The Experts below are selected from a list of 41211 Experts worldwide ranked by ideXlab platform

Peter P. Chen - One of the best experts on this subject based on the ideXlab platform.

  • Load Balancing Among Photolithography Machines in the Semiconductor Manufacturing System
    Journal of Information Science and Engineering, 2008
    Co-Authors: Arthur M. D. Shr, Alan Liu, Peter P. Chen
    Abstract:

    We propose a Load Balancing (LB) scheduling approach to tackle the load balancing issue in the semiconductor manufacturing system. This issue is derived from the dedicated Photolithography machine constraint. The constraint of having a dedicated machine for the Photolithography process in semiconductor manufacturing is one of the new challenges introduced in Photolithography machinery due to natural bias. To prevent the impact of natural bias, the wafer lots passing through each Photolithography process have to be processed on the same machine. However, the previous research for the semiconductor manufacturing production has not addressed the load balancing issue and dedicated Photolithography machine constraint. In this paper, along with providing the LB approach to the issue, we also present a novel model, Resource Schedule and Execution Matrix (RSEM) – the representation and manipulation methods for the task process patterns. The advantage of the proposed approach is to easily schedule the wafer lots by using a simple two-dimensional matrix. We also present the simulation results to validate our approach.

  • BASYS - A Load Balancing Method for Dedicated Photolithography Machine Constraint
    Information Technology For Balanced Manufacturing Systems, 2006
    Co-Authors: Arthur M. D. Shr, Alan Liu, Peter P. Chen
    Abstract:

    The dedicated Photolithography machine constraint in semiconductor manufacturing is one of the new issues of Photolithography machinery due to natural bias. In this paper, we propose the heuristic Load Balancing (LB) scheduling approach based on a Resource Schedule and Execution Matrix (RSEM) to tackle this constraint. The LB method is to schedule each wafer lot at the first Photolithography stage to a suitable machine, according to the load balancing factors among machines. We describe the proposed LB scheduling method and present an example to demonstrate the proposed method and the result of the simulations to validate the approach.

  • Load Balancing among Photolithography Machines in Semiconductor Manufacturing
    2006 3rd International IEEE Conference Intelligent Systems, 2006
    Co-Authors: Arthur M. D. Shr, Alan Liu, Peter P. Chen
    Abstract:

    We propose a Multiagent Scheduling System (MSS) based on a Resource Schedule and Execution Matrix (RSEM) to tackle the issue of load balancing among Photolithography machines in semiconductor Manufacturing. This issue is derived from the dedicated Photolithography machine constraint. It is one of the new challenges introduced in Photolithography machinery due to natural bias. However, many scheduling policies or modeling methods proposed by previous research for the semiconductor manufacturing production have not addressed the load balancing issue and dedicated machine constraint. In this paper, we describe the design of the proposed MSS approach in detail, including the system architecture, coordination strategy, and its scheduling method on the RSEM. We also present the simulation results that validate the approach.

Arthur M. D. Shr - One of the best experts on this subject based on the ideXlab platform.

  • Load Balancing Among Photolithography Machines in the Semiconductor Manufacturing System
    Journal of Information Science and Engineering, 2008
    Co-Authors: Arthur M. D. Shr, Alan Liu, Peter P. Chen
    Abstract:

    We propose a Load Balancing (LB) scheduling approach to tackle the load balancing issue in the semiconductor manufacturing system. This issue is derived from the dedicated Photolithography machine constraint. The constraint of having a dedicated machine for the Photolithography process in semiconductor manufacturing is one of the new challenges introduced in Photolithography machinery due to natural bias. To prevent the impact of natural bias, the wafer lots passing through each Photolithography process have to be processed on the same machine. However, the previous research for the semiconductor manufacturing production has not addressed the load balancing issue and dedicated Photolithography machine constraint. In this paper, along with providing the LB approach to the issue, we also present a novel model, Resource Schedule and Execution Matrix (RSEM) – the representation and manipulation methods for the task process patterns. The advantage of the proposed approach is to easily schedule the wafer lots by using a simple two-dimensional matrix. We also present the simulation results to validate our approach.

