiene, Ona Nivinskiene, Vytautas Melvydas, Levonas ManusadzianasAbstract:To decontaminate spent Offset-Printing developer Polychrome 4003, several microorganisms were separated from the soil that has been used for developer dumping for 3 years. Two organism cultures were isolated and identified to genus Geomyces pannorum and Bacteria spp. These organisms, as well as commercial Septic Gobbler (SG) bacteria, were used to decontaminate the developer. Reduction of both the chemical oxygen demand (COD) and the amount of total identified organic compounds reached 30% after 40 day treatment of waste suspension by G. pannorum and Bacteria spp. A substantially higher degree of COD reduction by approximately 80% and the total amount of identified organic compounds by approximately 90% was achieved when SG bacteria have been applied for the same period. According to a rapid electrophysiological test with macrophytic algae Nitellopsis obtusa, the toxicity of spent Offset-Printing developer Polychrome 4003 was classified as extremely toxic (>100 toxic units, T.U.), and it remained at the same level after treatment with G. pannorum and Bacteria spp. More effective biodegradation with SG bacteria diminished toxicity substantially.
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Microbiological degradation of a spent Offset-Printing developer.
Journal of Hazardous Materials, 2004Co-Authors: Tomas Vengris, Vytautas Melvydas, Rima Binkienė, Rita Butkienė, Ona Nivinskienė, Levonas ManusadzianasAbstract:To decontaminate spent Offset-Printing developer Polychrome 4003, several microorganisms were separated from the soil that has been used for developer dumping for 3 years. Two organism cultures were isolated and identified to genus Geomyces pannorum and Bacteria spp. These organisms, as well as commercial Septic Gobbler (SG) bacteria, were used to decontaminate the developer. Reduction of both the chemical oxygen demand (COD) and the amount of total identified organic compounds reached 30% after 40 day treatment of waste suspension by G. pannorum and Bacteria spp. A substantially higher degree of COD reduction by ∼80% and the total amount of identified organic compounds by ∼90% was achieved when SG bacteria have been applied for the same period. According to a rapid electrophysiological test with macrophytic algae Nitellopsis obtusa, the toxicity of spent Offset-Printing developer Polychrome 4003 was classified as extremely toxic (>100 toxic units, T.U.), and it remained at the same level after treatment with G. pannorum and Bacteria spp. More effective biodegradation with SG bacteria diminished toxicity substantially.
Inyoung Kim - One of the best experts on this subject based on the ideXlab platform.
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Reverse Offset Printing of Transparent Metal Mesh Electrodes using an Imprinted Disposable Cliché
International Journal of Precision Engineering and Manufacturing, 2015Co-Authors: Young-man Choi, Inyoung Kim, Taik Min Lee, Eonseok Lee, Yunseok Jang, Jae Hong Park, Chung-mo Yang, Woo Choong Kim, Kwon SinAbstract:The cliches used in reverse Offset Printing are typically fabricated using photolithography and etching processes applied to a Si wafer or glass substrate. Because those fabrication processes make cliches cost high, they are cleaned and reused in repeated Printing processes. The cleaning process tends to reduce the quality and throughput of reverse Offset Printing techniques. This paper describes reverse Offset Printing using a noble disposable cliche. Disposable cliches may be used once or a few times, and then they may be discarded. They are fabricated by imPrinting methods applied to an ultraviolet curable resin on a flexible plastic film. The high adhesion of the plastic film facilitates patterning on the disposable cliches and yields patterns similar to those achieved using hard cliches. The disposable cliches and roll-to-plate reverse Offset Printing methods were used to fabricate highly transparent conductive electrodes consisting of metal meshes with a linewidth of 3.6 µm. The transmittance of the metal mesh electrodes was 98% and the sheet resistance was 80 Ω/□.
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investigation on synchronization of the Offset Printing process for fine patterning and precision overlay
Journal of Applied Physics, 2014Co-Authors: Dong Woo Kang, Inyoung Kim, Young-man Choi, Eonseok Lee, Bongmin Kim, Hyunchang Kim, Seung Hyun Lee, Dukkyun Yoon, Taik Min LeeAbstract:Offset Printing processes are promising candidates for producing printed electronics due to their capacity for fine patterning and suitability for mass production. To print high-resolution patterns with good overlay using Offset Printing, the velocities of two contact surfaces, which ink is transferred between, should be synchronized perfectly. However, an exact velocity of the contact surfaces is unknown due to several imperfections, including tolerances, blanket swelling, and velocity ripple, which prevents the system from being operated in the synchronized condition. In this paper, a novel method of measurement based on the sticking model of friction force was proposed to determine the best synchronized condition, i.e., the condition in which the rate of synchronization error is minimized. It was verified by experiment that the friction force can accurately represent the rate of synchronization error. Based on the measurement results of the synchronization error, the allowable margin of synchronization error when Printing high-resolution patterns was investigated experimentally using reverse Offset Printing. There is a region where the patterning performance is unchanged even though the synchronization error is varied, and this may be viewed as indirect evidence that printability performance is secured when there is no slip at the contact interface. To understand what happens at the contact surfaces during ink transfer, the deformation model of the blanket's surface was developed. The model estimates how much deformation on the blanket's surface can be borne by the synchronization error when there is no slip at the contact interface. In addition, the model shows that the synchronization error results in scale variation in the machine direction (MD), which means that the Printing registration in the MD can be adjusted actively by controlling the synchronization if there is a sufficient margin of synchronization error to guarantee printability. The effect of synchronization on the Printing registration was verified experimentally using gravure Offset Printing. The variations in synchronization result in the differences in the MD scale, and the measured MD scale matches exactly with the modeled MD scale.
