The Experts below are selected from a list of 38193 Experts worldwide ranked by ideXlab platform
Yi Chieh Lai - One of the best experts on this subject based on the ideXlab platform.
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gan metalens for pixel level full color routing at visible light
Nano Letters, 2017Co-Authors: Bo Han Chen, Yi Chieh Lai, Cheng Hung Chu, Chen I Lee, Jia Wern Chen, Yu Han Chen, Yung Chiang Lan, Chiehhsiung Kuan, Din Ping TsaiAbstract:Metasurface-based components are known to be one of the promising candidates for developing flat optical systems. However, their low working efficiency highly limits the use of such flat components for feasible applications. Although the introduction of the metallic mirror has been demonstrated to successfully enhance the efficiency, it is still somehow limited for imaging and sensing applications because they are only available for devices operating in a reflection fashion. Here, we demonstrate three individual GaN-based metalenses working in a transmission window with extremely high operation efficiency at visible light (87%, 91.6%, and 50.6% for blue, green, and red light, respectively). For the proof of concept, a multiplex color router with dielectric metalens, which is capable of guiding individual primary colors into different spatial positions, is experimentally verified based on the design of out-of-plane focusing metalens. Our approach with low-cost, Semiconductor Fabrication compatibility and h...
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GaN Metalens for Pixel-Level Full-Color Routing at Visible Light
2017Co-Authors: Bo Han Chen, Yi Chieh Lai, Cheng Hung Chu, Chen I Lee, Jia Wern Chen, Yu Han Chen, Yung Chiang Lan, Chiehhsiung KuanAbstract:Metasurface-based components are known to be one of the promising candidates for developing flat optical systems. However, their low working efficiency highly limits the use of such flat components for feasible applications. Although the introduction of the metallic mirror has been demonstrated to successfully enhance the efficiency, it is still somehow limited for imaging and sensing applications because they are only available for devices operating in a reflection fashion. Here, we demonstrate three individual GaN-based metalenses working in a transmission window with extremely high operation efficiency at visible light (87%, 91.6%, and 50.6% for blue, green, and red light, respectively). For the proof of concept, a multiplex color router with dielectric metalens, which is capable of guiding individual primary colors into different spatial positions, is experimentally verified based on the design of out-of-plane focusing metalens. Our approach with low-cost, Semiconductor Fabrication compatibility and high working efficiency characteristics offers a way for establishing a complete set of flat optical components for a wide range of applications such as compact imaging sensors, optical spectroscopy, and high-resolution lithography, just named a few
Din Ping Tsai - One of the best experts on this subject based on the ideXlab platform.
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gan metalens for pixel level full color routing at visible light
Nano Letters, 2017Co-Authors: Bo Han Chen, Yi Chieh Lai, Cheng Hung Chu, Chen I Lee, Jia Wern Chen, Yu Han Chen, Yung Chiang Lan, Chiehhsiung Kuan, Din Ping TsaiAbstract:Metasurface-based components are known to be one of the promising candidates for developing flat optical systems. However, their low working efficiency highly limits the use of such flat components for feasible applications. Although the introduction of the metallic mirror has been demonstrated to successfully enhance the efficiency, it is still somehow limited for imaging and sensing applications because they are only available for devices operating in a reflection fashion. Here, we demonstrate three individual GaN-based metalenses working in a transmission window with extremely high operation efficiency at visible light (87%, 91.6%, and 50.6% for blue, green, and red light, respectively). For the proof of concept, a multiplex color router with dielectric metalens, which is capable of guiding individual primary colors into different spatial positions, is experimentally verified based on the design of out-of-plane focusing metalens. Our approach with low-cost, Semiconductor Fabrication compatibility and h...
Shao Chung Hsu - One of the best experts on this subject based on the ideXlab platform.
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requirement estimation for indirect workforce allocation in Semiconductor manufacturing
International Journal of Production Research, 2010Co-Authors: Chenfu Chien, Wenchih Chen, Shao Chung HsuAbstract:This work, based on a real case, presents a model to estimate indirect workforce requirements of Semiconductor Fabrication facilities (fabs) so that the workforce can be fairly allocated. There is a concern in a real setting to fairly allocate the overall corporate workforce among the fabs, particularly when they compete in performance, and properly determining the actual requirement is the most critical in the decision process. The actual requirements of the workforce, especially the indirect workforce, for fabs may be indeterminate due to the lack of a well-defined workforce-output relationship. This paper presents a non-parametric frontier approach for estimating the indirect workforce, and the estimate is based on the best past performance adjusted to reflect the expected productivity growth. An empirical study was conducted in a leading foundry in Taiwan that has a number of 8-inch fabs. The proposed (re)allocation approach can provide an explicit decision support mechanism to balance the workloads i...
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an indirect workforce re allocation model for Semiconductor manufacturing
Winter Simulation Conference, 2008Co-Authors: Chenfu Chien, Wenchih Chen, Shao Chung HsuAbstract:Semiconductor industry is a capital intensive and knowledge intensive industry, in which human resource management and human capital enhancement is increasingly important. To maintain competitive human resource, it is critical to develop a decision framework for headcount planning and workforce allocation for indirect labors. Motivated by the needs in real setting, this study aims to develop a model for allocating indirect workforce among Semiconductor Fabrication facilities to meet expected outputs and labor productivity improvement. Workforce allocation and reallocation based on the overall corporate workforce level is essential so that the shortage or exceed workforce will be balanced among different production sites. The key to achieve this purpose is the proper understanding of real requirements of each production site according to its corresponding tasks assigned. Non-parametric activity analysis approach is used for the workforce requirement estimation given delegated tasks. The estimation is based on the best performance from the past with adjustments reflecting the expected productivity growth.