  • BASYS - A Load Balancing Method for Dedicated Photolithography Machine Constraint
    Information Technology For Balanced Manufacturing Systems, 2006
    Co-Authors: Arthur M. D. Shr, Alan Liu, Peter P. Chen
    Abstract:

    The dedicated Photolithography machine constraint in semiconductor manufacturing is one of the new issues of Photolithography machinery due to natural bias. In this paper, we propose the heuristic Load Balancing (LB) scheduling approach based on a Resource Schedule and Execution Matrix (RSEM) to tackle this constraint. The LB method is to schedule each wafer lot at the first Photolithography stage to a suitable machine, according to the load balancing factors among machines. We describe the proposed LB scheduling method and present an example to demonstrate the proposed method and the result of the simulations to validate the approach.

  • Load Balancing among Photolithography Machines in Semiconductor Manufacturing
    2006 3rd International IEEE Conference Intelligent Systems, 2006
    Co-Authors: Arthur M. D. Shr, Alan Liu, Peter P. Chen
    Abstract:

    We propose a Multiagent Scheduling System (MSS) based on a Resource Schedule and Execution Matrix (RSEM) to tackle the issue of load balancing among Photolithography machines in semiconductor Manufacturing. This issue is derived from the dedicated Photolithography machine constraint. It is one of the new challenges introduced in Photolithography machinery due to natural bias. However, many scheduling policies or modeling methods proposed by previous research for the semiconductor manufacturing production have not addressed the load balancing issue and dedicated machine constraint. In this paper, we describe the design of the proposed MSS approach in detail, including the system architecture, coordination strategy, and its scheduling method on the RSEM. We also present the simulation results that validate the approach.

Ha Ran Hwang - One of the best experts on this subject based on the ideXlab platform.

  • Minimization of Total Processing Time in Semiconductor Photolithography Process
    Applied Mechanics and Materials, 2013
    Co-Authors: You Jin Park, Ha Ran Hwang
    Abstract:

    This paper focuses on a scheduling problem in Photolithography process of semiconductor manufacturing. The Photolithography equipment can be divided into three main parts, that is, scanner, spinner, and developer. Generally, in like manner to the other processes, the identical product types are processed at the same time in Photolithography process since a certain amount of recipe change time is required whenever product type is changed. So, in this research, we consider multi-product production case with different processing times and flow recipes, and then attempt to reduce total processing time in Photolithography process. From this research, we show that the total processing time can be minimized if we give a variety of input orders of lots and wafers.

  • A rule-based simulation approach to scheduling problem in semiconductor Photolithography process
    2013 8th International Conference on Intelligent Systems: Theories and Applications (SITA), 2013
    Co-Authors: You Jin Park, Ha Ran Hwang
    Abstract:

    In this research, we consider a scheduling problem in Photolithography process of semiconductor manufacturing. Generally, the Photolithography process can be regarded as the most important processes since it may affect the fab productivity due to its various technological attributes. Physically, the Photolithography equipment consists of three main parts: scanner, spinner, and developer, and it is designed to process different types of products as a machine for general purpose. However, in current semiconductor fab system, the same type of product is processed in order to reduce recipe change time incurred by changing masks in scanner module. So, in this study, the multi-product production case with different recipes is considered in Photolithography process, and 4 different lot-wafer input methods are evaluated from makespan point of view.

Alan Liu - One of the best experts on this subject based on the ideXlab platform.