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Formulation and Characterization of CuIn1-xGaxSe2Ink for Gravure Offset Printing
Japanese Journal of Applied Physics, 2013Co-Authors: Inyoung Kim, Hyun-suk Han, Sun-woo Kwak, Bongmin Kim, Yunseok Jang, Taik Min LeeAbstract:CuIn1-xGaxSe2 (CIGS) paste for gravure Offset Printing was formulated by changing the amount of additives to determine the critical factor for gravure Offset Printing quality. With the addition of poly(vinyl pyrrolidone) (PVP), the viscosity and yield stress of CIGS ink decreased and shear thinning behavior disappeared. However, PVP effectively enhanced ink cohesion and elastic modulus, which critically affected the printability of the CIGS paste. Intense pulsed light (IPL) treatment in air made the microstructure of CIGS film denser without a phase change or oxidation. The gravure Offset Printing technique and IPL treatment were considered a good combination for a continuous and fast CIGS film growth process.
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Effect of ink cohesive force on gravure Offset Printing
Microelectronic Engineering, 2012Co-Authors: Inyoung Kim, Taik Min Lee, Sun-woo Kwak, Kwang-seop Kim, Jae-hyun Kim, Hak-joo LeeAbstract:In order to understand the ink transfer mechanism of contact Printing, a novel method for measuring ink cohesive force was designed and a new apparatus was fabricated through replicating a gravure Offset Printing process. Measured results showed that the cohesive force of Ag ink increased during the Printing process due to solvent absorption into a polydimethylsiloxane (PDMS) blanket material, which enhanced ink transfer from a cliche to a substrate. This enhanced ink transfer mechanism was discussed with the results of changes in ink viscosity and cohesive force and contact angle.
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reliability of gravure Offset Printing under various Printing conditions
Journal of Applied Physics, 2010Co-Authors: Taik Min Lee, Jae Ho Noh, Inyoung Kim, Dong-soo Kim, Sangki ChunAbstract:This paper focuses on the reliability of gravure Offset Printing and presents a mechanism on how the width of the printed line increases on repeated Printings. Of the various Printing process parameters, such as the resting times between doctoring, off, and set, Printing velocity, Printing pressure, and so forth, we investigated the effects of Printing velocity, Printing pressure, and blanket’s thickness on the reliability of gravure Offset Printing. As the Printing velocity increases, the reliability of gravure Offset Printing also increases. This is because the actual contact time between ink and blanket decreases, resulting in less solvent absorption into the blanket. Printing pressure does not have much influence on reliability. Even though some change was observed, it was within the range of experimental error. Under sufficient Printing pressure, this observation implies that the more important factor as regards the absorption model is time rather than pressure. As the thickness of the blanket increa...
Sangki Chun - One of the best experts on this subject based on the ideXlab platform.
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reliability of gravure Offset Printing under various Printing conditions
Journal of Applied Physics, 2010Co-Authors: Taik Min Lee, Jae Ho Noh, Inyoung Kim, Dong-soo Kim, Sangki ChunAbstract:This paper focuses on the reliability of gravure Offset Printing and presents a mechanism on how the width of the printed line increases on repeated Printings. Of the various Printing process parameters, such as the resting times between doctoring, off, and set, Printing velocity, Printing pressure, and so forth, we investigated the effects of Printing velocity, Printing pressure, and blanket’s thickness on the reliability of gravure Offset Printing. As the Printing velocity increases, the reliability of gravure Offset Printing also increases. This is because the actual contact time between ink and blanket decreases, resulting in less solvent absorption into the blanket. Printing pressure does not have much influence on reliability. Even though some change was observed, it was within the range of experimental error. Under sufficient Printing pressure, this observation implies that the more important factor as regards the absorption model is time rather than pressure. As the thickness of the blanket increa...
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Reliability of gravure Offset Printing under various Printing conditions
2010Co-Authors: Taik Min Lee, Jae Ho Noh, Inyoung Kim, Dong-yu Kim, Sangki ChunAbstract:This paper focuses on the reliability of gravure Offset Printing and presents a mechanism on how the width of the printed line increases on repeated Printings. Of the various Printing process parameters, such as the resting times between doctoring, off, and set, Printing velocity, Printing pressure, and so forth, we investigated the effects of Printing velocity, Printing pressure, and blanket’s thickness on the reliability of gravure Offset Printing. As the Printing velocity increases, the reliability of gravure Offset Printing also increases. This is because the actual contact time between ink and blanket decreases, resulting in less solvent absorption into the blanket. Printing pressure does not have much influence on reliability. Even though some change was observed, it was within the range of experimental error. Under sufficient Printing pressure, this observation implies that the more important factor as regards the absorption model is time rather than pressure. As the thickness of the blanket increases, the reliability also increases. In the case of a thin blanket, in particular, the reliability of gravure Offset Printing is sensitive to changes in thickness.