Chenfu Chien - One of the best experts on this subject based on the ideXlab platform.
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big data analytics for modeling wat parameter variation induced by process tool in Semiconductor manufacturing and empirical study
Winter Simulation Conference, 2016Co-Authors: Chenfu Chien, Yingjen ChenAbstract:With the feature size shrinkage in advanced technology nodes, the modeling of process variations has become more critical for troubleshooting and yield enhancement. Misalignment among equipment tools or chambers in process stages is a major source of process variations. Because a process flow contains hundreds of stages during Semiconductor Fabrication, tool/chamber misalignment may more significantly affect the variation of transistor parameters in a wafer acceptance test. This study proposes a big data analytic framework that simultaneously considers the mean difference between tools and wafer-to-wafer variation and identifies possible root causes for yield enhancement. An empirical study was conducted to demonstrate the effectiveness of proposed approach and obtained promising results.
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requirement estimation for indirect workforce allocation in Semiconductor manufacturing
International Journal of Production Research, 2010Co-Authors: Chenfu Chien, Wenchih Chen, Shao Chung HsuAbstract:This work, based on a real case, presents a model to estimate indirect workforce requirements of Semiconductor Fabrication facilities (fabs) so that the workforce can be fairly allocated. There is a concern in a real setting to fairly allocate the overall corporate workforce among the fabs, particularly when they compete in performance, and properly determining the actual requirement is the most critical in the decision process. The actual requirements of the workforce, especially the indirect workforce, for fabs may be indeterminate due to the lack of a well-defined workforce-output relationship. This paper presents a non-parametric frontier approach for estimating the indirect workforce, and the estimate is based on the best past performance adjusted to reflect the expected productivity growth. An empirical study was conducted in a leading foundry in Taiwan that has a number of 8-inch fabs. The proposed (re)allocation approach can provide an explicit decision support mechanism to balance the workloads i...
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an indirect workforce re allocation model for Semiconductor manufacturing
Winter Simulation Conference, 2008Co-Authors: Chenfu Chien, Wenchih Chen, Shao Chung HsuAbstract:Semiconductor industry is a capital intensive and knowledge intensive industry, in which human resource management and human capital enhancement is increasingly important. To maintain competitive human resource, it is critical to develop a decision framework for headcount planning and workforce allocation for indirect labors. Motivated by the needs in real setting, this study aims to develop a model for allocating indirect workforce among Semiconductor Fabrication facilities to meet expected outputs and labor productivity improvement. Workforce allocation and reallocation based on the overall corporate workforce level is essential so that the shortage or exceed workforce will be balanced among different production sites. The key to achieve this purpose is the proper understanding of real requirements of each production site according to its corresponding tasks assigned. Non-parametric activity analysis approach is used for the workforce requirement estimation given delegated tasks. The estimation is based on the best performance from the past with adjustments reflecting the expected productivity growth.
Bo Han Chen - One of the best experts on this subject based on the ideXlab platform.
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gan metalens for pixel level full color routing at visible light
Nano Letters, 2017Co-Authors: Bo Han Chen, Yi Chieh Lai, Cheng Hung Chu, Chen I Lee, Jia Wern Chen, Yu Han Chen, Yung Chiang Lan, Chiehhsiung Kuan, Din Ping TsaiAbstract:Metasurface-based components are known to be one of the promising candidates for developing flat optical systems. However, their low working efficiency highly limits the use of such flat components for feasible applications. Although the introduction of the metallic mirror has been demonstrated to successfully enhance the efficiency, it is still somehow limited for imaging and sensing applications because they are only available for devices operating in a reflection fashion. Here, we demonstrate three individual GaN-based metalenses working in a transmission window with extremely high operation efficiency at visible light (87%, 91.6%, and 50.6% for blue, green, and red light, respectively). For the proof of concept, a multiplex color router with dielectric metalens, which is capable of guiding individual primary colors into different spatial positions, is experimentally verified based on the design of out-of-plane focusing metalens. Our approach with low-cost, Semiconductor Fabrication compatibility and h...
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GaN Metalens for Pixel-Level Full-Color Routing at Visible Light
2017Co-Authors: Bo Han Chen, Yi Chieh Lai, Cheng Hung Chu, Chen I Lee, Jia Wern Chen, Yu Han Chen, Yung Chiang Lan, Chiehhsiung KuanAbstract:Metasurface-based components are known to be one of the promising candidates for developing flat optical systems. However, their low working efficiency highly limits the use of such flat components for feasible applications. Although the introduction of the metallic mirror has been demonstrated to successfully enhance the efficiency, it is still somehow limited for imaging and sensing applications because they are only available for devices operating in a reflection fashion. Here, we demonstrate three individual GaN-based metalenses working in a transmission window with extremely high operation efficiency at visible light (87%, 91.6%, and 50.6% for blue, green, and red light, respectively). For the proof of concept, a multiplex color router with dielectric metalens, which is capable of guiding individual primary colors into different spatial positions, is experimentally verified based on the design of out-of-plane focusing metalens. Our approach with low-cost, Semiconductor Fabrication compatibility and high working efficiency characteristics offers a way for establishing a complete set of flat optical components for a wide range of applications such as compact imaging sensors, optical spectroscopy, and high-resolution lithography, just named a few