  • Load Balancing Among Photolithography Machines in the Semiconductor Manufacturing System
    Journal of Information Science and Engineering, 2008
    Co-Authors: Arthur M. D. Shr, Alan Liu, Peter P. Chen
    Abstract:

    We propose a Load Balancing (LB) scheduling approach to tackle the load balancing issue in the semiconductor manufacturing system. This issue is derived from the dedicated Photolithography machine constraint. The constraint of having a dedicated machine for the Photolithography process in semiconductor manufacturing is one of the new challenges introduced in Photolithography machinery due to natural bias. To prevent the impact of natural bias, the wafer lots passing through each Photolithography process have to be processed on the same machine. However, the previous research for the semiconductor manufacturing production has not addressed the load balancing issue and dedicated Photolithography machine constraint. In this paper, along with providing the LB approach to the issue, we also present a novel model, Resource Schedule and Execution Matrix (RSEM) – the representation and manipulation methods for the task process patterns. The advantage of the proposed approach is to easily schedule the wafer lots by using a simple two-dimensional matrix. We also present the simulation results to validate our approach.

  • BASYS - A Load Balancing Method for Dedicated Photolithography Machine Constraint
    Information Technology For Balanced Manufacturing Systems, 2006
    Co-Authors: Arthur M. D. Shr, Alan Liu, Peter P. Chen
    Abstract:

    The dedicated Photolithography machine constraint in semiconductor manufacturing is one of the new issues of Photolithography machinery due to natural bias. In this paper, we propose the heuristic Load Balancing (LB) scheduling approach based on a Resource Schedule and Execution Matrix (RSEM) to tackle this constraint. The LB method is to schedule each wafer lot at the first Photolithography stage to a suitable machine, according to the load balancing factors among machines. We describe the proposed LB scheduling method and present an example to demonstrate the proposed method and the result of the simulations to validate the approach.

  • Load Balancing among Photolithography Machines in Semiconductor Manufacturing
    2006 3rd International IEEE Conference Intelligent Systems, 2006
    Co-Authors: Arthur M. D. Shr, Alan Liu, Peter P. Chen
    Abstract:

    We propose a Multiagent Scheduling System (MSS) based on a Resource Schedule and Execution Matrix (RSEM) to tackle the issue of load balancing among Photolithography machines in semiconductor Manufacturing. This issue is derived from the dedicated Photolithography machine constraint. It is one of the new challenges introduced in Photolithography machinery due to natural bias. However, many scheduling policies or modeling methods proposed by previous research for the semiconductor manufacturing production have not addressed the load balancing issue and dedicated machine constraint. In this paper, we describe the design of the proposed MSS approach in detail, including the system architecture, coordination strategy, and its scheduling method on the RSEM. We also present the simulation results that validate the approach.

Yongtao Fan - One of the best experts on this subject based on the ideXlab platform.

  • chalcogenide phase change thin films used as grayscale Photolithography materials
    Optics Express, 2014
    Co-Authors: Rui Wang, Jingsong Wei, Yongtao Fan
    Abstract:

    Chalcogenide phase-change thin films are used in many fields, such as optical information storage and solid-state memory. In this work, we present another application of chalcogenide phase-change thin films, i.e., as grayscale photolithgraphy materials. The grayscale patterns can be directly inscribed on the chalcogenide phase-change thin films by a single process through direct laser writing method. In grayscale Photolithography, the laser pulse can induce the formation of bump structure, and the bump height and size can be precisely controlled by changing laser energy. Bumps with different height and size present different optical reflection and transmission spectra, leading to the different gray levels. For example, the continuous-tone grayscale images of lifelike bird and cat are successfully inscribed onto Sb2Te3 chalcogenide phase-change thin films using a home-built laser direct writer, where the expression and appearance of the lifelike bird and cat are fully presented. This work provides a way to fabricate complicated grayscale patterns using laser-induced bump structures onto chalcogenide phase-change thin films, different from current techniques such as Photolithography, electron beam lithography, and focused ion beam lithography. The ability to form grayscale patterns of chalcogenide phase-change thin films reveals many potential applications in high-resolution optical images for micro/nano image storage, microartworks, and grayscale photomasks.