Vapour Deposition

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Ivan P Parkin - One of the best experts on this subject based on the ideXlab platform.

Claire J Carmalt - One of the best experts on this subject based on the ideXlab platform.

  • scaling aerosol assisted chemical Vapour Deposition exploring the relationship between growth rate and film properties
    2017
    Co-Authors: Michael Powell, Ivan P Parkin, Dominic B Potter, Rachel L Wilson, Jawwad A Darr, Claire J Carmalt
    Abstract:

    Abstract Thin films of fluorine doped tin oxide were deposited, by an aerosol assisted chemical Vapour Deposition route, to study the effect of scaling the growth rate. The effect of precursor concentration on the growth rate of the films and the properties of deposited films were compared. The films were characterised by X-ray diffraction, scanning electron microscopy, UV/vis spectroscopy, X-ray photoelectron spectroscopy and Hall effect measurements. A maximum film growth rate of ca. 100 nm min− 1 was observed, which is significantly faster than previously reported aerosol assisted studies. This method shows the ability of aerosol assisted methods to deliver high growth rates whilst maintaining the ease of doping and control over stoichiometry.

  • synthesis and material characterization of amorphous and crystalline α al2o3 via aerosol assisted chemical Vapour Deposition
    2016
    Co-Authors: Sapna D Ponja, Ivan P Parkin, Claire J Carmalt
    Abstract:

    The facile synthesis of Al2O3 in the amorphous and corundum phase on both glass and quartz substrates is reported. The synthesis was carried out via aerosol assisted chemical Vapour Deposition using Al(acac)3 and methanol. The films were analyzed using XRD, SEM, UV-vis spectroscopy and XPS. The coatings were highly crystalline (when annealed) with low carbon contamination levels and a relatively featureless morphology that gave rise to ultra high transparency in the UV, visible and near IR portions of the electromagnetic spectrum.

  • scalable route to ch3nh3pbi3 perovskite thin films by aerosol assisted chemical Vapour Deposition
    2015
    Co-Authors: Davinder S Bhachu, Ivan P Parkin, David O Scanlon, E J Saban, Hugo Bronstein, Claire J Carmalt, Robert G Palgrave
    Abstract:

    Methyl-ammonium lead iodide is the archetypal perovskite solar cell material. Phase pure, compositionally uniform methyl-ammonium lead iodide thin films on large glass substrates were deposited using ambient pressure aerosol assisted chemical Vapour Deposition. This opens up a route to efficient scale up of hybrid perovskite film growth towards industrial deployment.

  • atmospheric pressure chemical Vapour Deposition of vanadium diselenide thin films
    2007
    Co-Authors: Nicolas D Boscher, Ivan P Parkin, Claire J Carmalt, Christopher S Blackman, Garcia A Prieto
    Abstract:

    Abstract Atmospheric pressure chemical Vapour Deposition (APCVD) of vanadium diselenide thin films on glass substrates was achieved by reaction of [V(NMe 2 ) 4 ] and t Bu 2 Se. X-ray diffraction showed that the VSe 2 films were crystalline with preferential growth either along the (1 0 1) or the (1 1 0) direction. Energy-dispersive analysis by X-rays (EDAX) gave a V:Se ratio close to 1:2 for all films. The films were matt black in appearance, were adhesive, passed the Scotch tape test but could be scratched with a steel scalpel. SEM showed that the films were composed of plate-like crystallites orientated parallel to the substrate which become longer and thicker with increasing Deposition temperature. Attempts to produce vanadium selenide films were also performed using t Bu 2 Se and two different vanadium precursors: VCl 4 and VOCl 3 . Both were found to be unsuitable for producing VSe 2 from the APCVD reaction with t Bu 2 Se. The VSe 2 showed charge density wave transition at 110–115 K.

  • atmospheric pressure chemical Vapour Deposition of ws2 thin films on glass
    2003
    Co-Authors: Claire J Carmalt, Ivan P Parkin, Emily S Peters
    Abstract:

    The atmospheric pressure chemical Vapour Deposition reaction Of W(CO)(6), WOCl4 or WCl6 with HS(CH2)(2)SH or HSC(CH3)(3) at 350-600degreesC leads to thin films Of WS2 on glass substrates. The WS2 films were nanocrystalline, showed a W:S ratio of 1:2 by EDAX and gave Raman bands at 416 and 351 cm(-1). The films were silver or gold in colour, adhesive to the substrate and showed Volmer-Webber type growth by SEM. Optical band gaps were 1.4 eV. The films were reflective in the visible region and transparent in the near IR. (C) 2003 Elsevier Science Ltd. All rights reserved.

Russell Binions - One of the best experts on this subject based on the ideXlab platform.

  • synthesis of highly surface textured zno thin films by aerosol assisted chemical Vapour Deposition
    2015
    Co-Authors: Shuqun Chen, Rory M Wilson, Russell Binions
    Abstract:

    ZnO thin films with hexagonal pyramid-shaped surfaces were deposited on fluorine tin oxide (FTO) glass substrate by aerosol assisted chemical Vapour Deposition (AACVD). The coatings exhibit high optical transparency (∼70–80% at 550 nm) and ultra-large haze factor (up to 91.6%), which can be potentially used as the front contact in silicon thin-film solar cells.

  • chemical Vapour Deposition of thermochromic vanadium dioxide thin films for energy efficient glazing
    2014
    Co-Authors: Michael E. A. Warwick, Russell Binions
    Abstract:

    Abstract Vanadium dioxide is a thermochromic material that undergoes a semiconductor to metal transitions at a critical temperature of 68 °C. This phase change from a low temperature monoclinic structure to a higher temperature rutile structure is accompanied by a marked change in infrared reflectivity and change in resistivity. This ability to have a temperature-modulated film that can limit solar heat gain makes vanadium dioxide an ideal candidate for thermochromic energy efficient glazing. In this review we detail the current challenges to such glazing becoming a commercial reality and describe the key chemical Vapour Deposition technologies being employed in the latest research.

  • templated growth of smart coatings hybrid chemical Vapour Deposition of vanadyl acetylacetonate with tetraoctyl ammonium bromide
    2009
    Co-Authors: Manfredi Saeli, Clara Piccirillo, Russell Binions, Ivan P Parkin
    Abstract:

    Hybrid aerosol assisted and atmospheric pressure chemical Vapour Deposition methodology has been utilised to produce thin films of vanadium dioxide from vanadyl acetylacetonate. Tetraoctyl ammonium bromide (TOAB) was used in the aerosol precursor solution. The films were analysed by X-ray diffraction, scanning electron microscopy (SEM) and X-ray photoelectron spectroscopy. Their optical and thermochromic behaviour was also determined. It was found that the use of TOAB had a templating effect that led to a halving in the particle size and that this consequently led to a significant decrease in the thermochromic transition temperature of the films to 34 °C.

  • synthesis and characterisation of w doped vo2 by aerosol assisted chemical Vapour Deposition
    2008
    Co-Authors: Clara Piccirillo, Russell Binions, Ivan P Parkin
    Abstract:

    Abstract W-doped vanadium dioxide thin films were deposited by Aerosol Assisted Chemical Vapour Deposition. Samples were characterised with several different techniques (i.e. X-ray Diffraction, Raman, Scanning Electron Microscopy–Energy Dispersive X-ray Analysis), to determine their composition and morphology. A study of their optical properties was also performed, to test the suitability of these materials as intelligent window coatings. Good changes in the transmittance and reflectance were observed above the transition temperature (decrease and increase respectively). A linear decrease in the transition temperature with increasing tungsten content was also seen, lowering it to room temperature.

  • Chemical Vapour Deposition of metal oxides and phosphides
    2006
    Co-Authors: Russell Binions
    Abstract:

    This thesis investigates the Deposition of thin films of main group metal phosphide and main group metal oxide compounds on glass substrates by the use of dual source atmospheric pressure chemical Vapour Deposition. Binary phosphide systems with tin, germanium, silicon, antimony, copper or boron have been examined. Binary oxide systems of gallium, antimony, tin or niobium have also been investigated. Additionally these systems were deposited on gas sensor substrates and evaluated as metal oxide semiconductor gas sensors. Halides were used as the metal precursor, RXPH3.X (R = Cychex or Phenyl) were used as phosphorous precursors and either methanol or ethyl acetate were used as oxygen precursors. These coatings showed good uniformity and coverage and the films were adherent passing the Scotch tape test. The tin phosphide films were opaque in appearance with some signs of birefringence due to differential thickness effects. Germanium phosphide and the gallium, antimony, niobium and tin oxide systems were all transparent, once again birefringence was observed. The films produced from the antimony phosphide and silicon phosphide systems were opaque, grey and metallic. Additional work was conducted on the Deposition on a variety of alkali metal and alkaline earth metal fluorides on glass substrates using aerosol assisted chemical Vapour Deposition. In all cases the films were very powdery and were easily wiped off of the substrate. A number of Depositions were carried out combining the aerosol and atmospheric pressure methodologies. A tin oxide film was produced from the atmospheric pressure chemical Vapour Deposition reaction of tin tetrachloride and ethyl acetate. The film contained tungsten, which was introduced into the reaction using a polyoxometalate delivered via aerosol assisted chemical Vapour Deposition. Films were analysed using Raman microscopy, X-ray diffraction, scanning electron microscopy, energy dispersive analysis of X-rays, electron probe microanalysis, X-ray photoelectron spectroscopy and ultra violet and visible spectroscopy.

Alexander Malesevic - One of the best experts on this subject based on the ideXlab platform.

  • synthesis of few layer graphene via microwave plasma enhanced chemical Vapour Deposition
    2008
    Co-Authors: Alexander Malesevic, Roumen Vitchev, K Schouteden, A Volodin, Liang Zhang, Gustaaf Van Tendeloo, Annick Vanhulsel, Christian Van Haesendonck
    Abstract:

    If graphene is ever going to live up to the promises of future nanoelectronic devices, an easy and cheap route for mass production is an essential requirement. A way to extend the capabilities of plasma-enhanced chemical Vapour Deposition to the synthesis of freestanding few-layer graphene is presented. Micrometre-wide flakes consisting of four to six atomic layers of stacked graphene sheets have been synthesized by controlled recombination of carbon radicals in a microwave plasma. A simple and highly reproducible technique is essential, since the resulting flakes can be synthesized without the need for a catalyst on the surface of any substrate that withstands elevated temperatures up to 700 °C. A thorough structural analysis of the flakes is performed with electron microscopy, x-ray diffraction, Raman spectroscopy and scanning tunnelling microscopy. The resulting graphene flakes are aligned vertically to the substrate surface and grow according to a three-step process, as revealed by the combined analysis of electron microscopy and x-ray photoelectron spectroscopy.

Joan M Redwing - One of the best experts on this subject based on the ideXlab platform.